JP2016529702A - モノリシック3次元(3d)集積回路(ic)(3dic)技術を使用した完全システムオンチップ(soc) - Google Patents
モノリシック3次元(3d)集積回路(ic)(3dic)技術を使用した完全システムオンチップ(soc) Download PDFInfo
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Abstract
Description
[0001]本出願は、その全体が参照により本明細書に組み込まれる、2013年7月16日に出願された「COMPLETE SYSTEM-ON-CHIP (SOC) USING MONOLITHIC THREE DIMENSIONAL (3D) INTEGRATED CIRCUIT (IC) (3DIC) TECHNOLOGY」と題する米国仮特許出願第61/846,648号の優先権を主張する。
以下に、本願出願の当初の特許請求の範囲に記載された発明を付記する。
[C1]
重ねて配置された複数のティアと、
計算、デジタル処理、アナログ処理、無線周波数(RF)信号処理、アナログ/混合信号処理、電力管理、センサー、電源、バッテリー、メモリ、デジタル論理、低漏れ、低雑音/高利得、クロック、組合せ論理、および順序論理からなるグループから選択された複数の機能要素と、
前記複数のティアの間に分散された前記複数の機能要素と、
前記複数のティアを電気的に結合する複数のモノリシックティア間ビア(MIV)と、
完全自己充足型システムオンチップ(SOC)を与える前記複数の機能要素と
を備える、モノリシック3次元(3D)集積回路(IC)(3DIC)システム。
[C2]
前記複数のティアの各々が同等の水平寸法を有する、C1に記載の3DICシステム。
[C3]
前記複数のティアのうちの少なくとも1つのティアが高速動作のために最適化される、C1に記載の3DICシステム。
[C4]
前記複数のティアのうちの少なくとも1つのティアが低電流漏れのために最適化される、C1に記載の3DICシステム。
[C5]
前記複数の機能要素のうちの異なる機能要素が前記複数のティアのうちの異なるティア上に配置される、C1に記載の3DICシステム。
[C6]
前記複数のティアの第1のティアが、前記グループからの第1の機能を最適化するように構成された第1の技術タイプを備える、C1に記載の3DICシステム。
[C7]
前記複数のティアの第2のティアが、前記グループからの第2の機能を最適化するように構成された第2の技術タイプを備える、C6に記載の3DICシステム。
[C8]
前記複数のティアが第3のティアをさらに備える、C1に記載の3DICシステム。
[C9]
前記システムがRFトランシーバとして動作する、C1に記載の3DICシステム。
[C10]
前記ICがそこに一体化される、セットトップボックス、エンターテインメントユニット、ナビゲーションデバイス、通信デバイス、固定ロケーションデータユニット、モバイルロケーションデータユニット、モバイルフォン、セルラーフォン、コンピュータ、ポータブルコンピュータ、デスクトップコンピュータ、携帯情報端末(PDA)、モニタ、コンピュータモニタ、テレビジョン、チューナー、ラジオ、衛星ラジオ、音楽プレーヤ、デジタル音楽プレーヤ、ポータブル音楽プレーヤ、デジタルビデオプレーヤ、ビデオプレーヤ、デジタルビデオディスク(DVD)プレーヤ、およびポータブルデジタルビデオプレーヤからなるグループから選択されたデバイスをさらに備える、C1に記載の3DIC。
[C11]
重ねて配置された複数のティアと、
計算、デジタル処理、アナログ処理、無線周波数(RF)信号処理、アナログ/混合信号処理、電力管理、センサー、電源、バッテリー、メモリ、デジタル論理、低漏れ、低雑音/高利得、クロック、組合せ論理、および順序論理からなるグループから選択された複数の機能を与えるための手段と、
前記複数のティア間に分散された前記複数の機能を与えるための前記手段と、
前記複数のティアを電気的に相互結合するための手段と、
完全自己充足型システムオンチップ(SOC)を与える前記複数の機能を与えるための前記手段と
を備える、モノリシック3次元(3D)集積回路(IC)(3DIC)システム。
[C12]
前記複数のティアを電気的に相互結合するための前記手段が、モノリシックティア間ビア(MIV)を備える、C11に記載の3DICシステム。
[C13]
前記システムがRFトランシーバとして動作する、C11に記載の3DICシステム。
[C14]
3次元(3D)集積回路(IC)(3DIC)システムを実装する方法であって、
前記3DIC内の複数のティアを与えることと、
前記複数のティアにわたる複数の機能要素を与えることと、
モノリシックティア間ビア(MIV)を使用して前記複数のティアを相互結合することと、
前記3DICを用いた完全自己充足型システムオンチップ(SOC)を与えることと
を備える方法。
[C15]
前記複数のティアを与えることが、同等の水平寸法を有する複数のティアを備える、C14に記載の方法。
[C16]
前記複数のティアを与えることが、高速動作のために最適化された少なくとも1つのティアを与えることを備える、C14に記載の方法。
[C17]
前記複数のティアを与えることが、低電流漏れのために最適化された少なくとも1つのティアを与えることを備える、C14に記載の方法。
[C18]
前記複数の機能要素のうちの異なる機能要素が、前記複数のティアのうちの異なるティアの上に配置される、C14に記載の方法。
[C19]
前記複数のティアの第1のティアが、前記グループからの第1の機能を最適化するように構成された第1の技術タイプを備える、C14に記載の方法。
