JP7576635B2 - 光学対物レンズを回転させるための装置および方法 - Google Patents

光学対物レンズを回転させるための装置および方法 Download PDF

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JP7576635B2
JP7576635B2 JP2022569122A JP2022569122A JP7576635B2 JP 7576635 B2 JP7576635 B2 JP 7576635B2 JP 2022569122 A JP2022569122 A JP 2022569122A JP 2022569122 A JP2022569122 A JP 2022569122A JP 7576635 B2 JP7576635 B2 JP 7576635B2
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objective lens
darkfield
sample
illumination
dark field
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JP2023525584A (ja
JP2023525584A5 (https=
Inventor
アナトリー ロマノフスキー
ジェン－クエン レオン
ダニエル カバルディエフ
チュンハイ ワン
ブレット ホワイトサイド
ヂウェイ スティーブ シュー
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KLA Corp
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KLA Corp
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95684—Patterns showing highly reflecting parts, e.g. metallic elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/06—Means for illuminating specimens
    • G02B21/08—Condensers
    • G02B21/10—Condensers affording dark-field illumination
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/24—Base structure
    • G02B21/26—Stages; Adjusting means therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G01N2021/8822—Dark field detection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G01N2021/8822—Dark field detection
    • G01N2021/8825—Separate detection of dark field and bright field
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/06—Illumination; Optics
    • G01N2201/063—Illuminating optical parts

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  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Optics & Photonics (AREA)
  • Microscoopes, Condenser (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
JP2022569122A 2020-05-15 2021-05-10 光学対物レンズを回転させるための装置および方法 Active JP7576635B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US202063025192P 2020-05-15 2020-05-15
US63/025,192 2020-05-15
US17/313,703 2021-05-06
US17/313,703 US11733172B2 (en) 2020-05-15 2021-05-06 Apparatus and method for rotating an optical objective
PCT/US2021/031662 WO2021231342A1 (en) 2020-05-15 2021-05-10 Apparatus and method for rotating an optical objective

Publications (3)

Publication Number Publication Date
JP2023525584A JP2023525584A (ja) 2023-06-16
JP2023525584A5 JP2023525584A5 (https=) 2024-03-18
JP7576635B2 true JP7576635B2 (ja) 2024-10-31

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JP2022569122A Active JP7576635B2 (ja) 2020-05-15 2021-05-10 光学対物レンズを回転させるための装置および方法

Country Status (7)

Country Link
US (1) US11733172B2 (https=)
EP (1) EP4115229A4 (https=)
JP (1) JP7576635B2 (https=)
KR (1) KR102735955B1 (https=)
CN (1) CN115516361B (https=)
TW (1) TWI860476B (https=)
WO (1) WO2021231342A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7640397B2 (ja) * 2021-07-28 2025-03-05 アンリツ株式会社 物品検査装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007024876A (ja) 2005-07-18 2007-02-01 Samsung Electronics Co Ltd 内部に少なくとも一対のビーム経路を有するレンズユニットを具備する光学的検査装置及びこれを用いて基板の表面欠陥を検出する方法
JP2018512623A (ja) 2015-04-13 2018-05-17 カール・ツアイス・インダストリーエレ・メステクニク・ゲーエムベーハー 可変の作動距離用の入射光照明
JP2019521368A (ja) 2016-04-28 2019-07-25 エーエスエムエル ネザーランズ ビー．ブイ． Ｈｈｇ源、検査装置、および測定を実施する方法

