JP2014175535A5 - - Google Patents
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- Publication number
- JP2014175535A5 JP2014175535A5 JP2013048185A JP2013048185A JP2014175535A5 JP 2014175535 A5 JP2014175535 A5 JP 2014175535A5 JP 2013048185 A JP2013048185 A JP 2013048185A JP 2013048185 A JP2013048185 A JP 2013048185A JP 2014175535 A5 JP2014175535 A5 JP 2014175535A5
- Authority
- JP
- Japan
- Prior art keywords
- electrostatic chuck
- focus ring
- pedestal
- adhesive
- divided
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000853 adhesive Substances 0.000 claims description 12
- 230000001070 adhesive effect Effects 0.000 claims description 12
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims description 10
- 239000011347 resin Substances 0.000 claims description 6
- 229920005989 resin Polymers 0.000 claims description 6
- 230000003068 static effect Effects 0.000 claims description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- 229910010293 ceramic material Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000007751 thermal spraying Methods 0.000 description 1
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013048185A JP6400273B2 (ja) | 2013-03-11 | 2013-03-11 | 静電チャック装置 |
| TW103105786A TWI606546B (zh) | 2013-03-11 | 2014-02-21 | 靜電夾頭裝置 |
| US14/190,285 US9252039B2 (en) | 2013-03-11 | 2014-02-26 | Electrostatic chuck apparatus |
| KR1020140025410A KR102155122B1 (ko) | 2013-03-11 | 2014-03-04 | 정전 척 장치 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013048185A JP6400273B2 (ja) | 2013-03-11 | 2013-03-11 | 静電チャック装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014175535A JP2014175535A (ja) | 2014-09-22 |
| JP2014175535A5 true JP2014175535A5 (enExample) | 2016-02-18 |
| JP6400273B2 JP6400273B2 (ja) | 2018-10-03 |
Family
ID=51487526
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013048185A Active JP6400273B2 (ja) | 2013-03-11 | 2013-03-11 | 静電チャック装置 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US9252039B2 (enExample) |
| JP (1) | JP6400273B2 (enExample) |
| KR (1) | KR102155122B1 (enExample) |
| TW (1) | TWI606546B (enExample) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6149945B2 (ja) * | 2014-09-30 | 2017-06-21 | 住友大阪セメント株式会社 | 静電チャック装置 |
| JP6540022B2 (ja) * | 2014-12-26 | 2019-07-10 | 東京エレクトロン株式会社 | 載置台及びプラズマ処理装置 |
| US10755902B2 (en) * | 2015-05-27 | 2020-08-25 | Tokyo Electron Limited | Plasma processing apparatus and focus ring |
| GB201511282D0 (en) * | 2015-06-26 | 2015-08-12 | Spts Technologies Ltd | Plasma etching apparatus |
| US11024528B2 (en) * | 2015-10-21 | 2021-06-01 | Sumitomo Osaka Cement Co., Ltd. | Electrostatic chuck device having focus ring |
| CN107316795B (zh) * | 2016-04-26 | 2020-01-03 | 北京北方华创微电子装备有限公司 | 一种聚焦环和等离子体处理装置 |
| KR20170127724A (ko) * | 2016-05-12 | 2017-11-22 | 삼성전자주식회사 | 플라즈마 처리 장치 |
| JP7228989B2 (ja) * | 2018-11-05 | 2023-02-27 | 東京エレクトロン株式会社 | 載置台、エッジリングの位置決め方法及び基板処理装置 |
| CN114843165A (zh) * | 2021-02-01 | 2022-08-02 | 中微半导体设备(上海)股份有限公司 | 一种下电极组件及等离子体处理装置 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6123804A (en) * | 1999-02-22 | 2000-09-26 | Applied Materials, Inc. | Sectional clamp ring |
| US6475336B1 (en) * | 2000-10-06 | 2002-11-05 | Lam Research Corporation | Electrostatically clamped edge ring for plasma processing |
| JP2003179129A (ja) * | 2001-12-11 | 2003-06-27 | Ngk Spark Plug Co Ltd | 静電チャック装置 |
| US7494560B2 (en) * | 2002-11-27 | 2009-02-24 | International Business Machines Corporation | Non-plasma reaction apparatus and method |
| US20040261946A1 (en) * | 2003-04-24 | 2004-12-30 | Tokyo Electron Limited | Plasma processing apparatus, focus ring, and susceptor |
| US7988816B2 (en) * | 2004-06-21 | 2011-08-02 | Tokyo Electron Limited | Plasma processing apparatus and method |
| JP4942471B2 (ja) * | 2005-12-22 | 2012-05-30 | 京セラ株式会社 | サセプタおよびこれを用いたウェハの処理方法 |
| JP5227197B2 (ja) * | 2008-06-19 | 2013-07-03 | 東京エレクトロン株式会社 | フォーカスリング及びプラズマ処理装置 |
| US9543181B2 (en) * | 2008-07-30 | 2017-01-10 | Taiwan Semiconductor Manufacturing Company, Ltd. | Replaceable electrostatic chuck sidewall shield |
| JP5100617B2 (ja) * | 2008-11-07 | 2012-12-19 | 東京エレクトロン株式会社 | リング状部材及びその製造方法 |
| JP5395633B2 (ja) * | 2009-11-17 | 2014-01-22 | 東京エレクトロン株式会社 | 基板処理装置の基板載置台 |
| JP5496630B2 (ja) * | 2009-12-10 | 2014-05-21 | 東京エレクトロン株式会社 | 静電チャック装置 |
| KR20150013627A (ko) * | 2012-04-26 | 2015-02-05 | 어플라이드 머티어리얼스, 인코포레이티드 | Ｅｓｃ 본딩 접착제 부식을 방지하기 위한 방법들 및 장치 |
-
2013
- 2013-03-11 JP JP2013048185A patent/JP6400273B2/ja active Active
-
2014
- 2014-02-21 TW TW103105786A patent/TWI606546B/zh active
- 2014-02-26 US US14/190,285 patent/US9252039B2/en active Active
- 2014-03-04 KR KR1020140025410A patent/KR102155122B1/ko active Active
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