JP2017510708A - 大型基板の横型湿式化学処理用装置の処理モジュール - Google Patents
大型基板の横型湿式化学処理用装置の処理モジュール Download PDFInfo
- Publication number
- JP2017510708A JP2017510708A JP2016554872A JP2016554872A JP2017510708A JP 2017510708 A JP2017510708 A JP 2017510708A JP 2016554872 A JP2016554872 A JP 2016554872A JP 2016554872 A JP2016554872 A JP 2016554872A JP 2017510708 A JP2017510708 A JP 2017510708A
- Authority
- JP
- Japan
- Prior art keywords
- processing module
- liquid
- processing
- transport
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/6776—Continuous loading and unloading into and out of a processing chamber, e.g. transporting belts within processing chambers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
- B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
- B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
- B65G49/063—Transporting devices for sheet glass
- B65G49/064—Transporting devices for sheet glass in a horizontal position
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1619—Apparatus for electroless plating
- C23C18/1632—Features specific for the apparatus, e.g. layout of cells and of its equipment, multiple cells
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/38—Coating with copper
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67075—Apparatus for fluid treatment for etching for wet etching
- H01L21/6708—Apparatus for fluid treatment for etching for wet etching using mainly spraying means, e.g. nozzles
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67706—Mechanical details, e.g. roller, belt
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67709—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations using magnetic elements
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G2201/00—Indexing codes relating to handling devices, e.g. conveyors, characterised by the type of product or load being conveyed or handled
- B65G2201/02—Articles
- B65G2201/0214—Articles of special size, shape or weigh
- B65G2201/022—Flat
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1603—Process or apparatus coating on selected surface areas
- C23C18/1607—Process or apparatus coating on selected surface areas by direct patterning
- C23C18/1608—Process or apparatus coating on selected surface areas by direct patterning from pretreatment step, i.e. selective pre-treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1646—Characteristics of the product obtained
- C23C18/165—Multilayered product
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/1851—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material
- C23C18/1872—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material by chemical pretreatment
- C23C18/1886—Multistep pretreatment
- C23C18/1889—Multistep pretreatment with use of metal first
