JP2019523565A - 薄膜トランジスタの製造方法 - Google Patents
薄膜トランジスタの製造方法 Download PDFInfo
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 111
- 239000010409 thin film Substances 0.000 title claims abstract description 86
- 238000005530 etching Methods 0.000 claims abstract description 115
- 230000004888 barrier function Effects 0.000 claims abstract description 112
- 229910052751 metal Inorganic materials 0.000 claims abstract description 93
- 239000002184 metal Substances 0.000 claims abstract description 93
- 238000000034 method Methods 0.000 claims abstract description 70
- 239000000758 substrate Substances 0.000 claims abstract description 28
- 239000010410 layer Substances 0.000 claims description 470
- 239000011241 protective layer Substances 0.000 claims description 21
- 238000000059 patterning Methods 0.000 claims description 20
- 229920002120 photoresistant polymer Polymers 0.000 claims description 19
- 239000011368 organic material Substances 0.000 claims description 18
- 238000004380 ashing Methods 0.000 claims description 10
- 229910010272 inorganic material Inorganic materials 0.000 claims description 10
- 239000011147 inorganic material Substances 0.000 claims description 10
- 239000000203 mixture Substances 0.000 claims description 5
- 238000001312 dry etching Methods 0.000 claims description 3
- 238000001039 wet etching Methods 0.000 claims description 3
- 239000000463 material Substances 0.000 description 8
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 6
- 239000012044 organic layer Substances 0.000 description 6
- 230000003071 parasitic effect Effects 0.000 description 6
- 230000000717 retained effect Effects 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 238000000206 photolithography Methods 0.000 description 4
- 239000000523 sample Substances 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 229910052814 silicon oxide Inorganic materials 0.000 description 4
- 229920001621 AMOLED Polymers 0.000 description 2
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- 229910007717 ZnSnO Inorganic materials 0.000 description 2
- 229910021417 amorphous silicon Inorganic materials 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 229910052733 gallium Inorganic materials 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- -1 polyethylene naphthalate Polymers 0.000 description 2
- 239000011112 polyethylene naphthalate Substances 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- KBEVZHAXWGOKCP-UHFFFAOYSA-N zinc oxygen(2-) tin(4+) Chemical compound [O--].[O--].[O--].[Zn++].[Sn+4] KBEVZHAXWGOKCP-UHFFFAOYSA-N 0.000 description 2
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- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
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- H01L29/66409—Unipolar field-effect transistors
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- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
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- H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
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- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
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- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66742—Thin film unipolar transistors
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- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
