JP2016534558A5 - - Google Patents
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- Publication number
- JP2016534558A5 JP2016534558A5 JP2016534576A JP2016534576A JP2016534558A5 JP 2016534558 A5 JP2016534558 A5 JP 2016534558A5 JP 2016534576 A JP2016534576 A JP 2016534576A JP 2016534576 A JP2016534576 A JP 2016534576A JP 2016534558 A5 JP2016534558 A5 JP 2016534558A5
- Authority
- JP
- Japan
- Prior art keywords
- peripheral surface
- inner peripheral
- optically transparent
- transparent layer
- support cylinder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000002093 peripheral effect Effects 0.000 claims 23
- 239000010410 layer Substances 0.000 claims 13
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 10
- 239000000463 material Substances 0.000 claims 7
- 239000000758 substrate Substances 0.000 claims 7
- 238000000034 method Methods 0.000 claims 6
- 238000010438 heat treatment Methods 0.000 claims 3
- 239000010453 quartz Substances 0.000 claims 3
- 239000011247 coating layer Substances 0.000 claims 2
- 239000004065 semiconductor Substances 0.000 claims 2
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- 239000005350 fused silica glass Substances 0.000 claims 1
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201361866379P | 2013-08-15 | 2013-08-15 | |
| US61/866,379 | 2013-08-15 | ||
| US14/298,389 US9385004B2 (en) | 2013-08-15 | 2014-06-06 | Support cylinder for thermal processing chamber |
| US14/298,389 | 2014-06-06 | ||
| PCT/US2014/042025 WO2015023352A1 (en) | 2013-08-15 | 2014-06-12 | Support cylinder for thermal processing chamber |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018233391A Division JP6688865B2 (ja) | 2013-08-15 | 2018-12-13 | 熱処理チャンバのための支持シリンダー |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016534558A JP2016534558A (ja) | 2016-11-04 |
| JP2016534558A5 true JP2016534558A5 (enExample) | 2017-07-27 |
| JP6453882B2 JP6453882B2 (ja) | 2019-01-16 |
Family
ID=52467142
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016534576A Active JP6453882B2 (ja) | 2013-08-15 | 2014-06-12 | 熱処理チャンバのための支持シリンダー |
| JP2018233391A Active JP6688865B2 (ja) | 2013-08-15 | 2018-12-13 | 熱処理チャンバのための支持シリンダー |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018233391A Active JP6688865B2 (ja) | 2013-08-15 | 2018-12-13 | 熱処理チャンバのための支持シリンダー |
Country Status (6)
| Country | Link |
|---|---|
| US (3) | US9385004B2 (enExample) |
| JP (2) | JP6453882B2 (enExample) |
| KR (2) | KR101966566B1 (enExample) |
| CN (3) | CN105453248B (enExample) |
| TW (3) | TWI688040B (enExample) |
| WO (1) | WO2015023352A1 (enExample) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SG11201508512PA (en) * | 2013-05-23 | 2015-12-30 | Applied Materials Inc | A coated liner assembly for a semiconductor processing chamber |
| US9385004B2 (en) * | 2013-08-15 | 2016-07-05 | Applied Materials, Inc. | Support cylinder for thermal processing chamber |
| US9330955B2 (en) * | 2013-12-31 | 2016-05-03 | Applied Materials, Inc. | Support ring with masked edge |
| KR102709229B1 (ko) * | 2015-12-07 | 2024-09-23 | 어플라이드 머티어리얼스, 인코포레이티드 | 병합형 커버 링 |
| TWM573071U (zh) * | 2017-03-06 | 2019-01-11 | 美商應用材料股份有限公司 | 用於熱處理腔室的旋轉器蓋與用於處理基板的設備 |
| US11004704B2 (en) | 2017-03-17 | 2021-05-11 | Applied Materials, Inc. | Finned rotor cover |
| CN110071064A (zh) * | 2018-01-22 | 2019-07-30 | 上海新昇半导体科技有限公司 | 一种改善外延片污染印记的方法 |
| KR102723235B1 (ko) | 2018-03-13 | 2024-10-31 | 어플라이드 머티어리얼스, 인코포레이티드 | 플라즈마 분무 코팅을 갖는 지지 링 |
| CN109148353A (zh) * | 2018-08-15 | 2019-01-04 | 深圳市华星光电技术有限公司 | 一种基板承托盘 |
| JP7178823B2 (ja) * | 2018-08-17 | 2022-11-28 | 東京応化工業株式会社 | 基板加熱装置および基板処理システム |
| DE102019104433A1 (de) * | 2019-02-21 | 2020-08-27 | Aixtron Se | CVD-Reaktor mit Mitteln zur lokalen Beeinflussung der Suszeptortemperatur |