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemically Coating (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Weting (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
Description
i)少なくとも1つの前処理モジュールと、少なくとも1つの本発明に係る処理モジュールと、少なくとも1つの後処理モジュールと、を備える横型装置を提供するステップ
ii)本発明の処理モジュールの搬送エレメントおよび液体堰を、搬送エレメントと液体堰との正確な水平方向の整列を保証するために、調節装置によって調節するステップ
iii)大型基板、好適にはガラス基板を提供するステップ
iv)前処理、処理および後処理を行うために大型基板を横型装置のモジュールを通して搬送するステップ。
2 ハウジング
3 ハウジングカバーの中央領域
4 ハウジングカバー
5 ハウジングカバーの側部領域
6 ハウジングカバーの窓
7 ガス排出開口
8 搬送エレメント
9 軸受リテーナ条片
10 ガスノズル
11 第1の液体ノズル
12 第2の液体ノズル
13 液体堰
14 ガスノズルのガス供給部
15 第1の液体ノズルの液体供給部
16 第2の液体ノズルの液体供給部
17 大型基板の搬送面
18 処理液出口エレメント
19 第1の調節エレメント
20 第2の調節エレメント
21 ガス供給エレメントの液体供給部
22 ガス供給エレメント
Claims (15)
- 大型基板、特にガラス基板の横型湿式化学処理用装置の処理モジュール(1)であって、
ハウジングカバー(4)を有するハウジング(2)と、
前記大型基板の水平方向の処理のための複数の搬送エレメント(8)を有する搬送装置であって、前記処理モジュール(1)は、該処理モジュール(1)の入口において前記大型基板の搬送面(17)の上方に配置された少なくとも1つの第1の液体ノズル(11)および少なくとも1つのガスノズル(10)と、前記処理モジュール(1)の内部に処理液を蓄積するために前記処理モジュール(1)の出口において前記大型基板の搬送面(17)の上方に配置された少なくとも1つの別の第1の液体ノズル(11)および少なくとも1つの別のガスノズル(10)と、をさらに有し、各ガスノズル(10)は、それぞれの第1の液体ノズル(11)よりも外側に配置されている、搬送装置と、
前記大型基板の前記搬送面(17)の下方において各第1の液体ノズル(11)の下方に配置された少なくとも1つの液体堰(13)と、を備える処理モジュール(1)において、
当該処理モジュール(1)の前記搬送装置および前記液体堰(13)を調節する少なくとも1つの調節装置をさらに備えることを特徴とする、処理モジュール(1)。 - 前記搬送装置の各搬送エレメント(8)のそれぞれの外側端部を収容するための複数の軸受、好適には玉軸受を有する、2つの軸受リテーナ条片(9)、好適には玉軸受条片をさらに備える、請求項1記載の処理モジュール。
- 前記第1の液体ノズル(11)の間で前記大型基板の前記搬送面(17)の上方に配置された少なくとも1つの第2の液体ノズル(12)をさらに備える、請求項1または2記載の処理モジュール。
- 前記液体堰(13)は、それぞれの第1の液体ノズル(11)の下方において前記搬送システムの2つの隣接する搬送エレメント(8)の間に配置されている、請求項1から3までのいずれか1項記載の処理モジュール。
- 前記大型基板の前記搬送面(17)の下方に配置された、ガス、好適には圧縮空気デリバリエレメント(22)を備え、前記ガス供給エレメント(22)は、前記処理モジュールの各ガスノズル(10)の下方に配置されている、請求項1から4までのいずれか1項記載の処理モジュール。
- 前記搬送装置の前記搬送エレメント(8)のそれぞれの外側端部を収容するための複数の軸受、好適には玉軸受を有する、少なくとも1つの第3の軸受リテーナ条片(9)、好適には玉軸受条片をさらに備え、前記少なくとも1つの第3の軸受リテーナ条片(9)は2つの軸受リテーナ条片(9)の間に平行に配置されている、請求項1から5までのいずれか1項記載の処理モジュール。
- 前記調節装置は、少なくとも1つの第1の調節エレメント(19)と、少なくとも1つの第2の調節エレメント(20)とを有し、前記第1の調節エレメント(19)は、前記液体堰(13)と前記軸受リテーナ条片(9)との水平方向の整列を調節することができるように、複数の第2の調節エレメント(20)によってそれぞれの液体堰(13)または前記軸受リテーナ条片(9)に接続されている、請求項1から6までのいずれか1項記載の処理モジュール。
- 前記調節装置は、実質的に処理液を有さない別個の領域内において前記処理モジュール(1)の前記ハウジング(2)の底部の下方に配置されている、請求項1から7までのいずれか1項記載の処理モジュール。
- 前記第1の調節エレメント(19)はバーまたは条片であり、該バーまたは条片は、前記処理モジュール用の下部構造としてのラケットを共同で形成しており、前記第2の調節エレメント(20)は、ボルト、ピンまたはねじであり、両調節エレメント(19,20)は好適には金属から形成されている、請求項7記載の処理モジュール。
- 当該処理モジュール(1)の別個の処理液循環システムの一部である少なくとも1つの処理液出口エレメント(18)をさらに備える、請求項1から9までのいずれか1項記載の処理モジュール。
- 前記ハウジングカバー(4)は、中央領域(3)と、2つの側部領域(5)とを有し、前記中央領域(3)は、前記搬送領域に対して平行に整列させられておりかつ少なくとも1つのガス排出開口(7)を有し、両側部領域(5)は、前記ハウジングカバー(4)の前記中央領域(3)から前記ハウジング(2)へ一定して下方へ延びている、請求項1から10までのいずれか1項記載の処理モジュール。
- 複数のモジュールを有する横型装置おいて大型基板を処理する方法であって、
i)少なくとも1つの前処理モジュールと、請求項1から11までのいずれか1項記載の少なくとも1つの処理モジュールと、少なくとも1つの後処理モジュールと、を備える横型装置を提供するステップと、
ii)請求項1から11までのいずれか1項記載の各処理モジュール(1)の搬送エレメント(8)と液体堰(13)とを、前記搬送エレメントと前記液体堰との正確な水平方向整列を保証するために調節装置によって調節するステップと、
