JPWO2023189803A5 - - Google Patents
Info
- Publication number
- JPWO2023189803A5 JPWO2023189803A5 JP2024511869A JP2024511869A JPWO2023189803A5 JP WO2023189803 A5 JPWO2023189803 A5 JP WO2023189803A5 JP 2024511869 A JP2024511869 A JP 2024511869A JP 2024511869 A JP2024511869 A JP 2024511869A JP WO2023189803 A5 JPWO2023189803 A5 JP WO2023189803A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- underlayer film
- resist underlayer
- aromatic
- ring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022051965 | 2022-03-28 | ||
| PCT/JP2023/010827 WO2023189803A1 (ja) | 2022-03-28 | 2023-03-20 | レジスト下層膜形成組成物 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2023189803A1 JPWO2023189803A1 (https=) | 2023-10-05 |
| JPWO2023189803A5 true JPWO2023189803A5 (https=) | 2026-03-10 |
Family
ID=88201076
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024511869A Pending JPWO2023189803A1 (https=) | 2022-03-28 | 2023-03-20 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20260118765A1 (https=) |
| JP (1) | JPWO2023189803A1 (https=) |
| KR (1) | KR20240167851A (https=) |
| CN (1) | CN118974659A (https=) |
| TW (1) | TW202405042A (https=) |
| WO (1) | WO2023189803A1 (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2025192457A1 (ja) * | 2024-03-15 | 2025-09-18 | 日産化学株式会社 | レジスト下層膜形成用組成物、レジスト下層膜、レジストパターンの形成方法、及び半導体装置の製造方法 |
| WO2025192444A1 (ja) * | 2024-03-15 | 2025-09-18 | 日産化学株式会社 | レジスト下層膜形成用組成物、レジスト下層膜、レジストパターンの形成方法、及び半導体装置の製造方法 |
| WO2025205630A1 (ja) * | 2024-03-27 | 2025-10-02 | 日産化学株式会社 | レジスト下層膜形成用組成物、レジスト下層膜、レジストパターンの形成方法、及び半導体装置の製造方法 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4945091B1 (https=) | 1970-08-20 | 1974-12-02 | ||
| JPS6256719U (https=) | 1985-09-26 | 1987-04-08 | ||
| JPH0515035Y2 (https=) | 1986-08-26 | 1993-04-21 | ||
| US9244353B2 (en) | 2012-08-10 | 2016-01-26 | Nissan Chemical Industries, Ltd. | Resist underlayer film forming composition |
| CN105027005B (zh) * | 2013-02-25 | 2020-02-07 | 日产化学工业株式会社 | 含有具有羟基的芳基磺酸盐的抗蚀剂下层膜形成用组合物 |
| US10429737B2 (en) | 2017-09-21 | 2019-10-01 | Rohm And Haas Electronic Materials Korea Ltd. | Antireflective compositions with thermal acid generators |
| WO2022196606A1 (ja) * | 2021-03-15 | 2022-09-22 | 日産化学株式会社 | 酸触媒担持型ポリマーを含むレジスト下層膜形成組成物 |
-
2023
- 2023-03-20 KR KR1020247035242A patent/KR20240167851A/ko active Pending
- 2023-03-20 US US18/852,760 patent/US20260118765A1/en active Pending
- 2023-03-20 TW TW112110162A patent/TW202405042A/zh unknown
- 2023-03-20 JP JP2024511869A patent/JPWO2023189803A1/ja active Pending
- 2023-03-20 CN CN202380031452.3A patent/CN118974659A/zh active Pending
- 2023-03-20 WO PCT/JP2023/010827 patent/WO2023189803A1/ja not_active Ceased
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