[C20]
前記複数のティアの第2のティアが、前記グループからの第2の機能を最適化するように構成された第2の技術タイプを備える、C19に記載の方法。
Claims (20)
- 重ねて配置された複数のティアと、
計算、デジタル処理、アナログ処理、無線周波数(RF)信号処理、アナログ/混合信号処理、電力管理、センサー、電源、バッテリー、メモリ、デジタル論理、低漏れ、低雑音/高利得、クロック、組合せ論理、および順序論理からなるグループから選択された複数の機能要素と、
前記複数のティアの間に分散された前記複数の機能要素と、
前記複数のティアを電気的に結合する複数のモノリシックティア間ビア(MIV)と、
完全自己充足型システムオンチップ(SOC)を与える前記複数の機能要素と
を備える、モノリシック3次元(3D)集積回路(IC)(3DIC)システム。 - 前記複数のティアの各々が同等の水平寸法を有する、請求項1に記載の3DICシステム。
- 前記複数のティアのうちの少なくとも1つのティアが高速動作のために最適化される、請求項1に記載の3DICシステム。
- 前記複数のティアのうちの少なくとも1つのティアが低電流漏れのために最適化される、請求項1に記載の3DICシステム。
- 前記複数の機能要素のうちの異なる機能要素が前記複数のティアのうちの異なるティア上に配置される、請求項1に記載の3DICシステム。
- 前記複数のティアの第1のティアが、前記グループからの第1の機能を最適化するように構成された第1の技術タイプを備える、請求項1に記載の3DICシステム。
- 前記複数のティアの第2のティアが、前記グループからの第2の機能を最適化するように構成された第2の技術タイプを備える、請求項6に記載の3DICシステム。
- 前記複数のティアが第3のティアをさらに備える、請求項1に記載の3DICシステム。
- 前記システムがRFトランシーバとして動作する、請求項1に記載の3DICシステム。
- 前記ICがそこに一体化される、セットトップボックス、エンターテインメントユニット、ナビゲーションデバイス、通信デバイス、固定ロケーションデータユニット、モバイルロケーションデータユニット、モバイルフォン、セルラーフォン、コンピュータ、ポータブルコンピュータ、デスクトップコンピュータ、携帯情報端末(PDA)、モニタ、コンピュータモニタ、テレビジョン、チューナー、ラジオ、衛星ラジオ、音楽プレーヤ、デジタル音楽プレーヤ、ポータブル音楽プレーヤ、デジタルビデオプレーヤ、ビデオプレーヤ、デジタルビデオディスク(DVD)プレーヤ、およびポータブルデジタルビデオプレーヤからなるグループから選択されたデバイスをさらに備える、請求項1に記載の3DIC。
- 重ねて配置された複数のティアと、
計算、デジタル処理、アナログ処理、無線周波数(RF)信号処理、アナログ/混合信号処理、電力管理、センサー、電源、バッテリー、メモリ、デジタル論理、低漏れ、低雑音/高利得、クロック、組合せ論理、および順序論理からなるグループから選択された複数の機能を与えるための手段と、
前記複数のティア間に分散された前記複数の機能を与えるための前記手段と、
前記複数のティアを電気的に相互結合するための手段と、
完全自己充足型システムオンチップ(SOC)を与える前記複数の機能を与えるための前記手段と
を備える、モノリシック3次元(3D)集積回路(IC)(3DIC)システム。 - 前記複数のティアを電気的に相互結合するための前記手段が、モノリシックティア間ビア(MIV)を備える、請求項11に記載の3DICシステム。
- 前記システムがRFトランシーバとして動作する、請求項11に記載の3DICシステム。
- 3次元(3D)集積回路(IC)(3DIC)システムを実装する方法であって、
前記3DIC内の複数のティアを与えることと、
前記複数のティアにわたる複数の機能要素を与えることと、
モノリシックティア間ビア(MIV)を使用して前記複数のティアを相互結合することと、
前記3DICを用いた完全自己充足型システムオンチップ(SOC)を与えることと
を備える方法。 - 前記複数のティアを与えることが、同等の水平寸法を有する複数のティアを備える、請求項14に記載の方法。
- 前記複数のティアを与えることが、高速動作のために最適化された少なくとも1つのティアを与えることを備える、請求項14に記載の方法。
- 前記複数のティアを与えることが、低電流漏れのために最適化された少なくとも1つのティアを与えることを備える、請求項14に記載の方法。
- 前記複数の機能要素のうちの異なる機能要素が、前記複数のティアのうちの異なるティアの上に配置される、請求項14に記載の方法。
- 前記複数のティアの第1のティアが、前記グループからの第1の機能を最適化するように構成された第1の技術タイプを備える、請求項14に記載の方法。
- 前記複数のティアの第2のティアが、前記グループからの第2の機能を最適化するように構成された第2の技術タイプを備える、請求項19に記載の方法。
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US14/013,399 | 2013-08-29 | ||
PCT/US2014/046503 WO2015009614A1 (en) | 2013-07-16 | 2014-07-14 | Complete system-on-chip (soc) using monolithic three dimensional (3d) integrated circuit (ic) (3dic) technology |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2019513985A (ja) * | 2016-04-15 | 2019-05-30 | コグニティヴ システムズ コーポレイション | 反復無線送信に基づく動き検出 |