iii)大型基板、好適にはガラス基板を提供するステップと、
iv)前処理、処理および後処理を行うために前記大型基板を横型装置のモジュールを通して搬送するステップと、
を含むことを特徴とする方法。 - 請求項1から11までのいずれか1項記載の処理モジュール(1)における方法ステップiv)の間の大型基板の処理は、金属、好適には銅を前記大型基板の表面に析出させる無電解湿式化学処理である、請求項12記載の方法。
- 前記無電解湿式化学処理は、前記大型基板を処理液に浸漬させることによって行われる、請求項13記載の方法。
- 大型ガラス基板、特にフラットパネルディスプレイ上の金属、特に銅の析出のための、請求項1から11までのいずれか1項記載の処理モジュールの使用。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP14199222.2A EP3035375B1 (en) | 2014-12-19 | 2014-12-19 | Treating module of an apparatus for horizontal wet-chemical treatment of large-scale substrates |
EP14199222.2 | 2014-12-19 | ||
PCT/EP2015/075285 WO2016096227A1 (en) | 2014-12-19 | 2015-10-30 | Treating module of an apparatus for horizontal wet-chemical treatment of large-scale substrates |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2017510708A true JP2017510708A (ja) | 2017-04-13 |
JP6195998B2 JP6195998B2 (ja) | 2017-09-13 |
Family
ID=52278393
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016554872A Active JP6195998B2 (ja) | 2014-12-19 | 2015-10-30 | 大型基板の横型湿式化学処理用装置の処理モジュール |
Country Status (6)
Country | Link |
---|---|
EP (1) | EP3035375B1 (ja) |
JP (1) | JP6195998B2 (ja) |
KR (1) | KR101740208B1 (ja) |
CN (1) | CN106030777B (ja) |
TW (1) | TWI598309B (ja) |
WO (1) | WO2016096227A1 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6762184B2 (ja) * | 2016-09-26 | 2020-09-30 | 株式会社Screenホールディングス | 回収配管洗浄方法および基板処理装置 |
JP6700605B2 (ja) * | 2016-11-16 | 2020-05-27 | 日本電気硝子株式会社 | ガラス基板の製造方法 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010199150A (ja) * | 2009-02-23 | 2010-09-09 | Tokyo Electron Ltd | 基板処理装置及び基板処理方法 |
JP2011154380A (ja) * | 2003-03-20 | 2011-08-11 | Toshiba Mobile Display Co Ltd | 表示装置の形成方法 |
JP5133428B2 (ja) * | 2009-02-02 | 2013-01-30 | シャープ株式会社 | 基板処理装置 |
JP2014519209A (ja) * | 2011-06-03 | 2014-08-07 | ティーイーエル ネックス,インコーポレイテッド | 基板枚葉式並列処理システム |
JP2014528517A (ja) * | 2011-10-05 | 2014-10-27 | アトーテヒ ドイッチュラント ゲゼルシャフト ミット ベシュレンクテル ハフツング | ホルムアルデヒドのない無電解銅めっき溶液 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000062951A (ja) * | 1998-08-19 | 2000-02-29 | Daiichi Shisetsu Kogyo Kk | 搬送装置 |
JP2004073743A (ja) * | 2002-08-22 | 2004-03-11 | Shinko Seisakusho Co Ltd | パチンコ玉揚上装置 |
JP2010103383A (ja) * | 2008-10-27 | 2010-05-06 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
DE102011109568A1 (de) * | 2011-08-05 | 2013-02-07 | Rena Gmbh | Abluftsystem und Verfahren dazu |
-
2014
- 2014-12-19 EP EP14199222.2A patent/EP3035375B1/en active Active
-
2015
- 2015-10-30 JP JP2016554872A patent/JP6195998B2/ja active Active
- 2015-10-30 WO PCT/EP2015/075285 patent/WO2016096227A1/en active Application Filing
- 2015-10-30 CN CN201580008807.2A patent/CN106030777B/zh active Active
- 2015-10-30 KR KR1020167025085A patent/KR101740208B1/ko active IP Right Grant
