JP2018530150A5 - - Google Patents
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- Publication number
- JP2018530150A5 JP2018530150A5 JP2018512877A JP2018512877A JP2018530150A5 JP 2018530150 A5 JP2018530150 A5 JP 2018530150A5 JP 2018512877 A JP2018512877 A JP 2018512877A JP 2018512877 A JP2018512877 A JP 2018512877A JP 2018530150 A5 JP2018530150 A5 JP 2018530150A5
- Authority
- JP
- Japan
- Prior art keywords
- sensor
- sensor assembly
- substrate support
- support surface
- disposed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims 16
- 239000000835 fiber Substances 0.000 claims 1
- 239000013307 optical fiber Substances 0.000 claims 1
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021075947A JP7112565B2 (ja) | 2015-09-11 | 2021-04-28 | リアルタイムの力および膜応力制御を備えた基板支持体 |
| JP2022116938A JP7443430B2 (ja) | 2015-09-11 | 2022-07-22 | リアルタイムの力および膜応力制御を備えた基板支持体 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14/852,485 | 2015-09-11 | ||
| US14/852,485 US10879046B2 (en) | 2015-09-11 | 2015-09-11 | Substrate support with real time force and film stress control |
| PCT/US2016/044989 WO2017044201A1 (en) | 2015-09-11 | 2016-08-01 | Substrate support with real time force and film stress control |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021075947A Division JP7112565B2 (ja) | 2015-09-11 | 2021-04-28 | リアルタイムの力および膜応力制御を備えた基板支持体 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2018530150A JP2018530150A (ja) | 2018-10-11 |
| JP2018530150A5 true JP2018530150A5 (enExample) | 2019-09-12 |
| JP6878413B2 JP6878413B2 (ja) | 2021-05-26 |
Family
ID=58237095
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018512877A Active JP6878413B2 (ja) | 2015-09-11 | 2016-08-01 | リアルタイムの力および膜応力制御を備えた基板支持体 |
| JP2021075947A Active JP7112565B2 (ja) | 2015-09-11 | 2021-04-28 | リアルタイムの力および膜応力制御を備えた基板支持体 |
| JP2022116938A Active JP7443430B2 (ja) | 2015-09-11 | 2022-07-22 | リアルタイムの力および膜応力制御を備えた基板支持体 |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021075947A Active JP7112565B2 (ja) | 2015-09-11 | 2021-04-28 | リアルタイムの力および膜応力制御を備えた基板支持体 |
| JP2022116938A Active JP7443430B2 (ja) | 2015-09-11 | 2022-07-22 | リアルタイムの力および膜応力制御を備えた基板支持体 |
Country Status (7)
| Country | Link |
|---|---|
| US (4) | US10879046B2 (enExample) |
| JP (3) | JP6878413B2 (enExample) |
| KR (2) | KR20240129089A (enExample) |
| CN (3) | CN107039325B (enExample) |
| SG (1) | SG10202002453XA (enExample) |
| TW (3) | TW202036780A (enExample) |
| WO (1) | WO2017044201A1 (enExample) |
Families Citing this family (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102113453B1 (ko) * | 2016-06-03 | 2020-05-21 | 어플라이드 머티어리얼스, 인코포레이티드 | 기판 거리 모니터링 |
| JP6457468B2 (ja) * | 2016-12-08 | 2019-01-23 | ファナック株式会社 | バリ取り装置 |
| US10460916B2 (en) * | 2017-05-15 | 2019-10-29 | Applied Materials, Inc. | Real time monitoring with closed loop chucking force control |
| DE102017208645A1 (de) * | 2017-05-22 | 2018-11-22 | Siemens Aktiengesellschaft | Messsondenkopf |
| US10704142B2 (en) * | 2017-07-27 | 2020-07-07 | Applied Materials, Inc. | Quick disconnect resistance temperature detector assembly for rotating pedestal |
| US11114327B2 (en) * | 2017-08-29 | 2021-09-07 | Applied Materials, Inc. | ESC substrate support with chucking force control |
| KR20190029365A (ko) * | 2017-09-12 | 2019-03-20 | 삼성전자주식회사 | 리프트 핀 조립체, 이를 갖는 기판 지지 유닛 및 기판 처리 장치 |
