JP2016529735A - 静電チャック用障壁層 - Google Patents
静電チャック用障壁層 Download PDFInfo
- Publication number
- JP2016529735A JP2016529735A JP2016538951A JP2016538951A JP2016529735A JP 2016529735 A JP2016529735 A JP 2016529735A JP 2016538951 A JP2016538951 A JP 2016538951A JP 2016538951 A JP2016538951 A JP 2016538951A JP 2016529735 A JP2016529735 A JP 2016529735A
- Authority
- JP
- Japan
- Prior art keywords
- electrostatic chuck
- dielectric
- layer
- barrier layer
- chuck according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000004888 barrier function Effects 0.000 title claims abstract description 34
- 239000010410 layer Substances 0.000 claims abstract description 97
- 239000002245 particle Substances 0.000 claims abstract description 26
- 239000011241 protective layer Substances 0.000 claims abstract description 11
- 239000000463 material Substances 0.000 claims description 25
- 229910010293 ceramic material Inorganic materials 0.000 claims description 11
- 239000012535 impurity Substances 0.000 claims description 11
- 229910052751 metal Inorganic materials 0.000 claims description 10
- 239000002184 metal Substances 0.000 claims description 10
- 239000002923 metal particle Substances 0.000 claims description 8
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 6
- 238000005468 ion implantation Methods 0.000 claims description 6
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 5
- 230000008859 change Effects 0.000 claims description 5
- 229910052802 copper Inorganic materials 0.000 claims description 5
- 239000010949 copper Substances 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 5
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 4
- 239000005388 borosilicate glass Substances 0.000 claims description 4
- 239000011133 lead Substances 0.000 claims description 4
- 229910052749 magnesium Inorganic materials 0.000 claims description 4
- 239000011777 magnesium Substances 0.000 claims description 4
- 229910052725 zinc Inorganic materials 0.000 claims description 4
- 239000011701 zinc Substances 0.000 claims description 4
- 230000000903 blocking effect Effects 0.000 claims 1
- 230000003647 oxidation Effects 0.000 claims 1
- 238000007254 oxidation reaction Methods 0.000 claims 1
- 150000002500 ions Chemical class 0.000 abstract description 5
- 238000010438 heat treatment Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 3
- 230000005686 electrostatic field Effects 0.000 description 3
- 230000005012 migration Effects 0.000 description 3
- 238000013508 migration Methods 0.000 description 3
- 150000004767 nitrides Chemical class 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 230000002411 adverse Effects 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000010884 ion-beam technique Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000011819 refractory material Substances 0.000 description 1
- 238000012216 screening Methods 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000005019 vapor deposition process Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
- H01L21/6833—Details of electrostatic chucks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
