JP2020146617A - 硫酸イオン除去システム及び方法 - Google Patents
硫酸イオン除去システム及び方法 Download PDFInfo
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- JP2020146617A JP2020146617A JP2019045285A JP2019045285A JP2020146617A JP 2020146617 A JP2020146617 A JP 2020146617A JP 2019045285 A JP2019045285 A JP 2019045285A JP 2019045285 A JP2019045285 A JP 2019045285A JP 2020146617 A JP2020146617 A JP 2020146617A
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- Prior art keywords
- water
- treated
- membrane
- sulfate ion
- functional layer
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- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 title claims abstract description 55
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- 239000011248 coating agent Substances 0.000 claims abstract description 43
- 238000000576 coating method Methods 0.000 claims abstract description 43
- 125000002091 cationic group Chemical group 0.000 claims abstract description 15
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- 238000001728 nano-filtration Methods 0.000 claims abstract description 11
- 238000000926 separation method Methods 0.000 claims description 55
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- 229920000642 polymer Polymers 0.000 claims description 29
- 239000000178 monomer Substances 0.000 claims description 25
- 125000001424 substituent group Chemical group 0.000 claims description 16
- GLUUGHFHXGJENI-UHFFFAOYSA-N Piperazine Chemical compound C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 claims description 10
- 150000004885 piperazines Chemical class 0.000 claims description 9
- 125000001453 quaternary ammonium group Chemical group 0.000 claims description 7
- 229910052757 nitrogen Inorganic materials 0.000 claims description 5
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 5
- 229940066771 systemic antihistamines piperazine derivative Drugs 0.000 claims description 4
- 239000004952 Polyamide Substances 0.000 claims description 3
- 229910052799 carbon Inorganic materials 0.000 claims description 3
- 125000004432 carbon atom Chemical group C* 0.000 claims description 3
- 229920002647 polyamide Polymers 0.000 claims description 3
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- 150000001412 amines Chemical class 0.000 description 41
- 239000002253 acid Substances 0.000 description 36
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- 125000003277 amino group Chemical group 0.000 description 6
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- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 230000000903 blocking effect Effects 0.000 description 3
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 3
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- 238000012695 Interfacial polymerization Methods 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical group C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
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- UWCPYKQBIPYOLX-UHFFFAOYSA-N benzene-1,3,5-tricarbonyl chloride Chemical compound ClC(=O)C1=CC(C(Cl)=O)=CC(C(Cl)=O)=C1 UWCPYKQBIPYOLX-UHFFFAOYSA-N 0.000 description 2
