JP2016207806A5 - - Google Patents
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- Publication number
- JP2016207806A5 JP2016207806A5 JP2015086807A JP2015086807A JP2016207806A5 JP 2016207806 A5 JP2016207806 A5 JP 2016207806A5 JP 2015086807 A JP2015086807 A JP 2015086807A JP 2015086807 A JP2015086807 A JP 2015086807A JP 2016207806 A5 JP2016207806 A5 JP 2016207806A5
- Authority
- JP
- Japan
- Prior art keywords
- dielectric substrate
- main surface
- ceramic dielectric
- outer periphery
- electrode layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000919 ceramic Substances 0.000 claims description 68
- 239000000758 substrate Substances 0.000 claims description 60
- 230000002093 peripheral effect Effects 0.000 claims description 18
Priority Applications (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015086807A JP6124156B2 (ja) | 2015-04-21 | 2015-04-21 | 静電チャックおよびウェーハ処理装置 |
| PCT/JP2015/062905 WO2016170694A1 (ja) | 2015-04-21 | 2015-04-28 | 静電チャックおよびウェーハ処理装置 |
| KR1020177019576A KR101855228B1 (ko) | 2015-04-21 | 2015-04-28 | 정전척 및 웨이퍼 처리 장치 |
| TW104113464A TWI553774B (zh) | 2015-04-21 | 2015-04-28 | Electrostatic sucker and wafer handling device |
| CN201580077698.XA CN107431038B (zh) | 2015-04-21 | 2015-04-28 | 静电吸盘以及晶片处理装置 |
| KR1020187011953A KR20180049176A (ko) | 2015-04-21 | 2015-04-28 | 정전척 및 웨이퍼 처리 장치 |
| US15/788,132 US10714373B2 (en) | 2015-04-21 | 2017-10-19 | Electrostatic chuck and wafer processing apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015086807A JP6124156B2 (ja) | 2015-04-21 | 2015-04-21 | 静電チャックおよびウェーハ処理装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016207806A JP2016207806A (ja) | 2016-12-08 |
| JP2016207806A5 true JP2016207806A5 (enExample) | 2017-03-30 |
| JP6124156B2 JP6124156B2 (ja) | 2017-05-10 |
Family
ID=57143470
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015086807A Active JP6124156B2 (ja) | 2015-04-21 | 2015-04-21 | 静電チャックおよびウェーハ処理装置 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US10714373B2 (enExample) |
| JP (1) | JP6124156B2 (enExample) |
| KR (2) | KR20180049176A (enExample) |
| CN (1) | CN107431038B (enExample) |
| TW (1) | TWI553774B (enExample) |
| WO (1) | WO2016170694A1 (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11133211B2 (en) * | 2018-08-22 | 2021-09-28 | Lam Research Corporation | Ceramic baseplate with channels having non-square corners |
| US20210159107A1 (en) * | 2019-11-21 | 2021-05-27 | Applied Materials, Inc. | Edge uniformity tunability on bipolar electrostatic chuck |
| KR20220016387A (ko) * | 2020-07-31 | 2022-02-09 | 삼성디스플레이 주식회사 | 정전척, 에칭 장치 및 표시 장치의 제조 방법 |
| WO2022146667A1 (en) | 2020-12-29 | 2022-07-07 | Mattson Technology, Inc. | Electrostatic chuck assembly for plasma processing apparatus |
| CN116917805A (zh) * | 2021-01-20 | 2023-10-20 | 应用材料公司 | 防滑印模降落环 |
| JP7623084B2 (ja) * | 2021-03-08 | 2025-01-28 | 東京エレクトロン株式会社 | 基板支持器 |
| JP7745434B2 (ja) * | 2021-11-05 | 2025-09-29 | 日本特殊陶業株式会社 | 基板保持部材及び基板保持部材の製造方法 |
| JP2025176267A (ja) * | 2024-05-21 | 2025-12-04 | Toto株式会社 | 静電チャック |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6992876B1 (en) | 1999-07-08 | 2006-01-31 | Lam Research Corporation | Electrostatic chuck and its manufacturing method |
| JP2004282047A (ja) * | 2003-02-25 | 2004-10-07 | Kyocera Corp | 静電チャック |
| JP4031419B2 (ja) * | 2003-09-19 | 2008-01-09 | 日本碍子株式会社 | 静電チャック及びその製造方法 |
| US7646580B2 (en) | 2005-02-24 | 2010-01-12 | Kyocera Corporation | Electrostatic chuck and wafer holding member and wafer treatment method |
| JP4796523B2 (ja) * | 2006-03-24 | 2011-10-19 | 日本碍子株式会社 | セラミックス焼成体の製造方法 |
| JP5069452B2 (ja) * | 2006-04-27 | 2012-11-07 | アプライド マテリアルズ インコーポレイテッド | 二重温度帯を有する静電チャックをもつ基板支持体 |
| JP2008042140A (ja) * | 2006-08-10 | 2008-02-21 | Tokyo Electron Ltd | 静電チャック装置 |
| WO2008099789A1 (ja) * | 2007-02-15 | 2008-08-21 | Creative Technology Corporation | 静電チャック |
| JP5025576B2 (ja) | 2008-06-13 | 2012-09-12 | 新光電気工業株式会社 | 静電チャック及び基板温調固定装置 |
| KR101691044B1 (ko) * | 2009-02-04 | 2016-12-29 | 맷슨 테크놀로지, 인크. | 기판의 표면에 걸친 온도 프로파일을 방사상으로 튜닝하는 정전 척 시스템 및 방법 |
| JP5496630B2 (ja) * | 2009-12-10 | 2014-05-21 | 東京エレクトロン株式会社 | 静電チャック装置 |
| JP5218865B2 (ja) * | 2010-03-26 | 2013-06-26 | Ｔｏｔｏ株式会社 | 静電チャック |
| JP5339162B2 (ja) | 2011-03-30 | 2013-11-13 | Ｔｏｔｏ株式会社 | 静電チャック |
| JP5816454B2 (ja) * | 2011-05-09 | 2015-11-18 | 新光電気工業株式会社 | 基板温調固定装置 |
| JP5441019B1 (ja) * | 2012-08-29 | 2014-03-12 | Ｔｏｔｏ株式会社 | 静電チャック |
| JP5441021B1 (ja) * | 2012-09-12 | 2014-03-12 | Ｔｏｔｏ株式会社 | 静電チャック |
| JP6001402B2 (ja) * | 2012-09-28 | 2016-10-05 | 日本特殊陶業株式会社 | 静電チャック |
| JP5633766B2 (ja) * | 2013-03-29 | 2014-12-03 | Toto株式会社 | 静電チャック |
| JP2015088743A (ja) * | 2013-09-27 | 2015-05-07 | Toto株式会社 | 静電チャック |
-
2015
- 2015-04-21 JP JP2015086807A patent/JP6124156B2/ja active Active
- 2015-04-28 CN CN201580077698.XA patent/CN107431038B/zh active Active
- 2015-04-28 TW TW104113464A patent/TWI553774B/zh active
- 2015-04-28 KR KR1020187011953A patent/KR20180049176A/ko not_active Withdrawn
- 2015-04-28 WO PCT/JP2015/062905 patent/WO2016170694A1/ja not_active Ceased
- 2015-04-28 KR KR1020177019576A patent/KR101855228B1/ko active Active
-
2017
- 2017-10-19 US US15/788,132 patent/US10714373B2/en active Active