JP2018529934A - 電子デバイスの透明なひずみセンサ - Google Patents
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- G—PHYSICS
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- G01L1/00—Measuring force or stress, in general
- G01L1/20—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress
- G01L1/205—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using distributed sensing elements
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L1/00—Measuring force or stress, in general
- G01L1/20—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress
- G01L1/22—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges
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- G01L1/22—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges
- G01L1/225—Measuring circuits therefor
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- G—PHYSICS
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- G01L1/20—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress
- G01L1/22—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges
- G01L1/2287—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges constructional details of the strain gauges
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- G06F3/048—Interaction techniques based on graphical user interfaces [GUI]
- G06F3/0487—Interaction techniques based on graphical user interfaces [GUI] using specific features provided by the input device, e.g. functions controlled by the rotation of a mouse with dual sensing arrangements, or of the nature of the input device, e.g. tap gestures based on pressure sensed by a digitiser
- G06F3/0488—Interaction techniques based on graphical user interfaces [GUI] using specific features provided by the input device, e.g. functions controlled by the rotation of a mouse with dual sensing arrangements, or of the nature of the input device, e.g. tap gestures based on pressure sensed by a digitiser using a touch-screen or digitiser, e.g. input of commands through traced gestures
Abstract
Description
本特許協力条約に基づく特許出願は、「Transparent Strain Sensors in an Electronic Device」と題する、2015年7月21日付出願の米国仮特許出願第62/195,030号、及び「Transparent Strain Sensors in an Electronic Device」と題する、2015年8月11日付出願の米国特許出願第14/823,910号に対する優先権を主張するものであり、それらの内容は、それらの全体を参照することにより本明細書に組み込まれる。
本明細書に記載する実施形態は、概して電子デバイスに関する。より具体的には、本実施形態は、電子デバイスにある1つ以上の透明なひずみセンサに関する。
Claims (24)
- 電子デバイスの視認可能なエリアに配置される透明なひずみセンサであって、
第1のゲージ率を有する第1の透明な導電材で構成された透明なひずみ感知素子と、
前記透明なひずみ感知素子に直接接続され、第2のゲージ率を有する第2の透明な導電材で構成された透明なひずみ信号線と、
を備え、前記第1のゲージ率は前記第2のゲージ率よりも高い、透明なひずみセンサ。 - 前記第1の透明な導電材は第1の電気抵抗を有し、前記第2の透明な導電材は第2の電気抵抗を有し、前記第1の電気抵抗は前記第2の電気抵抗よりも高い、請求項1に記載の透明なひずみセンサ。
- 前記第1の透明な導電材及び前記第2の透明な導電材は、それぞれ透明な導電酸化膜を含む、請求項1に記載の透明なひずみセンサ。
- 前記第1の透明な導電材は、ガリウムドープ酸化亜鉛膜及びアルミニウムドープ酸化亜鉛膜のうちの一方を含む、請求項3に記載の透明なひずみセンサ。
- 前記第2の透明な導電材は酸化インジウムスズ膜を含む、請求項3に記載の透明なひずみセンサ。
- 前記第1の透明な導電材は、2つの透明な導電酸化膜の間に配設された絶縁層を含む透明な多層導電構造体を含む、請求項3に記載の透明なひずみセンサ。
- 前記ひずみ信号線の前記第2の透明な導電材は、前記第2の電気抵抗を生じるように処理されている、請求項2に記載の透明なひずみセンサ。
- 前記第2の透明な導電材は、前記第2の電気抵抗を生じるように1つ以上のドープ剤でドープされている、請求項7に記載の透明なひずみセンサ。
- 前記ひずみ感知素子の前記第1の透明な導電材は、前記第1のゲージ率を生じるように処理されている、請求項1に記載の透明なひずみセンサ。
- 前記ひずみ感知素子の前記第1の透明な導電材は、前記第1のゲージ率を生じるようにレーザアニール処理されている、請求項8に記載の透明なひずみセンサ。
- 前記電子デバイスの前記視認可能なエリアは、前記電子デバイスのディスプレイスタックを含む、請求項1に記載の透明なひずみセンサ。
- 電子デバイスの視認可能なエリアに配置される透明なひずみセンサであって、第1のゲージ率及び第1の電気抵抗を有する第1の透明な導電セグメントと、前記第1の導電セグメントに接続されて第2のゲージ率及び第2の電気抵抗を有する第2の導電セグメントとを含む複合型の透明な導電材を備え、前記第1のゲージ率は前記第2のゲージ率よりも高く、前記第1の電気抵抗は前記第2の電気抵抗よりも高い、透明なひずみセンサ。