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- MIOPJNTWMNEORI-GMSGAONNSA-N (S)-camphorsulfonic acid Chemical compound C1C[C@@]2(CS(O)(=O)=O)C(=O)C[C@@H]1C2(C)C MIOPJNTWMNEORI-GMSGAONNSA-N 0.000 description 1
- CEGRHPCDLKAHJD-UHFFFAOYSA-N 1,1,1-propanetricarboxylic acid Chemical compound CCC(C(O)=O)(C(O)=O)C(O)=O CEGRHPCDLKAHJD-UHFFFAOYSA-N 0.000 description 1
- AJDIZQLSFPQPEY-UHFFFAOYSA-N 1,1,2-Trichlorotrifluoroethane Chemical compound FC(F)(Cl)C(F)(Cl)Cl AJDIZQLSFPQPEY-UHFFFAOYSA-N 0.000 description 1
- LNWOTKRKCOXTCU-UHFFFAOYSA-N 2,3,5-triethylpiperazine Chemical compound CCC1CNC(CC)C(CC)N1 LNWOTKRKCOXTCU-UHFFFAOYSA-N 0.000 description 1
- OMEMBAXECFIRSG-UHFFFAOYSA-N 2,3,5-trimethylpiperazine Chemical compound CC1CNC(C)C(C)N1 OMEMBAXECFIRSG-UHFFFAOYSA-N 0.000 description 1
- ORCXDCBGXCHCFW-UHFFFAOYSA-N 2,5-dibutylpiperazine Chemical compound CCCCC1CNC(CCCC)CN1 ORCXDCBGXCHCFW-UHFFFAOYSA-N 0.000 description 1
- JIAOVIBEPXQRNK-UHFFFAOYSA-N 2,5-diethylpiperazine Chemical compound CCC1CNC(CC)CN1 JIAOVIBEPXQRNK-UHFFFAOYSA-N 0.000 description 1
- NSMWYRLQHIXVAP-UHFFFAOYSA-N 2,5-dimethylpiperazine Chemical compound CC1CNC(C)CN1 NSMWYRLQHIXVAP-UHFFFAOYSA-N 0.000 description 1
- IFNWESYYDINUHV-UHFFFAOYSA-N 2,6-dimethylpiperazine Chemical compound CC1CNCC(C)N1 IFNWESYYDINUHV-UHFFFAOYSA-N 0.000 description 1
- ITTFEPALADGOBD-UHFFFAOYSA-N 2-butylpropanedioyl dichloride Chemical compound CCCCC(C(Cl)=O)C(Cl)=O ITTFEPALADGOBD-UHFFFAOYSA-N 0.000 description 1
- IPOVOSHRRIJKBR-UHFFFAOYSA-N 2-ethylpropanedioyl dichloride Chemical compound CCC(C(Cl)=O)C(Cl)=O IPOVOSHRRIJKBR-UHFFFAOYSA-N 0.000 description 1
- JOMNTHCQHJPVAZ-UHFFFAOYSA-N 2-methylpiperazine Chemical compound CC1CNCCN1 JOMNTHCQHJPVAZ-UHFFFAOYSA-N 0.000 description 1
- MLNSYGKGQFHSNI-UHFFFAOYSA-N 2-propylpropanedioyl dichloride Chemical compound CCCC(C(Cl)=O)C(Cl)=O MLNSYGKGQFHSNI-UHFFFAOYSA-N 0.000 description 1
- CNSVHYQBYNMMHW-UHFFFAOYSA-N 3-chlorosulfonylphthalic acid Chemical compound OC(=O)C1=CC=CC(S(Cl)(=O)=O)=C1C(O)=O CNSVHYQBYNMMHW-UHFFFAOYSA-N 0.000 description 1
- GNIZQCLFRCBEGE-UHFFFAOYSA-N 3-phenylbenzene-1,2-dicarbonyl chloride Chemical compound ClC(=O)C1=CC=CC(C=2C=CC=CC=2)=C1C(Cl)=O GNIZQCLFRCBEGE-UHFFFAOYSA-N 0.000 description 1
- 0 CCC(C1)C(CC(C)*)C*1(*)I Chemical compound CCC(C1)C(CC(C)*)C*1(*)I 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 description 1
- FBPFZTCFMRRESA-JGWLITMVSA-N D-glucitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-JGWLITMVSA-N 0.000 description 1
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 1
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- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
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- FDQSRULYDNDXQB-UHFFFAOYSA-N benzene-1,3-dicarbonyl chloride Chemical compound ClC(=O)C1=CC=CC(C(Cl)=O)=C1 FDQSRULYDNDXQB-UHFFFAOYSA-N 0.000 description 1
