MX169489B - Procedimiento para preparar compuestos de estirilo - Google Patents
Procedimiento para preparar compuestos de estiriloInfo
- Publication number
- MX169489B MX169489B MX014356A MX1435688A MX169489B MX 169489 B MX169489 B MX 169489B MX 014356 A MX014356 A MX 014356A MX 1435688 A MX1435688 A MX 1435688A MX 169489 B MX169489 B MX 169489B
- Authority
- MX
- Mexico
- Prior art keywords
- different
- same
- general formula
- optionally substituted
- compounds
- Prior art date
Links
- 150000001875 compounds Chemical class 0.000 title abstract 3
- 125000000217 alkyl group Chemical group 0.000 abstract 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 abstract 2
- 229910052757 nitrogen Inorganic materials 0.000 abstract 2
- 125000004433 nitrogen atom Chemical group N* 0.000 abstract 2
- 125000003710 aryl alkyl group Chemical group 0.000 abstract 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract 1
- 125000005504 styryl group Chemical group 0.000 abstract 1
- 125000005017 substituted alkenyl group Chemical group 0.000 abstract 1
- 125000000547 substituted alkyl group Chemical group 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C229/00—Compounds containing amino and carboxyl groups bound to the same carbon skeleton
- C07C229/40—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino groups bound to carbon atoms of at least one six-membered aromatic ring and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton
- C07C229/44—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino groups bound to carbon atoms of at least one six-membered aromatic ring and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton with carboxyl groups linked to the six-membered aromatic ring, or to the condensed ring system containing that ring, by unsaturated carbon chains
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C255/00—Carboxylic acid nitriles
- C07C255/01—Carboxylic acid nitriles having cyano groups bound to acyclic carbon atoms
- C07C255/32—Carboxylic acid nitriles having cyano groups bound to acyclic carbon atoms having cyano groups bound to acyclic carbon atoms of a carbon skeleton containing at least one six-membered aromatic ring
- C07C255/34—Carboxylic acid nitriles having cyano groups bound to acyclic carbon atoms having cyano groups bound to acyclic carbon atoms of a carbon skeleton containing at least one six-membered aromatic ring with cyano groups linked to the six-membered aromatic ring, or to the condensed ring system containing that ring, by unsaturated carbon chains
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C255/00—Carboxylic acid nitriles
- C07C255/01—Carboxylic acid nitriles having cyano groups bound to acyclic carbon atoms
- C07C255/32—Carboxylic acid nitriles having cyano groups bound to acyclic carbon atoms having cyano groups bound to acyclic carbon atoms of a carbon skeleton containing at least one six-membered aromatic ring
- C07C255/42—Carboxylic acid nitriles having cyano groups bound to acyclic carbon atoms having cyano groups bound to acyclic carbon atoms of a carbon skeleton containing at least one six-membered aromatic ring the carbon skeleton being further substituted by singly-bound nitrogen atoms, not being further bound to other hetero atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
- C07C309/01—Sulfonic acids
- C07C309/02—Sulfonic acids having sulfo groups bound to acyclic carbon atoms
- C07C309/03—Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton
- C07C309/13—Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing nitrogen atoms, not being part of nitro or nitroso groups, bound to the carbon skeleton
- C07C309/14—Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing nitrogen atoms, not being part of nitro or nitroso groups, bound to the carbon skeleton containing amino groups bound to the carbon skeleton
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C311/00—Amides of sulfonic acids, i.e. compounds having singly-bound oxygen atoms of sulfo groups replaced by nitrogen atoms, not being part of nitro or nitroso groups