- 前記透明なひずみセンサに直接接続された少なくとも1つの透明なひずみ信号線を更に備え、前記少なくとも1つの透明な信号線は第3のゲージ率及び第3の電気抵抗を有し、前記第3の電気抵抗は前記第1の電気抵抗及び前記第2の電気抵抗よりも低い、請求項12に記載の透明なひずみセンサ。
- 前記電子デバイスの前記視認可能なエリアは、前記電子デバイスのディスプレイスタックを含む、請求項12に記載の透明なひずみセンサ。
- 透明なひずみセンサを生成する方法であって、
第1のゲージ率を有する1つ以上の透明な導電材を含む透明なひずみ感知素子を基板上に設けることと、
前記透明なひずみ感知素子に直接接続された、異なる第2のゲージ率を有する1つ以上の透明な導電材を含む透明なひずみ信号線を前記基板上に設けることと、
を含む方法。 - 前記透明なひずみ感知素子の前記1つ以上の透明な導電材は第1の電気抵抗を有し、前記透明なひずみ信号線の前記1つ以上の透明な導電材は第2の電気抵抗を有し、前記第1の電気抵抗は前記第2の電気抵抗よりも高い、請求項15に記載の方法。
- 透明なひずみセンサを生成する方法であって、
1つ以上の透明な導電材を含む透明なひずみ感知素子を基板上に設けることと、
前記透明なひずみ感知素子に直接接続された透明なひずみ信号線を前記基板上に設けることと、
前記透明なひずみ感知素子のゲージ率を高めるように前記透明なひずみ感知素子の前記1つ以上の透明な導電材を処理することと、
を含む方法。 - 前記透明なひずみ信号線は、同じ1つ以上の透明な導電材で構成されている、請求項17に記載の方法。
- 前記透明なひずみ信号線のコンダクタンスを高めるように前記透明なひずみ信号線の前記1つ以上の透明な導電材を処理することを更に含む、請求項18に記載の方法。
- 前記透明なひずみ感知素子のゲージ率を高めるように前記透明なひずみ感知素子の前記1つ以上の透明な導電材を処理することは、前記透明なひずみ感知素子のゲージ率を高めるように前記透明なひずみ感知素子の前記1つ以上の透明な導電材をレーザアニール処理することを含む、請求項17に記載の方法。
- 透明なひずみセンサを生成する方法であって、
透明なひずみ感知素子を基板上に設けることと、
前記透明なひずみ感知素子に直接接続された、1つ以上の透明な導電材を含む透明なひずみ信号線を前記基板上に設けることと、
前記透明なひずみ信号線のコンダクタンスを高めるように前記透明なひずみ信号線の前記1つ以上の透明な導電材を処理することと、
を含む方法。 - 前記透明なひずみ感知素子のゲージ率を高めるように前記透明なひずみ感知素子の前記1つ以上の透明な導電材を処理することは、前記透明なひずみ感知素子のゲージ率を高めるように前記透明なひずみ感知素子の前記1つ以上の透明な導電材をレーザアニール処理することを含む、請求項21に記載の方法。
- 電子デバイスであって、
ディスプレイ用のディスプレイスタックであって、
カバーガラス、
前記カバーガラスの下方に配置されたひずみ検知構造体であって、基板、前記基板の第1の表面に配置された第1の透明なひずみ感知素子、及び前記基板の第2の表面に配置された第2の透明なひずみ感知素子を含むひずみ検知構造体、並びに
それぞれの透明なひずみ感知素子に直接接続された1つ以上の透明なひずみ信号線、
を含む、ディスプレイスタックであって、前記第1の透明なひずみ感知素子及び前記第2の透明なひずみ感知素子は、前記透明なひずみ信号線のゲージ率よりも高いゲージ率を有し、前記第1の透明なひずみ感知素子及び前記第2の透明なひずみ感知素子並びに前記透明なひずみ信号線は、前記ディスプレイを見るときに視認可能なエリアに配置されている、ディスプレイスタックと、
前記透明なひずみ信号線に電気的に接続された検知回路と、
前記検知回路に機能可能に接続され、前記検知回路から受信される信号に基づいて、前記カバーガラスに加わる力の大きさを判定するように構成されたコントローラと、
を備える電子デバイス。 - 前記第1の透明なひずみ感知素子及び前記第2の透明なひずみ感知素子は、それぞれガリウムドープ酸化亜鉛膜及びアルミニウムドープ酸化亜鉛膜のうちの一方で構成されており、前記透明なひずみ信号線は、酸化インジウムスズ膜で構成されている、請求項23に記載の電子デバイス。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201562195030P | 2015-07-21 | 2015-07-21 | |
US62/195,030 | 2015-07-21 | ||
US14/823,910 US9612170B2 (en) | 2015-07-21 | 2015-08-11 | Transparent strain sensors in an electronic device |
US14/823,910 | 2015-08-11 | ||
PCT/US2016/037613 WO2017014870A1 (en) | 2015-07-21 | 2016-06-15 | Transparent strain sensors in an electronic device |
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JP2018529934A true JP2018529934A (ja) | 2018-10-11 |
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JP2018502374A Pending JP2018529934A (ja) | 2015-07-21 | 2016-06-15 | 電子デバイスの透明なひずみセンサ |
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US (2) | US9612170B2 (ja) |
JP (1) | JP2018529934A (ja) |
KR (1) | KR20180031028A (ja) |
CN (3) | CN107850499A (ja) |
AU (1) | AU2016296116B2 (ja) |
DE (1) | DE112016003264T5 (ja) |
WO (1) | WO2017014870A1 (ja) |
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WO2021145342A1 (ja) * | 2020-01-15 | 2021-07-22 | ミネベアミツミ株式会社 | ひずみゲージ |
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KR20180031028A (ko) | 2018-03-27 |
US10139294B2 (en) | 2018-11-27 |
US9612170B2 (en) | 2017-04-04 |
CN107850499A (zh) | 2018-03-27 |
US20170191884A1 (en) | 2017-07-06 |
US20170023420A1 (en) | 2017-01-26 |
AU2016296116A1 (en) | 2018-03-08 |
CN205940446U (zh) | 2017-02-08 |
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CN207019619U (zh) | 2018-02-16 |
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