JP2019531407A - 電解用電極およびその製造方法 - Google Patents
電解用電極およびその製造方法 Download PDFInfo
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- JP2019531407A JP2019531407A JP2019510866A JP2019510866A JP2019531407A JP 2019531407 A JP2019531407 A JP 2019531407A JP 2019510866 A JP2019510866 A JP 2019510866A JP 2019510866 A JP2019510866 A JP 2019510866A JP 2019531407 A JP2019531407 A JP 2019531407A
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- 238000005868 electrolysis reaction Methods 0.000 title claims abstract description 67
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 56
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- 229910052761 rare earth metal Inorganic materials 0.000 claims abstract description 32
- 150000002910 rare earth metals Chemical class 0.000 claims abstract description 32
- 238000000034 method Methods 0.000 claims abstract description 26
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- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 38
- 239000003054 catalyst Substances 0.000 claims description 37
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- NOWPEMKUZKNSGG-UHFFFAOYSA-N azane;platinum(2+) Chemical compound N.N.N.N.[Pt+2] NOWPEMKUZKNSGG-UHFFFAOYSA-N 0.000 claims description 6
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- FJLUATLTXUNBOT-UHFFFAOYSA-N 1-Hexadecylamine Chemical compound CCCCCCCCCCCCCCCCN FJLUATLTXUNBOT-UHFFFAOYSA-N 0.000 claims description 3
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- JBTWLSYIZRCDFO-UHFFFAOYSA-N ethyl methyl carbonate Chemical compound CCOC(=O)OC JBTWLSYIZRCDFO-UHFFFAOYSA-N 0.000 description 1
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- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 description 1
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- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
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Classifications
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
- C25B11/095—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds at least one of the compounds being organic
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
- C25B11/093—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds at least one noble metal or noble metal oxide and at least one non-noble metal oxide
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/08—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of metallic material
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B1/00—Electrolytic production of inorganic compounds or non-metals
- C25B1/01—Products
- C25B1/34—Simultaneous production of alkali metal hydroxides and chlorine, oxyacids or salts of chlorine, e.g. by chlor-alkali electrolysis
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/02—Electrodes; Manufacture thereof not otherwise provided for characterised by shape or form
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/055—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the substrate or carrier material
- C25B11/057—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the substrate or carrier material consisting of a single element or compound
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/055—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the substrate or carrier material
- C25B11/057—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the substrate or carrier material consisting of a single element or compound
- C25B11/061—Metal or alloy
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B1/00—Electrolytic production of inorganic compounds or non-metals
- C25B1/01—Products
- C25B1/34—Simultaneous production of alkali metal hydroxides and chlorine, oxyacids or salts of chlorine, e.g. by chlor-alkali electrolysis
- C25B1/46—Simultaneous production of alkali metal hydroxides and chlorine, oxyacids or salts of chlorine, e.g. by chlor-alkali electrolysis in diaphragm cells
Landscapes