- C07C311/01—Sulfonamides having sulfur atoms of sulfonamide groups bound to acyclic carbon atoms
- C07C311/02—Sulfonamides having sulfur atoms of sulfonamide groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton
- C07C311/03—Sulfonamides having sulfur atoms of sulfonamide groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton having the nitrogen atoms of the sulfonamide groups bound to hydrogen atoms or to acyclic carbon atoms
- C07C311/05—Sulfonamides having sulfur atoms of sulfonamide groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton having the nitrogen atoms of the sulfonamide groups bound to hydrogen atoms or to acyclic carbon atoms to acyclic carbon atoms of hydrocarbon radicals substituted by nitrogen atoms, not being part of nitro or nitroso groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C317/00—Sulfones; Sulfoxides
- C07C317/44—Sulfones; Sulfoxides having sulfone or sulfoxide groups and carboxyl groups bound to the same carbon skeleton
- C07C317/48—Sulfones; Sulfoxides having sulfone or sulfoxide groups and carboxyl groups bound to the same carbon skeleton the carbon skeleton being further substituted by singly-bound nitrogen atoms, not being part of nitro or nitroso groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/127—Spectral sensitizer containing
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
La presente invención se refiere a un procedimiento para la preparación de compuestos de estirilo de la fórmula general en donde R1 y R2 son iguales o diferentes y un átomo de hidrógeno, un grupo alquilo opcionalmente substituído, un grupo alquenilo opcionalmente substituído o un grupo aralquilo opcionalmente substituído o R1 y R2 pueden formar un anillo junto con el átomo de nitrógeno al cual se ligan, dicho anillo puede incluir cuando menos un teteroátomo además del a´tomo de nitrógeno; R3 es -OH, -OCOR5 ó -OSi(R5)3; X e Y son iguales o diferentes y son -CN, -COOR4, -CONR6R7, R4 y R5 cada uno son grupo alquilo; R6, R7, R8 y R9 son iguales o diferentes y un átomo de hidrógeno, un grupo alquilo inferior o fenilo opcionalmente substituído; n es un número de 2 a 15 y a y b son iguales o diferentes y un número de 1 a 2, el procedimiento está caracterizado porque comprende reaccionar un compuesto de la fórmula general: en donde R1, R2 y n y R es -OCOR5 o -OSi(R5)3, con un compuesto de la fórmula general: en donde X e Y son como se definieron anteriormente.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62332110A JP2595598B2 (ja) | 1987-12-28 | 1987-12-28 | フォトレジスト組成物 |
JP63177752A JP2819562B2 (ja) | 1988-07-15 | 1988-07-15 | スチリル系化合物及びその製法 |
Publications (1)
Publication Number | Publication Date |
---|---|
MX169489B true MX169489B (es) | 1993-07-07 |
Family
ID=26498182
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MX014356A MX169489B (es) | 1987-12-28 | 1988-12-27 | Procedimiento para preparar compuestos de estirilo |
Country Status (7)
Country | Link |
---|---|
US (2) | US5218136A (es) |
EP (2) | EP0510726B1 (es) |
KR (1) | KR0139093B1 (es) |
CA (1) | CA1329599C (es) |
DE (2) | DE3855110T2 (es) |
MX (1) | MX169489B (es) |
SG (1) | SG77100A1 (es) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2682126B2 (ja) * | 1989-04-10 | 1997-11-26 | 住友化学工業株式会社 | フォトレジスト組成物 |
US5362598A (en) * | 1989-04-10 | 1994-11-08 | Sumitomo Chemical Co., Ltd. | Quinone diazide photoresist composition containing alkali-soluble resin and an ultraviolet ray absorbing dye |
FR2651239B1 (fr) * | 1989-08-29 | 1996-08-02 | Thomson Csf | Colorants pour polymeres actifs en optique non lineaire. |
DE4004613A1 (de) * | 1990-02-15 | 1991-08-22 | Basf Ag | Bichromophore cyanogruppen aufweisende methinfarbstoffe und ein verfahren zu ihrer uebertragung |
CA2080554A1 (en) * | 1991-10-15 | 1993-04-16 | Mitsubishi Chemical Corporation | Styrene derivatives |
JPH05301838A (ja) * | 1991-10-15 | 1993-11-16 | Mitsubishi Kasei Corp | スチレン誘導体 |
