JPWO2023074777A5 - - Google Patents
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- Publication number
- JPWO2023074777A5 JPWO2023074777A5 JP2023550293A JP2023550293A JPWO2023074777A5 JP WO2023074777 A5 JPWO2023074777 A5 JP WO2023074777A5 JP 2023550293 A JP2023550293 A JP 2023550293A JP 2023550293 A JP2023550293 A JP 2023550293A JP WO2023074777 A5 JPWO2023074777 A5 JP WO2023074777A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- silicon
- underlayer film
- optionally substituted
- atom
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 25
- 229910052710 silicon Inorganic materials 0.000 claims 25
- 239000010703 silicon Substances 0.000 claims 14
- 239000000203 mixture Substances 0.000 claims 13
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims 7
- 125000003545 alkoxy group Chemical group 0.000 claims 7
- 125000000217 alkyl group Chemical group 0.000 claims 7
- 125000000962 organic group Chemical group 0.000 claims 7
- 229910000077 silane Inorganic materials 0.000 claims 7
- 150000001450 anions Chemical class 0.000 claims 5
- 238000000034 method Methods 0.000 claims 5
- 239000000126 substance Substances 0.000 claims 5
- 125000000547 substituted alkyl group Chemical group 0.000 claims 5
- 125000004423 acyloxy group Chemical group 0.000 claims 4
- 125000002102 aryl alkyloxo group Chemical group 0.000 claims 4
- 125000004429 atom Chemical group 0.000 claims 4
- 125000005843 halogen group Chemical group 0.000 claims 4
- -1 methacryloyl group Chemical group 0.000 claims 4
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 claims 3
- 125000004183 alkoxy alkyl group Chemical group 0.000 claims 3
- 125000003368 amide group Chemical group 0.000 claims 3
- 125000003277 amino group Chemical group 0.000 claims 3
- 125000004093 cyano group Chemical group *C#N 0.000 claims 3
- 125000003700 epoxy group Chemical group 0.000 claims 3
- 238000005530 etching Methods 0.000 claims 3
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 claims 3
- 125000003396 thiol group Chemical group [H]S* 0.000 claims 3
- 229940126062 Compound A Drugs 0.000 claims 1
- NLDMNSXOCDLTTB-UHFFFAOYSA-N Heterophylliin A Natural products O1C2COC(=O)C3=CC(O)=C(O)C(O)=C3C3=C(O)C(O)=C(O)C=C3C(=O)OC2C(OC(=O)C=2C=C(O)C(O)=C(O)C=2)C(O)C1OC(=O)C1=CC(O)=C(O)C(O)=C1 NLDMNSXOCDLTTB-UHFFFAOYSA-N 0.000 claims 1
- 125000003342 alkenyl group Chemical group 0.000 claims 1
- 125000003710 aryl alkyl group Chemical group 0.000 claims 1
- 125000003118 aryl group Chemical group 0.000 claims 1
- 150000001768 cations Chemical class 0.000 claims 1
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- 150000001924 cycloalkanes Chemical class 0.000 claims 1
- 229910052731 fluorine Inorganic materials 0.000 claims 1
- 125000001153 fluoro group Chemical group F* 0.000 claims 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 1
- 125000006574 non-aromatic ring group Chemical group 0.000 claims 1
- 230000007261 regionalization Effects 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 claims 1
- 125000005156 substituted alkylene group Chemical group 0.000 claims 1
- 125000003107 substituted aryl group Chemical group 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- RINCXYDBBGOEEQ-UHFFFAOYSA-N succinic anhydride Chemical group O=C1CCC(=O)O1 RINCXYDBBGOEEQ-UHFFFAOYSA-N 0.000 claims 1