Families Citing this family (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9418985B2 (en) | 2013-07-16 | 2016-08-16 | Qualcomm Incorporated | Complete system-on-chip (SOC) using monolithic three dimensional (3D) integrated circuit (IC) (3DIC) technology |
ES2798115T3 (es) * | 2014-06-20 | 2020-12-09 | Nagravision Sa | Módulo de interfaz física |
US9256246B1 (en) * | 2015-01-29 | 2016-02-09 | Qualcomm Incorporated | Clock skew compensation with adaptive body biasing in three-dimensional (3D) integrated circuits (ICs) (3DICs) |
US9628077B2 (en) * | 2015-03-04 | 2017-04-18 | Qualcomm Incorporated | Dual power swing pipeline design with separation of combinational and sequential logics |
CN105391823B (zh) * | 2015-11-25 | 2019-02-12 | 上海新储集成电路有限公司 | 一种降低移动设备尺寸和功耗的方法 |
CN105742277B (zh) * | 2016-04-13 | 2018-06-22 | 中国航天科技集团公司第九研究院第七七一研究所 | 一种大容量立体集成sram存储器三维扩展方法 |
US9754923B1 (en) * | 2016-05-09 | 2017-09-05 | Qualcomm Incorporated | Power gate placement techniques in three-dimensional (3D) integrated circuits (ICs) (3DICs) |
US9929149B2 (en) | 2016-06-21 | 2018-03-27 | Arm Limited | Using inter-tier vias in integrated circuits |
US9871020B1 (en) * | 2016-07-14 | 2018-01-16 | Globalfoundries Inc. | Through silicon via sharing in a 3D integrated circuit |
US10678985B2 (en) | 2016-08-31 | 2020-06-09 | Arm Limited | Method for generating three-dimensional integrated circuit design |
US9712168B1 (en) * | 2016-09-14 | 2017-07-18 | Qualcomm Incorporated | Process variation power control in three-dimensional (3D) integrated circuits (ICs) (3DICs) |
US10176147B2 (en) * | 2017-03-07 | 2019-01-08 | Qualcomm Incorporated | Multi-processor core three-dimensional (3D) integrated circuits (ICs) (3DICs), and related methods |
US10727965B2 (en) * | 2017-11-21 | 2020-07-28 | Western Digital Technologies, Inc. | System and method for time stamp synchronization |
US10719100B2 (en) | 2017-11-21 | 2020-07-21 | Western Digital Technologies, Inc. | System and method for time stamp synchronization |
CN110069795A (zh) * | 2018-01-23 | 2019-07-30 | 长芯半导体有限公司 | 快速定制芯片方法 |
GB2586050B (en) * | 2019-07-31 | 2021-11-10 | Murata Manufacturing Co | Power supply output device |
GB2586049B (en) * | 2019-07-31 | 2022-03-09 | Murata Manufacturing Co | Power supply output device |