| SG11202008969PA (en) * | 2018-03-23 | 2020-10-29 | Applied Materials Inc | Isolated backside helium delivery system |
| US10971352B2 (en) | 2018-07-16 | 2021-04-06 | Taiwan Semiconductor Manufacturing Co., Ltd | Cleaning method and apparatus |
| US10927461B2 (en) * | 2018-08-31 | 2021-02-23 | Applied Materials, Inc. | Gas diffuser support structure for reduced particle generation |
| CN109231152B (zh) * | 2018-09-30 | 2020-06-16 | 重庆大学 | 利用光纤Fabry-Perot干涉仪测量夹持力和夹爪位移的微夹钳 |
| CN109129410B (zh) * | 2018-09-30 | 2021-07-27 | 重庆大学 | 夹爪为光纤Fabry-Perot干涉仪且可夹持力自传感的微夹钳 |
| JP7209515B2 (ja) * | 2018-11-27 | 2023-01-20 | 東京エレクトロン株式会社 | 基板保持機構および成膜装置 |
| US12125728B2 (en) * | 2019-01-21 | 2024-10-22 | Applied Materials, Inc. | Substrate carrier |
| WO2020232074A1 (en) * | 2019-05-14 | 2020-11-19 | Mattson Technology, Inc. | Plasma processing apparatus having a focus ring adjustment assembly |
| US11415463B2 (en) * | 2019-06-04 | 2022-08-16 | Applied Materials, Inc. | Contactless workpiece temperature sensor |
| KR20220018591A (ko) * | 2019-06-07 | 2022-02-15 | 램 리써치 코포레이션 | 멀티 스테이션 반도체 프로세싱에서 독립적으로 조정 가능한 플로우 경로 컨덕턴스 |
| JP7681587B2 (ja) * | 2019-11-22 | 2025-05-22 | ラム リサーチ コーポレーション | コインスロットおよびボールロックセラミックリフトピンホルダ |
| CN215925072U (zh) * | 2020-09-24 | 2022-03-01 | 株式会社国际电气 | 基板处理装置 |
| WO2022173720A1 (en) * | 2021-02-09 | 2022-08-18 | Fuse Energy Technologies Corp. | Adjustable probe for plasma diagnostics |
| KR20230146074A (ko) * | 2021-02-19 | 2023-10-18 | 어플라이드 머티어리얼스, 인코포레이티드 | 기판 지지체, 기판을 프로세싱하는 방법, 및 프로세싱 시스템 |
| US11851761B2 (en) * | 2021-04-16 | 2023-12-26 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor processing tool |
| US20230141012A1 (en) * | 2021-11-09 | 2023-05-11 | Applied Materials, Inc. | Pressure puck diagnostic wafer |
| CN116476193B (zh) * | 2023-03-24 | 2024-01-05 | 上海数造机电科技股份有限公司 | 基于静电吸附的陶瓷3d打印构建平台、方法及系统 |
| CN116552611B (zh) * | 2023-05-11 | 2025-11-25 | 盛吉盛(宁波)半导体科技有限公司 | 一种用于支撑与搬运静电卡盘组件的底座工装 |
| US12449738B2 (en) * | 2023-06-20 | 2025-10-21 | Applied Materials, Inc. | Rotary substrate support for aligning a substrate |
| WO2025155847A1 (en) * | 2024-01-18 | 2025-07-24 | Watlow Electric Manufacturing Company | Electrical termination for ceramic pedestal with embedded electrical components |
Family Cites Families (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2616118B2 (ja) * | 1990-03-22 | 1997-06-04 | ソニー株式会社 | 低温処理方法及び低温処理装置 |
| JP3042786B2 (ja) * | 1990-07-03 | 2000-05-22 | 株式会社日立製作所 | 真空内被処理物の温度測定方法並びに温度制御方法及び装置 |
| JPH04193951A (ja) * | 1990-11-28 | 1992-07-14 | Tokyo Electron Ltd | 保持装置 |
| JPH05129421A (ja) | 1991-11-07 | 1993-05-25 | Fujitsu Ltd | 静電チヤツク |
| JPH06163674A (ja) | 1992-11-18 | 1994-06-10 | Hitachi Ltd | 試料保持装置のモニタ方法 |
| JP3488334B2 (ja) | 1996-04-15 | 2004-01-19 | 京セラ株式会社 | 静電チャック |
| KR19990040901U (ko) | 1998-05-11 | 1999-12-06 | 김영환 | 반도체 식각공정용 정전척의 냉각가스홀에퇴적된 폴리머 제거장치 |
| JP2000031252A (ja) * | 1998-07-08 | 2000-01-28 | Mitsubishi Electric Corp | 静電チャックを備えた半導体製造装置および静電チャックからのウエハ離脱方法 |
| JP2000266603A (ja) * | 1999-03-19 | 2000-09-29 | Tokyo Electron Ltd | 放射温度測定方法及び放射温度測定装置 |
| JP4236329B2 (ja) * | 1999-04-15 | 2009-03-11 | 日本碍子株式会社 | プラズマ処理装置 |
| WO2001076326A1 (en) * | 2000-03-30 | 2001-10-11 | Tokyo Electron Limited | Optical monitoring and control system and method for plasma reactors |