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- BZFATHSFIGBGOT-UHFFFAOYSA-N butane-1,1,1-tricarbonyl chloride Chemical compound CCCC(C(Cl)=O)(C(Cl)=O)C(Cl)=O BZFATHSFIGBGOT-UHFFFAOYSA-N 0.000 description 1
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Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/44—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
- C02F1/442—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis by nanofiltration
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
- B01D61/02—Reverse osmosis; Hyperfiltration ; Nanofiltration
- B01D61/027—Nanofiltration
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D67/00—Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
- B01D67/0081—After-treatment of organic or inorganic membranes
- B01D67/0088—Physical treatment with compounds, e.g. swelling, coating or impregnation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
- B01D69/02—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor characterised by their properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
- B01D69/10—Supported membranes; Membrane supports
- B01D69/107—Organic support material
- B01D69/1071—Woven, non-woven or net mesh
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
- B01D69/12—Composite membranes; Ultra-thin membranes
- B01D69/125—In situ manufacturing by polymerisation, polycondensation, cross-linking or chemical reaction
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
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Abstract
Description
流路と、
前記流路に設けられ、膜表面を構成するカチオン性コーティングを有し、被処理水を濾過することによって前記被処理水に含まれた硫酸イオンを除去するナノ濾過膜と、
を備えた、硫酸イオン除去システムを提供する。
被処理水をナノ濾過膜で濾過して処理済み水を生成することを含み、
前記ナノ濾過膜は、膜表面を構成するカチオン性コーティングを有し、被処理水を濾過することによって前記被処理水に含まれた硫酸イオンを除去する、
硫酸イオン除去方法を提供する。
ピペラジン7重量%、ドデシル硫酸ナトリウム0.15重量%、水酸化ナトリウム1.48重量%及びカンファースルホン酸6重量%を含むアミン水溶液を多孔性ポリスルホン支持体に塗布した。その後、余分なアミン水溶液を支持体から除去することによって、支持体上にアミン含有層を形成した。次に、トリメシン酸トリクロライド0.42重量%をイソパラフィン系溶媒(出光興産社製、IPソルベント1016)に溶解させることによって得られた酸ハライド溶液にアミン含有層の表面を10秒間浸した。その後、余分な酸ハライド溶液をアミン含有層から除去し、アミン含有層を60秒間風乾させ、さらに120℃の熱風乾燥機中で3分間保持して、多孔性ポリスルホン支持体に分離機能層を形成した。次に、重合体(センカ社製、ユニセンスKCA101L)0.1重量%を含む水溶液に分離機能層の表面を10秒間浸した。その後、分離機能層を30秒間風乾させ、さらに120℃の熱風乾燥機中で2分間保持して、分離機能層の上にコーティングを形成した。このようにして、サンプル1のNF膜を得た。ユニセンスKCA101Lは、式(4)で表される重合体である。
サンプル2のスパイラル型膜エレメント(直径8インチ)として、カチオン性コーティングを有さない市販のNF膜エレメントを準備した。
サンプル1及びサンプル2のスパイラル型膜エレメントを圧力容器に1つのみ入れ、以下の運転条件で模擬海水をスパイラル型膜エレメントで濾過し、透過水中の硫酸イオン濃度をイオンクロマトグラフィー法によって測定した。結果を表1に示す。なお、硫酸イオン濃度の測定方法は特に限定されず、滴定法、重量法などの他の方法によって測定されてもよい。
回収率:15%
透過水量:0.4075m3/m2・日
温度:25℃
pH:6.5〜7.0
Mg2+:1280
Na+:10600
K+:430
Cl-:19400
SO4 2-:2460
30 分離機能層
40 コーティング
50,50a,50b,50c,50d,50e,50f,50g,50h,50i, 流路
60 NF膜
62,64,66 NF膜エレメント
100 硫酸イオン除去システム
Claims (4)
- 流路と、
前記流路に設けられ、膜表面を構成するカチオン性コーティングを有し、被処理水を濾過することによって前記被処理水に含まれた硫酸イオンを除去するナノ濾過膜と、
を備えた、硫酸イオン除去システム。 - 前記流路が油田に接続されており、
前記被処理水を前記ナノ濾過膜で濾過することによって得られた処理済み水は、前記油田に注入されるべき注入水である、
請求項1又は2に記載の硫酸イオン除去システム。 - 被処理水をナノ濾過膜で濾過して処理済み水を生成することを含み、
前記ナノ濾過膜は、膜表面を構成するカチオン性コーティングを有し、被処理水を濾過することによって前記被処理水に含まれた硫酸イオンを除去する、
硫酸イオン除去方法。
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