JP2020530199A5 - - Google Patents
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- JP2020530199A5 JP2020530199A5 JP2020505377A JP2020505377A JP2020530199A5 JP 2020530199 A5 JP2020530199 A5 JP 2020530199A5 JP 2020505377 A JP2020505377 A JP 2020505377A JP 2020505377 A JP2020505377 A JP 2020505377A JP 2020530199 A5 JP2020530199 A5 JP 2020530199A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- netme
- nme
- busn
- organometallic compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022194698A JP7577104B2 (ja) | 2017-08-02 | 2022-12-06 | 有機金属化合物及びその精製法 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CA2975104A CA2975104A1 (en) | 2017-08-02 | 2017-08-02 | Organometallic compounds and methods for the deposition of high purity tin oxide |
| CA2975104 | 2017-08-02 | ||
| PCT/CA2018/050933 WO2019023797A1 (en) | 2017-08-02 | 2018-07-31 | Organometallic compounds and methods for the deposition of high purity tin oxide |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022194698A Division JP7577104B2 (ja) | 2017-08-02 | 2022-12-06 | 有機金属化合物及びその精製法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2020530199A JP2020530199A (ja) | 2020-10-15 |
| JP2020530199A5 true JP2020530199A5 (cg-RX-API-DMAC10.html) | 2021-09-16 |
Family
ID=65229074
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020505377A Pending JP2020530199A (ja) | 2017-08-02 | 2018-07-31 | 高純度酸化スズの堆積のための有機金属化合物及び方法 |
| JP2022194698A Active JP7577104B2 (ja) | 2017-08-02 | 2022-12-06 | 有機金属化合物及びその精製法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022194698A Active JP7577104B2 (ja) | 2017-08-02 | 2022-12-06 | 有機金属化合物及びその精製法 |
Country Status (8)
| Country | Link |
|---|---|
| US (3) | US20190337969A1 (cg-RX-API-DMAC10.html) |
| JP (2) | JP2020530199A (cg-RX-API-DMAC10.html) |
| KR (1) | KR102715899B1 (cg-RX-API-DMAC10.html) |
| CN (1) | CN111032667B (cg-RX-API-DMAC10.html) |
| CA (1) | CA2975104A1 (cg-RX-API-DMAC10.html) |
| SG (1) | SG11202000884RA (cg-RX-API-DMAC10.html) |
| TW (2) | TW201920214A (cg-RX-API-DMAC10.html) |
| WO (1) | WO2019023797A1 (cg-RX-API-DMAC10.html) |
Families Citing this family (52)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA2975104A1 (en) * | 2017-08-02 | 2019-02-02 | Seastar Chemicals Inc. | Organometallic compounds and methods for the deposition of high purity tin oxide |
| US10787466B2 (en) | 2018-04-11 | 2020-09-29 | Inpria Corporation | Monoalkyl tin compounds with low polyalkyl contamination, their compositions and methods |
| US11673903B2 (en) | 2018-04-11 | 2023-06-13 | Inpria Corporation | Monoalkyl tin compounds with low polyalkyl contamination, their compositions and methods |
| TWI822595B (zh) | 2018-06-21 | 2023-11-11 | 美商英培雅股份有限公司 | 包含溶劑與單烷基錫三烷氧化物之混合物的溶液、及使用其的方法 |
| CN113039486B (zh) | 2018-11-14 | 2024-11-12 | 朗姆研究公司 | 可用于下一代光刻法中的硬掩模制作方法 |
| CN120762258A (zh) | 2018-12-20 | 2025-10-10 | 朗姆研究公司 | 抗蚀剂的干式显影 |
| US11966158B2 (en) | 2019-01-30 | 2024-04-23 | Inpria Corporation | Monoalkyl tin trialkoxides and/or monoalkyl tin triamides with low metal contamination and/or particulate contamination, and corresponding methods |
