JPWO2022163673A5 - - Google Patents
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- Publication number
- JPWO2022163673A5 JPWO2022163673A5 JP2022578429A JP2022578429A JPWO2022163673A5 JP WO2022163673 A5 JPWO2022163673 A5 JP WO2022163673A5 JP 2022578429 A JP2022578429 A JP 2022578429A JP 2022578429 A JP2022578429 A JP 2022578429A JP WO2022163673 A5 JPWO2022163673 A5 JP WO2022163673A5
- Authority
- JP
- Japan
- Prior art keywords
- underlayer film
- resist underlayer
- group
- resist
- composition according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2025120704A JP2025148551A (ja) | 2021-01-27 | 2025-07-17 | 酸二無水物の反応生成物を含むレジスト下層膜形成組成物 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021011399 | 2021-01-27 | ||
| JP2021011399 | 2021-01-27 | ||
| PCT/JP2022/002758 WO2022163673A1 (ja) | 2021-01-27 | 2022-01-26 | 酸二無水物の反応生成物を含むレジスト下層膜形成組成物 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2025120704A Division JP2025148551A (ja) | 2021-01-27 | 2025-07-17 | 酸二無水物の反応生成物を含むレジスト下層膜形成組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2022163673A1 JPWO2022163673A1 (https=) | 2022-08-04 |
| JPWO2022163673A5 true JPWO2022163673A5 (https=) | 2024-12-23 |
| JP7771990B2 JP7771990B2 (ja) | 2025-11-18 |
Family
ID=82653418
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022578429A Active JP7771990B2 (ja) | 2021-01-27 | 2022-01-26 | 酸二無水物の反応生成物を含むレジスト下層膜形成組成物 |
| JP2025120704A Withdrawn JP2025148551A (ja) | 2021-01-27 | 2025-07-17 | 酸二無水物の反応生成物を含むレジスト下層膜形成組成物 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2025120704A Withdrawn JP2025148551A (ja) | 2021-01-27 | 2025-07-17 | 酸二無水物の反応生成物を含むレジスト下層膜形成組成物 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US12099303B2 (https=) |
| JP (2) | JP7771990B2 (https=) |
| KR (1) | KR102668658B1 (https=) |
| CN (2) | CN116745700A (https=) |
| TW (1) | TWI890922B (https=) |
| WO (1) | WO2022163673A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20240021011A (ko) * | 2022-08-09 | 2024-02-16 | 삼성에스디아이 주식회사 | 레지스트 하층막용 조성물 및 이를 이용한 패턴형성방법 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW502135B (en) * | 1996-05-13 | 2002-09-11 | Sumitomo Bakelite Co | Positive type photosensitive resin composition and process for preparing polybenzoxazole resin film by using the same |
| CN1965268B (zh) * | 2004-04-09 | 2011-08-03 | 日产化学工业株式会社 | 含有缩合类聚合物的半导体用防反射膜 |
| EP2251742B1 (en) * | 2008-02-21 | 2012-05-16 | Nissan Chemical Industries, Ltd. | Composition for forming resist underlayer film and method for forming resist pattern using the same |
| JP5134416B2 (ja) | 2008-03-31 | 2013-01-30 | 日本圧着端子製造株式会社 | ソケットコネクタ |
| US20120251955A1 (en) * | 2009-12-14 | 2012-10-04 | Nissan Chemical Industries, Ltd. | Composition for formation of resist underlayer film |
| US9623988B2 (en) | 2010-03-26 | 2017-04-18 | Philip Morris Usa Inc. | High speed poucher |
| JP5644339B2 (ja) * | 2010-10-01 | 2014-12-24 | Jsr株式会社 | レジスト下層膜形成用組成物、レジスト下層膜及びパターン形成方法 |
| CN103649835B (zh) * | 2011-08-04 | 2018-02-06 | 日产化学工业株式会社 | 具有缩合系聚合物的形成euv光刻用抗蚀剂下层膜的组合物 |
| CN108713164B (zh) * | 2016-03-09 | 2022-03-18 | 日产化学工业株式会社 | 抗蚀剂下层膜形成用组合物及使用了该组合物的抗蚀剂图案的形成方法 |
| JP7268684B2 (ja) * | 2018-10-05 | 2023-05-08 | 日産化学株式会社 | レジスト下層膜形成組成物及びそれを用いたレジストパターンの形成方法 |
| TWI903025B (zh) * | 2021-01-27 | 2025-11-01 | 日商日產化學股份有限公司 | 具有多重鍵之膜形成組成物 |
-
2022
- 2022-01-26 WO PCT/JP2022/002758 patent/WO2022163673A1/ja not_active Ceased
- 2022-01-26 KR KR1020237020124A patent/KR102668658B1/ko active Active
- 2022-01-26 CN CN202280011840.0A patent/CN116745700A/zh active Pending
- 2022-01-26 US US18/271,383 patent/US12099303B2/en active Active
- 2022-01-26 CN CN202410452510.6A patent/CN118276405B/zh active Active
- 2022-01-26 TW TW111103330A patent/TWI890922B/zh active
- 2022-01-26 JP JP2022578429A patent/JP7771990B2/ja active Active
-
2025
- 2025-07-17 JP JP2025120704A patent/JP2025148551A/ja not_active Withdrawn
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