JP2020035812A - 半導体装置および電力変換装置 - Google Patents
半導体装置および電力変換装置 Download PDFInfo
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- JP2020035812A JP2020035812A JP2018159171A JP2018159171A JP2020035812A JP 2020035812 A JP2020035812 A JP 2020035812A JP 2018159171 A JP2018159171 A JP 2018159171A JP 2018159171 A JP2018159171 A JP 2018159171A JP 2020035812 A JP2020035812 A JP 2020035812A
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- semiconductor device
- electroless
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 200
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims abstract description 306
- 238000007747 plating Methods 0.000 claims abstract description 107
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims abstract description 53
- 239000011574 phosphorus Substances 0.000 claims abstract description 53
- 229910052698 phosphorus Inorganic materials 0.000 claims abstract description 52
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 45
- 238000002425 crystallisation Methods 0.000 claims abstract description 28
- 230000008025 crystallization Effects 0.000 claims abstract description 28
- 239000000203 mixture Substances 0.000 claims abstract description 13
- 239000010949 copper Substances 0.000 claims description 31
- 229910052802 copper Inorganic materials 0.000 claims description 20
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 18
- 238000000034 method Methods 0.000 description 39
- 238000004519 manufacturing process Methods 0.000 description 36
- 239000000758 substrate Substances 0.000 description 34
- 229910052751 metal Inorganic materials 0.000 description 26
- 239000002184 metal Substances 0.000 description 26
- 229910052782 aluminium Inorganic materials 0.000 description 15
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 14
- 230000015572 biosynthetic process Effects 0.000 description 14
- 239000010936 titanium Substances 0.000 description 14
- 238000002441 X-ray diffraction Methods 0.000 description 12
- 238000010586 diagram Methods 0.000 description 12
- 239000000463 material Substances 0.000 description 12
- 238000010438 heat treatment Methods 0.000 description 11
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 10
- 238000000137 annealing Methods 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 9
- 238000009792 diffusion process Methods 0.000 description 9
- 238000004544 sputter deposition Methods 0.000 description 9
- 238000007772 electroless plating Methods 0.000 description 8
- 239000012535 impurity Substances 0.000 description 8
- 229910000838 Al alloy Inorganic materials 0.000 description 7
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 7
- 229910052719 titanium Inorganic materials 0.000 description 7
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 6
- 229910000679 solder Inorganic materials 0.000 description 6
- 229960004643 cupric oxide Drugs 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 238000002161 passivation Methods 0.000 description 5
- 230000035882 stress Effects 0.000 description 5
- 239000000919 ceramic Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 230000007774 longterm Effects 0.000 description 4
- 238000000206 photolithography Methods 0.000 description 4
- 239000004642 Polyimide Substances 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- -1 nickel-phosphorus compound Chemical class 0.000 description 3