| US11498934B2 (en) | 2019-01-30 | 2022-11-15 | Inpria Corporation | Monoalkyl tin trialkoxides and/or monoalkyl tin triamides with particulate contamination and corresponding methods |
| US11609494B2 (en) | 2019-04-30 | 2023-03-21 | Samsung Sdi Co., Ltd. | Semiconductor photoresist composition and method of forming patterns using the composition |
| KR102606844B1 (ko) * | 2019-04-30 | 2023-11-27 | 삼성에스디아이 주식회사 | 반도체 포토 레지스트용 조성물 및 이를 이용한 패턴 형성 방법 |
| TWI869221B (zh) | 2019-06-26 | 2025-01-01 | 美商蘭姆研究公司 | 利用鹵化物化學品的光阻顯影 |
| US20220306657A1 (en) * | 2019-08-29 | 2022-09-29 | Seastar Chemicals Ulc | Organometallic compounds for the deposition of high purity tin oxide and dry etching of the tin oxide films and deposition reactors |
| US11314168B2 (en) | 2020-01-15 | 2022-04-26 | Lam Research Corporation | Underlayer for photoresist adhesion and dose reduction |
| KR102573327B1 (ko) | 2020-04-02 | 2023-08-30 | 삼성에스디아이 주식회사 | 반도체 포토레지스트용 조성물 및 이를 이용한 패턴 형성 방법 |
| KR102619719B1 (ko) | 2020-05-12 | 2023-12-28 | 삼성에스디아이 주식회사 | 반도체 포토레지스트용 조성물 및 이를 이용한 패턴 형성 방법 |
| US11621172B2 (en) | 2020-07-01 | 2023-04-04 | Applied Materials, Inc. | Vapor phase thermal etch solutions for metal oxo photoresists |
| US12416863B2 (en) | 2020-07-01 | 2025-09-16 | Applied Materials, Inc. | Dry develop process of photoresist |
| US12159787B2 (en) * | 2020-07-02 | 2024-12-03 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method of manufacturing a semiconductor device and pattern formation method |
| EP4175963A4 (en) * | 2020-07-03 | 2025-10-29 | Entegris Inc | PROCESS FOR THE PREPARATION OF ORGANOETAIN COMPOUNDS |
| KR102781895B1 (ko) | 2020-07-07 | 2025-03-18 | 램 리써치 코포레이션 | 방사선 포토레지스트 패터닝을 패터닝하기 위한 통합된 건식 프로세스 |
| US20220064192A1 (en) * | 2020-08-25 | 2022-03-03 | Inpria Corporation | Methods to produce organotin compositions with convenient ligand providing reactants |
| KR102586112B1 (ko) * | 2020-09-14 | 2023-10-05 | 삼성에스디아이 주식회사 | 반도체 포토레지스트용 조성물 및 이를 이용한 패턴 형성 방법 |
| US12153346B2 (en) | 2020-09-30 | 2024-11-26 | Taiwan Semiconductor Manufacturing Company, Ltd. | Photoresist for semiconductor fabrication |
| KR102673863B1 (ko) | 2020-11-13 | 2024-06-11 | 램 리써치 코포레이션 | 포토레지스트의 건식 제거를 위한 프로세스 툴 |
| US20220199406A1 (en) * | 2020-12-17 | 2022-06-23 | Applied Materials, Inc. | Vapor deposition of carbon-doped metal oxides for use as photoresists |
| KR102598259B1 (ko) | 2020-12-18 | 2023-11-02 | 삼성에스디아이 주식회사 | 반도체 포토레지스트용 조성물 및 이를 이용한 패턴 형성 방법 |
| KR102690557B1 (ko) * | 2020-12-18 | 2024-07-30 | 삼성에스디아이 주식회사 | 반도체 포토레지스트용 조성물, 이의 제조 방법 및 이를 이용한 패턴 형성 방법 |
| KR20230131941A (ko) * | 2021-01-28 | 2023-09-14 | 엔테그리스, 아이엔씨. | 유기주석 화합물을 제조하는 방법 |
| US11697660B2 (en) * | 2021-01-29 | 2023-07-11 | Entegris, Inc. | Process for preparing organotin compounds |
| CN116888536A (zh) * | 2021-02-23 | 2023-10-13 | 朗姆研究公司 | 含卤素及脂肪族的有机锡光致抗蚀剂及其方法 |
| TWI882232B (zh) * | 2021-06-18 | 2025-05-01 | 美商恩特葛瑞斯股份有限公司 | 製備有機錫化合物的方法 |
| US20220411446A1 (en) * | 2021-06-28 | 2022-12-29 | Inpria Corporation | Deuterated organotin compounds, methods of synthesis and radiation patterning |
| CN117693513A (zh) * | 2021-07-30 | 2024-03-12 | 默克专利股份有限公司 | 二有机锡二卤化物的制备 |
