JP2018511816A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2018511816A5 JP2018511816A5 JP2017538195A JP2017538195A JP2018511816A5 JP 2018511816 A5 JP2018511816 A5 JP 2018511816A5 JP 2017538195 A JP2017538195 A JP 2017538195A JP 2017538195 A JP2017538195 A JP 2017538195A JP 2018511816 A5 JP2018511816 A5 JP 2018511816A5
- Authority
- JP
- Japan
- Prior art keywords
- antioxidant
- ribs
- attaching
- wgp
- oxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 claims 15
- 239000003963 antioxidant agent Substances 0.000 claims 13
- 230000003078 antioxidant effect Effects 0.000 claims 13
- 238000010521 absorption reaction Methods 0.000 claims 6
- 239000011248 coating agent Substances 0.000 claims 6
- 238000000576 coating method Methods 0.000 claims 6
- 229910001404 rare earth metal oxide Inorganic materials 0.000 claims 6
- 238000000034 method Methods 0.000 claims 5
- 230000002209 hydrophobic effect Effects 0.000 claims 4
- 238000007740 vapor deposition Methods 0.000 claims 4
- 230000004888 barrier function Effects 0.000 claims 3
- 229910000449 hafnium oxide Inorganic materials 0.000 claims 3
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 claims 3
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims 3
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical group OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 claims 2
- 229910052581 Si3N4 Inorganic materials 0.000 claims 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical group [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 2
- 125000000217 alkyl group Chemical group 0.000 claims 2
- 125000003118 aryl group Chemical group 0.000 claims 2
- 150000001875 compounds Chemical class 0.000 claims 2
- 238000000151 deposition Methods 0.000 claims 2
- 125000001165 hydrophobic group Chemical group 0.000 claims 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims 2
- 229910052710 silicon Inorganic materials 0.000 claims 2
- 239000010703 silicon Substances 0.000 claims 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims 2
- 229910010271 silicon carbide Inorganic materials 0.000 claims 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims 2
- 229910052814 silicon oxide Inorganic materials 0.000 claims 2
- 239000000126 substance Substances 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- 229910001928 zirconium oxide Inorganic materials 0.000 claims 2
- 229910052729 chemical element Inorganic materials 0.000 claims 1
- 125000003636 chemical group Chemical group 0.000 claims 1
- 229910052732 germanium Inorganic materials 0.000 claims 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
Applications Claiming Priority (15)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201562142854P | 2015-04-03 | 2015-04-03 | |
| US62/142,854 | 2015-04-03 | ||
| US201562190188P | 2015-07-08 | 2015-07-08 | |
| US62/190,188 | 2015-07-08 | ||
| US201562209024P | 2015-08-24 | 2015-08-24 | |
| US62/209,024 | 2015-08-24 | ||
| US201562216782P | 2015-09-10 | 2015-09-10 | |
| US62/216,782 | 2015-09-10 | ||
| US201562242883P | 2015-10-16 | 2015-10-16 | |
| US62/242,883 | 2015-10-16 | ||
| US201562265773P | 2015-12-10 | 2015-12-10 | |