US11270917B2 (en) * | 2020-06-01 | 2022-03-08 | Alibaba Group Holding Limited | Scalable and flexible architectures for integrated circuit (IC) design and fabrication |
CN112769402B (zh) * | 2020-12-21 | 2024-05-17 | 中国航天科工集团八五一一研究所 | 基于TSV技术的X/Ku波段宽带变频组件 |
EP4024222A1 (en) | 2021-01-04 | 2022-07-06 | Imec VZW | An integrated circuit with 3d partitioning |
KR102443742B1 (ko) * | 2021-02-08 | 2022-09-15 | 고려대학교 산학협력단 | 모놀리식 3d 집적 기술 기반 스크래치패드 메모리 |
US20220320045A1 (en) * | 2021-03-31 | 2022-10-06 | Taiwan Semiconductor Manufacturing Company Limited | Semiconductor device including power management die in a stack and methods of forming the same |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61131474A (ja) * | 1984-11-30 | 1986-06-19 | Agency Of Ind Science & Technol | 積層型半導体装置 |
JP2004165269A (ja) * | 2002-11-11 | 2004-06-10 | Canon Inc | 積層形半導体装置 |
JP2007529894A (ja) * | 2004-03-16 | 2007-10-25 | アーバー・カンパニー・リミテッド・ライアビリティ・パートナーシップ | ダイ素子が積層された再構成可能なプロセッサモジュール |
JP2012019018A (ja) * | 2010-07-07 | 2012-01-26 | Toshiba Corp | 半導体装置及びその製造方法 |
JP2012216776A (ja) * | 2011-03-31 | 2012-11-08 | Sony Corp | 半導体装置、および、その製造方法 |
WO2013075007A1 (en) * | 2011-11-16 | 2013-05-23 | Qualcomm Incorporated | Stacked chipset having an insulating layer and a secondary layer and method of forming same |
JP2013125917A (ja) * | 2011-12-16 | 2013-06-24 | Renesas Electronics Corp | 半導体装置および半導体装置の製造方法 |
Family Cites Families (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6046078A (en) * | 1997-04-28 | 2000-04-04 | Megamos Corp. | Semiconductor device fabrication with reduced masking steps |
US20030015768A1 (en) | 2001-07-23 | 2003-01-23 | Motorola, Inc. | Structure and method for microelectromechanical system (MEMS) devices integrated with other semiconductor structures |
WO2003030252A2 (en) | 2001-09-28 | 2003-04-10 | Hrl Laboratories, Llc | Process for producing interconnects |
KR100569590B1 (ko) | 2003-12-30 | 2006-04-10 | 매그나칩 반도체 유한회사 | 고주파 반도체 장치 및 그 제조방법 |
DE102006030267B4 (de) * | 2006-06-30 | 2009-04-16 | Advanced Micro Devices, Inc., Sunnyvale | Nano-Einprägetechnik mit erhöhter Flexibilität in Bezug auf die Justierung und die Formung von Strukturelementen |
US7692448B2 (en) | 2007-09-12 | 2010-04-06 | Neal Solomon | Reprogrammable three dimensional field programmable gate arrays |
US8136071B2 (en) | 2007-09-12 | 2012-03-13 | Neal Solomon | Three dimensional integrated circuits and methods of fabrication |
EP2161238B1 (fr) * | 2008-09-03 | 2011-06-08 | STMicroelectronics (Tours) SAS | Structure tridimensionnelle très haute densité |
