JP2018180416A - 半導体デバイスの製造方法および半導体デバイス - Google Patents
半導体デバイスの製造方法および半導体デバイス Download PDFInfo
- Publication number
- JP2018180416A JP2018180416A JP2017083039A JP2017083039A JP2018180416A JP 2018180416 A JP2018180416 A JP 2018180416A JP 2017083039 A JP2017083039 A JP 2017083039A JP 2017083039 A JP2017083039 A JP 2017083039A JP 2018180416 A JP2018180416 A JP 2018180416A
- Authority
- JP
- Japan
- Prior art keywords
- region
- groove
- exposure
- semiconductor device
- hole
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 43
- 238000000034 method Methods 0.000 title claims abstract description 38
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 24
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 27
- 239000000758 substrate Substances 0.000 claims abstract description 12
- 239000004020 conductor Substances 0.000 claims abstract description 9
- 238000003384 imaging method Methods 0.000 claims description 11
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 5
- 229910052802 copper Inorganic materials 0.000 claims description 5
- 239000010949 copper Substances 0.000 claims description 5
- 238000004891 communication Methods 0.000 claims description 3
- 239000012212 insulator Substances 0.000 claims description 3
- 238000005498 polishing Methods 0.000 claims description 2
- 238000005516 engineering process Methods 0.000 abstract description 2
- 238000009413 insulation Methods 0.000 abstract 4
- 239000010410 layer Substances 0.000 description 10
- 239000011229 interlayer Substances 0.000 description 4
- 238000000059 patterning Methods 0.000 description 4
- 230000009977 dual effect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 2
- 230000003667 anti-reflective effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
- H01L21/76802—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics
- H01L21/76807—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics for dual damascene structures
- H01L21/76808—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics for dual damascene structures involving intermediate temporary filling with material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
- H01L21/76802—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics
- H01L21/76816—Aspects relating to the layout of the pattern or to the size of vias or trenches
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/528—Geometry or layout of the interconnection structure
- H01L23/5283—Cross-sectional geometry
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/124—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
- H01L21/0276—Photolithographic processes using an anti-reflective coating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14603—Special geometry or disposition of pixel-elements, address-lines or gate-electrodes
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Geometry (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Abstract
Description
図1〜7を参照して、本発明の実施形態による半導体デバイスの構成およびその製造方法について説明する。図1は、本発明の第1の実施形態における半導体デバイスのデバイス領域DRの配置を概念的に示す平面図である。1つのデバイス領域DRは、1つの半導体チップとなる領域でありうる。本実施形態において、デバイス領域DRは、デバイス領域DRを複数の領域に分割し、それぞれ個別に露光する分割露光によって形成される。具体的には、デバイス領域DRは、領域SLと領域SRとの2つの領域とに分けて露光される。本実施形態では、デバイス領域DRは、2つの領域SL、SRに分けて露光が行われるが、3つ以上の領域に分けて分割露光が行われてもよい。
図8〜10を参照して、本発明の実施形態による半導体デバイスの構成およびその製造方法について説明する。図8は、本発明の第2の実施形態における半導体デバイスのデバイス領域DRの配置を概念的に示す平面図である。1つのデバイス領域DRは、1つの半導体チップとなる領域でありうる。本実施形態においても、上述の第1の実施形態と同様に、デバイス領域DRは、領域SLと領域SRとの2つの領域とに分けて露光される。一方、図8に示されるように、デバイス領域DRを分割露光する領域SLと領域SRとは、第1の実施形態と異なり重複する領域を含まない。図8において、デバイス領域DRの左端からB−B’線までが、1つのフォトマスクを用いて露光される領域SL、C−C’線からデバイス領域DRの右端までが、1つのフォトマスクを用いて露光される領域SRである。