- Chemical & Material Sciences (AREA)
- Metallurgy (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Electrochemistry (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
Abstract
Description
本出願は、2017年8月11日付の韓国特許出願第10−2017−0102524号および2018年7月27日付の韓国特許出願第10−2018−0087750号に基づく優先権の利益を主張し、当該韓国特許出願の文献に開示されたすべての内容を本明細書の一部として含む。
前記触媒層は、窒素、白金族金属、および希土類金属を含み、
前記触媒層中の窒素の含有量は、白金族金属に対して20〜60モル%である、電解用電極を提供する。
前記電極製造用コーティング液を金属基板上に塗布して触媒層を形成する段階と、
前記触媒層を乾燥させる段階と、
前記触媒層を熱処理する段階とを含む、電解用電極の製造方法を提供する。
前記触媒層は、窒素、白金族金属、および希土類金属を含み、
前記触媒層中の窒素の含有量は、白金族金属に対して20〜60モル%である、電解用電極を提供する。
前記電極製造用コーティング液を金属基板上に塗布してコーティング層を形成する段階と、
前記コーティング層を乾燥させる段階と、
前記コーティング層を熱処理して触媒層を製造する段階とを含む、電解用電極の製造方法を提供する。
<実施例1>
RuCl3・nH2OとCe(NO3)2・6H2Oとが6:1のモル比率で混合された金属前駆体を、イソプロピルアルコール(IPA)と2−ブトキシエタノール(2−butoxy ethanol)との1:1(体積比)混合溶媒に溶かして前駆体溶液を製造し、前記前駆体溶液とアミン系溶媒(Oleylamine)とを2:1の比率(体積比)で混合して、100g/Lの濃度の電極製造用コーティング液を製造した。前記コーティング液をニッケルメッシュにブラシコーティング後、200℃で10分乾燥、500℃で10分熱処理する工程を計10回繰り返した後、500℃で1時間熱処理して、電解用電極を得た。
アミン系溶媒としてオレイルアミンの代わりにオクチルアミン(Octylamine)を用いたことを除けば、実施例1と同様の方法で電解用電極を製造した。
RuCl3・nH2OとCe(NO3)2・6H2Oとが6:1のモル比率で混合された金属前駆体を、イソプロピルアルコール(IPA)と2−ブトキシエタノール(2−butoxy ethanol)との1:1(体積比)混合溶媒に溶かして、100g/Lの濃度のコーティング液を製造した。前記コーティング液をニッケルメッシュにブラシコーティング後、200℃で10分乾燥、500℃で10分熱処理する工程を計10回繰り返した後、500℃で1時間熱処理して、電解用電極を得た。
RuCl3・nH2OとCe(NO3)2・6H2Oとが6:1のモル比率で混合された金属前駆体を、イソプロピルアルコール(IPA)と2−ブトキシエタノール(2−butoxy ethanol)との1:1(体積比)混合溶媒に溶かして前駆体溶液を製造し、追加の添加剤としてシュウ酸をルテニウムに対して0.5倍モルとなるように添加し溶解させて、100g/Lの濃度のコーティング液を製造した。前記コーティング液をニッケルメッシュにブラシコーティング後、200℃で10分乾燥、500℃で10分熱処理する工程を計10回繰り返した後、500℃で1時間熱処理して、電解用電極を得た。
前記各実施例および比較例の電解用電極(10mm×10mm)を陰極とする半セルを次の方法で製造した。電解液としては前記32重量%NaOH水溶液、相対電極はPtワイヤ、基準電極はSaturated Calomel電極(SCE)を用いて、各実施例および比較例の電極を陰極とする半セルを製造した。
前記製造例の半電池を用いて、線形走査電位法(Linear Sweep Voltammetry)により各電解用電極の電流密度4.4kA/m2における電圧を測定した。前記実験を10回繰り返して測定された電圧の平均値を過電圧改善平均数値とし、商用電極(Asahi Kasei商用陰極電極:ncz−2)の電圧と比較して過電圧改善の程度を算出した。
電極size:10mm×10mm、温度:90℃、電解液:32重量%NaOH水溶液
サンプル(電解用電極)前処理:電流密度−6A/cm2で1時間水素を発生させるように電解。
Final potential(V):−1.500.0e0
Scan rate(V/s):10.0e-3
Sample period(V):1.0e-3
前記製造例の半セルに対して、下記の試験条件で逆電流テスト(Reverse current test)を行って、実施例1の電極と商用電極(実験例1と同一)に対する耐久性を評価し、その結果を下記表2および図1に示した。
電極size:10mm×10mm、温度:90℃、電解液:32重量%NaOH水溶液
サンプル前処理:電流密度−0.1A/cm2で20分間、−0.2A/cm2および−0.3A/cm2で各3分間、−0.4A/cm2で30分間水素を発生させるように電解。
前記実験例1のテストが完了した電池を分解して、実施例1、2および比較例1の電極表面の状態を、SEMによりそれぞれ1000倍、10000倍で確認した(図2)。そして、SEMの長さ測定ツールにより針状構造の厚さと長さを測定した。
前記実施例1、2および比較例1で製造された電極の成分をEDX(Energy Dispersive Spectrometer)により測定した。1つの電極のそれぞれ異なるポイントに対して3回ずつ測定し、電極内のRuおよびNのモル%を下記表3に記載した。
Claims (16)
- 金属基板と、前記金属基板上に形成された触媒層とを含む電解用電極であって、
前記触媒層は、窒素、白金族金属、および希土類金属を含み、
前記触媒層中の窒素の含有量は、白金族金属に対して20〜60モル%である、電解用電極。 - 前記触媒層は、希土類金属の針状構造を含むものである、請求項1に記載の電解用電極。
- 前記針状構造は、50〜300nmの厚さおよび0.5〜10μmの長さを有する針状の構造体を2以上含む、請求項2に記載の電解用電極。
- 白金族金属前駆体、希土類金属前駆体、有機溶媒、およびアミン系溶媒を含む電極製造用コーティング液を製造する段階と、
前記電極製造用コーティング液を金属基板上に塗布して触媒層を形成する段階と、
前記触媒層を乾燥させる段階と、
前記触媒層を熱処理する段階とを含む、電解用電極の製造方法。 - 前記白金族金属前駆体は、塩化ルテニウム水和物(RuCl3・nH2O)、テトラアミンプラチナム(II)クロライド水和物(Pt(NH3)4Cl2・H2O)、塩化ロジウム(RhCl3)、硝酸ロジウム水和物(Rh(NO3)3・nH2O)、塩化イリジウム水和物(IrCl3・nH2O)、硝酸パラジウム(Pd(NO3)2)からなる群より選択される1種以上である、請求項4に記載の電解用電極の製造方法。
- 前記希土類金属前駆体は、硝酸セリウム(III)(Ce(NO3)3)、炭酸セリウム(III)(Ce2(CO3)3)、塩化セリウム(III)(CeCl3)、酸化イットリウム(Y2O3)、および炭酸イットリウム(Y2(CO3)3)からなる群より選択される1種以上である、請求項4に記載の電解用電極の製造方法。
- 前記有機溶媒は、C1〜C6のアルコールおよびC4〜C8のグリコールエーテルの混合溶媒である、請求項4に記載の電解用電極の製造方法。
- 前記C1〜C6のアルコールおよびC4〜C8のグリコールエーテルの混合比は、10:1〜1:2である、請求項7に記載の電解用電極の製造方法。
- 前記アミン系溶媒は、C6〜C30の飽和または不飽和脂肪族アミンである、請求項4に記載の電解用電極の製造方法。
- 前記アミン系溶媒は、オクチルアミン、デシルアミン、ドデシルアミン、オレイルアミン、ラウリルアミン、およびヘキサデシルアミンからなる群より選択される1種以上である、請求項4に記載の電解用電極の製造方法。
- 前記白金族金属前駆体および希土類金属前駆体は、1:1〜10:1のモル比率で含まれるものである、請求項4に記載の電解用電極の製造方法。
- 前記アミン系溶媒は、電極製造用コーティング液100体積%に対して3〜40体積%含まれるものである、請求項4に記載の電解用電極の製造方法。
- 前記電極製造用コーティング液の濃度は、50〜150g/Lである、請求項4に記載の電解用電極の製造方法。
- 前記乾燥段階の温度は、70〜200℃である、請求項4に記載の電解用電極の製造方法。
- 前記熱処理段階の温度は、300〜600℃である、請求項4に記載の電解用電極の製造方法。
- 請求項4〜15のいずれか1項に記載の製造方法によって製造された電解用電極。
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