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2024077788A JP2024109670A (ja) | 2021-10-28 | 2024-05-13 | 添加剤含有シリコン含有レジスト下層膜形成組成物 |
| JP2025103481A JP2025134863A (ja) | 2021-10-28 | 2025-06-19 | 添加剤含有シリコン含有レジスト下層膜形成組成物 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021176582 | 2021-10-28 | ||
| JP2021176582 | 2021-10-28 | ||
| PCT/JP2022/040061 WO2023074777A1 (ja) | 2021-10-28 | 2022-10-27 | 添加剤含有シリコン含有レジスト下層膜形成組成物 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024077788A Division JP2024109670A (ja) | 2021-10-28 | 2024-05-13 | 添加剤含有シリコン含有レジスト下層膜形成組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2023074777A1 JPWO2023074777A1 (https=) | 2023-05-04 |
| JPWO2023074777A5 true JPWO2023074777A5 (https=) | 2023-11-06 |
| JP7495015B2 JP7495015B2 (ja) | 2024-06-04 |
Family
ID=86158089
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023550293A Active JP7495015B2 (ja) | 2021-10-28 | 2022-10-27 | 添加剤含有シリコン含有レジスト下層膜形成組成物 |
| JP2024077788A Pending JP2024109670A (ja) | 2021-10-28 | 2024-05-13 | 添加剤含有シリコン含有レジスト下層膜形成組成物 |
| JP2025103481A Pending JP2025134863A (ja) | 2021-10-28 | 2025-06-19 | 添加剤含有シリコン含有レジスト下層膜形成組成物 |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024077788A Pending JP2024109670A (ja) | 2021-10-28 | 2024-05-13 | 添加剤含有シリコン含有レジスト下層膜形成組成物 |
| JP2025103481A Pending JP2025134863A (ja) | 2021-10-28 | 2025-06-19 | 添加剤含有シリコン含有レジスト下層膜形成組成物 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20240419073A1 (https=) |
| JP (3) | JP7495015B2 (https=) |
| KR (1) | KR20240091099A (https=) |
| CN (1) | CN118159910A (https=) |
| TW (1) | TW202336532A (https=) |
| WO (1) | WO2023074777A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPWO2024225411A1 (https=) * | 2023-04-27 | 2024-10-31 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6250514B2 (ja) | 2014-10-03 | 2017-12-20 | 信越化学工業株式会社 | 塗布型ｂｐｓｇ膜形成用組成物、基板、及びパターン形成方法 |
| US10007184B2 (en) * | 2016-09-01 | 2018-06-26 | Rohm And Haas Electronic Materials Llc | Silicon-containing underlayers |
| KR102577038B1 (ko) * | 2017-03-31 | 2023-09-12 | 닛산 가가쿠 가부시키가이샤 | 카르보닐구조를 갖는 실리콘함유 레지스트 하층막 형성 조성물 |
| JP6943001B2 (ja) | 2017-04-10 | 2021-09-29 | セイコーエプソン株式会社 | 電子機器 |
| KR102674631B1 (ko) * | 2017-07-06 | 2024-06-12 | 닛산 가가쿠 가부시키가이샤 | 알칼리성 현상액 가용성 실리콘함유 레지스트 하층막 형성 조성물 |
| KR102785062B1 (ko) * | 2017-10-25 | 2025-03-21 | 닛산 가가쿠 가부시키가이샤 | 암모늄기를 갖는 유기기를 포함하는 실리콘함유 레지스트 하층막 형성 조성물을 이용하는 반도체장치의 제조방법 |
| JP7368324B2 (ja) * | 2019-07-23 | 2023-10-24 | 信越化学工業株式会社 | ケイ素含有レジスト下層膜形成用組成物及びパターン形成方法 |
-
2022
- 2022-10-27 CN CN202280071698.9A patent/CN118159910A/zh active Pending
- 2022-10-27 US US18/704,765 patent/US20240419073A1/en active Pending
- 2022-10-27 WO PCT/JP2022/040061 patent/WO2023074777A1/ja not_active Ceased
- 2022-10-27 JP JP2023550293A patent/JP7495015B2/ja active Active
- 2022-10-27 TW TW111140908A patent/TW202336532A/zh unknown
- 2022-10-27 KR KR1020247017733A patent/KR20240091099A/ko active Pending
-
2024
- 2024-05-13 JP JP2024077788A patent/JP2024109670A/ja active Pending
-
2025
- 2025-06-19 JP JP2025103481A patent/JP2025134863A/ja active Pending
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