JPWO2020255984A5 - - Google Patents
Download PDFInfo
- Publication number
- JPWO2020255984A5 JPWO2020255984A5 JP2021526818A JP2021526818A JPWO2020255984A5 JP WO2020255984 A5 JPWO2020255984 A5 JP WO2020255984A5 JP 2021526818 A JP2021526818 A JP 2021526818A JP 2021526818 A JP2021526818 A JP 2021526818A JP WO2020255984 A5 JPWO2020255984 A5 JP WO2020255984A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- underlayer film
- resist underlayer
- forming
- resist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 150000002391 heterocyclic compounds Chemical class 0.000 claims 11
- -1 dicyanostyryl group Chemical group 0.000 claims 8
- 125000000217 alkyl group Chemical group 0.000 claims 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims 6
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims 5
- 229910052802 copper Inorganic materials 0.000 claims 5
- 239000010949 copper Substances 0.000 claims 5
- 238000004519 manufacturing process Methods 0.000 claims 5
- 239000000758 substrate Substances 0.000 claims 5
- 150000001875 compounds Chemical class 0.000 claims 4
- 125000003545 alkoxy group Chemical group 0.000 claims 3
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims 3
- 125000000732 arylene group Chemical group 0.000 claims 3
- 125000004093 cyano group Chemical group *C#N 0.000 claims 3
- 125000003700 epoxy group Chemical group 0.000 claims 3
- 125000005843 halogen group Chemical group 0.000 claims 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 3
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims 3
- 239000002243 precursor Substances 0.000 claims 3
- 125000002947 alkylene group Chemical group 0.000 claims 2
- 125000004432 carbon atom Chemical group C* 0.000 claims 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims 2
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical group OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 claims 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 2
- 239000004065 semiconductor Substances 0.000 claims 2
- 239000002904 solvent Substances 0.000 claims 2
- 125000003368 amide group Chemical group 0.000 claims 1
- 125000004429 atom Chemical group 0.000 claims 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims 1
- 239000003054 catalyst Substances 0.000 claims 1
- 239000007795 chemical reaction product Substances 0.000 claims 1
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- 238000004132 cross linking Methods 0.000 claims 1
- 239000003431 cross linking reagent Substances 0.000 claims 1
- 150000001923 cyclic compounds Chemical group 0.000 claims 1
- 238000010894 electron beam technology Methods 0.000 claims 1
- 125000000623 heterocyclic group Chemical group 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 claims 1
- 238000000059 patterning Methods 0.000 claims 1
- 238000007747 plating Methods 0.000 claims 1
- 125000005156 substituted alkylene group Chemical group 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019111915 | 2019-06-17 | ||
| JP2019111915 | 2019-06-17 | ||
| PCT/JP2020/023670 WO2020255984A1 (ja) | 2019-06-17 | 2020-06-17 | ジシアノスチリル基を有する複素環化合物を含むウェットエッチング可能なレジスト下層膜形成組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2020255984A1 JPWO2020255984A1 (https=) | 2020-12-24 |
| JPWO2020255984A5 true JPWO2020255984A5 (https=) | 2023-06-02 |
| JP7327479B2 JP7327479B2 (ja) | 2023-08-16 |
Family
ID=74040813
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021526818A Active JP7327479B2 (ja) | 2019-06-17 | 2020-06-17 | ジシアノスチリル基を有する複素環化合物を含むウェットエッチング可能なレジスト下層膜形成組成物 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US12366804B2 (https=) |
| JP (1) | JP7327479B2 (https=) |
| KR (1) | KR102808973B1 (https=) |
| CN (1) | CN113994261B (https=) |
| TW (1) | TWI843863B (https=) |
| WO (1) | WO2020255984A1 (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113994263B (zh) * | 2019-06-17 | 2024-08-16 | 日产化学株式会社 | 包含二氰基苯乙烯基的能够湿蚀刻的抗蚀剂下层膜形成用组合物 |
| CN117178231A (zh) * | 2021-04-26 | 2023-12-05 | 日产化学株式会社 | 抗蚀剂图案形成方法 |
| US20260008934A1 (en) * | 2022-08-29 | 2026-01-08 | Nissan Chemical Corporation | Composition for forming gap-filling material |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| MX169489B (es) * | 1987-12-28 | 1993-07-07 | Sumitomo Chemical Co | Procedimiento para preparar compuestos de estirilo |
| US5693691A (en) | 1995-08-21 | 1997-12-02 | Brewer Science, Inc. | Thermosetting anti-reflective coatings compositions |
| US6872506B2 (en) * | 2002-06-25 | 2005-03-29 | Brewer Science Inc. | Wet-developable anti-reflective compositions |
| EP1762895B1 (en) * | 2005-08-29 | 2016-02-24 | Rohm and Haas Electronic Materials, L.L.C. | Antireflective Hard Mask Compositions |
| AU2009210562B2 (en) | 2008-02-08 | 2011-04-28 | 3M Innovative Properties Company | Multi-layer intumescent fire protection barrier with adhesive surface |
| JP5255297B2 (ja) * | 2008-02-28 | 2013-08-07 | 富士フイルム株式会社 | フォトレジスト液、およびこれを用いるエッチング方法 |
| JP5040839B2 (ja) * | 2008-07-18 | 2012-10-03 | Ｊｓｒ株式会社 | レジスト下層膜形成組成物 |
| US8632948B2 (en) * | 2009-09-30 | 2014-01-21 | Az Electronic Materials Usa Corp. | Positive-working photoimageable bottom antireflective coating |
| US8465902B2 (en) * | 2011-02-08 | 2013-06-18 | Az Electronic Materials Usa Corp. | Underlayer coating composition and processes thereof |
| KR102413357B1 (ko) * | 2014-08-08 | 2022-06-27 | 미쯔비시 가스 케미칼 컴파니, 인코포레이티드 | 리소그래피용 하층막 형성용 조성물, 리소그래피용 하층막 및 패턴형성방법 |
| US11500291B2 (en) | 2017-10-31 | 2022-11-15 | Rohm And Haas Electronic Materials Korea Ltd. | Underlying coating compositions for use with photoresists |
| WO2019098338A1 (ja) | 2017-11-20 | 2019-05-23 | 三菱瓦斯化学株式会社 | リソグラフィー用膜形成用組成物、リソグラフィー用膜、レジストパターン形成方法、及び回路パターン形成方法 |
-
2020
- 2020-06-17 TW TW109120323A patent/TWI843863B/zh active
- 2020-06-17 KR KR1020217041384A patent/KR102808973B1/ko active Active
- 2020-06-17 WO PCT/JP2020/023670 patent/WO2020255984A1/ja not_active Ceased
- 2020-06-17 CN CN202080044302.2A patent/CN113994261B/zh active Active
- 2020-06-17 US US17/619,542 patent/US12366804B2/en active Active
- 2020-06-17 JP JP2021526818A patent/JP7327479B2/ja active Active