Claims (13)
- 半導体デバイスの製造方法であって、
基板の上に絶縁膜を配する工程と、
前記絶縁膜に孔を形成する工程と、
前記絶縁膜の上に配されたフォトレジストの第1の部分を露光する第1の露光工程と、
第1の露光工程の後、前記フォトレジストの第2の部分を露光する第2の露光工程と、
前記第1の露光工程および前記第2の露光工程の後、前記フォトレジストを現像することによって形成されたレジストパターンをマスクとして用いて前記絶縁膜をエッチングすることによって、前記絶縁膜に溝を形成する工程と、
前記孔および前記溝に導電体を埋め込む工程と、含み、
前記溝は、前記レジストパターンのうち前記第1の部分の前記露光によって形成された第1のパターンに対応した第1の溝と、前記レジストパターンのうち前記第2の部分の前記露光によって形成された第2のパターンに対応した第2の溝と、を含み、
前記埋め込む工程において、前記第1の溝および前記第2の溝のそれぞれは前記孔に連通しており、前記孔が前記第1の溝および前記第2の溝よりも深いことを特徴とする製造方法。 - 前記レジストパターンにおいて、前記第1の溝を形成するための開口部と前記第2の溝を形成するための開口部とが、連続して開口していることを特徴とする請求項1に記載の製造方法。
- 前記レジストパターンにおいて、前記第1の溝を形成するための開口部と前記第2の溝を形成するための開口部とが、それぞれ離間していることを特徴とする請求項1に記載の製造方法。
- 前記製造方法は、前記埋め込む工程の後、前記導電体に研磨処理を施す工程をさらに含むことを特徴とする請求項1乃至3の何れか1項に記載の製造方法。
- 前記孔を形成する工程の後、前記第1の露光工程を行うことを特徴とする請求項1乃至4の何れか1項に記載の製造方法。
- 前記第1の溝が延在する方向および前記第2の溝が延在する方向に交差する方向における前記孔の幅が、前記第1の溝の幅と前記第2の溝の幅の和よりも小さいことを特徴とする請求項1乃至5の何れか1項に記載の製造方法。
- 前記埋め込む工程において、前記孔の底が絶縁体で構成されていることを特徴とする請求項1乃至6の何れか1項に記載の製造方法。
- 前記導電体が、銅を含むことを特徴とする請求項1乃至7の何れか1項に記載の製造方法。
- 前記半導体デバイスが、撮像デバイスまたは表示デバイスであることを特徴とする請求項1乃至8の何れか1項に記載の製造方法。
- 前記半導体デバイスは、前記第1の露光工程によって露光される領域および前記第2の露光工程によって露光される領域にわたって、複数の画素が配置された画素領域を有し、
前記画素領域の大きさが、33mm×22mm以上であることを特徴とする請求項1乃至9の何れか1項に記載の製造方法。 - 互いに隣接する第1の領域および第2の領域を含むデバイス領域を備える半導体デバイスであって、
前記半導体デバイスは、基板の上の絶縁膜に埋め込まれ、前記第1の領域および前記第2の領域にまたがって第1の方向に沿って延在する配線パターンを有し、
前記配線パターンは、前記第1の領域と前記第2の領域とにまたがる境界部に配された第1の部分と、前記境界部から前記第1の領域の側に延在し、一部が前記第1の部分の上に配される第2の部分と、前記境界部から前記第2の領域の側に延在し、一部が前記第1の部分の上に配される第3の部分と、を含み、
前記デバイス領域に対する正射影において、前記第2の部分のうち前記第1の方向に沿った外縁の一部と、前記第3の部分のうち前記第1の方向に沿った外縁の一部と、のうち少なくとも一方が、前記第1の部分と重なるように配されていることを特徴とする半導体デバイス。 - 前記半導体デバイスが、撮像デバイスまたは表示デバイスであることを特徴とする請求項11に記載の半導体デバイス。
- 前記半導体デバイスは、前記第1の領域および前記第2の領域にわたって、複数の画素が配置された画素領域を有し、
前記画素領域の大きさが、33mm×22mm以上であることを特徴とする請求項11または12に記載の半導体デバイス。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017083039A JP6982976B2 (ja) | 2017-04-19 | 2017-04-19 | 半導体デバイスの製造方法および半導体デバイス |
US15/945,120 US10332783B2 (en) | 2017-04-19 | 2018-04-04 | Method of manufacturing semiconductor device, and semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017083039A JP6982976B2 (ja) | 2017-04-19 | 2017-04-19 | 半導体デバイスの製造方法および半導体デバイス |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2018180416A true JP2018180416A (ja) | 2018-11-15 |
JP2018180416A5 JP2018180416A5 (ja) | 2020-07-02 |
JP6982976B2 JP6982976B2 (ja) | 2021-12-17 |
Family
ID=63852799
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017083039A Active JP6982976B2 (ja) | 2017-04-19 | 2017-04-19 | 半導体デバイスの製造方法および半導体デバイス |
Country Status (2)
Country | Link |
---|---|
US (1) | US10332783B2 (ja) |
JP (1) | JP6982976B2 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20210265411A1 (en) * | 2020-02-21 | 2021-08-26 | Canon Kabushiki Kaisha | Semiconductor device and method for manufacturing semiconductor device |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006128543A (ja) * | 2004-11-01 | 2006-05-18 | Nec Electronics Corp | 電子デバイスの製造方法 |
JP2006148003A (ja) * | 2004-11-24 | 2006-06-08 | Toshiba Corp | 半導体装置の製造方法及び半導体装置 |
JP2010098095A (ja) * | 2008-10-16 | 2010-04-30 | Sony Corp | 半導体装置及び半導体装置の製造方法 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05136020A (ja) | 1991-11-11 | 1993-06-01 | Fujitsu Ltd | 半導体装置の露光方法 |
US6033977A (en) | 1997-06-30 | 2000-03-07 | Siemens Aktiengesellschaft | Dual damascene structure |
TW457635B (en) | 2000-04-21 | 2001-10-01 | Ind Tech Res Inst | Manufacturing process of copper structure |
JP2007103723A (ja) | 2005-10-05 | 2007-04-19 | Renesas Technology Corp | 半導体装置およびその製造方法 |
JP4699172B2 (ja) * | 2005-10-25 | 2011-06-08 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