- B23Q3/00—Devices holding, supporting, or positioning work or tools, of a kind normally removable from the machine
- B23Q3/15—Devices for holding work using magnetic or electric force acting directly on the work
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
- H02N13/00—Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mechanical Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
Claims (15)
- 静電チャックであって、
絶縁ベースと、
前記絶縁ベース上に配置された1つ以上の導電性電極と、
誘電体最上層であって、前記電極が前記絶縁ベースと前記誘電体最上層との間に配置されるように、最上面と、その反対側の底面とを有する誘電体最上層と、
前記最上面に配置される障壁層であって、該障壁層は前記誘電体最上層内から前記静電チャック上にクランプされたワークへの粒子の移動を阻止する障壁層と
を備える静電チャック。 - 請求項1に記載の静電チャックにおいて、前記障壁層が窒化ケイ素を含む静電チャック。
- 請求項1に記載の静電チャックにおいて、前記誘電体最上層が酸化物材料又はセラミック材料を含み、前記酸化物材料又はセラミック材料に金属不純物が導入されて当該酸化物材料又はセラミック材料の熱的特性又は誘電特性を変え、前記移動する粒子が前記金属不純物を含む静電チャック。
- 請求項3に記載の静電チャックにおいて、前記移動する粒子がマグネシウム、鉛及び亜鉛から成る群より選択される静電チャック。
- 請求項1に記載の静電チャックにおいて、前記移動する粒子が前記電極の作製に使用される静電チャック。
- 請求項5に記載の静電チャックにおいて、前記移動する粒子が銅粒子を含む静電チャック。
- 請求項1に記載の静電チャックにおいて、前記障壁層上に配置された保護層を更に含む静電チャック。
- 請求項7に記載の静電チャックにおいて、前記保護層が1mm未満の厚さのホウケイ酸ガラスを含む静電チャック。
- 高温イオン注入に使用される静電チャックであって、
セラミック材料を含む絶縁ベースと、
前記絶縁ベース上に配置される1つ以上の導電性電極と、
誘電体最上層であって、前記電極が前記絶縁ベースと前記誘電体最上層との間に配置されるように、最上面と、その反対側の底面とを有し、金属不純物が導入された酸化物材料を含む誘電体最上層と、
前記最上面に配置された、窒化ケイ素を含む障壁層であって、前記誘電体最上層から前記静電チャックにクランプされたワークへの金属粒子の移動を阻止する障壁層と
を含む静電チャック。 - 請求項9に記載の静電チャックにおいて、前記金属粒子が前記酸化物材料に導入された前記金属不純物を含む静電チャック。
- 請求項10に記載の静電チャックにおいて、前記酸化物材料の熱的特性又は誘電特性を変えるために、前記金属不純物が導入された静電チャック。
- 請求項9に記載の静電チャックにおいて、前記金属粒子が前記電極の作製に使用される静電チャック。
- 請求項9に記載の静電チャックにおいて、前記金属粒子が、マグネシウム、鉛、銅及び亜鉛から成る群より選択される静電チャック。
- 請求項9に記載の静電チャックにおいて、前記障壁層上に配置された保護層を更に含む静電チャック。
- 請求項14に記載の静電チャックにおいて、前記保護層が1mm未満の厚さのホウケイ酸ガラスを含む静電チャック。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US14/011,169 US20150062772A1 (en) | 2013-08-27 | 2013-08-27 | Barrier Layer For Electrostatic Chucks |
US14/011,169 | 2013-08-27 | ||
PCT/US2014/050689 WO2015031041A1 (en) | 2013-08-27 | 2014-08-12 | Barrier layers for electrostatic chucks |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2016529735A true JP2016529735A (ja) | 2016-09-23 |
JP2016529735A5 JP2016529735A5 (ja) | 2017-08-31 |
JP6461967B2 JP6461967B2 (ja) | 2019-01-30 |
Family
ID=52582917
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016538951A Active JP6461967B2 (ja) | 2013-08-27 | 2014-08-12 | 静電チャック |
Country Status (6)
Country | Link |
---|---|
US (1) | US20150062772A1 (ja) |
JP (1) | JP6461967B2 (ja) |
KR (1) | KR102208229B1 (ja) |
CN (1) | CN105684139B (ja) |
TW (1) | TW201513263A (ja) |
WO (1) | WO2015031041A1 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW201517133A (zh) * | 2013-10-07 | 2015-05-01 | Applied Materials Inc | 使用熱佈植與奈秒退火致使銦鋁鎵氮化物材料系統中摻雜劑的高活化 |
US11378889B2 (en) * | 2020-10-29 | 2022-07-05 | Taiwan Semiconductor Manufacturing Company, Ltd. | Immersion lithography system and method of using |
KR20220158635A (ko) * | 2021-05-24 | 2022-12-01 | 주식회사 아모센스 | 정전 척, 이를 포함하는 정전 척 히터 및 반도체 유지장치 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1064986A (ja) * | 1996-05-08 | 1998-03-06 | Applied Materials Inc | 汚染抑制層を有する基板支持チャック及びその製造方法 |
JP2006287210A (ja) * | 2005-03-07 | 2006-10-19 | Ngk Insulators Ltd | 静電チャック及びその製造方法 |
JP2007527625A (ja) * | 2004-02-24 | 2007-09-27 | アプライド マテリアルズ インコーポレイテッド | 汚染物質削減基板移送およびサポートシステム |