- 229920001721 polyimide Polymers 0.000 description 3
- 229910000789 Aluminium-silicon alloy Inorganic materials 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 239000003638 chemical reducing agent Substances 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000005336 cracking Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000005304 joining Methods 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 description 2
- 230000008646 thermal stress Effects 0.000 description 2
- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 229910001096 P alloy Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000008139 complexing agent Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000013527 degreasing agent Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000005224 laser annealing Methods 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- OFNHPGDEEMZPFG-UHFFFAOYSA-N phosphanylidynenickel Chemical compound [P].[Ni] OFNHPGDEEMZPFG-UHFFFAOYSA-N 0.000 description 1
- ACVYVLVWPXVTIT-UHFFFAOYSA-M phosphinate Chemical compound [O-][PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-M 0.000 description 1
- OJMIONKXNSYLSR-UHFFFAOYSA-N phosphorous acid Chemical compound OP(O)O OJMIONKXNSYLSR-UHFFFAOYSA-N 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000000682 scanning probe acoustic microscopy Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- MAKDTFFYCIMFQP-UHFFFAOYSA-N titanium tungsten Chemical compound [Ti].[W] MAKDTFFYCIMFQP-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
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- H—ELECTRICITY
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- H01L29/083—Anode or cathode regions of thyristors or gated bipolar-mode devices
- H01L29/0834—Anode regions of thyristors or gated bipolar-mode devices, e.g. supplementary regions surrounding anode regions
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- H01L2224/051—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/05117—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 400°C and less than 950°C
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Abstract
Description
第1のAl金属層106a、Cu拡散防止層107、第2のAl金属層106b、およびNi層104は、この順に(図1の上層側から下層側に向かって)形成されて、半導体基板108の裏面側の電極構造体であるカソード電極112を構成する。カソード電極112は、銅焼結層103を用いてセラミックス絶縁基板101上の導電部材102に接合されている。
次に、図2および図3を用いて、図1に示す本実施形態の半導体装置100の製造方法について説明する。図2および図3は、半導体装置100の製造方法の各工程を示す図である。
図2(a)は、本実施形態におけるアノードP型半導体領域形成後の断面図である。
図3(a)は、本実施形態における表面保護膜形成の裏面n+型半導体層形成後の断面図である。
次に、裏面のカソード電極112の製造方法について説明する。
図3(c)は、本実施形態におけるNi層104形成後の断面図である。
ここで、図4に示す無電解メッキ工程においては、下地電極となる第2のAl金属層106bは容易に酸化皮膜を形成するため、Niメッキ膜との密着性向上を目的に、亜鉛(Zn)置換を2回繰り返すダブルジンケート処理を行っている。(工程5,工程6)次に、無電解NiメッキによりNi膜を例えば3μm成膜する。(工程7)無電界Niメッキの反応では、還元剤である次亜リン酸塩が酸化され亜リン酸塩になる。
Ni2 ++2e−→Ni
このため、無電解Niメッキ膜104は、リン(P)を含み、P含有量の違いにより性質の異なる被膜が得られる。また、無電解Niメッキ膜は、錯化剤やpH濃度によってリン(P)の含有量が異なる。
(a)半導体基板の裏面に、スパッタリングにより第1のAl(アルミニウム)金属膜を成膜する工程、
(b)前記(a)工程の後、スパッタリングにより前記第1のAl(アルミニウム)金属膜上にCu拡散防止層となるTi(チタン)膜を成膜する工程、
(c)前記(b)工程の後、スパッタリングにより前記Ti(チタン)膜上に第2のAl(アルミニウム)金属膜を成膜する工程、
(d)前記(c)工程の後、無電解メッキ法により前記第2のAl(アルミニウム)金属膜上にNi(ニッケル)膜を成膜する工程、
を有する半導体装置の製造方法であって、
前記Ni(ニッケル)膜は、Ni(ニッケル)およびP(リン)を組成として含み、P(リン)濃度は2.5wt%以上6wt%以下であり、かつ、前記Ni(ニッケル)膜中のNi3Pの結晶化率が0%以上20%以下であることを特徴とする半導体装置の製造方法。
付記1に記載の半導体装置の製造方法であって、