| CN118043496A (zh) | 2021-09-13 | 2024-05-14 | 盖列斯特有限公司 | 用于生产富含氧化锡酸盐的膜的方法和前体 |
| JP2024535334A (ja) * | 2021-09-24 | 2024-09-30 | インプリア・コーポレイション | 高解像度の潜像加工、コントラスト増強及び熱現像、加工のための装置 |
| US12221691B2 (en) | 2021-11-24 | 2025-02-11 | Entegris, Inc. | Organotin precursor compounds |
| CN113956283B (zh) * | 2021-11-24 | 2023-12-19 | 云南锡业锡化工材料有限责任公司 | 一种两步法合成低电导率二丁基氧化锡的方法 |
| US11827659B2 (en) * | 2022-03-31 | 2023-11-28 | Feng Lu | Organometallic tin compounds as EUV photoresist |
| KR20250011129A (ko) * | 2022-05-18 | 2025-01-21 | 인프리아 코포레이션 | 하이드로카빌 리간드에 산소 헤테로원자를 갖는 방사선 민감성 유기주석 조성물 |
| WO2023235534A1 (en) | 2022-06-02 | 2023-12-07 | Gelest, Inc. | High purity alkyl tin compounds and manufacturing methods thereof |
| TW202403845A (zh) * | 2022-06-06 | 2024-01-16 | 美商應用材料股份有限公司 | 用於dram電容器模具圖案化之碳化釕 |
| KR20250040045A (ko) | 2022-08-12 | 2025-03-21 | 젤리스트 인코퍼레이티드 | 불포화 치환기를 함유하는 고순도 주석 화합물 및 이의 제조 방법 |
| US20240092810A1 (en) * | 2022-09-02 | 2024-03-21 | Entegris, Inc. | Compositions for extreme ultraviolet lithography and related methods |
| WO2024076481A1 (en) | 2022-10-04 | 2024-04-11 | Gelest, Inc. | Cyclic azastannane and cyclic oxostannane compounds and methods for preparation thereof |
| US20240174699A1 (en) * | 2022-11-15 | 2024-05-30 | Entegris, Inc. | Functionalized organotin precursors and related methods |
| CN116410222B (zh) * | 2023-06-09 | 2023-08-08 | 研峰科技(北京)有限公司 | 一种叔丁基三(二甲氨基)锡烷的合成方法 |
| CN116925130A (zh) * | 2023-07-25 | 2023-10-24 | 苏州源展材料科技有限公司 | 一种四(二甲氨基)锡的制备方法 |
| CN117164618A (zh) * | 2023-09-06 | 2023-12-05 | 苏州欣诺科生物科技有限公司 | 金属配合物前驱体及金属氧化物薄膜的制备方法 |
| TW202530237A (zh) | 2023-09-13 | 2025-08-01 | 德商馬克專利公司 | 具有改良熱及光穩定性之分子內穩定化單烷基金屬化合物及其用途 |
| US20250179101A1 (en) * | 2023-11-30 | 2025-06-05 | Mitsubishi Chemical Corporation | Methods for purifying tin compounds |
| WO2025147416A1 (en) | 2024-01-05 | 2025-07-10 | Mitsubishi Chemical Corporation | Method for cleaning an apparatus for a tin compound and the cleaned apparatus obtained thereby |
| US20250222496A1 (en) | 2024-01-05 | 2025-07-10 | Mitsubishi Chemical Corporation | Method for cleaning an apparatus for a tin compound and the cleaned apparatus obtained thereby |
Family Cites Families (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE588556A (cg-RX-API-DMAC10.html) * | 1959-03-18 | 1900-01-01 | ||
| DE1121050B (de) * | 1960-12-09 | 1962-01-04 | Dr Dr H C Egon Wiberg | Verfahren zur Herstellung von N-substituierten Zinn- und Organozinnamiden |
| SE7602501L (sv) * | 1975-06-14 | 1976-12-15 | Schering Ag | Medel med baktericid och fungicid verkan |
| JPS61205289A (ja) * | 1985-03-08 | 1986-09-11 | Mitsubishi Metal Corp | スズアルコキシドの製造方法 |
| GB8724049D0 (en) * | 1987-10-14 | 1987-11-18 | Kodak Ltd | Organotin compounds as anionic ionophores |
| DE19730880A1 (de) * | 1997-07-18 | 1999-01-21 | Basf Ag | Verfahren zur selektiven Herstellung von racemischen ansa-Metallocenkomplexen |
| US6984591B1 (en) * | 2000-04-20 | 2006-01-10 | International Business Machines Corporation | Precursor source mixtures |
| JP2005298433A (ja) | 2004-04-15 | 2005-10-27 | Asahi Kasei Chemicals Corp | ジアルキルスズアルコキシド |