| JP7461214B2 (ja) * | 2020-05-19 | 2024-04-03 | 株式会社Ｓｃｒｅｅｎホールディングス | 熱処理装置 |
| KR102787323B1 (ko) | 2020-09-24 | 2025-03-27 | 삼성전자주식회사 | 플라즈마 처리 장치 및 플라즈마 처리 방법 |
| US20240247404A1 (en) * | 2023-01-25 | 2024-07-25 | Applied Materials, Inc. | Pre-heat rings and processing chambers including black quartz, and related methods |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US960555A (en) * | 1906-02-08 | 1910-06-07 | Joseph Johnson | Basket. |
| US5960555A (en) | 1996-07-24 | 1999-10-05 | Applied Materials, Inc. | Method and apparatus for purging the back side of a substrate during chemical vapor processing |
| US6395363B1 (en) * | 1996-11-05 | 2002-05-28 | Applied Materials, Inc. | Sloped substrate support |
| US6133152A (en) | 1997-05-16 | 2000-10-17 | Applied Materials, Inc. | Co-rotating edge ring extension for use in a semiconductor processing chamber |
| US6200388B1 (en) | 1998-02-11 | 2001-03-13 | Applied Materials, Inc. | Substrate support for a thermal processing chamber |
| US6048403A (en) * | 1998-04-01 | 2000-04-11 | Applied Materials, Inc. | Multi-ledge substrate support for a thermal processing chamber |
| JP2000256037A (ja) * | 1999-03-05 | 2000-09-19 | Tosoh Corp | 透明部を有する黒色石英ガラス及びその製造方法 |
| JP4969732B2 (ja) * | 2001-03-14 | 2012-07-04 | 東京エレクトロン株式会社 | 加熱装置、熱処理装置及びランプ冷却方法 |
| TW200307652A (en) | 2002-04-04 | 2003-12-16 | Tosoh Corp | Quartz glass thermal sprayed parts and method for producing the same |
| US7704327B2 (en) * | 2002-09-30 | 2010-04-27 | Applied Materials, Inc. | High temperature anneal with improved substrate support |
| US7241345B2 (en) | 2003-06-16 | 2007-07-10 | Applied Materials, Inc. | Cylinder for thermal processing chamber |
| JP4348542B2 (ja) * | 2004-08-24 | 2009-10-21 | 信越半導体株式会社 | 石英治具及び半導体製造装置 |
| JP2007042844A (ja) * | 2005-08-03 | 2007-02-15 | Furukawa Co Ltd | 気相成長装置及びサセプタ |
| US10843954B2 (en) | 2006-12-05 | 2020-11-24 | Shin-Etsu Quartz Products Co., Ltd. | Synthetic opaque quartz glass and method for producing the same |
| US7378618B1 (en) * | 2006-12-14 | 2008-05-27 | Applied Materials, Inc. | Rapid conductive cooling using a secondary process plane |
| JP5048445B2 (ja) * | 2007-10-11 | 2012-10-17 | 信越石英株式会社 | 透明層付き黒色合成石英ガラス |
| US8434937B2 (en) * | 2008-05-30 | 2013-05-07 | Applied Materials, Inc. | Method and apparatus for detecting the substrate temperature in a laser anneal system |
| JP5441243B2 (ja) * | 2009-02-24 | 2014-03-12 | 信越石英株式会社 | 赤外線透過性部材の熱処理用石英ガラス治具 |
| JP5545090B2 (ja) * | 2010-07-13 | 2014-07-09 | 株式会社Ｓｕｍｃｏ | ウェーハ支持治具及び軸状部材並びにシリコンウェーハの熱処理方法 |
| JP5583082B2 (ja) * | 2011-06-21 | 2014-09-03 | 信越石英株式会社 | 透明層付き黒色合成石英ガラスの製造方法 |
| US9385004B2 (en) * | 2013-08-15 | 2016-07-05 | Applied Materials, Inc. | Support cylinder for thermal processing chamber |
-
2014
- 2014-06-06 US US14/298,389 patent/US9385004B2/en active Active
- 2014-06-12 KR KR1020177005570A patent/KR101966566B1/ko active Active
- 2014-06-12 CN CN201480043642.8A patent/CN105453248B/zh active Active
- 2014-06-12 CN CN201710619830.6A patent/CN107342253B/zh active Active
- 2014-06-12 CN CN201710952706.1A patent/CN107731718B/zh active Active
- 2014-06-12 JP JP2016534576A patent/JP6453882B2/ja active Active
- 2014-06-12 KR KR1020167006801A patent/KR101713078B1/ko active Active
- 2014-06-12 WO PCT/US2014/042025 patent/WO2015023352A1/en not_active Ceased
- 2014-06-30 TW TW108100335A patent/TWI688040B/zh active
- 2014-06-30 TW TW103122512A patent/TWI604559B/zh active
- 2014-06-30 TW TW106132888A patent/TWI656598B/zh active
-
2016
- 2016-06-21 US US15/188,706 patent/US9659809B2/en active Active
-
2017
- 2017-05-19 US US15/600,336 patent/US10128144B2/en active Active
-
2018
- 2018-12-13 JP JP2018233391A patent/JP6688865B2/ja active Active
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