JP2015517214A5 - - Google Patents

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Publication number
JP2015517214A5
JP2015517214A5 JP2015504669A JP2015504669A JP2015517214A5 JP 2015517214 A5 JP2015517214 A5 JP 2015517214A5 JP 2015504669 A JP2015504669 A JP 2015504669A JP 2015504669 A JP2015504669 A JP 2015504669A JP 2015517214 A5 JP2015517214 A5 JP 2015517214A5
Authority
JP
Japan
Prior art keywords
brush
protrusions
concave
central axis
cleaning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2015504669A
Other languages
English (en)
Japanese (ja)
Other versions
JP6329126B2 (ja
JP2015517214A (ja
Filing date
Publication date
Priority claimed from US13/804,428 external-priority patent/US20130255721A1/en
Application filed filed Critical
Publication of JP2015517214A publication Critical patent/JP2015517214A/ja
Publication of JP2015517214A5 publication Critical patent/JP2015517214A5/ja
Application granted granted Critical
Publication of JP6329126B2 publication Critical patent/JP6329126B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2015504669A 2012-04-03 2013-04-02 凹状突起部スポンジブラシ Active JP6329126B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201261619525P 2012-04-03 2012-04-03
US61/619,525 2012-04-03
US13/804,428 US20130255721A1 (en) 2012-04-03 2013-03-14 Concave nodule sponge brush
US13/804,428 2013-03-14
PCT/US2013/034897 WO2013151967A1 (en) 2012-04-03 2013-04-02 Concave nodule sponge brush

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2018018573A Division JP6820285B2 (ja) 2012-04-03 2018-02-05 凹状突起部スポンジブラシ

Publications (3)

Publication Number Publication Date
JP2015517214A JP2015517214A (ja) 2015-06-18
JP2015517214A5 true JP2015517214A5 (enExample) 2016-06-02
JP6329126B2 JP6329126B2 (ja) 2018-05-23

Family

ID=49233229

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2015504669A Active JP6329126B2 (ja) 2012-04-03 2013-04-02 凹状突起部スポンジブラシ
JP2018018573A Active JP6820285B2 (ja) 2012-04-03 2018-02-05 凹状突起部スポンジブラシ

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2018018573A Active JP6820285B2 (ja) 2012-04-03 2018-02-05 凹状突起部スポンジブラシ

Country Status (5)

Country Link
US (1) US20130255721A1 (enExample)
JP (2) JP6329126B2 (enExample)
KR (1) KR102169190B1 (enExample)
TW (1) TWI648107B (enExample)
WO (1) WO2013151967A1 (enExample)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD710062S1 (en) * 2011-06-09 2014-07-29 Ebara Corporation Roller shaft for semiconductor cleaning
US9202723B2 (en) 2011-11-29 2015-12-01 Illinois Tool Works, Inc. Brush with cantilevered nodules
US8778087B2 (en) * 2012-04-03 2014-07-15 Illinois Tool Works Inc. Conical sponge brush for cleaning semiconductor wafers
TWD170203S (zh) * 2013-09-24 2015-09-01 荏原製作所股份有限公司 基板洗淨用滾軸桿之部分
USD735430S1 (en) * 2013-09-24 2015-07-28 Ebara Corporation Roller shaft for substrate cleaning
USD735429S1 (en) * 2013-09-24 2015-07-28 Ebara Corporation Roller shaft for substrate cleaning
JP6843621B2 (ja) * 2014-02-20 2021-03-17 インテグリス・インコーポレーテッド 目標とする高い洗浄性能を得るためのこぶの比率
JP6316730B2 (ja) * 2014-10-31 2018-04-25 株式会社荏原製作所 ロール部材、ペンシル部材、及びそれらの少なくともいずれか一方を含む基板処理装置
US10271636B2 (en) * 2014-11-10 2019-04-30 Illinois Tool Works Inc. Archimedes brush for semiconductor cleaning
EP3806674B1 (en) * 2018-06-14 2022-12-28 Philip Morris Products S.A. Aerosol-generating device with pyrocatalytic material
CN109037116B (zh) * 2018-08-31 2021-05-28 上海华力微电子有限公司 晶圆清洗装置
CN109225973A (zh) * 2018-09-10 2019-01-18 麦斯克电子材料有限公司 一种用于硅抛光片擦片清洗机的擦片刷装置
US10758946B2 (en) * 2019-01-23 2020-09-01 Tung An Development Ltd. Device of cleaning brush
TWI861912B (zh) * 2022-05-31 2024-11-11 美商恩特葛瑞斯股份有限公司 清潔刷及化學機械平坦化設備
TWI827446B (zh) * 2023-01-16 2023-12-21 孫建忠 出水輪刷構造
KR102848562B1 (ko) * 2024-07-11 2025-08-25 주식회사 아이맥 내부 돌기를 포함하는 반도체용 브러쉬

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3403108B2 (ja) * 1999-02-26 2003-05-06 アイオン株式会社 洗浄用スポンジローラ
US6502273B1 (en) * 1996-11-08 2003-01-07 Kanebo, Ltd. Cleaning sponge roller
US6059888A (en) * 1997-11-14 2000-05-09 Creative Design Corporation Wafer cleaning system
DE19901243A1 (de) * 1999-01-14 2000-07-20 Heidelberger Druckmasch Ag Dosierbare Rasterwalze in einer Rotationsdruckmaschine
US6711775B2 (en) * 1999-06-10 2004-03-30 Lam Research Corporation System for cleaning a semiconductor wafer
JP2003051481A (ja) * 2001-08-07 2003-02-21 Hitachi Ltd 半導体集積回路装置の製造方法
JP4965253B2 (ja) * 2003-08-08 2012-07-04 インテグリス・インコーポレーテッド 回転可能ベース上に鋳造されるモノリシック多孔性パッドを作製する方法および材料
US7926144B1 (en) * 2003-10-23 2011-04-19 R.E. Whittaker Company, Inc. Rollers and disks for carpet cleaning
TWI245671B (en) * 2005-03-08 2005-12-21 Quanta Display Inc Clean apparatus
KR20060116488A (ko) * 2005-05-10 2006-11-15 삼성전자주식회사 반도체 웨이퍼용 세정 브러쉬
TWM362051U (en) * 2009-02-26 2009-08-01 Tung An Dev Ltd Structure for cleaning
JP2011112608A (ja) * 2009-11-30 2011-06-09 Okame Seisakusho:Kk 素材小欠陥深さ測定器
JP5535687B2 (ja) * 2010-03-01 2014-07-02 株式会社荏原製作所 基板洗浄方法及び基板洗浄装置
US9202723B2 (en) * 2011-11-29 2015-12-01 Illinois Tool Works, Inc. Brush with cantilevered nodules

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