| JP2006159090A (ja) * | 2004-12-07 | 2006-06-22 | Asahi Kasei Chemicals Corp | 有機スズアルコキシドの製造方法 |
| KR100700450B1 (ko) * | 2005-03-08 | 2007-03-28 | 주식회사 메카로닉스 | 원자층증착법에 의한 ｉｔｏ박막 제조방법 및 인듐 박막제조방법 |
| JP4798538B2 (ja) * | 2005-09-06 | 2011-10-19 | 株式会社豊田中央研究所 | 膜電極接合体 |
| GB2432364B (en) * | 2005-11-18 | 2009-11-11 | Rohm & Haas Elect Mat | Organometallic compound purification |
| TWI347855B (en) | 2006-02-23 | 2011-09-01 | Asahi Kasei Chemicals Corp | Method for separating out and recovering dialkyltin dialkoxide |
| KR100954541B1 (ko) | 2008-03-20 | 2010-04-23 | 한국화학연구원 | 신규의 주석 아미노알콕사이드 화합물 및 그 제조 방법 |
| US8043976B2 (en) | 2008-03-24 | 2011-10-25 | Air Products And Chemicals, Inc. | Adhesion to copper and copper electromigration resistance |
| KR101489327B1 (ko) * | 2008-05-15 | 2015-02-03 | 삼성전자주식회사 | 물질막의 형성 방법 및 메모리 장치의 제조 방법 |
| FR2940294B1 (fr) * | 2008-12-23 | 2011-02-18 | Michelin Soc Tech | Nouveau systeme d'amorcage pour polymerisation anionique de dienes conjugues, procede de preparation d'elastomeres dieniques. |
| JP2011168576A (ja) * | 2010-02-05 | 2011-09-01 | Rohm & Haas Co | 有機金属化合物を製造する方法 |
| JP2011162542A (ja) | 2010-02-05 | 2011-08-25 | Rohm & Haas Co | 有機金属化合物を製造する方法 |
| JP6108704B2 (ja) * | 2011-07-13 | 2017-04-05 | ダウ グローバル テクノロジーズ エルエルシー | 有機金属化合物精製 |
| KR101310058B1 (ko) * | 2011-10-06 | 2013-09-24 | 전남대학교산학협력단 | 역구조 유기 태양전지 및 그 제조방법 |
| JP6784670B2 (ja) * | 2014-10-23 | 2020-11-11 | インプリア・コーポレイションＩｎｐｒｉａ Ｃｏｒｐｏｒａｔｉｏｎ | 有機金属溶液に基づいた高解像度パターニング組成物および対応する方法 |
| JP6853814B2 (ja) * | 2015-04-30 | 2021-03-31 | シースター ケミカルズ アンリミティッド ライアビリティ カンパニー | 化学相堆積に有用な有機金属化合物 |
| KR102204773B1 (ko) * | 2015-10-13 | 2021-01-18 | 인프리아 코포레이션 | 유기주석 옥사이드 하이드록사이드 패터닝 조성물, 전구체 및 패터닝 |
| US9996004B2 (en) * | 2015-11-20 | 2018-06-12 | Lam Research Corporation | EUV photopatterning of vapor-deposited metal oxide-containing hardmasks |
| CA2920646A1 (en) * | 2016-02-12 | 2017-08-12 | Seastar Chemicals Inc. | Organometallic compound and method |
| KR20180063754A (ko) | 2016-12-02 | 2018-06-12 | 삼성전자주식회사 | 주석 화합물, 그의 합성 방법, ald용 주석 전구체 화합물 및 함주석 물질막의 형성 방법 |
| CA2975104A1 (en) * | 2017-08-02 | 2019-02-02 | Seastar Chemicals Inc. | Organometallic compounds and methods for the deposition of high purity tin oxide |
-
2017
- 2017-08-02 CA CA2975104A patent/CA2975104A1/en not_active Abandoned
-
2018
- 2018-07-31 JP JP2020505377A patent/JP2020530199A/ja active Pending
- 2018-07-31 WO PCT/CA2018/050933 patent/WO2019023797A1/en not_active Ceased
- 2018-07-31 CN CN201880050021.0A patent/CN111032667B/zh active Active
- 2018-07-31 SG SG11202000884RA patent/SG11202000884RA/en unknown
- 2018-07-31 KR KR1020207006021A patent/KR102715899B1/ko active Active
- 2018-08-01 TW TW107126752A patent/TW201920214A/zh unknown
- 2018-08-01 TW TW111123663A patent/TWI872345B/zh active
-
2019
- 2019-06-17 US US16/442,930 patent/US20190337969A1/en not_active Abandoned
-
2020
- 2020-03-30 US US16/834,361 patent/US11643422B2/en active Active
-
2021
- 2021-03-26 US US17/213,328 patent/US20210214379A1/en not_active Abandoned
-
2022
- 2022-12-06 JP JP2022194698A patent/JP7577104B2/ja active Active
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