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DE408638C (de) * 1924-01-17 1925-01-22 Ernst Leitz Spiegelkondensor fuer Dunkelfeldbeleuchtung
JP2732123B2 (ja) * 1989-06-19 1998-03-25 旭光学工業株式会社 パターン検査装置
US5820250A (en) 1995-10-24 1998-10-13 Dolan-Jenner Industries, Inc. Dark field illuminator ringlight adaptor
JP3185878B2 (ja) 1998-09-25 2001-07-11 日本電気株式会社 光学的検査装置
AU2002219847A1 (en) 2000-11-15 2002-05-27 Real Time Metrology, Inc. Optical method and apparatus for inspecting large area planar objects
US6538730B2 (en) 2001-04-06 2003-03-25 Kla-Tencor Technologies Corporation Defect detection system
US7369233B2 (en) * 2002-11-26 2008-05-06 Kla-Tencor Technologies Corporation Optical system for measuring samples using short wavelength radiation
US7433031B2 (en) * 2003-10-29 2008-10-07 Core Tech Optical, Inc. Defect review system with 2D scanning and a ring detector
WO2007008742A1 (en) * 2005-07-08 2007-01-18 Electro Scientific Industries, Inc. Optimizing use and performance of optical systems implemented with telecentric on-axis dark field illumination
DE102009017694B3 (de) * 2009-04-15 2010-12-02 Göpel electronic GmbH Anordnung einer rotatorischen Bildaufnahmeeinheit für die Abbildung von Objekten auf Leiterplatten unter einem polaren Betrachtungswinkel von 45°
JP5639169B2 (ja) * 2009-07-22 2014-12-10 ケーエルエー−テンカー・コーポレーションＫｌａ−Ｔｅｎｃｏｒ Ｃｏｒｐｏｒａｔｉｏｎ 暗視野検査システムおよび暗視野検査システムを構成する方法
US9044141B2 (en) * 2010-02-10 2015-06-02 Tokitae Llc Systems, devices, and methods including a dark-field reflected-illumination apparatus
DE102011114377A1 (de) * 2011-09-23 2013-03-28 Carl Zeiss Microscopy Gmbh Vorrichtung und Verfahren zur Durchlichtbeleuchtung für Lichtmikroskope und Mikroskopsystem
US10437034B2 (en) * 2014-10-14 2019-10-08 Nanotronics Imaging, Inc. Unique oblique lighting technique using a brightfield darkfield objective and imaging method relating thereto
US10072921B2 (en) * 2014-12-05 2018-09-11 Kla-Tencor Corporation Methods and systems for spectroscopic beam profile metrology having a first two dimensional detector to detect collected light transmitted by a first wavelength dispersive element
FR3045156B1 (fr) * 2015-12-11 2017-12-22 Soitec Silicon On Insulator Procede de detection de defauts et dispositif associe
US10739275B2 (en) 2016-09-15 2020-08-11 Kla-Tencor Corporation Simultaneous multi-directional laser wafer inspection
CN207833096U (zh) * 2018-01-23 2018-09-07 芜湖市奥尔特光电科技有限公司 一种a-117痕迹检验综合仪

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007024876A (ja) 2005-07-18 2007-02-01 Samsung Electronics Co Ltd 内部に少なくとも一対のビーム経路を有するレンズユニットを具備する光学的検査装置及びこれを用いて基板の表面欠陥を検出する方法
JP2018512623A (ja) 2015-04-13 2018-05-17 カール・ツアイス・インダストリーエレ・メステクニク・ゲーエムベーハー 可変の作動距離用の入射光照明
JP2019521368A (ja) 2016-04-28 2019-07-25 エーエスエムエル ネザーランズ ビー．ブイ． Ｈｈｇ源、検査装置、および測定を実施する方法

Also Published As

Publication number Publication date
EP4115229A1 (en) 2023-01-11
JP2023525584A (ja) 2023-06-16
US11733172B2 (en) 2023-08-22
TW202146974A (zh) 2021-12-16
TWI860476B (zh) 2024-11-01
WO2021231342A1 (en) 2021-11-18
CN115516361A (zh) 2022-12-23
CN115516361B (zh) 2026-04-17
EP4115229A4 (en) 2024-04-24
US20210356406A1 (en) 2021-11-18
KR20230005402A (ko) 2023-01-09
KR102735955B1 (ko) 2024-11-28

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