| US62/265,773 | 2015-12-10 | ||
| US15/078,495 US10054717B2 (en) | 2015-04-03 | 2016-03-23 | Oxidation and moisture barrier layers for wire grid polarizer |
| US15/078,495 | 2016-03-23 | ||
| PCT/US2016/024713 WO2016160803A1 (en) | 2015-04-03 | 2016-03-29 | Oxidation and moisture barrier layers for wire grid polarizer |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020088222A Division JP7088497B2 (ja) | 2015-04-03 | 2020-05-20 | ワイヤグリッドポラライザ |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2018511816A JP2018511816A (ja) | 2018-04-26 |
| JP2018511816A5 true JP2018511816A5 (enExample) | 2018-09-06 |
| JP7059497B2 JP7059497B2 (ja) | 2022-04-26 |
Family
ID=57007562
Family Applications (4)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017538195A Active JP7059497B2 (ja) | 2015-04-03 | 2016-03-29 | ワイヤグリッドポラライザ用の酸化バリア層および吸湿バリア層 |
| JP2020088222A Active JP7088497B2 (ja) | 2015-04-03 | 2020-05-20 | ワイヤグリッドポラライザ |
| JP2022003989A Pending JP2022044664A (ja) | 2015-04-03 | 2022-01-13 | ワイヤグリッドポラライザ |
| JP2022089259A Pending JP2022107723A (ja) | 2015-04-03 | 2022-05-31 | 水溶性材料を使用したワイヤグリッドポラライザ |
Family Applications After (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020088222A Active JP7088497B2 (ja) | 2015-04-03 | 2020-05-20 | ワイヤグリッドポラライザ |
| JP2022003989A Pending JP2022044664A (ja) | 2015-04-03 | 2022-01-13 | ワイヤグリッドポラライザ |
| JP2022089259A Pending JP2022107723A (ja) | 2015-04-03 | 2022-05-31 | 水溶性材料を使用したワイヤグリッドポラライザ |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US10054717B2 (enExample) |
| EP (1) | EP3237943B1 (enExample) |
| JP (4) | JP7059497B2 (enExample) |
| KR (1) | KR20170134422A (enExample) |
| CN (2) | CN107533172B (enExample) |
| WO (1) | WO2016160803A1 (enExample) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102422109B1 (ko) * | 2015-01-08 | 2022-07-19 | 삼성디스플레이 주식회사 | 액정 표시 장치 및 이를 제조하는 방법 |
| US10534120B2 (en) | 2015-04-03 | 2020-01-14 | Moxtek, Inc. | Wire grid polarizer with protected wires |
| US9995864B2 (en) * | 2015-04-03 | 2018-06-12 | Moxtek, Inc. | Wire grid polarizer with silane protective coating |
| US10444410B2 (en) | 2016-08-16 | 2019-10-15 | Moxtek, Inc. | Overcoat wire grid polarizer having conformal coat layer with oxidation barrier and moisture barrier |
| JP2019536074A (ja) * | 2016-11-22 | 2019-12-12 | モックステック・インコーポレーテッド | オーバーコートワイヤグリッド偏光子 |
| CN107102394B (zh) * | 2017-07-03 | 2020-05-22 | 京东方科技集团股份有限公司 | 一种线栅偏振器、其制作方法及显示面板 |
| JP2019061125A (ja) * | 2017-09-27 | 2019-04-18 | デクセリアルズ株式会社 | 偏光板及びその製造方法、並びに光学機器 |
| JP6678630B2 (ja) * | 2017-09-28 | 2020-04-08 | デクセリアルズ株式会社 | 偏光板及びこれを備える光学機器 |
| US10852464B2 (en) * | 2018-03-01 | 2020-12-01 | Moxtek, Inc. | High-contrast polarizer |
| JP7333168B2 (ja) * | 2018-11-19 | 2023-08-24 | デクセリアルズ株式会社 | 偏光素子、偏光素子の製造方法及び光学機器 |
| US11746418B2 (en) * | 2018-12-03 | 2023-09-05 | Moxtek, Inc. | Chemical vapor deposition of thick inorganic coating on a polarizer |
| PH12020050239A1 (en) * | 2019-08-27 | 2021-05-17 | Moxtek Inc | Optical device with embedded organic moieties |
| WO2022170321A1 (en) * | 2021-02-03 | 2022-08-11 | Kester Julian Batchelor | Structured electrode for vapor pocket ignition |