JP2008098626A (ja) * | 2006-09-13 | 2008-04-24 | Ngk Insulators Ltd | 静電チャック及びその製造方法 |
JP2008124265A (ja) * | 2006-11-13 | 2008-05-29 | Nippon Steel Materials Co Ltd | 低熱膨張セラミックス部材及びその製造方法 |
JP2011176328A (ja) * | 2002-05-01 | 2011-09-08 | Trek Inc | 静電ウェハクランプ装置のための進歩したプラテン |
Family Cites Families (15)
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JPH11157953A (ja) * | 1997-12-02 | 1999-06-15 | Nhk Spring Co Ltd | セラミックスと金属との構造体及びそれを用いた静電チャック装置 |
US6890861B1 (en) * | 2000-06-30 | 2005-05-10 | Lam Research Corporation | Semiconductor processing equipment having improved particle performance |
KR100511854B1 (ko) * | 2002-06-18 | 2005-09-02 | 아네르바 가부시키가이샤 | 정전 흡착 장치 |
DE102006003591A1 (de) * | 2005-01-26 | 2006-08-17 | Disco Corporation | Laserstrahlbearbeitungsmaschine |
TW200735254A (en) * | 2006-03-03 | 2007-09-16 | Ngk Insulators Ltd | Electrostatic chuck and producing method thereof |
CN101467243B (zh) * | 2006-06-02 | 2012-08-08 | 萨尔泽曼塔普拉斯有限公司 | 防止衬底支座引起的金属污染的方法 |
US20080092806A1 (en) * | 2006-10-19 | 2008-04-24 | Applied Materials, Inc. | Removing residues from substrate processing components |
JP2008160093A (ja) * | 2006-11-29 | 2008-07-10 | Toto Ltd | 静電チャック、静電チャックの製造方法および基板処理装置 |
WO2009017088A1 (ja) * | 2007-08-02 | 2009-02-05 | Ulvac, Inc. | 静電チャック機構の製造方法 |
WO2009035002A1 (ja) * | 2007-09-11 | 2009-03-19 | Canon Anelva Corporation | 静電チャック |
JP5025576B2 (ja) | 2008-06-13 | 2012-09-12 | 新光電気工業株式会社 | 静電チャック及び基板温調固定装置 |
JP5343802B2 (ja) | 2009-09-30 | 2013-11-13 | 住友大阪セメント株式会社 | 静電チャック装置 |
JP5510411B2 (ja) * | 2010-08-11 | 2014-06-04 | Toto株式会社 | 静電チャック及び静電チャックの製造方法 |
KR101353157B1 (ko) * | 2010-12-28 | 2014-01-22 | 도쿄엘렉트론가부시키가이샤 | 정전 척 |
JP6010296B2 (ja) * | 2010-12-28 | 2016-10-19 | 東京エレクトロン株式会社 | 静電チャック |
-
2013
- 2013-08-27 US US14/011,169 patent/US20150062772A1/en not_active Abandoned
-
2014
- 2014-08-12 KR KR1020167008046A patent/KR102208229B1/ko active IP Right Grant
- 2014-08-12 JP JP2016538951A patent/JP6461967B2/ja active Active
- 2014-08-12 WO PCT/US2014/050689 patent/WO2015031041A1/en active Application Filing
- 2014-08-12 CN CN201480050762.0A patent/CN105684139B/zh active Active
- 2014-08-21 TW TW103128728A patent/TW201513263A/zh unknown
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1064986A (ja) * | 1996-05-08 | 1998-03-06 | Applied Materials Inc | 汚染抑制層を有する基板支持チャック及びその製造方法 |
JP2011176328A (ja) * | 2002-05-01 | 2011-09-08 | Trek Inc | 静電ウェハクランプ装置のための進歩したプラテン |
JP2007527625A (ja) * | 2004-02-24 | 2007-09-27 | アプライド マテリアルズ インコーポレイテッド | 汚染物質削減基板移送およびサポートシステム |
JP2006287210A (ja) * | 2005-03-07 | 2006-10-19 | Ngk Insulators Ltd | 静電チャック及びその製造方法 |
JP2008098626A (ja) * | 2006-09-13 | 2008-04-24 | Ngk Insulators Ltd | 静電チャック及びその製造方法 |
JP2008124265A (ja) * | 2006-11-13 | 2008-05-29 | Nippon Steel Materials Co Ltd | 低熱膨張セラミックス部材及びその製造方法 |
Also Published As
Publication number | Publication date |
---|---|
CN105684139B (zh) | 2019-03-26 |
WO2015031041A1 (en) | 2015-03-05 |
JP6461967B2 (ja) | 2019-01-30 |
US20150062772A1 (en) | 2015-03-05 |
KR20160048899A (ko) | 2016-05-04 |
KR102208229B1 (ko) | 2021-01-28 |
CN105684139A (zh) | 2016-06-15 |
TW201513263A (zh) | 2015-04-01 |
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