JP5008929B2 (ja) | 2006-09-11 | 2012-08-22 | ソニーモバイルディスプレイ株式会社 | 液晶装置の製造方法 |
JP2010141093A (ja) | 2008-12-11 | 2010-06-24 | Sony Corp | 半導体装置とその製造方法 |
JP2010165737A (ja) | 2009-01-13 | 2010-07-29 | Renesas Electronics Corp | 半導体装置及び半導体装置の製造方法 |
JP2010165760A (ja) | 2009-01-14 | 2010-07-29 | Toshiba Corp | 半導体装置及び半導体装置の製造方法 |
JP6240443B2 (ja) | 2012-09-17 | 2017-11-29 | シチズンファインデバイス株式会社 | 液晶表示装置 |
JP2014102292A (ja) | 2012-11-16 | 2014-06-05 | Canon Inc | フォトマスク、分割露光方法、および半導体デバイスの製造方法 |
JP6117246B2 (ja) | 2013-01-11 | 2017-04-19 | ルネサスエレクトロニクス株式会社 | 半導体装置およびその製造方法 |
US20170256506A1 (en) | 2013-01-11 | 2017-09-07 | Renesas Electronics Corporation | Semiconductor device |
JP5855695B2 (ja) | 2014-03-24 | 2016-02-09 | ルネサスエレクトロニクス株式会社 | 固体撮像素子の製造方法及び固体撮像素子 |
JP2016192467A (ja) | 2015-03-31 | 2016-11-10 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
-
2017
- 2017-04-19 JP JP2017083039A patent/JP6982976B2/ja active Active
-
2018
- 2018-04-04 US US15/945,120 patent/US10332783B2/en active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006128543A (ja) * | 2004-11-01 | 2006-05-18 | Nec Electronics Corp | 電子デバイスの製造方法 |
JP2006148003A (ja) * | 2004-11-24 | 2006-06-08 | Toshiba Corp | 半導体装置の製造方法及び半導体装置 |
JP2010098095A (ja) * | 2008-10-16 | 2010-04-30 | Sony Corp | 半導体装置及び半導体装置の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
US10332783B2 (en) | 2019-06-25 |
JP6982976B2 (ja) | 2021-12-17 |
US20180308747A1 (en) | 2018-10-25 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US8759224B2 (en) | Method of forming a pattern structure for a semiconductor device | |
JP5513872B2 (ja) | 固体撮像装置 | |
US8966410B2 (en) | Semiconductor structure and method for fabricating semiconductor layout | |
US9437541B2 (en) | Patterning approach to reduce via to via minimum spacing | |
KR102572514B1 (ko) | 반도체 소자 및 이의 제조 방법 | |
TWI552270B (zh) | 半導體裝置及其製造方法 | |
US9188883B2 (en) | Alignment mark | |
US8278770B2 (en) | Overlay mark | |
KR102377568B1 (ko) | 패드부 및 라인부를 가진 미세 패턴을 형성하는 방법 | |
KR100901054B1 (ko) | 반도체 소자 및 반도체 소자의 제조 방법 | |
JP4921884B2 (ja) | 半導体記憶装置 | |
JP6982976B2 (ja) | 半導体デバイスの製造方法および半導体デバイス | |
US9165884B2 (en) | Method for fabricating a semiconductor device with formation of conductive lines | |
KR20100030125A (ko) | 포토키 및 이를 이용한 반도체 소자의 제조방법 | |
US20170256506A1 (en) | Semiconductor device | |
US20170162434A1 (en) | Wiring structure and method of forming a wiring structure | |
KR101203270B1 (ko) | 반도체 소자 | |
JP2010098095A (ja) | 半導体装置及び半導体装置の製造方法 | |
US10290543B1 (en) | Method for manufacturing semiconductor device | |
KR101045371B1 (ko) | 이중 패터닝을 이용한 미세 패턴 형성 방법 | |
JP2001298081A (ja) | 半導体装置及びその製造方法 | |
JP2007103723A (ja) | 半導体装置およびその製造方法 | |
US20230298997A1 (en) | Routing pattern | |
CN109920761B (zh) | 半导体元件的制作方法 | |
CN110349909B (zh) | 半导体器件及其形成方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20200403 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20200430 |
|
RD01 | Notification of change of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7421 Effective date: 20210103 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20210113 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20210319 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20210402 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20210527 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20211025 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20211122 |
|
R151 | Written notification of patent or utility model registration |
Ref document number: 6982976 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R151 |