JP2020038384A - 計測方法、コンピュータ製品およびシステム - Google Patents
計測方法、コンピュータ製品およびシステム Download PDFInfo
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Abstract
Description
本出願は、2014年11月26日に出願された欧州出願14195009.7号の利益を主張し、その全体が参照により本書に援用される。
本発明は、例えばリソグラフィ技術によるデバイス製造に利用可能なメトロロジーのための方法、装置およびコンピュータ製品に関し、リソグラフィ技術を用いるデバイス製造方法に関する。
Claims (36)
- ターゲットにより回折される放射の測定パラメータを用いて前記ターゲットの非対称な変形を決定することと、
前記ターゲットに関連するターゲット形成パラメータの変化に対して最小の感度となる前記非対称な変形に基づいて前記ターゲットの測定ビームの特性を決定することと、を備えることを特徴とする方法。 - 前記測定ビームの特性を用いて前記ターゲットを測定することと、前記非対称な変形に基づいて、前記測定ビームの特性を用いる前記ターゲットの測定から決定される前記ターゲットのオーバレイまたはアライメントの値を補正することと、をさらに備えることを特徴とする請求項1に記載の方法。
- 前記非対称な変形は、前記ターゲットを用いる測定結果の前記非対称性に起因する位置オフセット、または、前記ターゲットを用いる測定結果の前記非対称性に起因する位置オフセットを前記ターゲットを用いる測定結果の前記非対称性に起因するプロセス依存の倍率オフセットに関連付ける倍率を含むことを特徴とする請求項1または2に記載の方法。
- 前記測定ビームの特性は、前記測定ビームの波長および/または偏光を含むことを特徴とする請求項1から3のいずれか一項に記載の方法。
- 前記ターゲットの前記非対称な変形の測定結果に基づいて、前記ターゲットを再設計すること、または、前記ターゲットを形成することをさらに備えることを特徴とする請求項1から4のいずれか一項に記載の方法。
- ターゲットの測定値から前記ターゲットの非対称な変形を決定することと、
前記非対称な変形に関連する非対称性パラメータの値を決定するために前記ターゲットの光学測定のシミュレーションを実行することと、を備えることを特徴とする方法。 - 前記非対称性パラメータは、前記ターゲットを用いる測定結果の前記非対称性に起因する位置オフセットを含むことを特徴とする請求項6に記載の方法。
- 前記非対称性パラメータは、前記ターゲットを用いる測定結果の前記非対称性に起因する位置オフセットを、前記ターゲットを用いる測定結果の前記非対称性に起因するプロセス依存の倍率オフセットに関連付ける倍率を含むことを特徴とする請求項6または7に記載の方法。
- 前記ターゲットの前記非対称な変形を決定することは、前記光学測定のパラメータの関数として、ターゲットの測定から決定されるオーバレイの値、または、前記ターゲットの測定から決定される非対称性に起因するプロセス依存の倍率オフセットの値を評価することを備えることを特徴とする請求項6から8のいずれか一項に記載の方法。
- 前記光学測定のパラメータは、当該光学測定の測定ビームの波長および/または偏光を含むことを特徴とする請求項9に記載の方法。
- 前記決定される値を評価することは、(i)前記決定される値または前記決定される値を表す構成物と、(ii)前記光学測定のパラメータの関数としての一以上のフィンガープリントのオーバレイもしくはプロセス依存の倍率オフセットの値のセットまたは前記フィンガープリントの値のセットを表す一以上のフィンガープリント構成物と、の間の適合性を決定することを含み、フィンガープリントのセットまたはフィンガープリントの構成物のそれぞれが異なる非対称な変形を表すことを特徴とする請求項9または10に記載の方法。
- 前記ターゲットに関連するターゲット形成パラメータの変化に対する前記非対称性パラメータの感度を分析することをさらに備える特徴とする請求項6から11のいずれか一項に記載の方法。
- 前記感度を分析することは、前記ターゲット形成パラメータの変化に対する前記非対称性パラメータの感度が最小値となる前記光学測定のパラメータの値を決定することを含むことを特徴とする請求項12に記載の方法。
- 前記光学測定のパラメータは、前記光学測定の測定ビームの波長および/または偏光を含むことを特徴とする請求項13に記載の方法。
- 前記分析することは、シミュレーションを実行することを含むことを特徴とする請求項12から14のいずれか一項に記載の方法。
- 前記ターゲットは、上位層(overlying)周期構造を含むことを特徴とする請求項6から15のいずれか一項に記載の方法。
- 前記シミュレーションを実行することは、特定された非対称性に対する横シフトがゼロの位置で、上位層周期構造の光学測定をシミュレーションすることを含むことを特徴とする請求項16に記載の方法。
