JP7240829B2 - パターン構造のx線測定 - Google Patents
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Description
当該技術分野において,パターン構造の測定に関し,X線散乱計測を利用して,粗さ(roughness)や測定信号の背景雑音(background noise)といった影響を効率的に除去し,それによって測定技術の信号対雑音を大幅に改善する新規の測定技術が必要である。
Claims (13)
- パターン構造のX線測定に用いられる方法であって,
照明装置から試料上のパターン構造に所定の照明角度範囲の入射X線放射線を照射し,
(a)上記入射X線放射線が上記パターン構造とX線干渉することによって上記パターン構造から散乱される反射回折次数の放射成分に対応する信号と(b)背景信号とを含む測定信号を,測定平面を備える検出器によって検出し,
ここで,上記照明角度範囲は,上記パターン構造からの反射回折次数の放射成分に対応する信号が上記検出器の測定平面上で空間的に互いに分離され,背景信号のみが到達する領域が上記検出器の測定平面上に残されるように設定され,
上記測定信号から,上記背景信号のみが到達する領域において得られる信号を内挿/外挿することによって得られる全体画像範囲にわたって背景を表す画像を減算し,これよって上記背景信号を実質的に含まない有効測定信号を得る,方法。 - 提供される上記測定信号に含まれる上記有効測定信号が,上記構造の放射線反応における反射次数の所定の角度範囲φCOLに対応するものであり,さまざまな反射次数の放射成分が検出器の放射線感受性表面上のさまざまな空間的に分離された領域と干渉する,請求項1に記載の方法。
- 上記測定信号の収集において用いられる最適化測定スキームを表すデータを提供し,上記最適化測定スキームが,上記測定信号に上記有効測定信号が含まれるものにし,上記有効測定信号が,上記構造の放射線反応における反射次数の角度範囲φCOLに対応し,さまざまな反射次数の放射成分が検出器の放射線感受性表面上のさまざまな空間的に分離された領域と干渉する,請求項1に記載の方法。
- 上記最適化測定スキームが,上記構造上のパターンの造形の配向に対して選択される照明放射線の角度範囲θILLおよび方位φILLを含み,照明放射線の上記選択された角度範囲θILLを用いることによって,上記照明放射線に対する上記構造の放射線反応における反射次数の上記角度範囲φCOLが提供される,請求項3に記載の方法。
- 上記最適化測定スキームを用いて上記パターン構造上で実行され,上記測定信号を表すデータを生成する一または複数の測定セッションを実行する,請求項3または4に記載の方法。
- 上記有効測定信号にモデルベース適合処理を適用して,上記パターン構造の一または複数のパラメータを決定する,請求項1から5のいずれか一項に記載の方法。
- データ入力および出力ユーティリティ,メモリユーティリティ,ならびにプロセッサユーティリティを含み,上記プロセッサユーティリティが,請求項1から5のいずれか一項に記載の方法を実行するように構成されかつ動作する,制御装置。
- 測定される上記構造上のパターンを表す入力データを解析し,かつ上記パターンに対する照明放射線の選択角度範囲θILLおよび方位φILLを表す測定スキームデータを生成して,上記構造の放射線反応における反射次数の角度範囲φCOLを提供するように構成されかつ作動する,測定スキーム制御器をさらに備えている,請求項7に記載の制御装置。
- パターン構造のX線測定に用いられる測定システムであって,
測定される構造と干渉するように照明放射線を測定平面上に案内する照明チャネルを規定するように構成されかつ作動する照明装置,
上記照明チャネル内に配置される角度範囲制御器,
収集チャネルに沿って伝播する上記構造からの(a)反射回折次数の放射成分に対応する信号と(b)背景信号とを含む測定信号を検出する,上記測定平面を備える検出装置,ならびに
上記照明装置および上記検出装置とデータ通信するように構成された制御装置を備え,
上記角度範囲制御器が,
上記パターン構造からの反射回折次数の放射成分に対応する信号が上記検出装置の測定平面上で空間的に互いに分離され,背景信号のみ到達する領域が上記検出装置の測定平面上に残されるように設定され,
上記制御装置が,
上記測定信号から,上記背景信号のみが到達する領域において得られる信号を内挿/外挿することによって得られる全体画像範囲にわたって背景を表す画像を減算し,これよって上記背景信号を実質的に含まない有効測定信号を得る,
測定システム。 - 上記角度範囲制御器は,選択された測定スキームにしたがう孔寸法を選択可能にするために,寸法を制御可能に可変させる孔アセンブリを備えている,請求項9に記載のシステム。
- 上記制御装置は,データ入力および出力ユーティリティ,メモリユーティリティ,およびプロセッサユーティリティを備え,上記プロセッサユーティリティが,請求項1から5のいずれか一項に記載の方法を実行するように構成されている,請求項9または10に記載のシステム。
- 上記角度範囲制御器は,選択された測定スキームにしたがう孔形状を選択可能にするために,形状を制御可能に可変させる孔アセンブリを備えている,請求項9に記載のシステム。
- 上記角度範囲制御器は,選択された測定スキームにしたがう孔形状を選択可能にするために,形状を制御可能に可変させる孔アセンブリをさらに備えている,請求項10に記載のシステム。
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JP2017504045A (ja) | 2014-01-23 | 2017-02-02 | リヴェラ インコーポレイテッド | マルチアングルx線反射散乱計測(xrs)を用いた周期構造を計測する方法およびシステム |
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JP2017504045A (ja) | 2014-01-23 | 2017-02-02 | リヴェラ インコーポレイテッド | マルチアングルx線反射散乱計測(xrs)を用いた周期構造を計測する方法およびシステム |
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TWI831744B (zh) | 2024-02-11 |
US20190033236A1 (en) | 2019-01-31 |
US20220042934A1 (en) | 2022-02-10 |
TW201918795A (zh) | 2019-05-16 |
CN109283203B (zh) | 2023-09-12 |
CN117214212A (zh) | 2023-12-12 |
IL253578A0 (en) | 2017-09-28 |
IL253578B (en) | 2018-06-28 |
KR102665029B1 (ko) | 2024-05-20 |
CN109283203A (zh) | 2019-01-29 |
KR20240069699A (ko) | 2024-05-20 |
JP2019060849A (ja) | 2019-04-18 |
US11692953B2 (en) | 2023-07-04 |
US11099142B2 (en) | 2021-08-24 |
KR20190009719A (ko) | 2019-01-29 |
US20240044819A1 (en) | 2024-02-08 |
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