US7986042B2 (en) * | 2009-04-14 | 2011-07-26 | Monolithic 3D Inc. | Method for fabrication of a semiconductor device and structure |
US8115511B2 (en) * | 2009-04-14 | 2012-02-14 | Monolithic 3D Inc. | Method for fabrication of a semiconductor device and structure |
US20110199116A1 (en) | 2010-02-16 | 2011-08-18 | NuPGA Corporation | Method for fabrication of a semiconductor device and structure |
KR20120027339A (ko) * | 2009-05-14 | 2012-03-21 | 에스알아이 인터내셔널 | 유기 광전자 소자를 위한 저비용 고효율의 투명한 유기 전극 |
TWI501380B (zh) * | 2010-01-29 | 2015-09-21 | Nat Chip Implementation Ct Nat Applied Res Lab | 多基板晶片模組堆疊之三維系統晶片結構 |
US8450779B2 (en) | 2010-03-08 | 2013-05-28 | International Business Machines Corporation | Graphene based three-dimensional integrated circuit device |
CN102024782B (zh) * | 2010-10-12 | 2012-07-25 | 北京大学 | 三维垂直互联结构及其制作方法 |
EP2469597A3 (en) | 2010-12-23 | 2016-06-29 | Commissariat à l'Énergie Atomique et aux Énergies Alternatives | Multi-level integrated circuit, device and method for modeling multi-level integrated circuits |
US8384215B2 (en) * | 2010-12-30 | 2013-02-26 | Industrial Technology Research Institute | Wafer level molding structure |
DE102011004581A1 (de) * | 2011-02-23 | 2012-08-23 | Globalfoundries Dresden Module One Limited Liability Company & Co. Kg | Technik zur Reduzierung der plasmahervorgerufenen Ätzschäden während der Herstellung von Kontaktdurchführungen in Zwischenschichtdielektrika durch modifizierten HF-Leistungshochlauf |
US8975670B2 (en) | 2011-03-06 | 2015-03-10 | Monolithic 3D Inc. | Semiconductor device and structure for heat removal |
US8796741B2 (en) | 2011-10-04 | 2014-08-05 | Qualcomm Incorporated | Semiconductor device and methods of making semiconductor device using graphene |
JP2013215917A (ja) | 2012-04-05 | 2013-10-24 | Seiko Epson Corp | 印刷装置、及び、印刷方法 |
CN103545275B (zh) * | 2012-07-12 | 2016-02-17 | 中芯国际集成电路制造(上海)有限公司 | 硅通孔封装结构及形成方法 |
US8889491B2 (en) * | 2013-01-28 | 2014-11-18 | International Business Machines Corporation | Method of forming electronic fuse line with modified cap |
US9171608B2 (en) * | 2013-03-15 | 2015-10-27 | Qualcomm Incorporated | Three-dimensional (3D) memory cell separation among 3D integrated circuit (IC) tiers, and related 3D integrated circuits (3DICS), 3DIC processor cores, and methods |
KR20140113024A (ko) * | 2013-03-15 | 2014-09-24 | 에스케이하이닉스 주식회사 | 저항 변화 메모리 장치 및 그 구동방법 |
