TWD210379S - 電漿處理裝置用保護環 - Google Patents

電漿處理裝置用保護環 Download PDF

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Publication number
TWD210379S
TWD210379S TW109302067F TW109302067F TWD210379S TW D210379 S TWD210379 S TW D210379S TW 109302067 F TW109302067 F TW 109302067F TW 109302067 F TW109302067 F TW 109302067F TW D210379 S TWD210379 S TW D210379S
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TW
Taiwan
Prior art keywords
plasma processing
protective ring
article
outer peripheral
processing device
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TW109302067F
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English (en)
Inventor
中谷信太郎
Original Assignee
日商日立全球先端科技股份有限公司
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Publication of TWD210379S publication Critical patent/TWD210379S/zh

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Abstract

【物品用途】;本設計的物品是電漿處理裝置用保護環，為一種在製造半導體時所使用的電漿處理裝置中用來保護靜電吸盤及RF供電環不會受到電漿破壞的保護環。;【設計說明】;本物品係如「B-B部分放大圖」所示，係具備略呈橫長矩形狀的大溝槽，並且具備較長的外周緣部，因此係如「使用狀態及標示各部名稱之參考圖」的例子所示，於使用狀態中，本物品的外周緣部是成為圍繞位於其內側之構造物的形狀。;各立體圖中，未呈現在其他六面圖的細線，皆為用來表現立體表面之形狀的線條。

Description

電漿處理裝置用保護環
本設計的物品是電漿處理裝置用保護環，為一種在製造半導體時所使用的電漿處理裝置中用來保護靜電吸盤及RF供電環不會受到電漿破壞的保護環。
本物品係如「B-B部分放大圖」所示，係具備略呈橫長矩形狀的大溝槽，並且具備較長的外周緣部，因此係如「使用狀態及標示各部名稱之參考圖」的例子所示，於使用狀態中，本物品的外周緣部是成為圍繞位於其內側之構造物的形狀。
各立體圖中，未呈現在其他六面圖的細線，皆為用來表現立體表面之形狀的線條。
TW109302067F 2019-10-18 2020-04-16 電漿處理裝置用保護環 TWD210379S (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019-023330 2019-02-13
JPD2019-23330F JP1659287S (zh) 2019-10-18 2019-10-18

Publications (1)

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TWD210379S true TWD210379S (zh) 2021-03-11

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TW109302067F TWD210379S (zh) 2019-10-18 2020-04-16 電漿處理裝置用保護環

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US (1) USD954986S1 (zh)
JP (1) JP1659287S (zh)
TW (1) TWD210379S (zh)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11996315B2 (en) 2020-11-18 2024-05-28 Applied Materials, Inc. Thin substrate handling via edge clamping
USD1038049S1 (en) * 2020-11-18 2024-08-06 Applied Materials, Inc. Cover ring for use in semiconductor processing chamber
JP1704964S (ja) 2021-04-19 2022-01-14 プラズマ処理装置用サセプタリング
USD1042373S1 (en) 2022-03-18 2024-09-17 Applied Materials, Inc. Sliding ring for an interlocking process kit for a substrate processing chamber
USD1042374S1 (en) * 2022-03-18 2024-09-17 Applied Materials, Inc. Support pipe for an interlocking process kit for a substrate processing chamber

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4579354A (en) * 1984-12-05 1986-04-01 Vassallo Research And Development Corporation Gasket
USD667561S1 (en) * 2009-11-13 2012-09-18 3M Innovative Properties Company Sample processing disk cover
USD638550S1 (en) * 2009-11-13 2011-05-24 3M Innovative Properties Company Sample processing disk cover
JP1546800S (zh) * 2015-06-12 2016-03-28
JP1545406S (zh) * 2015-06-16 2016-03-14
JP1545407S (zh) * 2015-06-16 2016-03-14
USD810705S1 (en) * 2016-04-01 2018-02-20 Veeco Instruments Inc. Self-centering wafer carrier for chemical vapor deposition
USD830434S1 (en) * 2015-12-28 2018-10-09 Ntn Corporation Inner ring for tapered roller bearing
JP1584906S (zh) * 2017-01-31 2017-08-28
JP1584241S (zh) * 2017-01-31 2017-08-21
JP1598984S (zh) * 2017-07-31 2018-03-05
JP1598996S (zh) * 2017-08-31 2018-03-05
JP1598997S (zh) * 2017-08-31 2018-03-05
JP1598998S (zh) * 2017-08-31 2018-03-05
JP1605832S (zh) * 2017-11-06 2018-06-04
JP1640255S (zh) * 2018-10-25 2019-09-02
USD933725S1 (en) * 2019-02-08 2021-10-19 Applied Materials, Inc. Deposition ring for a substrate processing chamber
USD917026S1 (en) * 2019-09-12 2021-04-20 S & B Technical Products, Inc. Pipe sealing gasket

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USD954986S1 (en) 2022-06-14
JP1659287S (zh) 2020-05-11

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