JP2022524160A - オリゴマーヘキサフルオロプロピレンオキシド誘導体 - Google Patents
オリゴマーヘキサフルオロプロピレンオキシド誘導体 Download PDFInfo
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Abstract
Description
本発明の化合物: ...-CH2-O-CO-NH-CH2-...
HFPOメタクリレート: ...-CO-O-CH2-...
以下において、好ましい実施形態を参照して本発明による化合物の調製が記載される。
1H,1H-ペルフルオロ-2,5,8-トリメチル-3,6,9-トリオキサドデカン-1-オール:
2-{1,1,2,3,3,3-ヘキサフルオロ-2-[1,1,2,3,3,3-ヘキサフルオロ-2-(ヘプタフルオロプロポキシ)プロポキシ]プロポキシ}-2,3,3,3-テトラフルオロプロパン-1-オール(CAS 14620-81-6)
2,4,4,5,7,7,8,10,10,11,13,13,14,14,15,15,15-ヘプタデカフルオロ-2,5,8,11-テトラキス(トリフルオロメチル)-3,6,9,12-テトラオキサペンタデカン-1-オール(CAS 141977-66-4)
を含む。
る。
エンボス加工されたワニス層(75%E8402、23%nOA、2%TPO-L)をN2不活性ガス下で硬化した。様々な濃度のPFPE-UA-3を粘着防止用添加剤として用いた。化合物PFPE-UA-3は、本発明による式(I)の化合物であり、式(I
)中、nは3、RはHである。E8402(Ebecry 8402)は、エンボス用ワニス基材として用いられるAllnexからの脂肪族ウレタンアクリレートである。用いた反応性シンナーは、n-オクチルアクリレート(nOA)である。TPO-Lは、光開始剤エチル(2,4,6-トリメチルベンゾイル)フェニルホスフィネートである。
FPSで被覆されたニッケル薄板に対してエンボス加工されたワニス層(75%E8402、23%nOA、2%TPO-L)を硬化した。粘着防止用添加剤として様々な濃度のPFPE-UA-3を用いた。
Claims (14)
- nは、3または4であり、Rは、水素またはメチルである、請求項1に記載の化合物。
- 請求項1または2に記載の化合物と、重合性炭素-炭素二重結合と反応するポリマー出発物質と、を含む組成物。
- 前記化合物を0.001~10重量パーセントの量で、前記ポリマー出発物質を50~99.999重量パーセントの量で含む、請求項3に記載の組成物。
- 前記化合物を0.001~1.0重量パーセントの量で含む、請求項4に記載の組成物。
- 請求項3~5のいずれか1項に記載の組成物を重合反応に付すことにより取得可能なポリマー。
- 請求項6に記載のポリマーを含有する層を表面に含む、被覆された基材。
- 請求項6に記載のポリマーを含むエンボス加工されたコーティング層を上に配置した支持体、または請求項6に記載のポリマーを含む構造化された表面層を上に配置したナノインプリントリソグラフィー用スタンプである、請求項7に記載の被覆された基材。
- 前記式(I)の化合物中のウレタン化合物を、対応するアルコールと対応するイソシアネートとから調製するステップを含む、請求項1または2に記載の化合物を調製するためのプロセス。
- 請求項1または2に記載の化合物の存在下でポリマー出発物質を重合させるステップを含む、ポリマーを調製するためのプロセスであって、前記化合物の重合性炭素-炭素二重結合が、前記重合させる反応に関与するプロセス。
- スタンプを用いてワニス層にエンボス加工するステップを含むナノインプリントリソグラフィープロセスであって、前記ワニス層は、請求項3~5のいずれか1項に記載の組成物であり、前記スタンプは、請求項6に記載のポリマーを含む構造化された表面層を有するプロセス。
- コーティングの表面エネルギーを改変するための、請求項1または2に記載の化合物あるいは請求項3~5のいずれか1項に記載の組成物の使用。
- 前記コーティングは、反射防止コーティング、防塵コーティング、自己清浄化コーティングまたは流れ摩擦低下コーティングから選択される、請求項12に記載の使用。
- 光電池、照明、光学または建物用ガラスの分野における物質の前記コーティングにおける、請求項12または13に記載の使用。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102019106081.8A DE102019106081B4 (de) | 2019-03-11 | 2019-03-11 | Oligomere Hexafluorpropylenoxidderivate |
DE102019106081.8 | 2019-03-11 | ||
PCT/EP2020/054739 WO2020182452A1 (de) | 2019-03-11 | 2020-02-24 | Oligomere hexafluorpropylenoxidderivate |
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JP2022524160A true JP2022524160A (ja) | 2022-04-27 |
JP7301999B2 JP7301999B2 (ja) | 2023-07-03 |
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US (1) | US20220204441A1 (ja) |
EP (1) | EP3938411A1 (ja) |
JP (1) | JP7301999B2 (ja) |
KR (1) | KR102647721B1 (ja) |
CN (1) | CN113748144B (ja) |
CA (1) | CA3132086A1 (ja) |
DE (1) | DE102019106081B4 (ja) |
WO (1) | WO2020182452A1 (ja) |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004358969A (ja) * | 2003-06-04 | 2004-12-24 | Komag Inc | ナノ・インプリント・リソグラフィ用の潤滑性付与レジスト膜 |
JP2005036160A (ja) * | 2003-07-18 | 2005-02-10 | Asahi Glass Co Ltd | 含フッ素樹脂、感光性樹脂組成物及びフォトレジスト |
