JP1704964S - プラズマ処理装置用サセプタリング - Google Patents

プラズマ処理装置用サセプタリング

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Publication number
JP1704964S
JP1704964S JP2021008306F JP2021008306F JP1704964S JP 1704964 S JP1704964 S JP 1704964S JP 2021008306 F JP2021008306 F JP 2021008306F JP 2021008306 F JP2021008306 F JP 2021008306F JP 1704964 S JP1704964 S JP 1704964S
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JP
Japan
Prior art keywords
article
processing equipment
plasma processing
suceptoring
outer peripheral
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Active
Application number
JP2021008306F
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English (en)
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Publication date
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Priority to JP2021008306F priority Critical patent/JP1704964S/ja
Priority to US29/789,775 priority patent/USD1005245S1/en
Application granted granted Critical
Publication of JP1704964S publication Critical patent/JP1704964S/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Abstract

本物品は、半導体製造で使われるプラズマ処理装置に用いられるサセプタリングであり、静電チャックおよびＲＦ給電リングをプラズマから保護するためのものである。本物品は、Ｂ－Ｂ部分拡大図において略横長長方形状で表れる大きな溝を備えており、また、長い外周縁部を備えることで、使用状態及び各部の名称を示す参考図に一例を示すように、使用状態において本物品の外周縁部が内側の構成物を囲う形状としている。
JP2021008306F 2021-04-19 2021-04-19 プラズマ処理装置用サセプタリング Active JP1704964S (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2021008306F JP1704964S (ja) 2021-04-19 2021-04-19 プラズマ処理装置用サセプタリング
US29/789,775 USD1005245S1 (en) 2021-04-19 2021-10-18 Electrode cover for a plasma processing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2021008306F JP1704964S (ja) 2021-04-19 2021-04-19 プラズマ処理装置用サセプタリング

Publications (1)

Publication Number Publication Date
JP1704964S true JP1704964S (ja) 2022-01-14

Family

ID=80217244

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021008306F Active JP1704964S (ja) 2021-04-19 2021-04-19 プラズマ処理装置用サセプタリング

Country Status (2)

Country Link
US (1) USD1005245S1 (ja)
JP (1) JP1704964S (ja)

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA127551A (en) * 1909-12-18 1910-08-16 Leon Braquier Confection explosive shell
USD667561S1 (en) * 2009-11-13 2012-09-18 3M Innovative Properties Company Sample processing disk cover
USD703160S1 (en) * 2011-01-27 2014-04-22 Hitachi High-Technologies Corporation Grounded electrode for a plasma processing apparatus
US10003873B2 (en) * 2011-09-06 2018-06-19 Kohler Co. Speaker and shower
JP1546801S (ja) * 2015-06-12 2016-03-28
TWD178425S (zh) * 2016-01-08 2016-09-21 Asm Ip Holding Bv 用於半導體製造設備的電極板
USD794753S1 (en) * 2016-04-08 2017-08-15 Applied Materials, Inc. Showerhead for a semiconductor processing chamber
JP1584906S (ja) * 2017-01-31 2017-08-28
JP1598997S (ja) * 2017-08-31 2018-03-05
JP1598996S (ja) * 2017-08-31 2018-03-05
JP1598998S (ja) * 2017-08-31 2018-03-05
USD874617S1 (en) * 2018-02-12 2020-02-04 Chudun Chen Shower drain strainer
USD877931S1 (en) * 2018-05-09 2020-03-10 Moleculight, Inc. Dispenser for a darkening drape
JP1624795S (ja) * 2018-07-24 2019-02-18
JP1624794S (ja) * 2018-07-24 2019-02-18
JP1624793S (ja) * 2018-07-24 2019-02-18
JP1640255S (ja) * 2018-10-25 2019-09-02
USD934993S1 (en) * 2019-05-09 2021-11-02 Fratelli Fantini S.P.A. Shower head
JP1659287S (ja) 2019-10-18 2020-05-11
USD923744S1 (en) * 2020-01-08 2021-06-29 As America, Inc. Shower head
JP1678330S (ja) * 2020-05-27 2021-02-01
JP1729106S (ja) * 2022-04-25 2022-11-04 半導体処理装置用シャワーヘッド
JP1733645S (ja) * 2022-04-25 2023-01-04 半導体処理装置用シャワーヘッド

Also Published As

Publication number Publication date
USD1005245S1 (en) 2023-11-21

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