- 前記シミュレーションから、前記ターゲットを用いる測定結果の前記非対称性に起因するプロセス依存の倍率オフセットの値および前記ターゲットを用いる測定結果の前記非対称性に起因する位置オフセットの値を決定することをさらに備えることを特徴とする請求項6から17のいずれか一項に記載の方法。
- 前記非対称性パラメータに基づいて、前記ターゲットの測定から決定された前記ターゲットのオーバレイまたはアライメントの値を補正することをさらに備えることを特徴とする請求項6から18のいずれか一項に記載の方法。
- 前記ターゲットの前記非対称な変形の測定結果に基づいて、前記ターゲットを再設計すること、または、前記ターゲットを形成することをさらに備えることを特徴とする請求項6から19のいずれか一項に記載の方法。
- ターゲットの測定値から決定された前記ターゲットの非対称な変形に関連する非対称性パラメータの値を決定するために前記ターゲットの光学測定のシミュレーションを実行することと、
前記ターゲットに関連するターゲット形成パラメータの変化に対する前記非対称性パラメータの感度を分析することと、を備えることを特徴とする方法。 - 前記非対称性パラメータは、前記ターゲットを用いる測定結果の前記非対称性に起因する位置オフセットを、前記ターゲットを用いる測定結果の前記非対称性に起因するプロセス依存の倍率オフセットに関連付ける倍率を含むことを特徴とする請求項21に記載の方法。
- 前記ターゲット形成パラメータの変化に対する前記非対称性パラメータの感度が最小値となる前記光学測定のパラメータの値を決定することをさらに備えることを特徴とする請求項21または22に記載の方法。
- 前記光学測定のパラメータは、前記光学測定の測定ビームの波長および/または偏光を含むことを特徴とする請求項23に記載の方法。
- 前記分析することは、シミュレーションを実行することを含むことを特徴とする請求項21から24のいずれか一項に記載の方法。
- 前記ターゲットは、上位層周期構造を含むことを特徴する請求項21から25のいずれか一項に記載の方法。
- 前記シミュレーションを実行することは、特定された非対称性に対する横シフトがゼロの位置で、上位層周期構造の前記光学測定をシミュレーションすることを含むことを特徴とする請求項26に記載の方法。
- 前記ターゲットを用いる測定結果および前記ターゲットを用いる測定結果の前記非対称性に起因する位置オフセットの値の決定に用いられる、前記非対称性に起因するプロセス依存の倍率オフセットの値を前記シミュレーションから決定することをさらに備えることを特徴とする請求項21から27のいずれか一項に記載の方法。
- 前記光学測定のパラメータの関数として、前記ターゲットの測定結果から決定されるオーバレイの値または前記ターゲットの測定結果から決定される前記非対称性に起因するプロセス依存の倍率オフセットの値を評価することにより、前記ターゲットの前記非対称な変形を決定することをさらに備えることを特徴とする請求項21から28のいずれか一項に記載の方法。
- 前記非対称性パラメータに基づいて、前記ターゲットの測定から決定されるオーバレイまたはアライメントの値を補正することをさらに備えることを特徴とする請求項21から29のいずれか一項に記載の方法。
- 前記ターゲットの前記非対称な変形の測定結果に基づいて、前記ターゲットを再設計すること、または、前記ターゲットを形成することをさらに備えることを特徴とする請求項21から30のいずれか一項に記載の方法。
- リソグラフィ工程を用いて一連の基板にデバイスパターンが付与されるデバイス製造方法であって、当該方法は、請求項1から31のいずれか一項に記載の方法を用いて少なくとも一つの回折測定ターゲットを評価することと、当該方法の結果にしたがって一以上の基板に対する前記リソグラフィ工程を制御することとを含むことを特徴とする方法。
- 前記少なくとも一つの回折測定ターゲットは、前記少なくとも一つの基板上の前記デバイスパターンの一部として形成され、または、前記デバイスパターンの側方に形成され、当該方法の結果にしたがって後続基板に対する前記リソグラフィ工程が制御されることを特徴とする請求項32に記載の方法。
- 請求項1から33のいずれか一項に記載の方法をプロセッサに実行させるための機械に読み取り可能な指令を備えることを特徴とする非一時的なコンピュータプログラム製品。
- 基板上の回折測定ターゲットにビームを提供し、リソグラフィ工程のパラメータを決定するために前記ターゲットにより回折された放射を検出するよう構成される検査装置と、
請求項34に記載の非一時的なコンピュータプログラム製品と、を備えることを特徴とするシステム。 - 放射ビームを変調させるパターニングデバイスを保持するサポート構造と、前記変調されたものを放射感受性基板上に投影するよう構成される投射光学システムとを含むリソグラフィ装置をさらに備えることを特徴とする請求項35に記載のシステム。
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