JPWO2023074777A5 - - Google Patents
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- Publication number
- JPWO2023074777A5 JPWO2023074777A5 JP2023550293A JP2023550293A JPWO2023074777A5 JP WO2023074777 A5 JPWO2023074777 A5 JP WO2023074777A5 JP 2023550293 A JP2023550293 A JP 2023550293A JP 2023550293 A JP2023550293 A JP 2023550293A JP WO2023074777 A5 JPWO2023074777 A5 JP WO2023074777A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- silicon
- underlayer film
- optionally substituted
- atom
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 25
- 229910052710 silicon Inorganic materials 0.000 claims 25
- 239000010703 silicon Substances 0.000 claims 14
- 239000000203 mixture Substances 0.000 claims 13
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims 7
- 125000003545 alkoxy group Chemical group 0.000 claims 7
- 125000000217 alkyl group Chemical group 0.000 claims 7
- 125000000962 organic group Chemical group 0.000 claims 7
- 229910000077 silane Inorganic materials 0.000 claims 7
- 150000001450 anions Chemical class 0.000 claims 5
- 238000000034 method Methods 0.000 claims 5
- 239000000126 substance Substances 0.000 claims 5
- 125000000547 substituted alkyl group Chemical group 0.000 claims 5
- 125000004423 acyloxy group Chemical group 0.000 claims 4
- 125000002102 aryl alkyloxo group Chemical group 0.000 claims 4
- 125000004429 atom Chemical group 0.000 claims 4
- 125000005843 halogen group Chemical group 0.000 claims 4
- -1 methacryloyl group Chemical group 0.000 claims 4
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 claims 3
- 125000004183 alkoxy alkyl group Chemical group 0.000 claims 3
- 125000003368 amide group Chemical group 0.000 claims 3
- 125000003277 amino group Chemical group 0.000 claims 3
- 125000004093 cyano group Chemical group *C#N 0.000 claims 3
- 125000003700 epoxy group Chemical group 0.000 claims 3
- 238000005530 etching Methods 0.000 claims 3
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 claims 3
- 125000003396 thiol group Chemical group [H]S* 0.000 claims 3
- 229940126062 Compound A Drugs 0.000 claims 1
- NLDMNSXOCDLTTB-UHFFFAOYSA-N Heterophylliin A Natural products O1C2COC(=O)C3=CC(O)=C(O)C(O)=C3C3=C(O)C(O)=C(O)C=C3C(=O)OC2C(OC(=O)C=2C=C(O)C(O)=C(O)C=2)C(O)C1OC(=O)C1=CC(O)=C(O)C(O)=C1 NLDMNSXOCDLTTB-UHFFFAOYSA-N 0.000 claims 1
- 125000003342 alkenyl group Chemical group 0.000 claims 1
- 125000003710 aryl alkyl group Chemical group 0.000 claims 1
- 125000003118 aryl group Chemical group 0.000 claims 1
- 150000001768 cations Chemical class 0.000 claims 1
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- 150000001924 cycloalkanes Chemical class 0.000 claims 1
- 229910052731 fluorine Inorganic materials 0.000 claims 1
- 125000001153 fluoro group Chemical group F* 0.000 claims 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 1
- 125000006574 non-aromatic ring group Chemical group 0.000 claims 1
- 230000007261 regionalization Effects 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 claims 1
- 125000005156 substituted alkylene group Chemical group 0.000 claims 1
- 125000003107 substituted aryl group Chemical group 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- RINCXYDBBGOEEQ-UHFFFAOYSA-N succinic anhydride Chemical group O=C1CCC(=O)O1 RINCXYDBBGOEEQ-UHFFFAOYSA-N 0.000 claims 1