| JP2002009140A (ja) * | 2000-06-22 | 2002-01-11 | Mitsubishi Electric Corp | 静電チャック装置 |
| US20020186934A1 (en) * | 2001-06-07 | 2002-12-12 | Hug Norman L. | Optical termination |
| US6898064B1 (en) * | 2001-08-29 | 2005-05-24 | Lsi Logic Corporation | System and method for optimizing the electrostatic removal of a workpiece from a chuck |
| KR20040000104A (ko) | 2002-06-24 | 2004-01-03 | 삼성전자주식회사 | 웨이퍼 감지 센서의 정렬장치 |
| US6938505B2 (en) | 2002-08-13 | 2005-09-06 | Taiwan Semiconductor Manufacturing Co., Ltd. | Chamber wafer detection |
| US7110122B2 (en) * | 2004-07-21 | 2006-09-19 | Hewlett-Packard Development Company, L.P. | Interferometer calibration methods and apparatus |
| US7292428B2 (en) | 2005-04-26 | 2007-11-06 | Applied Materials, Inc. | Electrostatic chuck with smart lift-pin mechanism for a plasma reactor |
| WO2007149733A2 (en) * | 2006-06-19 | 2007-12-27 | Baker Hughes Incorporated | Isolated sensor housing |
| KR101350145B1 (ko) | 2006-11-29 | 2014-01-09 | 엘아이지에이디피 주식회사 | 리프트 핀을 이용한 기판 유무 판별장치 및 이를 이용한기판 반입방법과 검사방법 |
| US7750818B2 (en) * | 2006-11-29 | 2010-07-06 | Adp Engineering Co., Ltd. | System and method for introducing a substrate into a process chamber |
| US20090034581A1 (en) * | 2007-08-02 | 2009-02-05 | Tokyo Electron Limited | Method for hot plate substrate monitoring and control |
| JP5484981B2 (ja) * | 2010-03-25 | 2014-05-07 | 東京エレクトロン株式会社 | 基板載置台及び基板処理装置 |
| JP5871453B2 (ja) | 2010-05-20 | 2016-03-01 | 東京エレクトロン株式会社 | プラズマ処理装置，基板保持機構，基板位置ずれ検出方法 |
| JP2011258756A (ja) * | 2010-06-09 | 2011-12-22 | Ntn Corp | リフタユニットおよびパターン修正装置 |
| WO2012112994A1 (en) * | 2011-02-18 | 2012-08-23 | Parker-Hannifin Corporation | Optical sensor and mounting interface |
| US9196514B2 (en) * | 2013-09-06 | 2015-11-24 | Applied Materials, Inc. | Electrostatic chuck with variable pixilated heating |
| US9558981B2 (en) | 2013-11-19 | 2017-01-31 | Applied Materials, Inc. | Control systems employing deflection sensors to control clamping forces applied by electrostatic chucks, and related methods |
| JP6455334B2 (ja) * | 2015-06-23 | 2019-01-23 | 東京エレクトロン株式会社 | 基板処理装置、基板処理方法及び記憶媒体 |
-
2015
- 2015-09-11 US US14/852,485 patent/US10879046B2/en active Active
-
2016
- 2016-08-01 KR KR1020247027406A patent/KR20240129089A/ko active Pending
- 2016-08-01 KR KR1020187010116A patent/KR102696914B1/ko active Active
- 2016-08-01 SG SG10202002453XA patent/SG10202002453XA/en unknown
- 2016-08-01 WO PCT/US2016/044989 patent/WO2017044201A1/en not_active Ceased
- 2016-08-01 JP JP2018512877A patent/JP6878413B2/ja active Active
- 2016-08-18 TW TW109115802A patent/TW202036780A/zh unknown
- 2016-08-18 TW TW105126313A patent/TWI670792B/zh active
- 2016-08-18 TW TW108123514A patent/TWI729429B/zh active
- 2016-09-09 CN CN201610815239.3A patent/CN107039325B/zh active Active
- 2016-09-09 CN CN202410003143.1A patent/CN117976601A/zh active Pending
- 2016-09-09 CN CN201621048176.5U patent/CN206610799U/zh active Active
-
2020
- 2020-11-11 US US17/095,577 patent/US11676802B2/en active Active
-
2021
- 2021-04-28 JP JP2021075947A patent/JP7112565B2/ja active Active
-
2022
- 2022-07-22 JP JP2022116938A patent/JP7443430B2/ja active Active
-
2023
- 2023-04-19 US US18/302,854 patent/US11915913B2/en active Active
-
2024
- 2024-01-18 US US18/416,580 patent/US12424413B2/en active Active
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