| US20230236347A1 (en) * | 2022-01-26 | 2023-07-27 | Moxtek, Inc. | Reflective ultraviolet wire grid polarizer |
| TW202422131A (zh) * | 2022-11-22 | 2024-06-01 | 日商牛尾電機股份有限公司 | 反射型相位差構造體及其製造方法 |
Family Cites Families (65)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3630790A (en) | 1969-05-13 | 1971-12-28 | Dow Chemical Co | Method of protection of metal surfaces from corrosion |
| US5045347A (en) | 1986-11-07 | 1991-09-03 | Hoechst Aktiengesellschaft | Reclaimable polyester film having adhesion-promoting coating |
| US4705725A (en) | 1986-11-28 | 1987-11-10 | E. I. Du Pont De Nemours And Company | Substrates with sterically-protected, stable, covalently-bonded organo-silane films |
| US4759611A (en) | 1986-12-19 | 1988-07-26 | Polaroid Corporation, Patent Department | Liquid crystal display having silylated light polarizers |
| DE4313130C1 (de) | 1993-04-22 | 1994-05-26 | Goldschmidt Ag Th | Verfahren zur Herstellung von Silanen bzw. Organosiliciumhydriden durch Reduktion der entsprechenden Siliciumhalogenide bzw. Organosiliciumhalogenide |
| DE19539789A1 (de) * | 1995-10-26 | 1997-04-30 | Merck Patent Gmbh | Mittel und Verfahren zur Herstellung von wasserabweisenden Beschichtungen auf optischen Substraten |
| JP3520775B2 (ja) | 1998-09-08 | 2004-04-19 | ソニーケミカル株式会社 | 低接着性塗料 |
| US6447120B2 (en) | 1999-07-28 | 2002-09-10 | Moxtex | Image projection system with a polarizing beam splitter |
| US6585378B2 (en) | 2001-03-20 | 2003-07-01 | Eastman Kodak Company | Digital cinema projector |
| AU2003207855A1 (en) | 2002-02-05 | 2003-09-02 | Gencell Corporation | Silane coated metallic fuel cell components and methods of manufacture |
| ATE419550T1 (de) | 2002-02-12 | 2009-01-15 | Oc Oerlikon Balzers Ag | Optisches bauteil mit submikrometer-hohlräumen |
| US6785050B2 (en) | 2002-05-09 | 2004-08-31 | Moxtek, Inc. | Corrosion resistant wire-grid polarizer and method of fabrication |
| US7404878B2 (en) | 2003-03-31 | 2008-07-29 | Chlorine Engineers Corp., Ltd. | Gas diffusion electrode assembly, bonding method for gas diffusion electrodes, and electrolyzer comprising gas diffusion electrodes |
| US7189479B2 (en) * | 2003-08-21 | 2007-03-13 | 3M Innovative Properties Company | Phototool coating |
| US7961393B2 (en) | 2004-12-06 | 2011-06-14 | Moxtek, Inc. | Selectively absorptive wire-grid polarizer |
| JP5431724B2 (ja) | 2005-05-23 | 2014-03-05 | イノベーション ケミカル テクノロジーズ リミテッド | フッ素化有機ケイ素コーティング材料 |
| KR100720454B1 (ko) | 2005-06-14 | 2007-05-22 | 엘지.필립스 엘시디 주식회사 | 액정표시소자 및 그 제조방법 |
| US7345855B2 (en) * | 2005-09-07 | 2008-03-18 | International Business Machines Corporation | Tunnel barriers based on rare earth element oxides |
| KR101135381B1 (ko) | 2005-12-20 | 2012-04-17 | 엘지디스플레이 주식회사 | 평판 디스플레이 패널의 리페어 방법 |
| EP1970194B1 (en) * | 2006-01-06 | 2012-10-31 | Konica Minolta Holdings, Inc. | Moistureproof cellulose ester film, polarizer-protective film, and polarizer |
| US20070242352A1 (en) | 2006-04-13 | 2007-10-18 | Macmaster Steven William | Wire-grid polarizers, methods of fabrication thereof and their use in transmissive displays |