- 2015-11-24 TW TW104138998A patent/TWI598309B/zh active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011154380A (ja) * | 2003-03-20 | 2011-08-11 | Toshiba Mobile Display Co Ltd | 表示装置の形成方法 |
JP5133428B2 (ja) * | 2009-02-02 | 2013-01-30 | シャープ株式会社 | 基板処理装置 |
JP2010199150A (ja) * | 2009-02-23 | 2010-09-09 | Tokyo Electron Ltd | 基板処理装置及び基板処理方法 |
JP2014519209A (ja) * | 2011-06-03 | 2014-08-07 | ティーイーエル ネックス,インコーポレイテッド | 基板枚葉式並列処理システム |
JP2014528517A (ja) * | 2011-10-05 | 2014-10-27 | アトーテヒ ドイッチュラント ゲゼルシャフト ミット ベシュレンクテル ハフツング | ホルムアルデヒドのない無電解銅めっき溶液 |
Also Published As
Publication number | Publication date |
---|---|
CN106030777A (zh) | 2016-10-12 |
JP6195998B2 (ja) | 2017-09-13 |
EP3035375A1 (en) | 2016-06-22 |
KR20160113303A (ko) | 2016-09-28 |
KR101740208B1 (ko) | 2017-05-25 |
TW201630845A (zh) | 2016-09-01 |
CN106030777B (zh) | 2019-01-01 |
TWI598309B (zh) | 2017-09-11 |
WO2016096227A1 (en) | 2016-06-23 |
EP3035375B1 (en) | 2017-05-03 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US20240155773A1 (en) | Method for manufacturing printed circuit boards | |
US10781530B2 (en) | Cleaning apparatus, plating apparatus using the same, and cleaning method | |
KR101917848B1 (ko) | 석션 도금장치 | |
KR20130082050A (ko) | 내부 내수성 코팅들을 갖는 전자 장치들을 조립하는 시스템 | |
JP6195998B2 (ja) | 大型基板の横型湿式化学処理用装置の処理モジュール | |
TWI280990B (en) | Etching device for electroplating substrate | |
US20130260041A1 (en) | Apparatus for coating substrate and method for coating substrate | |
KR100919562B1 (ko) | 에칭장치 | |
JP2011032538A (ja) | 無電解めっき処理方法 | |
KR101514421B1 (ko) | 기판 처리장치 | |
TWI564440B (zh) | 電鍍裝置 | |
EP3221497B1 (en) | Galvanic plating device of a horizontal galvanic plating processing line for galvanic metal deposition and use thereof | |
JP2005144325A (ja) | 液切り装置 | |
JP6045969B2 (ja) | 表面処理装置 | |
CN111441040B (zh) | 树脂膜的湿式处理装置 | |
EP2854490A1 (en) | Method and apparatus for a wet-chemical or electrochemical treatment | |
JP2017092124A (ja) | エッチング装置 | |
JP2011074416A (ja) | 帯状被処理物の置換めっき処理装置、及び置換めっき処理方法 | |
KR101102518B1 (ko) | 박판의 습식 에칭 장치 | |
JP5708127B2 (ja) | 金属被覆樹脂基板のめっき装置 | |
TW201534190A (zh) | 製造一線路的方法及具有電路圖案的陶瓷基板 | |
JP2004241544A (ja) | ウエット処理装置の液切りと液置換装置 | |
JP2008098327A (ja) | プリント基板の穴内処理方法 | |
JPH09263975A (ja) | エッチング加工方法およびエッチング加工装置 | |
TW201416497A (zh) | 水平連續電鍍系統 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A975 | Report on accelerated examination |
Free format text: JAPANESE INTERMEDIATE CODE: A971005 Effective date: 20170125 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20170403 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20170621 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20170814 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20170816 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6195998 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |