JP2016526286A5 - - Google Patents
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- JP2016526286A5 JP2016526286A5 JP2016512958A JP2016512958A JP2016526286A5 JP 2016526286 A5 JP2016526286 A5 JP 2016526286A5 JP 2016512958 A JP2016512958 A JP 2016512958A JP 2016512958 A JP2016512958 A JP 2016512958A JP 2016526286 A5 JP2016526286 A5 JP 2016526286A5
- Authority
- JP
- Japan
- Prior art keywords
- metal film
- semiconductor substrate
- silicon
- back surface
- metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 229910052751 metal Inorganic materials 0.000 claims 53
- 239000002184 metal Substances 0.000 claims 53
- 238000000034 method Methods 0.000 claims 36
- 239000004065 semiconductor Substances 0.000 claims 30
- 239000000758 substrate Substances 0.000 claims 26
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 14
- 229910052582 BN Inorganic materials 0.000 claims 11
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims 11
- 239000007789 gas Substances 0.000 claims 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 8
- 229910021389 graphene Inorganic materials 0.000 claims 8
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 6
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims 6
- 229910052796 boron Inorganic materials 0.000 claims 6
- 229910052799 carbon Inorganic materials 0.000 claims 6
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims 4
- 229910052581 Si3N4 Inorganic materials 0.000 claims 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 4
- 229910000577 Silicon-germanium Inorganic materials 0.000 claims 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims 4
- 229910052710 silicon Inorganic materials 0.000 claims 4
- 239000010703 silicon Substances 0.000 claims 4
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims 4
- 229910052814 silicon oxide Inorganic materials 0.000 claims 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims 3
- 125000004432 carbon atom Chemical group C* 0.000 claims 3
- 229910052802 copper Inorganic materials 0.000 claims 3
- 239000010949 copper Substances 0.000 claims 3
- 229910052759 nickel Inorganic materials 0.000 claims 3
- 229910052757 nitrogen Inorganic materials 0.000 claims 3
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims 3
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 claims 2
- 229910001218 Gallium arsenide Inorganic materials 0.000 claims 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 claims 2
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims 2
- LEVVHYCKPQWKOP-UHFFFAOYSA-N [Si].[Ge] Chemical compound [Si].[Ge] LEVVHYCKPQWKOP-UHFFFAOYSA-N 0.000 claims 2
- 229910045601 alloy Inorganic materials 0.000 claims 2
- 239000000956 alloy Substances 0.000 claims 2
- 229910021529 ammonia Inorganic materials 0.000 claims 2
- BGECDVWSWDRFSP-UHFFFAOYSA-N borazine Chemical compound B1NBNBN1 BGECDVWSWDRFSP-UHFFFAOYSA-N 0.000 claims 2
- KDKYADYSIPSCCQ-UHFFFAOYSA-N but-1-yne Chemical compound CCC#C KDKYADYSIPSCCQ-UHFFFAOYSA-N 0.000 claims 2
- 229910017052 cobalt Inorganic materials 0.000 claims 2
- 239000010941 cobalt Substances 0.000 claims 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims 2
- 238000001816 cooling Methods 0.000 claims 2
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims 2
- 229910052742 iron Inorganic materials 0.000 claims 2