| US7854864B2 (en) | 2006-04-28 | 2010-12-21 | Konica Minolta Opto, Inc. | Method for manufacturing an optical film having a convexoconcave structure |
| US20080015298A1 (en) | 2006-07-17 | 2008-01-17 | Mingna Xiong | Superhydrophobic coating composition and coated articles obtained therefrom |
| US20080131709A1 (en) | 2006-09-28 | 2008-06-05 | Aculon Inc. | Composite structure with organophosphonate adherent layer and method of preparing |
| CN102324462B (zh) | 2006-10-12 | 2015-07-01 | 凯博瑞奥斯技术公司 | 基于纳米线的透明导体及其应用 |
| TWI439740B (zh) | 2006-11-17 | 2014-06-01 | Dainippon Printing Co Ltd | 光學薄膜、偏光板及影像顯示裝置 |
| KR101281164B1 (ko) | 2006-11-21 | 2013-07-02 | 삼성디스플레이 주식회사 | 와이어 그리드 편광자 및 이의 제조방법 |
| US20080245273A1 (en) | 2007-04-05 | 2008-10-09 | Jouko Vyorkka | Hydrophobic coatings |
| CN101334497B (zh) * | 2007-06-28 | 2015-11-25 | 第一毛织株式会社 | 偏振分光器件及其制造方法和设备以及包括其的显示器 |
| JP5219715B2 (ja) | 2007-09-28 | 2013-06-26 | 富士フイルム株式会社 | 磁性粉末用表面改質剤、それを含む磁性塗料、ならびに磁気記録媒体 |
| CN101399205A (zh) * | 2007-09-28 | 2009-04-01 | 力晶半导体股份有限公司 | 制作快闪存储器的方法 |
| JP5315681B2 (ja) | 2007-12-12 | 2013-10-16 | Ｔｄｋ株式会社 | ハードコート用組成物、ハードコート層を有する物体およびその製造方法 |
| US20090231702A1 (en) * | 2008-03-17 | 2009-09-17 | Qihong Wu | Optical films and methods of making the same |
| KR20110002004A (ko) | 2008-04-08 | 2011-01-06 | 아사히 가라스 가부시키가이샤 | 와이어 그리드형 편광자의 제조 방법 |
| WO2009148138A1 (ja) * | 2008-06-05 | 2009-12-10 | 旭硝子株式会社 | ナノインプリント用モールド、その製造方法および表面に微細凹凸構造を有する樹脂成形体ならびにワイヤグリッド型偏光子の製造方法 |
| CN102084275B (zh) * | 2008-07-10 | 2014-04-30 | 旭硝子株式会社 | 线栅型偏振器及其制造方法 |
| KR101383930B1 (ko) | 2008-12-24 | 2014-04-10 | 엘지디스플레이 주식회사 | 광 조사 장치 |
| US20110200826A1 (en) | 2009-07-23 | 2011-08-18 | E. I. Du Pont De Nemours And Company | Articles containing fluorinated hybrid compositions |
| US20110189382A1 (en) | 2009-07-23 | 2011-08-04 | E. I. Du Pont De Nemours And Company | Method of preparing fluorinated hybrid compositions |
| US20110186790A1 (en) | 2009-07-23 | 2011-08-04 | E. I. Du Pont De Nemours And Company | Fluorinated hybrid compositions |
| JP5735522B2 (ja) | 2009-10-27 | 2015-06-17 | シルコテック コーポレイション | 化学気相成長コーティング、物品、及び方法 |
| CN101819125B (zh) * | 2010-03-24 | 2012-05-23 | 江苏大学 | 一种光栅结构的稳定超疏水表面设计方法 |
| JP2011248284A (ja) | 2010-05-31 | 2011-12-08 | Sony Chemical & Information Device Corp | 偏光板及び偏光板の製造方法 |
| JP2012002972A (ja) * | 2010-06-16 | 2012-01-05 | Seiko Epson Corp | 偏光素子及びその製造方法、液晶装置、電子機器 |
| JP2012058397A (ja) * | 2010-09-07 | 2012-03-22 | Asahi Glass Co Ltd | ワイヤグリッド型偏光子、その製造方法および液晶表示装置 |
| JP5682437B2 (ja) * | 2010-09-07 | 2015-03-11 | ソニー株式会社 | 固体撮像素子、固体撮像装置、撮像機器、及び、偏光素子の製造方法 |
| US8611007B2 (en) * | 2010-09-21 | 2013-12-17 | Moxtek, Inc. | Fine pitch wire grid polarizer |
| US8913321B2 (en) | 2010-09-21 | 2014-12-16 | Moxtek, Inc. | Fine pitch grid polarizer |
| JP5244889B2 (ja) | 2010-10-28 | 2013-07-24 | 富士フイルム株式会社 | 立体画像印刷用印画紙、立体画像印刷物、及び立体画像の提供方法 |
| JP5760388B2 (ja) * | 2010-11-01 | 2015-08-12 | セイコーエプソン株式会社 | 偏光素子とその製造方法、プロジェクター、液晶装置、電子機器 |
| US20150077851A1 (en) | 2010-12-30 | 2015-03-19 | Moxtek, Inc. | Multi-layer absorptive wire grid polarizer |
| KR20140006840A (ko) * | 2011-02-22 | 2014-01-16 | 아사히 가라스 가부시키가이샤 | 미세 구조 성형체 및 그 미세 구조 성형체를 구비한 액정 표시 장치 |
