JP2020505607A5 - - Google Patents

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Publication number
JP2020505607A5
JP2020505607A5 JP2019541117A JP2019541117A JP2020505607A5 JP 2020505607 A5 JP2020505607 A5 JP 2020505607A5 JP 2019541117 A JP2019541117 A JP 2019541117A JP 2019541117 A JP2019541117 A JP 2019541117A JP 2020505607 A5 JP2020505607 A5 JP 2020505607A5
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JP
Japan
Prior art keywords
particles
inspection system
surface inspection
illumination light
defect
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JP2019541117A
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English (en)
Japanese (ja)
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JP2020505607A (ja
JP6916886B2 (ja
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Priority claimed from US15/419,355 external-priority patent/US10551320B2/en
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Publication of JP2020505607A5 publication Critical patent/JP2020505607A5/ja
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JP2019541117A 2017-01-30 2018-01-26 分光組成分析のためのウェハ粒子欠陥の活性化 Active JP6916886B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US15/419,355 US10551320B2 (en) 2017-01-30 2017-01-30 Activation of wafer particle defects for spectroscopic composition analysis
US15/419,355 2017-01-30
PCT/US2018/015570 WO2018140805A1 (en) 2017-01-30 2018-01-26 Activation of wafer particle defects for spectroscopic composition analysis

Publications (3)

Publication Number Publication Date
JP2020505607A JP2020505607A (ja) 2020-02-20
JP2020505607A5 true JP2020505607A5 (enExample) 2021-03-04
JP6916886B2 JP6916886B2 (ja) 2021-08-11

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JP2019541117A Active JP6916886B2 (ja) 2017-01-30 2018-01-26 分光組成分析のためのウェハ粒子欠陥の活性化

Country Status (8)

Country Link
US (1) US10551320B2 (enExample)
EP (1) EP3549160B1 (enExample)
JP (1) JP6916886B2 (enExample)
KR (1) KR102353259B1 (enExample)
CN (1) CN110313058B (enExample)
SG (1) SG11201906281RA (enExample)
TW (1) TWI764979B (enExample)
WO (1) WO2018140805A1 (enExample)

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