JP2008527091A (ja) * | 2004-12-29 | 2008-07-24 | スリーエム イノベイティブ プロパティズ カンパニー | 感光性フルオロケミカルを含有する組成物および該組成物の用途 |
JP2009517528A (ja) * | 2005-12-01 | 2009-04-30 | スリーエム イノベイティブ プロパティズ カンパニー | フッ素化界面活性剤 |
JP2014026100A (ja) * | 2012-07-26 | 2014-02-06 | Toppan Printing Co Ltd | 低屈折率層形成用樹脂組成物、反射防止フィルム |
JP2014031397A (ja) * | 2012-08-01 | 2014-02-20 | 3M Innovative Properties Co | 防汚性ハードコートおよび防汚性ハードコート前駆体 |
JP2015520292A (ja) * | 2012-06-19 | 2015-07-16 | スリーエム イノベイティブ プロパティズ カンパニー | 低表面エネルギー基及びヒドロキシル基を含む添加剤、並びにコーティング組成物 |
CN104844759A (zh) * | 2015-04-21 | 2015-08-19 | 衢州氟硅技术研究院 | 一种含氨基甲酰基聚合物及其制备方法 |
JP2015224187A (ja) * | 2014-05-26 | 2015-12-14 | ユニマテック株式会社 | 含フッ素ウレタン(メタ)アクリレートの製造法 |
Family Cites Families (2)
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---|---|---|---|---|
JP2004107589A (ja) | 2002-09-20 | 2004-04-08 | Fuji Photo Film Co Ltd | フルオロ脂肪族基含有高分子化合物 |
JP6371032B2 (ja) * | 2012-08-01 | 2018-08-08 | スリーエム イノベイティブ プロパティズ カンパニー | 反射防止ハードコートおよび反射防止物品 |
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- 2019-03-11 DE DE102019106081.8A patent/DE102019106081B4/de active Active
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- 2020-02-24 CA CA3132086A patent/CA3132086A1/en not_active Abandoned
- 2020-02-24 US US17/437,183 patent/US20220204441A1/en active Pending
- 2020-02-24 CN CN202080029587.2A patent/CN113748144B/zh active Active
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- 2020-02-24 EP EP20706715.8A patent/EP3938411A1/de not_active Withdrawn
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Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004358969A (ja) * | 2003-06-04 | 2004-12-24 | Komag Inc | ナノ・インプリント・リソグラフィ用の潤滑性付与レジスト膜 |
JP2005036160A (ja) * | 2003-07-18 | 2005-02-10 | Asahi Glass Co Ltd | 含フッ素樹脂、感光性樹脂組成物及びフォトレジスト |
JP2008527091A (ja) * | 2004-12-29 | 2008-07-24 | スリーエム イノベイティブ プロパティズ カンパニー | 感光性フルオロケミカルを含有する組成物および該組成物の用途 |
JP2009517528A (ja) * | 2005-12-01 | 2009-04-30 | スリーエム イノベイティブ プロパティズ カンパニー | フッ素化界面活性剤 |
JP2015520292A (ja) * | 2012-06-19 | 2015-07-16 | スリーエム イノベイティブ プロパティズ カンパニー | 低表面エネルギー基及びヒドロキシル基を含む添加剤、並びにコーティング組成物 |
JP2014026100A (ja) * | 2012-07-26 | 2014-02-06 | Toppan Printing Co Ltd | 低屈折率層形成用樹脂組成物、反射防止フィルム |
JP2014031397A (ja) * | 2012-08-01 | 2014-02-20 | 3M Innovative Properties Co | 防汚性ハードコートおよび防汚性ハードコート前駆体 |
JP2015224187A (ja) * | 2014-05-26 | 2015-12-14 | ユニマテック株式会社 | 含フッ素ウレタン(メタ)アクリレートの製造法 |
CN104844759A (zh) * | 2015-04-21 | 2015-08-19 | 衢州氟硅技术研究院 | 一种含氨基甲酰基聚合物及其制备方法 |
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WO2020182452A1 (de) | 2020-09-17 |
KR102647721B1 (ko) | 2024-03-15 |
US20220204441A1 (en) | 2022-06-30 |
CA3132086A1 (en) | 2020-09-17 |
JP7301999B2 (ja) | 2023-07-03 |
CN113748144B (zh) | 2023-06-16 |
KR20210137509A (ko) | 2021-11-17 |
EP3938411A1 (de) | 2022-01-19 |
DE102019106081B4 (de) | 2024-05-08 |
DE102019106081A1 (de) | 2020-09-17 |
CN113748144A (zh) | 2021-12-03 |
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