USD735430S1 - Roller shaft for substrate cleaning - Google Patents

Roller shaft for substrate cleaning Download PDF

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Publication number
USD735430S1
USD735430S1 US29/485,711 US201429485711F USD735430S US D735430 S1 USD735430 S1 US D735430S1 US 201429485711 F US201429485711 F US 201429485711F US D735430 S USD735430 S US D735430S
Authority
US
United States
Prior art keywords
roller shaft
substrate cleaning
view
roller
cleaning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
US29/485,711
Inventor
Mitsuru Miyazaki
Takuya Inoue
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ebara Corp
Original Assignee
Ebara Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ebara Corp filed Critical Ebara Corp
Assigned to EBARA CORPORATION reassignment EBARA CORPORATION ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: INOUE, TAKUYA, MIYAZAKI, MITSURU
Application granted granted Critical
Publication of USD735430S1 publication Critical patent/USD735430S1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Description

FIG. 1 is a left side view of a roller shaft for substrate cleaning showing our new design attached to a roller;
FIG. 2 is a right side view thereof;
FIG. 3 is a top view thereof, including a detail view of a portion thereof;
FIG. 4 is a front view thereof, including a detail view of portion thereof;
FIG. 5 is a cross-section view thereof, taken along the line 5-5 of FIG. 1;
FIG. 6 is an enlarged top perspective view; and,
FIG. 7 is an enlarged left side view thereof.
The portions of the roller shaft and the roller shown in broken lines are provided for illustrative purposes only and form no part of the claimed design.
The cross-section views are provided illustrative purposes only and the internal details of the roller shaft form no part of the claimed design. The hatching pattern used in these views does not represent any particular material.

Claims (1)

    CLAIM
  1. The ornamental design for a roller shaft for substrate cleaning, as shown and described.
US29/485,711 2013-09-24 2014-03-21 Roller shaft for substrate cleaning Active USD735430S1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013-21974 2013-09-24
JP2013021974 2013-09-24

Publications (1)

Publication Number Publication Date
USD735430S1 true USD735430S1 (en) 2015-07-28

Family

ID=53639010

Family Applications (1)

Application Number Title Priority Date Filing Date
US29/485,711 Active USD735430S1 (en) 2013-09-24 2014-03-21 Roller shaft for substrate cleaning

Country Status (1)

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US (1) USD735430S1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD992845S1 (en) * 2020-05-15 2023-07-18 Ebara Corporation Roller shaft for substrate cleaning

Citations (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5745945A (en) * 1996-06-28 1998-05-05 International Business Machines Corporation Brush conditioner for a semiconductor cleaning brush
US6240588B1 (en) * 1999-12-03 2001-06-05 Lam Research Corporation Wafer scrubbing brush core
US6247197B1 (en) * 1998-07-09 2001-06-19 Lam Research Corporation Brush interflow distributor
US6330729B1 (en) * 1998-04-06 2001-12-18 Micron Technology, Inc. Brush alignment platform
US6467120B1 (en) * 1999-09-08 2002-10-22 International Business Machines Corporation Wafer cleaning brush profile modification
US6502273B1 (en) * 1996-11-08 2003-01-07 Kanebo, Ltd. Cleaning sponge roller
US6523210B1 (en) * 2000-04-05 2003-02-25 Nicholas Andros Surface charge controlling apparatus for wafer cleaning
US6598255B1 (en) * 1998-05-22 2003-07-29 Aion Co., Ltd. Cleaning rotary brush
US6616516B1 (en) * 2001-12-13 2003-09-09 Lam Research Corporation Method and apparatus for asymmetric processing of front side and back side of semiconductor substrates
US6651287B2 (en) * 2000-07-14 2003-11-25 Ebara Corporation Substrate cleaning apparatus and cleaning member
US6802099B2 (en) * 2000-04-12 2004-10-12 Ebara Corporation Cleaning member and cylindrical cleaning element
US7735177B1 (en) * 2006-02-10 2010-06-15 Lam Research Corporation Brush core assembly
US7908698B2 (en) * 2006-01-17 2011-03-22 Fujitsu Semiconductor Limited Cleaning apparatus and cleaning method for wafer
US7955693B2 (en) * 2001-04-20 2011-06-07 Tolland Development Company, Llc Foam composition roller brush with embedded mandrel
US8092730B2 (en) * 2005-12-06 2012-01-10 Entegris, Inc. Molded rotatable base for a porous pad
US8372210B2 (en) * 2003-10-27 2013-02-12 Applied Materials, Inc. Post CMP scrubbing of substrates
US8533895B2 (en) * 2003-08-08 2013-09-17 Entegris, Inc. Methods and materials for making a monolithic porous pad cast onto a rotatable base
US20130255720A1 (en) * 2012-04-03 2013-10-03 Illinois Tool Works Inc. Conical sponge brush for cleaning semiconductor wafers
US20130255721A1 (en) * 2012-04-03 2013-10-03 Illinois Tool Works Inc. Concave nodule sponge brush
US8555458B2 (en) * 2008-06-30 2013-10-15 Aion Co., Ltd Cleaning sponge roller
USD707408S1 (en) * 2011-04-20 2014-06-17 Ebara Corporation Roller for semiconductor wafer cleaning

