JP1640255S - - Google Patents
Info
- Publication number
- JP1640255S JP1640255S JPD2018-23399F JP2018023399F JP1640255S JP 1640255 S JP1640255 S JP 1640255S JP 2018023399 F JP2018023399 F JP 2018023399F JP 1640255 S JP1640255 S JP 1640255S
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPD2018-23399F JP1640255S (ja) | 2018-10-25 | 2018-10-25 | |
| TW108302365F TWD204229S (zh) | 2018-10-25 | 2019-04-24 | 電漿處理裝置用環 |
| US29/688,724 USD891636S1 (en) | 2018-10-25 | 2019-04-24 | Ring for a plasma processing apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPD2018-23399F JP1640255S (ja) | 2018-10-25 | 2018-10-25 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP1640255S true JP1640255S (ja) | 2019-09-02 |
Family
ID=67769555
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JPD2018-23399F Active JP1640255S (ja) | 2018-10-25 | 2018-10-25 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | USD891636S1 (ja) |
| JP (1) | JP1640255S (ja) |
| TW (1) | TWD204229S (ja) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP1659287S (ja) * | 2019-10-18 | 2020-05-11 | ||
| USD943539S1 (en) * | 2020-03-19 | 2022-02-15 | Applied Materials, Inc. | Confinement plate for a substrate processing chamber |
| JP1678330S (ja) * | 2020-05-27 | 2021-02-01 | ||
| JP1704964S (ja) * | 2021-04-19 | 2022-01-14 | プラズマ処理装置用サセプタリング | |
| JP1700629S (ja) * | 2021-04-26 | 2021-11-29 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8703249B2 (en) * | 2002-04-17 | 2014-04-22 | Lam Research Corporation | Techniques for reducing arcing-related damage in a clamping ring of a plasma processing system |
| JP1438320S (ja) | 2011-09-20 | 2015-04-06 | ||
| JP1438319S (ja) | 2011-09-20 | 2015-04-06 | ||
| JP1438745S (ja) | 2011-09-20 | 2015-04-06 | ||
| US9123661B2 (en) * | 2013-08-07 | 2015-09-01 | Lam Research Corporation | Silicon containing confinement ring for plasma processing apparatus and method of forming thereof |
| US9236284B2 (en) * | 2014-01-31 | 2016-01-12 | Applied Materials, Inc. | Cooled tape frame lift and low contact shadow ring for plasma heat isolation |
| JP5615454B1 (ja) * | 2014-02-25 | 2014-10-29 | コバレントマテリアル株式会社 | フォーカスリング |
| JP1551512S (ja) * | 2015-06-12 | 2016-06-13 | ||
| USD810705S1 (en) * | 2016-04-01 | 2018-02-20 | Veeco Instruments Inc. | Self-centering wafer carrier for chemical vapor deposition |
| JP1584784S (ja) * | 2017-01-31 | 2017-08-28 | ||
| JP1584146S (ja) * | 2017-01-31 | 2017-08-21 | ||
| JP1598984S (ja) * | 2017-07-31 | 2018-03-05 | ||
| JP1598997S (ja) * | 2017-08-31 | 2018-03-05 |
-
2018
- 2018-10-25 JP JPD2018-23399F patent/JP1640255S/ja active Active
-
2019
- 2019-04-24 TW TW108302365F patent/TWD204229S/zh unknown
- 2019-04-24 US US29/688,724 patent/USD891636S1/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| USD891636S1 (en) | 2020-07-28 |
| TWD204229S (zh) | 2020-04-21 |