- 239000000463 material Substances 0.000 claims 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims 2
- 229910021421 monocrystalline silicon Inorganic materials 0.000 claims 2
- 229910052763 palladium Inorganic materials 0.000 claims 2
- 230000002093 peripheral effect Effects 0.000 claims 2
- 229910052697 platinum Inorganic materials 0.000 claims 2
- 229910052707 ruthenium Inorganic materials 0.000 claims 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims 2
- 229910010271 silicon carbide Inorganic materials 0.000 claims 2
- 235000012239 silicon dioxide Nutrition 0.000 claims 2
- 239000000377 silicon dioxide Substances 0.000 claims 2
- 229910015900 BF3 Inorganic materials 0.000 claims 1
- VWHCRPOEYZPVCP-UHFFFAOYSA-N ClB1N(Cl)BNBN1Cl Chemical compound ClB1N(Cl)BNBN1Cl VWHCRPOEYZPVCP-UHFFFAOYSA-N 0.000 claims 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 claims 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 claims 1
- 239000005977 Ethylene Substances 0.000 claims 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 claims 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 1
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 claims 1
- 239000001273 butane Substances 0.000 claims 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 claims 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 claims 1
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 claims 1
- 125000004433 nitrogen atom Chemical group N* 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
- 238000001020 plasma etching Methods 0.000 claims 1
- 239000002244 precipitate Substances 0.000 claims 1
- 230000001376 precipitating effect Effects 0.000 claims 1
- 239000001294 propane Substances 0.000 claims 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 claims 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 claims 1
- MWWATHDPGQKSAR-UHFFFAOYSA-N propyne Chemical compound CC#C MWWATHDPGQKSAR-UHFFFAOYSA-N 0.000 claims 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 claims 1
- FAQYAMRNWDIXMY-UHFFFAOYSA-N trichloroborane Chemical compound ClB(Cl)Cl FAQYAMRNWDIXMY-UHFFFAOYSA-N 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US13/890,316 | 2013-05-09 | ||
| US13/890,316 US9029228B2 (en) | 2011-10-19 | 2013-05-09 | Direct and sequential formation of monolayers of boron nitride and graphene on substrates |
| PCT/US2014/036405 WO2014182540A1 (en) | 2013-05-09 | 2014-05-01 | Direct and sequential formation of monolayers of boron nitride and graphene on substrates |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017198481A Division JP6488350B2 (ja) | 2013-05-09 | 2017-10-12 | 基板上の窒化ホウ素およびグラフェンの直接および連続形成 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016526286A JP2016526286A (ja) | 2016-09-01 |
| JP2016526286A5 true JP2016526286A5 (enExample) | 2017-06-15 |
| JP6228293B2 JP6228293B2 (ja) | 2017-11-08 |
Family
ID=50841980
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016512958A Active JP6228293B2 (ja) | 2013-05-09 | 2014-05-01 | 基板上の窒化ホウ素およびグラフェンの直接および連続形成 |
| JP2017198481A Active JP6488350B2 (ja) | 2013-05-09 | 2017-10-12 | 基板上の窒化ホウ素およびグラフェンの直接および連続形成 |
| JP2019031183A Active JP6567208B2 (ja) | 2013-05-09 | 2019-02-25 | 基板上の窒化ホウ素およびグラフェンの直接および連続形成 |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017198481A Active JP6488350B2 (ja) | 2013-05-09 | 2017-10-12 | 基板上の窒化ホウ素およびグラフェンの直接および連続形成 |
