KR102917411B1 - 디올구조를 말단에 갖는 중합생성물을 포함하는 약액내성 보호막형성 조성물 - Google Patents

디올구조를 말단에 갖는 중합생성물을 포함하는 약액내성 보호막형성 조성물

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KR102917411B1
KR102917411B1 KR1020217029173A KR20217029173A KR102917411B1 KR 102917411 B1 KR102917411 B1 KR 102917411B1 KR 1020217029173 A KR1020217029173 A KR 1020217029173A KR 20217029173 A KR20217029173 A KR 20217029173A KR 102917411 B1 KR102917411 B1 KR 102917411B1
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group
protective film
carbon atoms
forming composition
formula
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KR20210135252A (ko
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타카후미 엔도
토키오 니시타
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닛산 가가쿠 가부시키가이샤
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    • C09D163/00—Coating compositions based on epoxy resins; Coating compositions based on derivatives of epoxy resins
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
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    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • G—PHYSICS
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    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/094—Multilayer resist systems, e.g. planarising layers
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    • C08G59/1433—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
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    • C08G59/1433—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
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    • C08G59/42—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
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    • C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
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  • Chemical & Material Sciences (AREA)
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  • Polymers & Plastics (AREA)
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  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polyesters Or Polycarbonates (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Epoxy Resins (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
KR1020217029173A 2019-03-04 2020-03-03 디올구조를 말단에 갖는 중합생성물을 포함하는 약액내성 보호막형성 조성물 Active KR102917411B1 (ko)

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KR1020267000648A KR20260019631A (ko) 2019-03-04 2020-03-03 디올구조를 말단에 갖는 중합생성물을 포함하는 약액내성 보호막형성 조성물

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JPJP-P-2019-038936 2019-03-04
JP2019038936 2019-03-04
PCT/JP2020/008784 WO2020179757A1 (ja) 2019-03-04 2020-03-03 ジオール構造を末端に有する重合生成物を含む薬液耐性保護膜形成組成物

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KR102917411B1 true KR102917411B1 (ko) 2026-01-26

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KR1020267000648A Pending KR20260019631A (ko) 2019-03-04 2020-03-03 디올구조를 말단에 갖는 중합생성물을 포함하는 약액내성 보호막형성 조성물

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US (1) US12344758B2 (https=)
JP (3) JP7447892B2 (https=)
KR (2) KR102917411B1 (https=)
CN (1) CN113574085B (https=)
TW (1) TW202104329A (https=)
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TW202429204A (zh) * 2022-12-05 2024-07-16 日商日產化學股份有限公司 保護膜形成用組成物
WO2026022021A1 (en) * 2024-07-25 2026-01-29 Basf Se Composition, its use and a process for selectively etching silicon-germanium layers

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WO2007148627A1 (ja) * 2006-06-19 2007-12-27 Nissan Chemical Industries, Ltd. 水酸基含有縮合系樹脂を含有するレジスト下層膜形成組成物
WO2009104685A1 (ja) * 2008-02-21 2009-08-27 日産化学工業株式会社 レジスト下層膜形成組成物及びそれを用いたレジストパターンの形成方法
CN108341948A (zh) 2017-01-25 2018-07-31 翁秋梅 一种杂化交联动态聚合物及其应用
US20180284614A1 (en) 2017-03-31 2018-10-04 Shin-Etsu Chemical Co., Ltd. Resist underlayer film composition, patterning process, and method for forming resist underlayer film
WO2018203540A1 (ja) * 2017-05-02 2018-11-08 日産化学株式会社 レジスト下層膜形成組成物

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