JP2018511816A - ワイヤグリッドポラライザ用の酸化バリア層および吸湿バリア層 - Google Patents
ワイヤグリッドポラライザ用の酸化バリア層および吸湿バリア層 Download PDFInfo
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- G—PHYSICS
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- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3058—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state comprising electrically conductive elements, e.g. wire grids, conductive particles
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- B05D1/60—Deposition of organic layers from vapour phase
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- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
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- B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
- B05D5/08—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain an anti-friction or anti-adhesive surface
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- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/08—Anti-corrosive paints
- C09D5/082—Anti-corrosive paints characterised by the anti-corrosive pigment
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/308—Oxynitrides
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/32—Carbides
- C23C16/325—Silicon carbide
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/34—Nitrides
- C23C16/345—Silicon nitride
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/403—Oxides of aluminium, magnesium or beryllium
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/405—Oxides of refractory metals or yttrium
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2350/00—Pretreatment of the substrate
- B05D2350/60—Adding a layer before coating
- B05D2350/63—Adding a layer before coating ceramic layer
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
- C23C16/45555—Atomic layer deposition [ALD] applied in non-semiconductor technology
Abstract
Description
Claims (10)
- 透明基板の表面上に位置し、延伸され、かつ、アレイ状に配置された複数のリブと、
前記複数のリブの少なくとも一部の間の複数のギャップと、
前記複数のリブ上に位置する共形コーティングであって、酸化アルミニウム、酸化ケイ素、窒化ケイ素、酸化窒化ケイ素、炭化ケイ素、酸化ハフニウム、酸化ジルコニウムおよびレアアース酸化物のうちの少なくとも1つを含むバリア層を有する共形コーティングと
を備えるワイヤグリッドポラライザ(WGP)。 - 前記バリア層は、前記複数のリブとは別個である、請求項1に記載のWGP。
- 前記複数のリブの外面の材料は、25℃で1リットル当たり少なくとも0.015グラムの水溶性を有する、請求項1または2に記載のWGP。
- 前記複数のリブの外面の材料は、ゲルマニウムを含む、請求項1から3のいずれか一項に記載のWGP。
- 前記バリア層は、酸化防止材および吸湿防止材を含む、異なる材料の2つの層を含み、
前記酸化防止材は、酸化アルミニウム、酸化ケイ素、窒化ケイ素、酸化窒化ケイ素、炭化ケイ素またはそれらの組み合わせを含み、
前記吸湿防止材は、酸化ハフニウム、酸化ジルコニウムまたはそれらの組み合わせを含み、かつ
前記酸化防止材は、前記吸湿防止材と前記複数のリブとの間に位置する、
請求項1から4のいずれか一項に記載のWGP。 - 前記酸化防止材は、5ナノメートル未満の厚さを有し、前記吸湿防止材は、5ナノメートル未満の厚さを有する、請求項5に記載のWGP。
- 透明基板の表面上に位置する複数のリブであって、前記複数のリブの少なくとも一部の間の複数のギャップと共に延伸された複数のリブのアレイを得る工程と、
前記複数のリブ上に共形コーティングのバリア層を蒸着により付着させる工程であって、前記バリア層は、酸化アルミニウム、酸化ケイ素、窒化ケイ素、酸化窒化ケイ素、炭化ケイ素、酸化ハフニウムおよび酸化ジルコニウムのうちの少なくとも1つを含む、付着させる工程と
を備える、ワイヤグリッドポラライザ(WGP)を製造する方法。 - 前記バリア層を付着させた後に前記共形コーティングの疎水層を蒸着により付着させる工程であって、前記疎水層を付着させる工程は、下記化学式
(R1)iPO(R4)j(R5)k
(式中、
iは1または2、jは1または2、kは0または1、かつ、i+j+k=3であり、
各R1は、独立して疎水基であり、
R4は、ホスホネート反応基であり、
各ホスホネート反応基は、独立して‐Cl、‐OR6、‐OCOR6または‐OHであり、かつ
各R6は、独立してアルキル基、アリール基またはあそれらの組み合わせである。)
を有する化合物に前記WGPを曝露する工程を含む付着させる工程をさらに備える、請求項7に記載の方法。 - 前記バリア層を付着させた後に前記共形コーティングの疎水層を蒸着により付着させる工程であって、前記疎水層を付着させる工程は、下記化学式
Si(R1)d(R2)e(R3)g
(式中、
dは1、2または3、eは1、2または3、gは0、1または2、かつ、d+e+g=4であり、
各R1は、独立して疎水基であり、
R2は、シラン反応基であり、
各シラン反応基は、独立して‐Cl、‐OR6、‐OCOR6、‐N(R6)2または‐OHであり、
各R6は、独立してアルキル基、アリール基またはそれらの組み合わせであり、かつ
各R3は、独立して任意の化学元素または化学基である。)
