JP2021041364A5 - - Google Patents
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- Publication number
- JP2021041364A5 JP2021041364A5 JP2019166674A JP2019166674A JP2021041364A5 JP 2021041364 A5 JP2021041364 A5 JP 2021041364A5 JP 2019166674 A JP2019166674 A JP 2019166674A JP 2019166674 A JP2019166674 A JP 2019166674A JP 2021041364 A5 JP2021041364 A5 JP 2021041364A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- formula
- carbon atoms
- atom
- forming method
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 125000004432 carbon atom Chemical group C* 0.000 claims description 14
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 6
- 125000002723 alicyclic group Chemical group 0.000 claims description 5
- 125000005843 halogen group Chemical group 0.000 claims description 4
- 125000000962 organic group Chemical group 0.000 claims description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 claims description 2
- 125000003118 aryl group Chemical group 0.000 claims description 2
- 238000000034 method Methods 0.000 claims 9
- 239000000203 mixture Substances 0.000 claims 9
- 239000002253 acid Substances 0.000 claims 8
- 239000011248 coating agent Substances 0.000 claims 8
- 238000000576 coating method Methods 0.000 claims 8
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 8
- 229920000642 polymer Polymers 0.000 claims 8
- 239000002184 metal Substances 0.000 claims 6
- 125000004429 atom Chemical group 0.000 claims 5
- 125000000524 functional group Chemical group 0.000 claims 5
- 239000002904 solvent Substances 0.000 claims 5
- 238000010438 heat treatment Methods 0.000 claims 4
- 229910008051 Si-OH Chemical group 0.000 claims 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 3
- 229910006358 Si—OH Chemical group 0.000 claims 3
- 229910052710 silicon Inorganic materials 0.000 claims 3
- 239000011203 carbon fibre reinforced carbon Substances 0.000 claims 2
- 150000004767 nitrides Chemical class 0.000 claims 2
- 125000004430 oxygen atom Chemical group O* 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims 1
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical group C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims 1
- 229910045601 alloy Inorganic materials 0.000 claims 1
- 239000000956 alloy Substances 0.000 claims 1
- 125000001626 borono group Chemical group [H]OB([*])O[H] 0.000 claims 1
- 150000001721 carbon Chemical group 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 125000004093 cyano group Chemical group *C#N 0.000 claims 1
- 229910052731 fluorine Inorganic materials 0.000 claims 1
- 125000001153 fluoro group Chemical group F* 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims 1
- 125000001918 phosphonic acid ester group Chemical group 0.000 claims 1
- ABLZXFCXXLZCGV-UHFFFAOYSA-N phosphonic acid group Chemical group P(O)(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 claims 1
- 125000005372 silanol group Chemical group 0.000 claims 1
- -1 silicic acid ester Chemical class 0.000 claims 1
- 229910021332 silicide Inorganic materials 0.000 claims 1
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 claims 1
- 235000012239 silicon dioxide Nutrition 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- 239000002344 surface layer Substances 0.000 claims 1
- 125000001302 tertiary amino group Chemical group 0.000 claims 1
- 125000003396 thiol group Chemical group [H]S* 0.000 claims 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 claims 1
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019166674A JP7310471B2 (ja) | 2019-09-12 | 2019-09-12 | パターン形成方法及び組成物 |
| US17/018,169 US11270883B2 (en) | 2019-09-12 | 2020-09-11 | Pattern-forming method and composition |
| US17/583,270 US12332563B2 (en) | 2019-09-12 | 2022-01-25 | Pattern-forming method and composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019166674A JP7310471B2 (ja) | 2019-09-12 | 2019-09-12 | パターン形成方法及び組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2021041364A JP2021041364A (ja) | 2021-03-18 |
| JP2021041364A5 true JP2021041364A5 (https=) | 2022-01-21 |
| JP7310471B2 JP7310471B2 (ja) | 2023-07-19 |
Family
ID=74863471
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019166674A Active JP7310471B2 (ja) | 2019-09-12 | 2019-09-12 | パターン形成方法及び組成物 |
Country Status (2)
| Country | Link |
|---|---|
| US (2) | US11270883B2 (https=) |
| JP (1) | JP7310471B2 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2021095766A1 (ja) * | 2019-11-12 | 2021-05-20 | Jsr株式会社 | 組成物、基板の製造方法及び重合体 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0789279B2 (en) * | 1996-02-09 | 2004-12-08 | Wako Pure Chemical Industries Ltd | Polymer and resist material |
| US7125938B2 (en) * | 1997-03-11 | 2006-10-24 | Carnegie Mellon University | Atom or group transfer radical polymerization |
| US7696292B2 (en) * | 2003-09-22 | 2010-04-13 | Commonwealth Scientific And Industrial Research Organisation | Low-polydispersity photoimageable acrylic polymers, photoresists and processes for microlithography |
| US7408013B2 (en) * | 2003-09-23 | 2008-08-05 | Commonwealth Scientific And Industrial Research Organization | Low-polydispersity photoimageable polymers and photoresists and processes for microlithography |
| WO2008072624A1 (ja) * | 2006-12-13 | 2008-06-19 | Nissan Chemical Industries, Ltd. | 低分子溶解促進剤を含むレジスト下層膜形成組成物 |
| JP6075369B2 (ja) * | 2012-03-14 | 2017-02-08 | Jsr株式会社 | フォトレジスト組成物、レジストパターン形成方法及び酸拡散制御剤 |
| US10457088B2 (en) * | 2013-05-13 | 2019-10-29 | Ridgefield Acquisition | Template for self assembly and method of making a self assembled pattern |
| JP6446195B2 (ja) | 2013-07-31 | 2018-12-26 | 東京応化工業株式会社 | 相分離構造体の製造方法、パターン形成方法及び微細パターン形成方法 |
| US20160306278A1 (en) * | 2015-04-20 | 2016-10-20 | Tokyo Ohka Kogyo Co., Ltd. | Chemical for photolithography with improved liquid transfer property and resist composition comprising the same |
| KR102426440B1 (ko) | 2016-09-01 | 2022-07-29 | 제이에스알 가부시끼가이샤 | 기재 표면의 선택적 수식 방법 및 조성물 |
| WO2018235877A1 (ja) | 2017-06-21 | 2018-12-27 | Jsr株式会社 | カバー膜形成方法 |
| US11360387B2 (en) * | 2017-08-04 | 2022-06-14 | Rohm And Haas Electronic Materials Llc | Silicon-containing underlayers |
| US20190146343A1 (en) * | 2017-11-10 | 2019-05-16 | Rohm And Haas Electronic Materials Llc | Silicon-containing underlayers |
-
2019
- 2019-09-12 JP JP2019166674A patent/JP7310471B2/ja active Active
-
2020
- 2020-09-11 US US17/018,169 patent/US11270883B2/en active Active
-
2022
- 2022-01-25 US US17/583,270 patent/US12332563B2/en active Active
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