KR0148598B1 (ko) * | 1994-11-21 | 1998-10-15 | 정선종 | 두꺼운 초전도채널층을 구비한 고온초전도 전계효과 트랜지스터의 제조방법 |
US5756257A (en) * | 1996-02-14 | 1998-05-26 | Imation Corp. | Color proofing article incorporating novel antihalation dye |
US5763135A (en) * | 1996-09-30 | 1998-06-09 | Clariant Finance (Bvi) Limited | Light sensitive composition containing an arylhydrazo dye |
DE10009580A1 (de) * | 2000-02-29 | 2001-08-30 | Bayer Ag | Verfahren zum Massefärben von Kunststoffen |
US6774116B2 (en) * | 2001-04-17 | 2004-08-10 | Cryolife, Inc. | Prodrugs via acylation with cinnamate |
JP5955583B2 (ja) * | 2012-02-24 | 2016-07-20 | 株式会社Adeka | 新規化合物、染料及び着色感光性組成物 |
CN103408461B (zh) * | 2013-07-19 | 2015-10-07 | 浙江工业大学 | 一种2-氰基-3-取代苯基丙烯酰胺衍生物、其制备及应用 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2798090A (en) * | 1953-03-02 | 1957-07-02 | Eastman Kodak Co | Process for preparing benzalaniline-3-sulfonic acid compounds |
US2850520A (en) * | 1956-07-18 | 1958-09-02 | Sandoz Ag | New water-insoluble styryl dyestuffs |
US3331687A (en) * | 1962-09-24 | 1967-07-18 | Render Belipa G M B H Fa | Electrophotographic material |
AU5303579A (en) * | 1979-01-26 | 1980-07-31 | Gaf Corporation | (2-cyano-3,3-diphenylacryloxy) alkylene compounds |
US4369310A (en) * | 1979-11-19 | 1983-01-18 | Ciba-Geigy Ltd. | Bleachable dyes |
DE3128159A1 (de) * | 1981-07-16 | 1983-02-03 | Bayer Ag, 5090 Leverkusen | Verfahren zur herstellung von styrylfarbstoffen |
US4420555A (en) * | 1982-07-19 | 1983-12-13 | Eastman Kodak Company | Photographic materials containing yellow filter dyes |
JPS6093445A (ja) * | 1983-10-28 | 1985-05-25 | Ricoh Co Ltd | 電子写真用感光体 |
JPS6193445A (ja) * | 1984-10-12 | 1986-05-12 | Fuji Photo Film Co Ltd | 新規なフオトレジスト組成物 |
JPS622250A (ja) * | 1985-06-28 | 1987-01-08 | Toshiba Corp | 感光性樹脂 |
CA1287768C (en) * | 1986-01-27 | 1991-08-20 | Thap Dominh | Antireflective photoresist composition |
US4914190A (en) * | 1987-03-19 | 1990-04-03 | Ciba-Geigy Corporation | Tricyanovinyl-N,N-disubstituted anilines as disperse dyes |
JPS63286843A (ja) * | 1987-05-19 | 1988-11-24 | Nippon Zeon Co Ltd | ポジ型フォトレジスト組成物 |
DE3735852A1 (de) * | 1987-10-23 | 1989-05-03 | Hoechst Ag | Positiv arbeitendes lichtempfindliches gemisch, enthaltend einen farbstoff, und daraus hergestelltes positiv arbeitendes lichtempfindliches aufzeichnungsmaterial |
US4958043A (en) * | 1988-04-18 | 1990-09-18 | Eastman Kodak Company | Novel methine compounds, polymers containing them and formed articles therefrom |
EP0351367A3 (de) * | 1988-07-11 | 1991-09-18 | Ciba-Geigy Ag | Dispersionsfarbstoffe, enthaltend eine Tricyanovinylgruppierung |
-
1988
- 1988-12-27 MX MX014356A patent/MX169489B/es unknown
- 1988-12-27 US US07/290,264 patent/US5218136A/en not_active Expired - Lifetime
- 1988-12-28 EP EP92110557A patent/EP0510726B1/en not_active Expired - Lifetime
- 1988-12-28 EP EP88121773A patent/EP0323631B1/en not_active Expired - Lifetime
- 1988-12-28 CA CA000587099A patent/CA1329599C/en not_active Expired - Fee Related
- 1988-12-28 DE DE3855110T patent/DE3855110T2/de not_active Expired - Fee Related
- 1988-12-28 DE DE88121773T patent/DE3883195T2/de not_active Expired - Fee Related
- 1988-12-28 KR KR1019880017667A patent/KR0139093B1/ko not_active IP Right Cessation
- 1988-12-28 SG SG1996001577A patent/SG77100A1/en unknown
-
1992
- 1992-09-01 US US07/937,684 patent/US5354644A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
SG77100A1 (en) | 2000-12-19 |
DE3883195D1 (de) | 1993-09-16 |
DE3855110T2 (de) | 1996-08-29 |
EP0323631B1 (en) | 1993-08-11 |
DE3883195T2 (de) | 1994-02-17 |
US5354644A (en) | 1994-10-11 |
EP0323631A3 (en) | 1989-12-13 |
EP0510726A1 (en) | 1992-10-28 |
DE3855110D1 (de) | 1996-04-18 |
CA1329599C (en) | 1994-05-17 |
EP0510726B1 (en) | 1996-03-13 |
KR0139093B1 (ko) | 1998-05-01 |
US5218136A (en) | 1993-06-08 |
KR890009852A (ko) | 1989-08-04 |
EP0323631A2 (en) | 1989-07-12 |
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