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- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
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Abstract
Description
基板上にゲート電極、ゲート絶縁層及び活性層を形成するステップと、
前記ゲート絶縁層及び前記活性層の上に保護層を形成するステップと、
前記保護層をパターニングして前記活性層上にエッチングバリア層を形成するステップと、
前記活性層、前記エッチングバリア層及び前記ゲート絶縁層の上に金属層を形成するステップと、
前記金属層の第一領域に感光層を塗布するステップと、
前記感光層の一部を除去して前記エッチングバリア層を覆う前記金属層の一部を露出させるステップと、
前記金属層を除去して前記エッチングバリア層の一部を露出させるステップと、
を備える。
露出された第一領域の表面と残った感光層の表面にフォトレジスト層を塗布するステップと、
前記フォトレジスト層をパターニングして、露出された第一領域を覆う前記フォトレジスト層の一部を除去するステップと、
残ったフォトレジスト層をマスクとして残った感光層を保護し、露出された第一領域をエッチングするステップと、
残った前記フォトレジスト層を剥離して、残った第一領域を形成するステップと、
を備える。
基板上にゲート電極、ゲート絶縁層及び活性層を形成するステップと、
前記ゲート絶縁層及び前記活性層の上に保護層を形成するステップと、
前記保護層をパターニングして前記活性層上にエッチングバリア層を形成するステップと、
前記活性層、前記エッチングバリア層及び前記ゲート絶縁層の上に金属層を形成するステップと、
前記金属層の第一領域に感光層を塗布するステップと、
前記感光層の一部を除去して前記エッチングバリア層を覆う前記金属層の第一領域の一部を露出させるステップと、
前記金属層を除去して前記エッチングバリア層の一部を露出させるステップと、
を備える。
露出された第一領域151の表面と残った感光層16の表面にフォトレジスト層を塗布するステップと、
前記フォトレジスト層をパターニングして、露出された第一領域151を覆う前記フォトレジスト層の一部を除去するステップと、
残ったフォトレジスト層をマスクとして残った感光層16を保護し、露出された第一領域151をエッチングするステップと、
残った前記フォトレジスト層を剥離して、残った第一領域151を形成するステップと、
を備える。
Claims (14)
- 薄膜トランジスタの製造方法であって、
基板上にゲート電極、ゲート絶縁層及び活性層を形成するステップと、
前記ゲート絶縁層及び前記活性層の上に保護層を形成するステップと、
前記保護層をパターニングして前記活性層上にエッチングバリア層を形成するステップと、
前記活性層、前記エッチングバリア層及び前記ゲート絶縁層の上に金属層を形成するステップと、
前記金属層の第一領域の上に感光層を塗布するステップと、
前記感光層の一部を除去して前記エッチングバリア層を覆う前記金属層の第一領域の一部を露出させるステップと、
前記金属層を除去して前記エッチングバリア層の一部を露出させるステップと、を備える、
ことを特徴とする薄膜トランジスタの製造方法。 - 前記方法は、残った前記感光層を除去して残った金属層を露出させてソース電極及びドレイン電極を形成するステップをさらに備える、
ことを特徴とする請求項1に記載の薄膜トランジスタの製造方法。 - 前記方法は、前記エッチングバリア層を除去して前記薄膜トランジスタのチャネル領域を形成するステップをさらに備える、
ことを特徴とする請求項2に記載の薄膜トランジスタの製造方法。 - 前記感光層の一部を除去して前記エッチングバリア層を覆う前記金属層の一部を露出させるステップ及び前記金属層を除去して前記エッチングバリア層の一部を露出させるステップは、
プラズマアッシングプロセスによって前記感光層の一部を除去して、前記エッチングバリア層を覆う前記第一領域の一部を露出させるとともに、残った前記感光層は前記金属層の第一領域の他の一部を覆い、且つ残った前記感光層は露出された一部の前記金属層の両側に位置し自己位置合わせ平面を形成するステップと、
エッチングプロセスによって露出された前記の第一領域の一部を除去して前記エッチングバリア層を露出させ、エッチングしてから残った前記金属層の表面と前記自己位置合わせ平面は同じ平面に位置するステップと、を備える、
ことを特徴とする請求項2又は3に記載の薄膜トランジスタの製造方法。 - 前記金属層の第一領域の上に感光層を塗布するステップは、
前記金属層の第一領域の上にフォトレジストを形成し、前記フォトレジストをパターニングして前記感光層を形成し、前記感光層の正投影が前記活性層及び前記エッチングバリア層を覆うようにすることを備える、
ことを特徴とする請求項2に記載の薄膜トランジスタの製造方法。 - 前記方法は、前記感光層の両側に露出された前記金属層における前記第一領域以外の部分を除去するステップをさらに備える、
ことを特徴とする請求項5に記載の薄膜トランジスタの製造方法。 - 前記感光層の両側に露出された前記金属層の一部を除去することは、ウェットエッチング又はドライエッチングを採用することを特徴とする請求項6に記載の薄膜トランジスタの製造方法。
- 前記保護層は、有機材料、無機材料、又は有機材料と無機材料の混合物であることを特徴とする請求項1に記載の薄膜トランジスタの製造方法。
- 前記方法は、
前記保護層をパターニングして、前記ゲート絶縁層の上に前記エッチングバリア層の両側に位置する支持層を形成するステップと、
前記支持層の上に金属層を形成し且つ前記金属層の上に感光層を形成するステップと、
前記感光層の一部を除去して前記支持層の上に位置する前記金属層の一部を露出させるステップと、
前記金属層を除去して前記支持層の一部を露出させるステップと、
前記支持層を除去するステップと、をさらに備える、
ことを特徴とする請求項1〜4のいずれか一項に記載の薄膜トランジスタの製造方法。 - 前記保護層をパターニングして、前記ゲート絶縁層の上にエッチングバリア層及び前記エッチングバリア層の両側に位置する支持層を形成するステップは、同じプロセスによって完成されることを特徴とする請求項9に記載の薄膜トランジスタの製造方法。
- 前記支持層の上に金属層を形成し且つ前記金属層の上に感光層を形成するステップ、前記活性層、前記エッチングバリア層及び前記ゲート絶縁層の上に金属層を形成するステップ及び前記金属層の第一領域の上に感光層を塗布するステップは、同じプロセスによって完成されることを特徴とする請求項9に記載の薄膜トランジスタの製造方法。
- 前記感光層の一部を除去して前記支持層の上に位置する前記金属層の一部を露出させるステップ及び前記感光層の一部を除去して前記エッチングバリア層を覆う前記金属層の一部を露出させるステップは、同じプロセスによって完成されることを特徴とする請求項9に記載の薄膜トランジスタの製造方法。
- 前記金属層を除去して前記支持層の一部を露出させるステップ及び前記金属層を除去して前記エッチングバリア層の一部を露出させるステップは、同じプロセスによって完成されることを特徴とする請求項9に記載の薄膜トランジスタの製造方法。
- 前記支持層を除去するステップは、先ず残った感光層を除去するステップを備えることを特徴とする請求項9に記載の薄膜トランジスタの製造方法。
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