CN113574085B - 包含末端具有二醇结构的聚合生成物的药液耐性保护膜形成用组合物 - Google Patents

包含末端具有二醇结构的聚合生成物的药液耐性保护膜形成用组合物 Download PDF

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CN113574085B
CN113574085B CN202080018601.9A CN202080018601A CN113574085B CN 113574085 B CN113574085 B CN 113574085B CN 202080018601 A CN202080018601 A CN 202080018601A CN 113574085 B CN113574085 B CN 113574085B
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group
protective film
formula
carbon atoms
forming
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CN113574085A (zh
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远藤贵文
西田登喜雄
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Nissan Chemical Corp
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    • C09D163/00—Coating compositions based on epoxy resins; Coating compositions based on derivatives of epoxy resins
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
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    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/094—Multilayer resist systems, e.g. planarising layers
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    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
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    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14—Polycondensates modified by chemical after-treatment
    • C08G59/1433—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
    • C08G59/1438—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds containing oxygen
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    • C08G59/1433—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
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    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
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    • C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/22—Di-epoxy compounds
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    • C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/42—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
    • C08G59/423—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof containing an atom other than oxygen belonging to a functional groups to C08G59/42, carbon and hydrogen
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    • C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/42—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
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    • G—PHYSICS
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    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
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  • Chemical & Material Sciences (AREA)
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  • Polymers & Plastics (AREA)
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  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polyesters Or Polycarbonates (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Epoxy Resins (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
CN202080018601.9A 2019-03-04 2020-03-03 包含末端具有二醇结构的聚合生成物的药液耐性保护膜形成用组合物 Active CN113574085B (zh)

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JP2019-038936 2019-03-04
JP2019038936 2019-03-04
PCT/JP2020/008784 WO2020179757A1 (ja) 2019-03-04 2020-03-03 ジオール構造を末端に有する重合生成物を含む薬液耐性保護膜形成組成物

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CN113574085A CN113574085A (zh) 2021-10-29
CN113574085B true CN113574085B (zh) 2024-07-30

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US (1) US12344758B2 (https=)
JP (3) JP7447892B2 (https=)
KR (2) KR102917411B1 (https=)
CN (1) CN113574085B (https=)
TW (1) TW202104329A (https=)
WO (1) WO2020179757A1 (https=)

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TW202429204A (zh) * 2022-12-05 2024-07-16 日商日產化學股份有限公司 保護膜形成用組成物
WO2026022021A1 (en) * 2024-07-25 2026-01-29 Basf Se Composition, its use and a process for selectively etching silicon-germanium layers

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CN101473270A (zh) * 2006-06-19 2009-07-01 日产化学工业株式会社 含有具有羟基的缩合系树脂的形成抗蚀剂下层膜的组合物
WO2009104685A1 (ja) * 2008-02-21 2009-08-27 日産化学工業株式会社 レジスト下層膜形成組成物及びそれを用いたレジストパターンの形成方法
WO2018203540A1 (ja) * 2017-05-02 2018-11-08 日産化学株式会社 レジスト下層膜形成組成物

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GB1528152A (en) * 1975-01-22 1978-10-11 Agfa Gevaert Development of photographic silver halide material
JP2015038534A (ja) * 2011-12-16 2015-02-26 日産化学工業株式会社 レジスト下層膜形成組成物及びそれを用いたレジストパターンの形成方法
JP6761657B2 (ja) * 2015-03-31 2020-09-30 住友化学株式会社 レジスト組成物及びレジストパターンの製造方法
TWI758326B (zh) 2016-09-16 2022-03-21 日商日產化學工業股份有限公司 保護膜形成組成物
CN108341948A (zh) * 2017-01-25 2018-07-31 翁秋梅 一种杂化交联动态聚合物及其应用
JP6853716B2 (ja) * 2017-03-31 2021-03-31 信越化学工業株式会社 レジスト下層膜材料、パターン形成方法、及びレジスト下層膜形成方法
JP7302480B2 (ja) * 2017-12-22 2023-07-04 日産化学株式会社 ジオール構造を有する保護膜形成組成物

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101473270A (zh) * 2006-06-19 2009-07-01 日产化学工业株式会社 含有具有羟基的缩合系树脂的形成抗蚀剂下层膜的组合物
WO2009104685A1 (ja) * 2008-02-21 2009-08-27 日産化学工業株式会社 レジスト下層膜形成組成物及びそれを用いたレジストパターンの形成方法
WO2018203540A1 (ja) * 2017-05-02 2018-11-08 日産化学株式会社 レジスト下層膜形成組成物

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KR102917411B1 (ko) 2026-01-26
WO2020179757A1 (ja) 2020-09-10
KR20210135252A (ko) 2021-11-12
KR20260019631A (ko) 2026-02-10
JP2023184588A (ja) 2023-12-28
US12344758B2 (en) 2025-07-01
JPWO2020179757A1 (https=) 2020-09-10
JP7803329B2 (ja) 2026-01-21
TW202104329A (zh) 2021-02-01
JP7447892B2 (ja) 2024-03-12
US20220145119A1 (en) 2022-05-12
CN113574085A (zh) 2021-10-29

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