KR102155122B1 - 정전 척 장치 - Google Patents

정전 척 장치 Download PDF

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Publication number
KR102155122B1
KR102155122B1 KR1020140025410A KR20140025410A KR102155122B1 KR 102155122 B1 KR102155122 B1 KR 102155122B1 KR 1020140025410 A KR1020140025410 A KR 1020140025410A KR 20140025410 A KR20140025410 A KR 20140025410A KR 102155122 B1 KR102155122 B1 KR 102155122B1
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KR
South Korea
Prior art keywords
electrostatic chuck
pedestal
focus ring
concave portion
concave
Prior art date
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KR1020140025410A
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English (en)
Korean (ko)
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KR20140111597A (ko
Inventor
노리오 시라이와
고키 다마가와
지로 가와이
Original Assignee
신꼬오덴기 고교 가부시키가이샤
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Publication of KR20140111597A publication Critical patent/KR20140111597A/ko
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Publication of KR102155122B1 publication Critical patent/KR102155122B1/ko
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Drying Of Semiconductors (AREA)
KR1020140025410A 2013-03-11 2014-03-04 정전 척 장치 Active KR102155122B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013048185A JP6400273B2 (ja) 2013-03-11 2013-03-11 静電チャック装置
JPJP-P-2013-048185 2013-03-11

Publications (2)

Publication Number Publication Date
KR20140111597A KR20140111597A (ko) 2014-09-19
KR102155122B1 true KR102155122B1 (ko) 2020-09-11

Family

ID=51487526

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020140025410A Active KR102155122B1 (ko) 2013-03-11 2014-03-04 정전 척 장치

Country Status (4)

Country Link
US (1) US9252039B2 (enExample)
JP (1) JP6400273B2 (enExample)
KR (1) KR102155122B1 (enExample)
TW (1) TWI606546B (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6149945B2 (ja) * 2014-09-30 2017-06-21 住友大阪セメント株式会社 静電チャック装置
JP6540022B2 (ja) * 2014-12-26 2019-07-10 東京エレクトロン株式会社 載置台及びプラズマ処理装置
US10755902B2 (en) * 2015-05-27 2020-08-25 Tokyo Electron Limited Plasma processing apparatus and focus ring
GB201511282D0 (en) * 2015-06-26 2015-08-12 Spts Technologies Ltd Plasma etching apparatus
US11024528B2 (en) * 2015-10-21 2021-06-01 Sumitomo Osaka Cement Co., Ltd. Electrostatic chuck device having focus ring
CN107316795B (zh) * 2016-04-26 2020-01-03 北京北方华创微电子装备有限公司 一种聚焦环和等离子体处理装置
KR20170127724A (ko) * 2016-05-12 2017-11-22 삼성전자주식회사 플라즈마 처리 장치
JP7228989B2 (ja) * 2018-11-05 2023-02-27 東京エレクトロン株式会社 載置台、エッジリングの位置決め方法及び基板処理装置
CN114843165A (zh) * 2021-02-01 2022-08-02 中微半导体设备(上海)股份有限公司 一种下电极组件及等离子体处理装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003179129A (ja) 2001-12-11 2003-06-27 Ngk Spark Plug Co Ltd 静電チャック装置
JP2007194616A (ja) 2005-12-22 2007-08-02 Kyocera Corp サセプタおよびこれを用いたウェハの処理方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6123804A (en) * 1999-02-22 2000-09-26 Applied Materials, Inc. Sectional clamp ring
US6475336B1 (en) * 2000-10-06 2002-11-05 Lam Research Corporation Electrostatically clamped edge ring for plasma processing
US7494560B2 (en) * 2002-11-27 2009-02-24 International Business Machines Corporation Non-plasma reaction apparatus and method
US20040261946A1 (en) * 2003-04-24 2004-12-30 Tokyo Electron Limited Plasma processing apparatus, focus ring, and susceptor
US7988816B2 (en) * 2004-06-21 2011-08-02 Tokyo Electron Limited Plasma processing apparatus and method
JP5227197B2 (ja) * 2008-06-19 2013-07-03 東京エレクトロン株式会社 フォーカスリング及びプラズマ処理装置
US9543181B2 (en) * 2008-07-30 2017-01-10 Taiwan Semiconductor Manufacturing Company, Ltd. Replaceable electrostatic chuck sidewall shield
JP5100617B2 (ja) * 2008-11-07 2012-12-19 東京エレクトロン株式会社 リング状部材及びその製造方法
JP5395633B2 (ja) * 2009-11-17 2014-01-22 東京エレクトロン株式会社 基板処理装置の基板載置台
JP5496630B2 (ja) * 2009-12-10 2014-05-21 東京エレクトロン株式会社 静電チャック装置
KR20150013627A (ko) * 2012-04-26 2015-02-05 어플라이드 머티어리얼스, 인코포레이티드 Ｅｓｃ 본딩 접착제 부식을 방지하기 위한 방법들 및 장치

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003179129A (ja) 2001-12-11 2003-06-27 Ngk Spark Plug Co Ltd 静電チャック装置
JP2007194616A (ja) 2005-12-22 2007-08-02 Kyocera Corp サセプタおよびこれを用いたウェハの処理方法

Also Published As

Publication number Publication date
KR20140111597A (ko) 2014-09-19
TWI606546B (zh) 2017-11-21
JP6400273B2 (ja) 2018-10-03
US20140254061A1 (en) 2014-09-11
TW201505123A (zh) 2015-02-01
JP2014175535A (ja) 2014-09-22
US9252039B2 (en) 2016-02-02

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