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2024077788A JP2024109670A (ja) | 2021-10-28 | 2024-05-13 | 添加剤含有シリコン含有レジスト下層膜形成組成物 |
| JP2025103481A JP2025134863A (ja) | 2021-10-28 | 2025-06-19 | 添加剤含有シリコン含有レジスト下層膜形成組成物 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021176582 | 2021-10-28 | ||
| JP2021176582 | 2021-10-28 | ||
| PCT/JP2022/040061 WO2023074777A1 (ja) | 2021-10-28 | 2022-10-27 | 添加剤含有シリコン含有レジスト下層膜形成組成物 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024077788A Division JP2024109670A (ja) | 2021-10-28 | 2024-05-13 | 添加剤含有シリコン含有レジスト下層膜形成組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2023074777A1 JPWO2023074777A1 (https=) | 2023-05-04 |
| JPWO2023074777A5 true JPWO2023074777A5 (https=) | 2023-11-06 |
| JP7495015B2 JP7495015B2 (ja) | 2024-06-04 |
Family
ID=86158089
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023550293A Active JP7495015B2 (ja) | 2021-10-28 | 2022-10-27 | 添加剤含有シリコン含有レジスト下層膜形成組成物 |
| JP2024077788A Pending JP2024109670A (ja) | 2021-10-28 | 2024-05-13 | 添加剤含有シリコン含有レジスト下層膜形成組成物 |
| JP2025103481A Pending JP2025134863A (ja) | 2021-10-28 | 2025-06-19 | 添加剤含有シリコン含有レジスト下層膜形成組成物 |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024077788A Pending JP2024109670A (ja) | 2021-10-28 | 2024-05-13 | 添加剤含有シリコン含有レジスト下層膜形成組成物 |
| JP2025103481A Pending JP2025134863A (ja) | 2021-10-28 | 2025-06-19 | 添加剤含有シリコン含有レジスト下層膜形成組成物 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20240419073A1 (https=) |
| JP (3) | JP7495015B2 (https=) |
| KR (1) | KR20240091099A (https=) |
| CN (1) | CN118159910A (https=) |
| TW (1) | TW202336532A (https=) |
| WO (1) | WO2023074777A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN120513432A (zh) * | 2023-04-27 | 2025-08-19 | 日产化学株式会社 | 能够湿式去除的含硅抗蚀剂下层膜形成组合物 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6250514B2 (ja) | 2014-10-03 | 2017-12-20 | 信越化学工業株式会社 | 塗布型ｂｐｓｇ膜形成用組成物、基板、及びパターン形成方法 |
| US10007184B2 (en) | 2016-09-01 | 2018-06-26 | Rohm And Haas Electronic Materials Llc | Silicon-containing underlayers |
| CN110494807A (zh) * | 2017-03-31 | 2019-11-22 | 日产化学株式会社 | 具有羰基结构的含有硅的抗蚀剂下层膜形成用组合物 |
| JP6943001B2 (ja) | 2017-04-10 | 2021-09-29 | セイコーエプソン株式会社 | 電子機器 |
| WO2019009413A1 (ja) * | 2017-07-06 | 2019-01-10 | 日産化学株式会社 | アルカリ性現像液可溶性シリコン含有レジスト下層膜形成組成物 |
| CN111226175A (zh) * | 2017-10-25 | 2020-06-02 | 日产化学株式会社 | 使用包含具有铵基的有机基的含硅抗蚀剂下层膜形成用组合物的半导体装置的制造方法 |
| JP7368324B2 (ja) * | 2019-07-23 | 2023-10-24 | 信越化学工業株式会社 | ケイ素含有レジスト下層膜形成用組成物及びパターン形成方法 |
-
2022
- 2022-10-27 CN CN202280071698.9A patent/CN118159910A/zh active Pending
- 2022-10-27 WO PCT/JP2022/040061 patent/WO2023074777A1/ja not_active Ceased
- 2022-10-27 KR KR1020247017733A patent/KR20240091099A/ko active Pending
- 2022-10-27 TW TW111140908A patent/TW202336532A/zh unknown
- 2022-10-27 US US18/704,765 patent/US20240419073A1/en active Pending
- 2022-10-27 JP JP2023550293A patent/JP7495015B2/ja active Active
-
2024
- 2024-05-13 JP JP2024077788A patent/JP2024109670A/ja active Pending
-
2025
- 2025-06-19 JP JP2025103481A patent/JP2025134863A/ja active Pending
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