JP2023514839A5 - - Google Patents

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Publication number
JP2023514839A5
JP2023514839A5 JP2022549846A JP2022549846A JP2023514839A5 JP 2023514839 A5 JP2023514839 A5 JP 2023514839A5 JP 2022549846 A JP2022549846 A JP 2022549846A JP 2022549846 A JP2022549846 A JP 2022549846A JP 2023514839 A5 JP2023514839 A5 JP 2023514839A5
Authority
JP
Japan
Prior art keywords
base plate
coolant channel
fin
fins
plate according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2022549846A
Other languages
English (en)
Japanese (ja)
Other versions
JP2023514839A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2021/018445 external-priority patent/WO2021168027A1/en
Publication of JP2023514839A publication Critical patent/JP2023514839A/ja
Publication of JP2023514839A5 publication Critical patent/JP2023514839A5/ja
Priority to JP2025279710A priority Critical patent/JP2026053556A/ja
Pending legal-status Critical Current

Links

JP2022549846A 2020-02-20 2021-02-18 基板処理台座のための内部フィンを備えた冷却剤チャネル Pending JP2023514839A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2025279710A JP2026053556A (ja) 2020-02-20 2025-12-24 基板処理台座のための内部フィンを備えた冷却剤チャネル

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US202062978899P 2020-02-20 2020-02-20
US62/978,899 2020-02-20
PCT/US2021/018445 WO2021168027A1 (en) 2020-02-20 2021-02-18 Coolant channel with internal fins for substrate processing pedestals

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2025279710A Division JP2026053556A (ja) 2020-02-20 2025-12-24 基板処理台座のための内部フィンを備えた冷却剤チャネル

Publications (2)

Publication Number Publication Date
JP2023514839A JP2023514839A (ja) 2023-04-11
JP2023514839A5 true JP2023514839A5 (https=) 2024-04-01

Family

ID=77391637

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2022549846A Pending JP2023514839A (ja) 2020-02-20 2021-02-18 基板処理台座のための内部フィンを備えた冷却剤チャネル
JP2025279710A Pending JP2026053556A (ja) 2020-02-20 2025-12-24 基板処理台座のための内部フィンを備えた冷却剤チャネル

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2025279710A Pending JP2026053556A (ja) 2020-02-20 2025-12-24 基板処理台座のための内部フィンを備えた冷却剤チャネル

Country Status (5)

Country Link
US (2) US12381105B2 (https=)
JP (2) JP2023514839A (https=)
KR (2) KR20260009393A (https=)
CN (1) CN115136279A (https=)
WO (1) WO2021168027A1 (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7765621B2 (ja) * 2023-09-12 2025-11-06 日本碍子株式会社 ウエハ載置台
JP2026000821A (ja) * 2024-06-18 2026-01-06 Toto株式会社 静電チャック
TW202601881A (zh) * 2024-06-18 2026-01-01 日商Ｔｏｔｏ股份有限公司 靜電吸盤
JP2026015960A (ja) * 2024-07-22 2026-02-03 東京エレクトロン株式会社 ステージ、および基板処理装置
KR102892423B1 (ko) * 2025-04-28 2025-11-27 성균관대학교 산학협력단 냉각 유체 및 기포 배출 촉진 구조를 구비한 히트 싱크

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3921234B2 (ja) 2002-02-28 2007-05-30 キヤノンアネルバ株式会社 表面処理装置及びその製造方法
US7221553B2 (en) 2003-04-22 2007-05-22 Applied Materials, Inc. Substrate support having heat transfer system
US7593229B2 (en) * 2006-03-31 2009-09-22 Hong Kong Applied Science & Technology Research Institute Co. Ltd Heat exchange enhancement
JP4564973B2 (ja) * 2007-01-26 2010-10-20 株式会社日立ハイテクノロジーズ プラズマ処理装置
US7649729B2 (en) * 2007-10-12 2010-01-19 Applied Materials, Inc. Electrostatic chuck assembly
JP2011040528A (ja) * 2009-08-10 2011-02-24 Hitachi High-Technologies Corp プラズマ処理装置
JP2011165939A (ja) * 2010-02-10 2011-08-25 Denso Corp 積層型冷却器
US10714315B2 (en) 2012-10-12 2020-07-14 Asm Ip Holdings B.V. Semiconductor reaction chamber showerhead
JP6173936B2 (ja) 2013-02-28 2017-08-02 東京エレクトロン株式会社 載置台及びプラズマ処理装置
WO2015027004A1 (en) * 2013-08-21 2015-02-26 CoolChip Technologies, Inc. Kinetic heat-sink with interdigitated heat-transfer fins
KR101574740B1 (ko) 2013-08-28 2015-12-04 (주)젠 기상식각 및 세정을 위한 플라즈마 장치
US9741593B2 (en) * 2015-08-06 2017-08-22 Applied Materials, Inc. Thermal management systems and methods for wafer processing systems
JP6183567B1 (ja) * 2016-05-13 2017-08-23 Toto株式会社 静電チャック
JP6918642B2 (ja) * 2017-08-25 2021-08-11 東京エレクトロン株式会社 冷媒用の流路を有する部材、冷媒用の流路を有する部材の制御方法及び基板処理装置
JP6392961B2 (ja) * 2017-09-13 2018-09-19 日本特殊陶業株式会社 静電チャック
JP6993835B2 (ja) * 2017-10-12 2022-01-14 日本特殊陶業株式会社 保持装置および保持装置の製造方法
US10900124B2 (en) 2018-06-12 2021-01-26 Lam Research Corporation Substrate processing chamber with showerhead having cooled faceplate
CN111211059B (zh) * 2018-11-22 2023-07-04 矽品精密工业股份有限公司 电子封装件及其制法与散热件

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