JPWO2022054853A5 - - Google Patents
Download PDFInfo
- Publication number
- JPWO2022054853A5 JPWO2022054853A5 JP2022547634A JP2022547634A JPWO2022054853A5 JP WO2022054853 A5 JPWO2022054853 A5 JP WO2022054853A5 JP 2022547634 A JP2022547634 A JP 2022547634A JP 2022547634 A JP2022547634 A JP 2022547634A JP WO2022054853 A5 JPWO2022054853 A5 JP WO2022054853A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- carbon atoms
- protective film
- film
- substituted
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020151888 | 2020-09-10 | ||
| JP2020151888 | 2020-09-10 | ||
| PCT/JP2021/033084 WO2022054853A1 (ja) | 2020-09-10 | 2021-09-09 | 薬液耐性保護膜 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2022054853A1 JPWO2022054853A1 (https=) | 2022-03-17 |
| JPWO2022054853A5 true JPWO2022054853A5 (https=) | 2024-07-11 |
| JP7841430B2 JP7841430B2 (ja) | 2026-04-07 |
Family
ID=80631552
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022547634A Active JP7841430B2 (ja) | 2020-09-10 | 2021-09-09 | 薬液耐性保護膜 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20230333470A1 (https=) |
| JP (1) | JP7841430B2 (https=) |
| KR (1) | KR20230066359A (https=) |
| CN (1) | CN116057103B (https=) |
| TW (1) | TW202225246A (https=) |
| WO (1) | WO2022054853A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20250333565A1 (en) * | 2022-05-24 | 2025-10-30 | Nissan Chemical Corporation | Chemical-resistant protective film |
| KR20250016138A (ko) * | 2022-05-24 | 2025-02-03 | 닛산 가가쿠 가부시키가이샤 | 약액내성 보호막 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4573050B2 (ja) * | 2006-07-21 | 2010-11-04 | 信越化学工業株式会社 | レジスト下層膜形成材料及びパターン形成方法 |
| JP4721978B2 (ja) | 2006-08-01 | 2011-07-13 | 信越化学工業株式会社 | レジスト下層膜材料並びにそれを用いたレジスト下層膜基板およびパターン形成方法 |
| JPWO2008117619A1 (ja) * | 2007-03-26 | 2010-07-15 | Jsr株式会社 | 感光性絶縁樹脂組成物 |
| WO2017029935A1 (ja) * | 2015-08-18 | 2017-02-23 | Dic株式会社 | ノボラック型フェノール性水酸基含有樹脂及びレジスト膜 |
| JP7196389B2 (ja) * | 2016-08-10 | 2022-12-27 | Jsr株式会社 | 半導体用レジスト下層膜形成組成物、レジスト下層膜、レジスト下層膜の形成方法及びパターニング基板の製造方法 |
| JP6718406B2 (ja) | 2017-03-31 | 2020-07-08 | 信越化学工業株式会社 | レジスト下層膜材料、パターン形成方法、及びレジスト下層膜形成方法 |
| KR20190140998A (ko) * | 2017-05-02 | 2019-12-20 | 닛산 가가쿠 가부시키가이샤 | 과산화수소수용액에 대한 보호막형성 조성물 |
| US12044968B2 (en) * | 2019-01-21 | 2024-07-23 | Nissan Chemical Corporation | Protective film-forming composition having acetal structure and amide structure |
| KR102800934B1 (ko) * | 2020-03-30 | 2025-04-29 | 닛산 가가쿠 가부시키가이샤 | 약액 내성 보호막 |
-
2021
- 2021-09-09 US US18/025,336 patent/US20230333470A1/en active Pending
- 2021-09-09 JP JP2022547634A patent/JP7841430B2/ja active Active
- 2021-09-09 KR KR1020237008506A patent/KR20230066359A/ko active Pending
- 2021-09-09 CN CN202180061886.9A patent/CN116057103B/zh active Active
- 2021-09-09 TW TW110133544A patent/TW202225246A/zh unknown
- 2021-09-09 WO PCT/JP2021/033084 patent/WO2022054853A1/ja not_active Ceased
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2019163463A5 (https=) | ||
| CN106883380B (zh) | 聚合物、有机层组合物及形成图案的方法 | |
| CN105209974B (zh) | 含有使用双酚醛的酚醛清漆树脂的抗蚀剂下层膜形成用组合物 | |
| TWI691560B (zh) | 可以濕式去除的含矽阻劑下層膜形成組成物 | |
| JP2004526212A5 (https=) | ||
| JPWO2022054853A5 (https=) | ||
| TWI791670B (zh) | 抗蝕劑底層膜形成用組成物、抗蝕劑底層膜及其形成方法、圖案化基板的製造方法及化合物 | |
| JP2023159163A5 (https=) | ||
| JP2010500607A5 (https=) | ||
| TWI697737B (zh) | 感放射線性組成物 | |
| TWI833044B (zh) | 感光性樹脂組成物、感光性乾薄膜及圖型形成方法 | |
| JP5835587B2 (ja) | 単分子層又は多分子層形成用組成物 | |
| JP2023052183A5 (https=) | ||
| JP2024161537A5 (https=) | ||
| JP2023184588A5 (https=) | ||
| JP2023126803A5 (https=) | ||
| CN112041746A (zh) | 半导体基板用底涂剂及图案形成方法 | |
| JPWO2023189803A5 (https=) | ||
| CN109725490B (zh) | 感光性树脂组合物、干膜、固化物、半导体元件、印刷电路板和电子部件 | |
| TWI497215B (zh) | 光阻底層組成物以及使用其產製積體電路元件的方法（二） | |
| JP2017534070A5 (https=) | ||
| JPWO2023106101A5 (https=) | ||
| JPWO2020255984A5 (https=) | ||
| JPWO2020255985A5 (https=) | ||
| JP2005222040A5 (https=) |