前記Ni(ニッケル)膜は、Ni(ニッケル)の結晶化率が70%以上95%以下であることを特徴とする半導体装置の製造方法。
(a)半導体基板の表面に、スパッタリングによりAl(アルミニウム)金属膜を成膜する工程、
(b)前記(a)工程の後、無電解メッキ法により前記Al(アルミニウム)金属膜上にNi(ニッケル)膜を成膜する工程、
を有する半導体装置の製造方法であって、
前記Ni(ニッケル)膜は、Ni(ニッケル)およびP(リン)を組成として含み、P(リン)濃度は2.5wt%以上6wt%以下であり、かつ、前記Ni(ニッケル)膜中のNi3Pの結晶化率が0%以上20%以下であることを特徴とする半導体装置の製造方法。
付記3に記載の半導体装置の製造方法であって、
前記Ni(ニッケル)膜は、Ni(ニッケル)の結晶化率が70%以上95%以下であることを特徴とする半導体装置の製造方法。
付記1に記載の半導体装置の製造方法であって、
前記(a)工程の前、或いは、前記(d)工程の後に、
(e)半導体基板の表面に、スパッタリングにより第1のAl(アルミニウム)金属膜を成膜する工程、
(f)前記(e)工程の後、スパッタリングにより前記第1のAl(アルミニウム)金属膜上にCu拡散防止層となるTi(チタン)膜を成膜する工程、
(g)前記(f)工程の後、スパッタリングにより前記Ti(チタン)膜上に第2のAl(アルミニウム)金属膜を成膜する工程、
(h)前記(g)工程の後、無電解メッキ法により前記第2のAl(アルミニウム)金属膜上にNi(ニッケル)膜を成膜する工程、
を有する半導体装置の製造方法であって、
前記Ni(ニッケル)膜は、Ni(ニッケル)およびP(リン)を組成として含み、P(リン)濃度は2.5wt%以上6wt%以下であり、かつ、前記Ni(ニッケル)膜中のNi3Pの結晶化率が0%以上20%以下であることを特徴とする半導体装置の製造方法。
付記5に記載の半導体装置の製造方法であって、
前記Ni(ニッケル)膜は、Ni(ニッケル)の結晶化率が70%以上95%以下であることを特徴とする半導体装置の製造方法。
100,200,300…半導体装置
101…セラミック(絶縁)基板
102…導電部材
103…銅焼結層
104…Ni層(無電解Niメッキ膜)
104a…Ni層の表面
106a…第1のAl金属層
106b…第2のAl金属層
107…Cu拡散防止層
108…半導体基板
108a…p型半導体層
108b…n−型ドリフト層
108c…n+型半導体層
108d…(半導体基板の)第1表面
108e…(半導体基板の)第2表面
109…アノード電極(Al金属層)
110…絶縁酸化膜
111…パッシベーション膜(表面保護膜)
112…第1の半導体チップの電極構造体(カソード電極)
113…第2の半導体チップの電極構造体(アノード電極)
150…半導体素子
151…ボンディングワイヤ
301…第3の半導体チップの電極構造体(アノード電極)
500…電力変換装置
501〜506…電力スイッチング素子
511〜516…ゲート回路
521〜526…ダイオード
531…P端子
532…N端子
533…U端子
534…V端子
535…W端子
Claims (9)
- 半導体素子と、
前記半導体素子の第1表面に形成された第1電極と、を備え、
前記第1電極は、第1無電解Niメッキ層を含む積層構造であり、
前記第1無電解Niメッキ層は、Ni(ニッケル)およびP(リン)を組成として含み、
前記第1無電解Niメッキ層のP(リン)濃度は2.5wt%以上6wt%以下であり、かつ、前記第1無電解Niメッキ層中のNi3Pの結晶化率は0%以上20%以下であることを特徴とする半導体装置。 - 請求項1に記載の半導体装置であって、
前記第1無電解Niメッキ層は、Ni(ニッケル)の結晶化率が70%以上95%以下であることを特徴とする半導体装置。 - 請求項1に記載の半導体装置であって、
前記第1無電解Niメッキ層は、前記第1電極において、前記第1表面の反対側に配置され、銅焼結層を介して導電部材に接合されることを特徴とする半導体装置。 - 請求項1に記載の半導体装置であって、
前記半導体素子の前記第1表面とは反対側の第2表面に形成された第2電極をさらに備え、
前記第2電極は、第2無電解Niメッキ層を含む積層構造であり、
前記第2無電解Niメッキ層は、Ni(ニッケル)およびP(リン)を組成として含み、
前記第2無電解Niメッキ層のP(リン)濃度は2.5wt%以上6wt%以下であり、かつ、前記第2無電解Niメッキ層中のNi3Pの結晶化率が0%以上20%以下であることを特徴とする半導体装置。 - 請求項4に記載の半導体装置であって、
前記第2無電解Niメッキ層は、Ni(ニッケル)の結晶化率が70%以上95%以下であることを特徴とする半導体装置。 - 請求項4に記載の半導体装置であって、
前記第2無電解Niメッキ層は、前記第2電極において、前記第2表面の反対側に配置され、銅焼結層を介して導電部材に接合されることを特徴とする半導体装置。 - 請求項4に記載の半導体装置であって、
前記第1電極の積層構造と前記第2電極の積層構造は、前記半導体素子を挟んで対称に配置された積層構造であり、
前記第1電極の積層構造を構成する膜の膜厚は、対称となる前記第2電極の積層構造を構成する膜の膜厚と略同一であることを特徴とする半導体装置。 - 請求項4に記載の半導体装置であって、
前記第2電極は、ボンディングワイヤが接合されるボンディングパッドであることを特徴とする半導体装置。 - 一対の直流端子と、
交流出力の相数と同数の交流端子と、
前記一対の直流端子間に接続され、スイッチング素子および逆極性のダイオードの並列回路が2個直列に接続された、交流出力の相数と同数のスイッチングレッグと、
前記スイッチング素子を制御するゲート回路と、を有する電力変換装置であって、
前記スイッチング素子は、請求項1から8のいずれか1項に記載の半導体装置であることを特徴とする電力変換装置。
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WO2022038833A1 (ja) * | 2020-08-20 | 2022-02-24 | 株式会社日立パワーデバイス | 半導体パワーモジュールおよび半導体パワーモジュールの製造方法 |
JP2022035179A (ja) * | 2020-08-20 | 2022-03-04 | 株式会社 日立パワーデバイス | 半導体パワーモジュールおよび半導体パワーモジュールの製造方法 |
JP7410822B2 (ja) | 2020-08-20 | 2024-01-10 | 株式会社 日立パワーデバイス | 半導体パワーモジュールおよび半導体パワーモジュールの製造方法 |
WO2023053558A1 (ja) * | 2021-09-29 | 2023-04-06 | 株式会社日立パワーデバイス | めっき欠陥推定方法および半導体装置の製造方法 |
WO2024062845A1 (ja) * | 2022-09-21 | 2024-03-28 | 株式会社デンソー | 半導体装置 |
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JP7075847B2 (ja) | 2022-05-26 |
DE102019210821A1 (de) | 2020-03-05 |
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US10847614B2 (en) | 2020-11-24 |
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