JPWO2021171943A5 - - Google Patents
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- Publication number
- JPWO2021171943A5 JPWO2021171943A5 JP2022503209A JP2022503209A JPWO2021171943A5 JP WO2021171943 A5 JPWO2021171943 A5 JP WO2021171943A5 JP 2022503209 A JP2022503209 A JP 2022503209A JP 2022503209 A JP2022503209 A JP 2022503209A JP WO2021171943 A5 JPWO2021171943 A5 JP WO2021171943A5
- Authority
- JP
- Japan
- Prior art keywords
- insulating film
- interlayer insulating
- producing
- polymerizable
- coating composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011229 interlayer Substances 0.000 claims 20
- 238000004519 manufacturing process Methods 0.000 claims 10
- 239000008199 coating composition Substances 0.000 claims 8
- 150000001875 compounds Chemical class 0.000 claims 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 2
- 150000003377 silicon compounds Chemical class 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 claims 1
- 125000004432 carbon atom Chemical group C* 0.000 claims 1
- 239000003795 chemical substances by application Substances 0.000 claims 1
- 125000005842 heteroatom Chemical group 0.000 claims 1
- 239000003999 initiator Substances 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 239000006082 mold release agent Substances 0.000 claims 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 claims 1
- 238000000016 photochemical curing Methods 0.000 claims 1
- 238000003825 pressing Methods 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000002904 solvent Substances 0.000 claims 1
- 125000005156 substituted alkylene group Chemical group 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020031276 | 2020-02-27 | ||
| JP2020031276 | 2020-02-27 | ||
| PCT/JP2021/004014 WO2021171943A1 (ja) | 2020-02-27 | 2021-02-04 | 層間絶縁膜製造用塗布組成物、層間絶縁膜、及び半導体素子、並びに層間絶縁膜の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2021171943A1 JPWO2021171943A1 (https=) | 2021-09-02 |
| JPWO2021171943A5 true JPWO2021171943A5 (https=) | 2022-07-05 |
| JP7111274B2 JP7111274B2 (ja) | 2022-08-02 |
Family
ID=77490091
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022503209A Active JP7111274B2 (ja) | 2020-02-27 | 2021-02-04 | 層間絶縁膜製造用塗布組成物、層間絶縁膜、及び半導体素子、並びに層間絶縁膜の製造方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20230159707A1 (https=) |
| JP (1) | JP7111274B2 (https=) |
| KR (1) | KR102793541B1 (https=) |
| CN (1) | CN115210853B (https=) |
| TW (1) | TWI856235B (https=) |
| WO (1) | WO2021171943A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2022170092A (ja) * | 2021-04-28 | 2022-11-10 | 東京応化工業株式会社 | パターン形成方法 |
| TW202436411A (zh) * | 2022-11-29 | 2024-09-16 | 日商Ｄｉｃ股份有限公司 | 硬化性樹脂組成物 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4208447B2 (ja) | 2001-09-26 | 2009-01-14 | 独立行政法人科学技術振興機構 | Ｓｏｇを用いた室温ナノ−インプリント−リソグラフィー |
| US20080264672A1 (en) * | 2007-04-26 | 2008-10-30 | Air Products And Chemicals, Inc. | Photoimprintable Low Dielectric Constant Material and Method for Making and Using Same |
| JP2009206197A (ja) * | 2008-02-26 | 2009-09-10 | Fujifilm Corp | ナノインプリント用硬化性組成物、硬化物およびその製造方法 |
| US20140061970A1 (en) * | 2011-02-15 | 2014-03-06 | Dic Corporation | Nanoimprint curable composition, nanoimprint-lithographic molded product, and method for forming pattern |
| JP5879086B2 (ja) | 2011-10-14 | 2016-03-08 | 国立大学法人東北大学 | ナノインプリント用複製モールド |
| CN107075017B (zh) * | 2014-11-07 | 2019-11-05 | Dic株式会社 | 固化性组合物、抗蚀材料及抗蚀膜 |
| CN109195999B (zh) * | 2016-05-11 | 2021-04-16 | Dic株式会社 | 光压印用固化性组合物及使用其的图案形成方法 |
| IL267443B2 (en) * | 2016-12-22 | 2023-10-01 | Illumina Inc | Imprinting apparatus |
| JP7081337B2 (ja) | 2018-06-27 | 2022-06-07 | Dic株式会社 | 光硬化性組成物及びその製造方法 |
-
2021
- 2021-02-04 JP JP2022503209A patent/JP7111274B2/ja active Active
- 2021-02-04 US US17/801,353 patent/US20230159707A1/en not_active Abandoned
- 2021-02-04 CN CN202180017254.2A patent/CN115210853B/zh active Active
- 2021-02-04 WO PCT/JP2021/004014 patent/WO2021171943A1/ja not_active Ceased
- 2021-02-04 KR KR1020227025012A patent/KR102793541B1/ko active Active
- 2021-02-05 TW TW110104475A patent/TWI856235B/zh active
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