TWI606546B - 靜電夾頭裝置 - Google Patents

靜電夾頭裝置 Download PDF

Info

Publication number
TWI606546B
TWI606546B TW103105786A TW103105786A TWI606546B TW I606546 B TWI606546 B TW I606546B TW 103105786 A TW103105786 A TW 103105786A TW 103105786 A TW103105786 A TW 103105786A TW I606546 B TWI606546 B TW I606546B
Authority
TW
Taiwan
Prior art keywords
electrostatic chuck
focus ring
base portion
adhesive
concave
Prior art date
Application number
TW103105786A
Other languages
English (en)
Chinese (zh)
Other versions
TW201505123A (zh
Inventor
白岩則雄
玉川晃樹
川合治郎
Original Assignee
新光電氣工業股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 新光電氣工業股份有限公司 filed Critical 新光電氣工業股份有限公司
Publication of TW201505123A publication Critical patent/TW201505123A/zh
Application granted granted Critical
Publication of TWI606546B publication Critical patent/TWI606546B/zh

Links

Classifications

    • H10P72/72—
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Drying Of Semiconductors (AREA)
TW103105786A 2013-03-11 2014-02-21 靜電夾頭裝置 TWI606546B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013048185A JP6400273B2 (ja) 2013-03-11 2013-03-11 静電チャック装置

Publications (2)

Publication Number Publication Date
TW201505123A TW201505123A (zh) 2015-02-01
TWI606546B true TWI606546B (zh) 2017-11-21

Family

ID=51487526

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103105786A TWI606546B (zh) 2013-03-11 2014-02-21 靜電夾頭裝置

Country Status (4)

Country Link
US (1) US9252039B2 (enExample)
JP (1) JP6400273B2 (enExample)
KR (1) KR102155122B1 (enExample)
TW (1) TWI606546B (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6149945B2 (ja) * 2014-09-30 2017-06-21 住友大阪セメント株式会社 静電チャック装置
JP6540022B2 (ja) * 2014-12-26 2019-07-10 東京エレクトロン株式会社 載置台及びプラズマ処理装置
US10755902B2 (en) * 2015-05-27 2020-08-25 Tokyo Electron Limited Plasma processing apparatus and focus ring
GB201511282D0 (en) * 2015-06-26 2015-08-12 Spts Technologies Ltd Plasma etching apparatus
US11024528B2 (en) * 2015-10-21 2021-06-01 Sumitomo Osaka Cement Co., Ltd. Electrostatic chuck device having focus ring
CN107316795B (zh) * 2016-04-26 2020-01-03 北京北方华创微电子装备有限公司 一种聚焦环和等离子体处理装置
KR20170127724A (ko) * 2016-05-12 2017-11-22 삼성전자주식회사 플라즈마 처리 장치
JP7228989B2 (ja) * 2018-11-05 2023-02-27 東京エレクトロン株式会社 載置台、エッジリングの位置決め方法及び基板処理装置
CN114843165A (zh) * 2021-02-01 2022-08-02 中微半导体设备(上海)股份有限公司 一种下电极组件及等离子体处理装置
TW202303825A (zh) * 2021-02-05 2023-01-16 日商東京威力科創股份有限公司 基板支持體及基板處理裝置

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6123804A (en) * 1999-02-22 2000-09-26 Applied Materials, Inc. Sectional clamp ring
US6475336B1 (en) * 2000-10-06 2002-11-05 Lam Research Corporation Electrostatically clamped edge ring for plasma processing
JP2003179129A (ja) * 2001-12-11 2003-06-27 Ngk Spark Plug Co Ltd 静電チャック装置
US7494560B2 (en) * 2002-11-27 2009-02-24 International Business Machines Corporation Non-plasma reaction apparatus and method
US20040261946A1 (en) * 2003-04-24 2004-12-30 Tokyo Electron Limited Plasma processing apparatus, focus ring, and susceptor
US7988816B2 (en) * 2004-06-21 2011-08-02 Tokyo Electron Limited Plasma processing apparatus and method
JP4942471B2 (ja) * 2005-12-22 2012-05-30 京セラ株式会社 サセプタおよびこれを用いたウェハの処理方法
JP5227197B2 (ja) * 2008-06-19 2013-07-03 東京エレクトロン株式会社 フォーカスリング及びプラズマ処理装置
US9543181B2 (en) * 2008-07-30 2017-01-10 Taiwan Semiconductor Manufacturing Company, Ltd. Replaceable electrostatic chuck sidewall shield
JP5100617B2 (ja) * 2008-11-07 2012-12-19 東京エレクトロン株式会社 リング状部材及びその製造方法
JP5395633B2 (ja) * 2009-11-17 2014-01-22 東京エレクトロン株式会社 基板処理装置の基板載置台
JP5496630B2 (ja) * 2009-12-10 2014-05-21 東京エレクトロン株式会社 静電チャック装置
KR20150013627A (ko) * 2012-04-26 2015-02-05 어플라이드 머티어리얼스, 인코포레이티드 Ｅｓｃ 본딩 접착제 부식을 방지하기 위한 방법들 및 장치

Also Published As

Publication number Publication date
JP6400273B2 (ja) 2018-10-03
KR102155122B1 (ko) 2020-09-11
US9252039B2 (en) 2016-02-02
TW201505123A (zh) 2015-02-01
JP2014175535A (ja) 2014-09-22
KR20140111597A (ko) 2014-09-19
US20140254061A1 (en) 2014-09-11

Similar Documents

Publication Publication Date Title
TWI606546B (zh) 靜電夾頭裝置
US10304718B2 (en) Electrostatic chuck device
US11328948B2 (en) Electrostatic chuck device and method of manufacturing electrostatic chuck device
JP6640271B2 (ja) 基板を結合する方法
TWI713139B (zh) 用於高溫處理之靜電吸座組件
US20150179412A1 (en) Edge ring dimensioned to extend lifetime of elastomer seal in a plasma processing chamber
US10497597B2 (en) Electrostatic chuck assembly and substrate processing apparatus including the same
EP2325877A2 (en) Substrate mounting table of substrate processing apparatus
US20090243236A1 (en) Electrostatic chuck and manufacturing method thereof
JP2009256789A (ja) セラミックスヒータ
CN110622291A (zh) 基板支撑设备
TW201909330A (zh) 靜電卡盤和電漿加工裝置
CN102696101A (zh) 静电夹盘及其整修方法
KR20160052354A (ko) 클램프 조립체
US10957573B2 (en) Electrostatic chuck device including a heating member
JP6545613B2 (ja) フォーカスリング
TWI622123B (zh) 具有微溝槽不黏表面之安裝夾具及安裝彈性體帶的方法
TWI518820B (zh) 具有改良之衝擊保護器的噴頭組件
JP7299805B2 (ja) 保持装置
CN108538744A (zh) 卡盘装置以及半导体加工设备
CN111613509A (zh) 卡盘结构及反应腔室
KR102363647B1 (ko) 베이스 플레이트 구조체 및 그 제조방법, 기판 고정 장치
JP7710891B2 (ja) 保持装置
JP2021100050A (ja) 半導体製造装置用部品
KR102869774B1 (ko) 반도체 웨이퍼 제조 장치의 내식성 향상 방법