JPWO2023238920A5 - - Google Patents
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- Publication number
- JPWO2023238920A5 JPWO2023238920A5 JP2024527020A JP2024527020A JPWO2023238920A5 JP WO2023238920 A5 JPWO2023238920 A5 JP WO2023238920A5 JP 2024527020 A JP2024527020 A JP 2024527020A JP 2024527020 A JP2024527020 A JP 2024527020A JP WO2023238920 A5 JPWO2023238920 A5 JP WO2023238920A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- carbon atoms
- formula
- component
- underlayer film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 125000004432 carbon atom Chemical group C* 0.000 description 30
- 125000004430 oxygen atom Chemical group O* 0.000 description 8
- 229910052717 sulfur Inorganic materials 0.000 description 8
- 125000004434 sulfur atom Chemical group 0.000 description 8
- 239000002904 solvent Substances 0.000 description 6
- 125000000217 alkyl group Chemical group 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 125000004433 nitrogen atom Chemical group N* 0.000 description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 125000003342 alkenyl group Chemical group 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- 125000000304 alkynyl group Chemical group 0.000 description 3
- 125000005843 halogen group Chemical group 0.000 description 3
- 125000000962 organic group Chemical group 0.000 description 3
- 229920003169 water-soluble polymer Polymers 0.000 description 3
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 125000004414 alkyl thio group Chemical group 0.000 description 2
- 125000002947 alkylene group Chemical group 0.000 description 2
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 125000004093 cyano group Chemical group *C#N 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 2
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 125000002252 acyl group Chemical group 0.000 description 1
- 125000003302 alkenyloxy group Chemical group 0.000 description 1
- 125000005133 alkynyloxy group Chemical group 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000005129 aryl carbonyl group Chemical group 0.000 description 1
- 125000004104 aryloxy group Chemical group 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229920000172 poly(styrenesulfonic acid) Polymers 0.000 description 1
- 229940005642 polystyrene sulfonic acid Drugs 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022094144 | 2022-06-10 | ||
| PCT/JP2023/021446 WO2023238920A1 (ja) | 2022-06-10 | 2023-06-09 | 環境負荷を低減するためのレジスト下層膜形成用組成物 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2023238920A1 JPWO2023238920A1 (https=) | 2023-12-14 |
| JPWO2023238920A5 true JPWO2023238920A5 (https=) | 2025-02-20 |
Family
ID=89118402
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024527020A Pending JPWO2023238920A1 (https=) | 2022-06-10 | 2023-06-09 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20250180993A1 (https=) |
| JP (1) | JPWO2023238920A1 (https=) |
| KR (1) | KR20250021434A (https=) |
| CN (1) | CN119325575A (https=) |
| TW (1) | TW202403455A (https=) |
| WO (1) | WO2023238920A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN120530365A (zh) * | 2023-02-03 | 2025-08-22 | 日产化学株式会社 | 用于降低环境负荷的抗蚀剂下层膜形成用组合物 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7326509B2 (en) | 2001-08-20 | 2008-02-05 | Nissan Chemical Industries, Ltd. | Composition for forming anti-reflective coating for use in lithography |
| JP4832955B2 (ja) * | 2005-06-07 | 2011-12-07 | 信越化学工業株式会社 | レジスト下層膜材料並びにそれを用いたパターン形成方法 |
| JP5336146B2 (ja) * | 2008-10-10 | 2013-11-06 | 東京応化工業株式会社 | 塗布膜形成用組成物及びこれを用いたレジストパターン形成方法 |
| JP5889568B2 (ja) * | 2011-08-11 | 2016-03-22 | メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングＭｅｒｃｋ Ｐａｔｅｎｔ ＧｍｂＨ | 酸化タングステン膜形成用組成物およびそれを用いた酸化タングステン膜の製造法 |
| US20240393693A1 (en) * | 2021-09-07 | 2024-11-28 | Nissan Chemical Corporation | Silicon-containing resist underlayer film forming composition, laminate using the composition, and method for manufacturing semiconductor element |
-
2023
- 2023-06-09 KR KR1020247037200A patent/KR20250021434A/ko active Pending
- 2023-06-09 TW TW112121539A patent/TW202403455A/zh unknown
- 2023-06-09 CN CN202380045571.4A patent/CN119325575A/zh active Pending
- 2023-06-09 JP JP2024527020A patent/JPWO2023238920A1/ja active Pending
- 2023-06-09 WO PCT/JP2023/021446 patent/WO2023238920A1/ja not_active Ceased
- 2023-06-09 US US18/862,074 patent/US20250180993A1/en active Pending
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