Patent Citations (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5745945A (en) * 1996-06-28 1998-05-05 International Business Machines Corporation Brush conditioner for a semiconductor cleaning brush
US6684447B2 (en) * 1996-11-08 2004-02-03 Aion Co., Ltd. Cleaning sponge roller
US6502273B1 (en) * 1996-11-08 2003-01-07 Kanebo, Ltd. Cleaning sponge roller
US6330729B1 (en) * 1998-04-06 2001-12-18 Micron Technology, Inc. Brush alignment platform
US6598255B1 (en) * 1998-05-22 2003-07-29 Aion Co., Ltd. Cleaning rotary brush
US6247197B1 (en) * 1998-07-09 2001-06-19 Lam Research Corporation Brush interflow distributor
US6464796B2 (en) * 1998-07-09 2002-10-15 Lam Research Corporation Methods for applying fluid through a brush interflow distributor
US6467120B1 (en) * 1999-09-08 2002-10-22 International Business Machines Corporation Wafer cleaning brush profile modification
US6240588B1 (en) * 1999-12-03 2001-06-05 Lam Research Corporation Wafer scrubbing brush core
US6543084B2 (en) * 1999-12-03 2003-04-08 Lam Research Corporation Wafer scrubbing brush core
US6523210B1 (en) * 2000-04-05 2003-02-25 Nicholas Andros Surface charge controlling apparatus for wafer cleaning
US6802099B2 (en) * 2000-04-12 2004-10-12 Ebara Corporation Cleaning member and cylindrical cleaning element
US6842933B2 (en) * 2000-07-14 2005-01-18 Ebara Corporation Substrate cleaning apparatus and cleaning member
US6651287B2 (en) * 2000-07-14 2003-11-25 Ebara Corporation Substrate cleaning apparatus and cleaning member
US7955693B2 (en) * 2001-04-20 2011-06-07 Tolland Development Company, Llc Foam composition roller brush with embedded mandrel
US8444890B2 (en) * 2001-04-20 2013-05-21 Hydrofera, Llc Method of manufacturing a foam composition roller brush
US6616516B1 (en) * 2001-12-13 2003-09-09 Lam Research Corporation Method and apparatus for asymmetric processing of front side and back side of semiconductor substrates
US8533895B2 (en) * 2003-08-08 2013-09-17 Entegris, Inc. Methods and materials for making a monolithic porous pad cast onto a rotatable base
US8372210B2 (en) * 2003-10-27 2013-02-12 Applied Materials, Inc. Post CMP scrubbing of substrates
US8460475B2 (en) * 2005-12-06 2013-06-11 Entegris, Inc. Molded rotatable base for a porous pad
US8092730B2 (en) * 2005-12-06 2012-01-10 Entegris, Inc. Molded rotatable base for a porous pad
US7908698B2 (en) * 2006-01-17 2011-03-22 Fujitsu Semiconductor Limited Cleaning apparatus and cleaning method for wafer
US8496758B2 (en) * 2006-01-17 2013-07-30 Fujitsu Semiconductor Limited Cleaning apparatus and cleaning method for wafer
US7735177B1 (en) * 2006-02-10 2010-06-15 Lam Research Corporation Brush core assembly
US8555458B2 (en) * 2008-06-30 2013-10-15 Aion Co., Ltd Cleaning sponge roller
USD707408S1 (en) * 2011-04-20 2014-06-17 Ebara Corporation Roller for semiconductor wafer cleaning
US20130255720A1 (en) * 2012-04-03 2013-10-03 Illinois Tool Works Inc. Conical sponge brush for cleaning semiconductor wafers
US20130255721A1 (en) * 2012-04-03 2013-10-03 Illinois Tool Works Inc. Concave nodule sponge brush

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD992845S1 (en) * 2020-05-15 2023-07-18 Ebara Corporation Roller shaft for substrate cleaning

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