JP2017502844A5 - - Google Patents
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- JP2017502844A5 JP2017502844A5 JP2016539263A JP2016539263A JP2017502844A5 JP 2017502844 A5 JP2017502844 A5 JP 2017502844A5 JP 2016539263 A JP2016539263 A JP 2016539263A JP 2016539263 A JP2016539263 A JP 2016539263A JP 2017502844 A5 JP2017502844 A5 JP 2017502844A5
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- 230000003287 optical Effects 0.000 claims 13
- 238000010521 absorption reaction Methods 0.000 claims 6
- 238000005553 drilling Methods 0.000 claims 4
- 230000004075 alteration Effects 0.000 claims 1
- 230000002950 deficient Effects 0.000 claims 1
- 230000002093 peripheral Effects 0.000 claims 1
Claims (14)
- 材料にレーザ孔あけする方法であって、
約850nm以下の波長を有するパルスレーザビームを、ビーム伝搬方向に沿って配向されたレーザビーム焦線に集光する工程と、
前記レーザビーム焦線を前記材料内へと向ける工程であって、前記レーザビーム焦線が、前記材料内において誘起吸収を生じ、該誘起吸収が、前記材料内において前記レーザビーム焦線に沿って約300nm以下の直径を有する欠陥線を生成するものである工程と
を有してなることを特徴とする方法。 - 材料にレーザ孔あけするシステムであって、
約850nm以下の波長を有するパルスレーザビームを生じるよう構成されたパルスレーザと、
前記レーザのビーム経路上に配置された光学アセンブリであって、該光学アセンブリのビーム発生側において前記レーザビームをビーム伝搬方向に沿って配向されたレーザビーム焦線に変換するよう構成され、該光学アセンブリが、前記レーザビーム焦線を生じるよう構成された球面収差を有する集光光学素子を含み、前記レーザビーム焦線が、前記材料内において誘起吸収を生じるよう構成され、該誘起吸収が、前記材料内において前記レーザビーム焦線に沿って約300nm以下の直径を有する欠陥線を生成する、光学アセンブリと
を備えたシステム。 - 前記誘起吸収が、前記材料内において、約75μm以下の深さまでの表面下損傷を生じる、請求項2記載のシステム。
- 前記材料および前記レーザビームを互いに相対的に平行移動させることにより、前記材料内に、該材料を少なくとも2つの部分に分離するよう離間された複数の前記欠陥線を孔あけする工程を更に含む、請求項2または3に記載のシステム。
- 前記レーザビームのパルス持続時間が約1ピコ秒より大きく且つ約100ピコ秒未満の範囲内である、請求項2〜4のいずれか一項記載のシステム。
- 前記レーザビーム焦線が、約0.1mm〜約100mmの範囲内の長さを有する、請求項2〜5のいずれか一項記載のシステム。
- 前記光学アセンブリが、前記レーザのビーム経路上の前記集光光学素子の前に配置された環状開口部を含み、該環状開口部が、前記レーザビームの中心の1以上の光線を遮断するよう構成されており、前記レーザビームの中心の外側の周辺光線のみが前記集光光学素子に入射することにより、ビーム方向に沿って見たときに、前記パルスレーザビームの各パルスにつき単一のレーザビーム焦線のみが生じる、請求項2〜5のいずれか一項記載のシステム。
- 前記集光光学素子が、非球面の自由表面を有する円錐プリズムである、請求項2〜6のいずれか一項記載のシステム。
- 前記光学アセンブリがデフォーカス光学素子を更に含み、該デフォーカス光学素子が、該デフォーカス光学素子のビーム発生側における該デフォーカス光学素子から或る距離に、前記レーザビーム焦線が生じるよう配置および位置合わせされた、請求項2〜8いずれか一項記載のシステム。
- 前記欠陥線を生成する前記工程が、0.2μm未満の内径を有する前記欠陥線を生成することを含む、請求項2〜9のいずれか一項記載のシステム。
- 前記誘起吸収が、前記材料内において、約75μm以下の深さまでの表面下損傷を生じる、請求項1記載の方法。
- 前記材料および前記レーザビームを互いに相対的に平行移動させることにより、前記材料内に、該材料を少なくとも2つの部分に分離するよう離間された複数の前記欠陥線を孔あけする工程を更に含む、請求項1または11に記載の方法。
- 前記レーザビームのパルス持続時間が約1ピコ秒より大きく且つ約100ピコ秒未満の範囲内である、請求項1,11,12のいずれか一項記載の方法。
- 前記欠陥線を生成する前記工程が、0.2μm未満の内径を有する前記欠陥線を生成することを含む、請求項1,11,12,13のいずれか一項記載の方法。
Applications Claiming Priority (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201361917140P | 2013-12-17 | 2013-12-17 | |
US61/917,140 | 2013-12-17 | ||
US201462022888P | 2014-07-10 | 2014-07-10 | |
US62/022,888 | 2014-07-10 | ||
US14/529,801 | 2014-10-31 | ||
US14/529,801 US9687936B2 (en) | 2013-12-17 | 2014-10-31 | Transparent material cutting with ultrafast laser and beam optics |
PCT/US2014/070275 WO2015095014A1 (en) | 2013-12-17 | 2014-12-15 | Transparent material cutting with ultrafast laser and beam optics |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2017502844A JP2017502844A (ja) | 2017-01-26 |
JP2017502844A5 true JP2017502844A5 (ja) | 2018-02-01 |
JP6571085B2 JP6571085B2 (ja) | 2019-09-04 |
Family
ID=53367591
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016539263A Active JP6571085B2 (ja) | 2013-12-17 | 2014-12-15 | 超高速レーザおよびビーム光学系を用いた透明材料の切断 |
Country Status (8)
Country | Link |
---|---|
US (2) | US9687936B2 (ja) |
EP (1) | EP3083126B1 (ja) |
JP (1) | JP6571085B2 (ja) |
CN (1) | CN106170367A (ja) |
MX (1) | MX364462B (ja) |
RU (1) | RU2673258C1 (ja) |
TW (1) | TWI645929B (ja) |
WO (1) | WO2015095014A1 (ja) |
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-
2014
- 2014-10-31 US US14/529,801 patent/US9687936B2/en active Active
- 2014-12-15 RU RU2016128888A patent/RU2673258C1/ru not_active IP Right Cessation
- 2014-12-15 CN CN201480075659.1A patent/CN106170367A/zh active Pending
- 2014-12-15 EP EP14822005.6A patent/EP3083126B1/en active Active
- 2014-12-15 JP JP2016539263A patent/JP6571085B2/ja active Active
- 2014-12-15 MX MX2016007974A patent/MX364462B/es active IP Right Grant
- 2014-12-15 WO PCT/US2014/070275 patent/WO2015095014A1/en active Application Filing
- 2014-12-17 TW TW103144125A patent/TWI645929B/zh not_active IP Right Cessation
-
2017
- 2017-06-08 US US15/617,622 patent/US20170266757A1/en not_active Abandoned
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