| US20120219801A1 (en) | 2011-02-25 | 2012-08-30 | Yu-Hui Huang | Hydrophobic and lipophobic coating material |
| JP6051562B2 (ja) * | 2011-04-28 | 2016-12-27 | セントラル硝子株式会社 | 撥水性保護膜形成用薬液 |
| TWI611920B (zh) | 2012-01-27 | 2018-01-21 | 第一毛織股份有限公司 | 用於窗片之層合物、含有該層合物之窗片以及含有該層合物之顯示裝置 |
| CN104769049A (zh) | 2012-07-13 | 2015-07-08 | 哈佛学院 | 多功能抗性材料 |
| JP6100492B2 (ja) | 2012-09-05 | 2017-03-22 | デクセリアルズ株式会社 | 偏光素子、プロジェクター及び偏光素子の製造方法 |
| JP6268692B2 (ja) * | 2012-09-14 | 2018-01-31 | 大日本印刷株式会社 | 光学積層体、偏光板及び画像表示装置 |
| JP2014077972A (ja) * | 2012-09-18 | 2014-05-01 | Ricoh Co Ltd | 光学フィルタ及び該光学フィルタを備える撮像装置、並びに光学フィルタの製造方法 |
| JP2014085516A (ja) * | 2012-10-24 | 2014-05-12 | Asahi Kasei E-Materials Corp | ワイヤグリッド偏光板及びその製造方法 |
| JP2014209558A (ja) * | 2013-03-27 | 2014-11-06 | 東京エレクトロン株式会社 | シリコン酸化膜の形成方法、及び、シリコン酸化膜の形成装置 |
| US9666766B2 (en) | 2013-08-21 | 2017-05-30 | Pacific Light Technologies Corp. | Quantum dots having a nanocrystalline core, a nanocrystalline shell surrounding the core, and an insulator coating for the shell |
| KR20150029817A (ko) * | 2013-09-10 | 2015-03-19 | 삼성디스플레이 주식회사 | 편광판, 이를 갖는 표시장치 및 이의 제조방법 |
| US9995864B2 (en) * | 2015-04-03 | 2018-06-12 | Moxtek, Inc. | Wire grid polarizer with silane protective coating |
| US9703028B2 (en) * | 2015-04-03 | 2017-07-11 | Moxtek, Inc. | Wire grid polarizer with phosphonate protective coating |
-
2016
- 2016-03-23 US US15/078,495 patent/US10054717B2/en active Active
- 2016-03-29 EP EP16773995.2A patent/EP3237943B1/en active Active
- 2016-03-29 KR KR1020177027671A patent/KR20170134422A/ko not_active Ceased
- 2016-03-29 WO PCT/US2016/024713 patent/WO2016160803A1/en not_active Ceased
- 2016-03-29 JP JP2017538195A patent/JP7059497B2/ja active Active
- 2016-03-29 CN CN201680018879.XA patent/CN107533172B/zh active Active
- 2016-03-29 CN CN202010697586.7A patent/CN111766656A/zh active Pending
-
2020
- 2020-05-20 JP JP2020088222A patent/JP7088497B2/ja active Active
-
2022
- 2022-01-13 JP JP2022003989A patent/JP2022044664A/ja active Pending
- 2022-05-31 JP JP2022089259A patent/JP2022107723A/ja active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2018511816A5 (enExample) | ||
| KR102545804B1 (ko) | 식각용 조성물 및 이를 이용한 반도체 소자의 제조방법 | |
| JP7274025B2 (ja) | エッチング用組成物およびこれを用いた半導体素子の製造方法 | |
| JP2009099900A5 (enExample) | ||
| JP2017501591A5 (enExample) | ||
| JP2010205990A5 (enExample) | ||
| JP2008311627A5 (enExample) | ||
| JP2009152551A5 (enExample) | ||
| JP2007067412A5 (enExample) | ||
| KR20160010267A (ko) | 식각용 조성물 및 이를 이용한 반도체 소자의 제조방법 | |
| JP2016539085A5 (enExample) | ||
| JP2018517303A5 (enExample) | ||
| TW201604265A (zh) | 蝕刻用組合物 | |
| KR102629574B1 (ko) | 절연막 식각액 조성물 및 이를 이용한 패턴 형성 방법 | |
| JP2015026849A5 (enExample) | ||
| JP2014112681A5 (enExample) | ||
| JP2011511403A5 (enExample) | ||
| JP2012216452A5 (enExample) | ||
| JP2008288579A5 (enExample) | ||
| JP2012099598A5 (enExample) | ||
| JP2010523458A5 (enExample) | ||
| KR102812905B1 (ko) | 식각용 조성물 및 이를 이용한 반도체 소자의 제조방법 | |
| JP2009135472A5 (enExample) | ||
| JP2011033624A5 (enExample) | ||
| JP2018520510A5 (ja) | 多層構造体の製造方法 |