US9418985B2 (en) | 2013-07-16 | 2016-08-16 | Qualcomm Incorporated | Complete system-on-chip (SOC) using monolithic three dimensional (3D) integrated circuit (IC) (3DIC) technology |
US9070711B2 (en) * | 2013-08-02 | 2015-06-30 | Globalfoundries Inc. | Methods of forming cap layers for semiconductor devices with self-aligned contact elements and the resulting devices |
-
2013
- 2013-08-29 US US14/013,399 patent/US9418985B2/en not_active Expired - Fee Related
-
2014
- 2014-06-30 TW TW103122569A patent/TWI618222B/zh not_active IP Right Cessation
- 2014-07-14 JP JP2016527009A patent/JP2016529702A/ja active Pending
- 2014-07-14 KR KR1020167003723A patent/KR101832330B1/ko active IP Right Grant
- 2014-07-14 CN CN201480039458.6A patent/CN105378918B/zh active Active
- 2014-07-14 BR BR112016000868-5A patent/BR112016000868B1/pt active IP Right Grant
- 2014-07-14 EP EP14747230.2A patent/EP3022766A1/en not_active Ceased
- 2014-07-14 WO PCT/US2014/046503 patent/WO2015009614A1/en active Application Filing
- 2014-07-14 CA CA2917586A patent/CA2917586C/en active Active
-
2016
- 2016-08-09 US US15/231,836 patent/US9583473B2/en active Active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61131474A (ja) * | 1984-11-30 | 1986-06-19 | Agency Of Ind Science & Technol | 積層型半導体装置 |
JP2004165269A (ja) * | 2002-11-11 | 2004-06-10 | Canon Inc | 積層形半導体装置 |
JP2007529894A (ja) * | 2004-03-16 | 2007-10-25 | アーバー・カンパニー・リミテッド・ライアビリティ・パートナーシップ | ダイ素子が積層された再構成可能なプロセッサモジュール |
JP2012019018A (ja) * | 2010-07-07 | 2012-01-26 | Toshiba Corp | 半導体装置及びその製造方法 |
JP2012216776A (ja) * | 2011-03-31 | 2012-11-08 | Sony Corp | 半導体装置、および、その製造方法 |
WO2013075007A1 (en) * | 2011-11-16 | 2013-05-23 | Qualcomm Incorporated | Stacked chipset having an insulating layer and a secondary layer and method of forming same |
JP2013125917A (ja) * | 2011-12-16 | 2013-06-24 | Renesas Electronics Corp | 半導体装置および半導体装置の製造方法 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2019513985A (ja) * | 2016-04-15 | 2019-05-30 | コグニティヴ システムズ コーポレイション | 反復無線送信に基づく動き検出 |
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BR112016000868A2 (ja) | 2017-07-25 |
US9418985B2 (en) | 2016-08-16 |
WO2015009614A1 (en) | 2015-01-22 |
US20160351553A1 (en) | 2016-12-01 |
CN105378918A (zh) | 2016-03-02 |
TW201513299A (zh) | 2015-04-01 |
US20150022262A1 (en) | 2015-01-22 |
BR112016000868B1 (pt) | 2022-08-16 |
CA2917586C (en) | 2019-02-12 |
CN105378918B (zh) | 2018-05-04 |
TWI618222B (zh) | 2018-03-11 |
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