JPWO2020179757A5 - - Google Patents
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- Publication number
- JPWO2020179757A5 JPWO2020179757A5 JP2021504096A JP2021504096A JPWO2020179757A5 JP WO2020179757 A5 JPWO2020179757 A5 JP WO2020179757A5 JP 2021504096 A JP2021504096 A JP 2021504096A JP 2021504096 A JP2021504096 A JP 2021504096A JP WO2020179757 A5 JPWO2020179757 A5 JP WO2020179757A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- protective film
- carbon atoms
- formula
- composition according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000001681 protective effect Effects 0.000 claims description 29
- 125000004432 carbon atom Chemical group C* 0.000 claims description 21
- 239000000203 mixture Substances 0.000 claims description 21
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 7
- 125000000962 organic group Chemical group 0.000 claims description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 4
- 229920000642 polymer Polymers 0.000 claims description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 3
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 8
- 239000004065 semiconductor Substances 0.000 description 8
- 239000000758 substrate Substances 0.000 description 7
- 230000002378 acidificating effect Effects 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- 238000001039 wet etching Methods 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 3
- 230000001588 bifunctional effect Effects 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical group OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 125000003342 alkenyl group Chemical group 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 125000004414 alkyl thio group Chemical group 0.000 description 2
- 125000004093 cyano group Chemical group *C#N 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 125000004450 alkenylene group Chemical group 0.000 description 1
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- 125000000304 alkynyl group Chemical group 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 125000001183 hydrocarbyl group Chemical group 0.000 description 1
- 125000005462 imide group Chemical group 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- 125000000325 methylidene group Chemical group [H]C([H])=* 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 125000000547 substituted alkyl group Chemical group 0.000 description 1
- 125000005156 substituted alkylene group Chemical group 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2023183011A JP7803329B2 (ja) | 2019-03-04 | 2023-10-25 | ジオール構造を末端に有する重合生成物を含む薬液耐性保護膜形成組成物 |
| JP2025134145A JP2025159112A (ja) | 2019-03-04 | 2025-08-12 | ジオール構造を末端に有する重合生成物を含む薬液耐性保護膜形成組成物 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019038936 | 2019-03-04 | ||
| JP2019038936 | 2019-03-04 | ||
| PCT/JP2020/008784 WO2020179757A1 (ja) | 2019-03-04 | 2020-03-03 | ジオール構造を末端に有する重合生成物を含む薬液耐性保護膜形成組成物 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023183011A Division JP7803329B2 (ja) | 2019-03-04 | 2023-10-25 | ジオール構造を末端に有する重合生成物を含む薬液耐性保護膜形成組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2020179757A1 JPWO2020179757A1 (https=) | 2020-09-10 |
| JPWO2020179757A5 true JPWO2020179757A5 (https=) | 2023-01-25 |
| JP7447892B2 JP7447892B2 (ja) | 2024-03-12 |
Family
ID=72338334
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021504096A Active JP7447892B2 (ja) | 2019-03-04 | 2020-03-03 | ジオール構造を末端に有する重合生成物を含む薬液耐性保護膜形成組成物 |
| JP2023183011A Active JP7803329B2 (ja) | 2019-03-04 | 2023-10-25 | ジオール構造を末端に有する重合生成物を含む薬液耐性保護膜形成組成物 |
| JP2025134145A Withdrawn JP2025159112A (ja) | 2019-03-04 | 2025-08-12 | ジオール構造を末端に有する重合生成物を含む薬液耐性保護膜形成組成物 |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023183011A Active JP7803329B2 (ja) | 2019-03-04 | 2023-10-25 | ジオール構造を末端に有する重合生成物を含む薬液耐性保護膜形成組成物 |
| JP2025134145A Withdrawn JP2025159112A (ja) | 2019-03-04 | 2025-08-12 | ジオール構造を末端に有する重合生成物を含む薬液耐性保護膜形成組成物 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US12344758B2 (https=) |
| JP (3) | JP7447892B2 (https=) |
| KR (2) | KR20260019631A (https=) |
| CN (1) | CN113574085B (https=) |
| TW (1) | TW202104329A (https=) |
| WO (1) | WO2020179757A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP4632026A1 (en) * | 2022-12-05 | 2025-10-15 | Nissan Chemical Corporation | Composition for forming protective film |
| WO2026022021A1 (en) * | 2024-07-25 | 2026-01-29 | Basf Se | Composition, its use and a process for selectively etching silicon-germanium layers |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1528152A (en) * | 1975-01-22 | 1978-10-11 | Agfa Gevaert | Development of photographic silver halide material |
| US8445175B2 (en) * | 2006-06-19 | 2013-05-21 | Nissan Chemical Industries, Ltd. | Composition containing hydroxylated condensation resin for forming resist underlayer film |
| EP2251742B1 (en) | 2008-02-21 | 2012-05-16 | Nissan Chemical Industries, Ltd. | Composition for forming resist underlayer film and method for forming resist pattern using the same |
| JP2015038534A (ja) * | 2011-12-16 | 2015-02-26 | 日産化学工業株式会社 | レジスト下層膜形成組成物及びそれを用いたレジストパターンの形成方法 |
| US9946157B2 (en) * | 2015-03-31 | 2018-04-17 | Sumitomo Chemical Company, Limited | Resist composition and method for producing resist pattern |
| WO2018052130A1 (ja) | 2016-09-16 | 2018-03-22 | 日産化学工業株式会社 | 保護膜形成組成物 |
| CN108341948A (zh) * | 2017-01-25 | 2018-07-31 | 翁秋梅 | 一种杂化交联动态聚合物及其应用 |
| JP6853716B2 (ja) * | 2017-03-31 | 2021-03-31 | 信越化学工業株式会社 | レジスト下層膜材料、パターン形成方法、及びレジスト下層膜形成方法 |
| WO2018203540A1 (ja) | 2017-05-02 | 2018-11-08 | 日産化学株式会社 | レジスト下層膜形成組成物 |
| JP7302480B2 (ja) * | 2017-12-22 | 2023-07-04 | 日産化学株式会社 | ジオール構造を有する保護膜形成組成物 |
-
2020
- 2020-03-03 KR KR1020267000648A patent/KR20260019631A/ko active Pending
- 2020-03-03 JP JP2021504096A patent/JP7447892B2/ja active Active
- 2020-03-03 KR KR1020217029173A patent/KR102917411B1/ko active Active
- 2020-03-03 US US17/433,523 patent/US12344758B2/en active Active
- 2020-03-03 CN CN202080018601.9A patent/CN113574085B/zh active Active
- 2020-03-03 WO PCT/JP2020/008784 patent/WO2020179757A1/ja not_active Ceased
- 2020-03-04 TW TW109107023A patent/TW202104329A/zh unknown
-
2023
- 2023-10-25 JP JP2023183011A patent/JP7803329B2/ja active Active
-
2025
- 2025-08-12 JP JP2025134145A patent/JP2025159112A/ja not_active Withdrawn
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