を有する化合物に前記WGPを曝露する工程を含む付着させる工程をさらに備える、請求項7または8に記載の方法。 - 前記バリア層を付着させる工程は、酸化防止材を付着させ、次に、吸湿防止材を付着させる工程を有し、
前記酸化防止材は、酸化アルミニウム、酸化ケイ素、窒化ケイ素、酸化窒化ケイ素、炭化ケイ素またはそれらの組み合わせを含み、かつ
前記吸湿防止材は、酸化ハフニウム、酸化ジルコニウムまたはそれらの組み合わせを含む、
請求項7から9のいずれか一項に記載の方法。
Applications Claiming Priority (15)
Application Number | Priority Date | Filing Date | Title |
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US201562142854P | 2015-04-03 | 2015-04-03 | |
US62/142,854 | 2015-04-03 | ||
US201562190188P | 2015-07-08 | 2015-07-08 | |
US62/190,188 | 2015-07-08 | ||
US201562209024P | 2015-08-24 | 2015-08-24 | |
US62/209,024 | 2015-08-24 | ||
US201562216782P | 2015-09-10 | 2015-09-10 | |
US62/216,782 | 2015-09-10 | ||
US201562242883P | 2015-10-16 | 2015-10-16 | |
US62/242,883 | 2015-10-16 | ||
US201562265773P | 2015-12-10 | 2015-12-10 | |
US62/265,773 | 2015-12-10 | ||
US15/078,495 | 2016-03-23 | ||
US15/078,495 US10054717B2 (en) | 2015-04-03 | 2016-03-23 | Oxidation and moisture barrier layers for wire grid polarizer |
PCT/US2016/024713 WO2016160803A1 (en) | 2015-04-03 | 2016-03-29 | Oxidation and moisture barrier layers for wire grid polarizer |
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JP2020088222A Division JP7088497B2 (ja) | 2015-04-03 | 2020-05-20 | ワイヤグリッドポラライザ |
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JP2018511816A5 JP2018511816A5 (ja) | 2018-09-06 |
JP7059497B2 JP7059497B2 (ja) | 2022-04-26 |
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JP2017538195A Active JP7059497B2 (ja) | 2015-04-03 | 2016-03-29 | ワイヤグリッドポラライザ用の酸化バリア層および吸湿バリア層 |
JP2020088222A Active JP7088497B2 (ja) | 2015-04-03 | 2020-05-20 | ワイヤグリッドポラライザ |
JP2022003989A Pending JP2022044664A (ja) | 2015-04-03 | 2022-01-13 | ワイヤグリッドポラライザ |
JP2022089259A Pending JP2022107723A (ja) | 2015-04-03 | 2022-05-31 | 水溶性材料を使用したワイヤグリッドポラライザ |
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JP2020088222A Active JP7088497B2 (ja) | 2015-04-03 | 2020-05-20 | ワイヤグリッドポラライザ |
JP2022003989A Pending JP2022044664A (ja) | 2015-04-03 | 2022-01-13 | ワイヤグリッドポラライザ |
JP2022089259A Pending JP2022107723A (ja) | 2015-04-03 | 2022-05-31 | 水溶性材料を使用したワイヤグリッドポラライザ |
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US (1) | US10054717B2 (ja) |
EP (1) | EP3237943B1 (ja) |
JP (4) | JP7059497B2 (ja) |
KR (1) | KR20170134422A (ja) |
CN (2) | CN111766656A (ja) |
WO (1) | WO2016160803A1 (ja) |
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US20160291227A1 (en) * | 2015-04-03 | 2016-10-06 | Moxtek, Inc. | Wire Grid Polarizer with Water-Soluble Materials |
US10444410B2 (en) | 2016-08-16 | 2019-10-15 | Moxtek, Inc. | Overcoat wire grid polarizer having conformal coat layer with oxidation barrier and moisture barrier |
CN109804281A (zh) * | 2016-11-22 | 2019-05-24 | 莫克斯泰克公司 | 外涂线栅偏振器 |
CN107102394B (zh) * | 2017-07-03 | 2020-05-22 | 京东方科技集团股份有限公司 | 一种线栅偏振器、其制作方法及显示面板 |
JP2019061125A (ja) * | 2017-09-27 | 2019-04-18 | デクセリアルズ株式会社 | 偏光板及びその製造方法、並びに光学機器 |
JP6678630B2 (ja) * | 2017-09-28 | 2020-04-08 | デクセリアルズ株式会社 | 偏光板及びこれを備える光学機器 |
US10852464B2 (en) * | 2018-03-01 | 2020-12-01 | Moxtek, Inc. | High-contrast polarizer |
US11746418B2 (en) * | 2018-12-03 | 2023-09-05 | Moxtek, Inc. | Chemical vapor deposition of thick inorganic coating on a polarizer |
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JP7059497B2 (ja) | 2022-04-26 |
EP3237943B1 (en) | 2021-01-13 |
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