JP2017508303A5 - - Google Patents

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Publication number
JP2017508303A5
JP2017508303A5 JP2016561588A JP2016561588A JP2017508303A5 JP 2017508303 A5 JP2017508303 A5 JP 2017508303A5 JP 2016561588 A JP2016561588 A JP 2016561588A JP 2016561588 A JP2016561588 A JP 2016561588A JP 2017508303 A5 JP2017508303 A5 JP 2017508303A5
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JP
Japan
Prior art keywords
coating
region
thickness
tapered
support ring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2016561588A
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English (en)
Japanese (ja)
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JP2017508303A (ja
JP6408606B2 (ja
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Publication date
Priority claimed from US14/218,597 external-priority patent/US9330955B2/en
Application filed filed Critical
Publication of JP2017508303A publication Critical patent/JP2017508303A/ja
Publication of JP2017508303A5 publication Critical patent/JP2017508303A5/ja
Application granted granted Critical
Publication of JP6408606B2 publication Critical patent/JP6408606B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2016561588A 2013-12-31 2014-11-25 マスキングされたエッジを有する支持リング Active JP6408606B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201361922451P 2013-12-31 2013-12-31
US61/922,451 2013-12-31
US14/218,597 2014-03-18
US14/218,597 US9330955B2 (en) 2013-12-31 2014-03-18 Support ring with masked edge
PCT/US2014/067367 WO2015102781A1 (en) 2013-12-31 2014-11-25 Support ring with masked edge

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2018176528A Division JP6758353B2 (ja) 2013-12-31 2018-09-20 マスキングされたエッジを有する支持リング

Publications (3)

Publication Number Publication Date
JP2017508303A JP2017508303A (ja) 2017-03-23
JP2017508303A5 true JP2017508303A5 (enExample) 2018-01-18
JP6408606B2 JP6408606B2 (ja) 2018-10-17

Family

ID=53482656

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2016561588A Active JP6408606B2 (ja) 2013-12-31 2014-11-25 マスキングされたエッジを有する支持リング
JP2018176528A Active JP6758353B2 (ja) 2013-12-31 2018-09-20 マスキングされたエッジを有する支持リング

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2018176528A Active JP6758353B2 (ja) 2013-12-31 2018-09-20 マスキングされたエッジを有する支持リング

Country Status (6)

Country Link
US (4) US9330955B2 (enExample)
JP (2) JP6408606B2 (enExample)
KR (3) KR102279150B1 (enExample)
CN (2) CN110223949B (enExample)
TW (3) TWI667735B (enExample)
WO (1) WO2015102781A1 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103649158B (zh) * 2011-05-13 2016-04-06 陶氏环球技术有限责任公司 绝缘制剂
US9330955B2 (en) * 2013-12-31 2016-05-03 Applied Materials, Inc. Support ring with masked edge
JP2020516770A (ja) 2017-04-07 2020-06-11 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 基板端部上のプラズマ密度制御
CN107121892B (zh) * 2017-04-26 2018-12-28 武汉华星光电技术有限公司 一种基板曝边设备
US11594445B2 (en) 2018-03-13 2023-02-28 Applied Materials, Inc. Support ring with plasma spray coating
CN110920254B (zh) 2018-09-19 2021-03-16 精工爱普生株式会社 打印头控制电路及液体喷出装置
US12134835B2 (en) * 2021-09-01 2024-11-05 Applied Materials, Inc. Quartz susceptor for accurate non-contact temperature measurement
US20250305141A1 (en) * 2024-03-27 2025-10-02 Applied Materials, Inc. Multi-section substrate supports and related methods, process kits, and processing chambers for semiconductor manufacturing

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US6383931B1 (en) * 2000-02-11 2002-05-07 Lam Research Corporation Convertible hot edge ring to improve low-K dielectric etch
KR20010087542A (ko) 2000-03-07 2001-09-21 윤종용 반도체 확산 공정용 석영 보트의 웨이퍼 지지장치
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JP4323764B2 (ja) * 2002-07-16 2009-09-02 大日本スクリーン製造株式会社 熱処理装置
JP4067858B2 (ja) * 2002-04-16 2008-03-26 東京エレクトロン株式会社 Ａｌｄ成膜装置およびａｌｄ成膜方法
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JPWO2005017988A1 (ja) * 2003-08-15 2006-10-12 株式会社日立国際電気 基板処理装置および半導体デバイスの製造方法
US6888104B1 (en) * 2004-02-05 2005-05-03 Applied Materials, Inc. Thermally matched support ring for substrate processing chamber
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US9385004B2 (en) * 2013-08-15 2016-07-05 Applied Materials, Inc. Support cylinder for thermal processing chamber
US9330955B2 (en) * 2013-12-31 2016-05-03 Applied Materials, Inc. Support ring with masked edge

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