| JP2019031183A Active JP6567208B2 (ja) | 2013-05-09 | 2019-02-25 | 基板上の窒化ホウ素およびグラフェンの直接および連続形成 |
Country Status (5)
| Country | Link |
|---|---|
| EP (3) | EP4293707A3 (enExample) |
| JP (3) | JP6228293B2 (enExample) |
| KR (1) | KR102202991B1 (enExample) |
| ES (1) | ES2968152T3 (enExample) |
| WO (1) | WO2014182540A1 (enExample) |
Families Citing this family (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6213328B2 (ja) * | 2014-03-20 | 2017-10-18 | Jsr株式会社 | 膜形成用組成物、レジスト下層膜及びその形成方法並びにパターン形成方法 |
| JP2017037820A (ja) * | 2015-08-14 | 2017-02-16 | アルプス電気株式会社 | 接点材料、接点材料の製造方法、コネクタ、および電子・電気部品 |
| GB201514542D0 (en) | 2015-08-14 | 2015-09-30 | Thomas Simon C S | A method of producing graphene |
| JP6775804B2 (ja) * | 2016-05-12 | 2020-10-28 | グローバルウェーハズ カンパニー リミテッドＧｌｏｂａｌＷａｆｅｒｓ Ｃｏ．，Ｌｔｄ． | シリコン系誘電体上の六方晶窒化ホウ素の直接形成 |
| CN110167876B (zh) | 2017-01-06 | 2022-08-30 | 国立研究开发法人科学技术振兴机构 | 六方晶氮化硼薄膜及其制造方法 |
| CN107164739B (zh) * | 2017-06-12 | 2023-03-10 | 中国科学技术大学 | Cvd生长多层异质结的方法和装置 |
| KR101971550B1 (ko) * | 2017-07-26 | 2019-04-23 | 주식회사 오투마 | 섬모를 이용한 방열장치 |
| CN109534328B (zh) * | 2017-09-22 | 2022-06-24 | 天津大学 | 一种二维氮掺杂石墨烯及其制备方法 |
| KR102014132B1 (ko) * | 2017-11-28 | 2019-08-26 | 광운대학교 산학협력단 | 고성능 ｉｇｚｏ ｔｆｔ를 위한 저온 용액 공정 기반의 고품질 ａｌ２ｏ３ ｂｎ 절연막 제조 방법 및 그 ｉｇｚｏ ｔｆｔ |
| KR101986788B1 (ko) * | 2017-11-30 | 2019-06-07 | 한국세라믹기술원 | 단결정 성장 방법 및 중간 적층체 |
| KR102123016B1 (ko) * | 2018-02-28 | 2020-06-16 | 한국에너지기술연구원 | 기상반응에 의한 질화붕소 증착코팅 방법 |
| KR102783987B1 (ko) * | 2018-08-03 | 2025-03-21 | 삼성전자주식회사 | 나노결정질 그래핀의 형성방법 및 이를 포함하는 소자 |
| KR102072580B1 (ko) | 2018-11-06 | 2020-02-03 | 한국과학기술연구원 | 헥사고날 보론 니트라이드 박막의 제조 방법 및 이를 이용한 다층 구조의 제조 방법 및 스위칭 소자의 제조 방법 |
| WO2020184662A1 (ja) * | 2019-03-14 | 2020-09-17 | 国立大学法人東京工業大学 | ホウ素シートを用いた導電性および誘電体デバイス |
| CN110155991A (zh) * | 2019-04-24 | 2019-08-23 | 华东师范大学 | 一种氧化还原石墨烯和氮掺杂石墨烯的制备方法 |
| US11289582B2 (en) * | 2019-05-23 | 2022-03-29 | Taiwan Semiconductor Manufacturing Company, Ltd. | Single-crystal hexagonal boron nitride layer and method forming same |
| KR102837989B1 (ko) * | 2019-07-31 | 2025-07-24 | 주식회사 엘티아이 | 2d 물질 제조장치 |
| DE102019129789A1 (de) * | 2019-11-05 | 2021-05-06 | Aixtron Se | Verfahren zum Abscheiden einer zweidimensionalen Schicht sowie CVD-Reaktor |
| CN111072022A (zh) * | 2019-12-11 | 2020-04-28 | 中国科学院上海微系统与信息技术研究所 | 一种石墨薄膜的制备方法 |
| KR102314020B1 (ko) * | 2020-05-06 | 2021-10-15 | 아주대학교산학협력단 | 육방정계 질화붕소/그래핀 2차원 복합 소재 제조방법 |
| CN113979429B (zh) * | 2021-10-19 | 2023-04-07 | 中国科学院上海微系统与信息技术研究所 | 六方氮化硼表面扭转双层石墨烯及其制备方法 |
| KR20230152454A (ko) | 2022-04-27 | 2023-11-03 | 삼성전자주식회사 | 나노결정질 질화붕소막, 이를 포함하는 이미지 센서 및 전계 효과 트랜지스터, 및 나노결정질 질화붕소막의 제조 방법 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004161561A (ja) * | 2002-11-14 | 2004-06-10 | National Institute For Materials Science | 窒化ホウ素ナノチューブの製造方法 |
| US7619257B2 (en) * | 2006-02-16 | 2009-11-17 | Alcatel-Lucent Usa Inc. | Devices including graphene layers epitaxially grown on single crystal substrates |
| WO2009119641A1 (ja) * | 2008-03-26 | 2009-10-01 | 学校法人早稲田大学 | 単原子膜の製造方法 |
| US20130230722A1 (en) * | 2010-11-24 | 2013-09-05 | Fuji Electric Co., Ltd. | Conductive thin film and transparent conductive film comprising graphene |
| US8980217B2 (en) * | 2010-12-21 | 2015-03-17 | Nec Corporation | Method of manufacturing graphene substrate, and graphene substrate |
| GB201104824D0 (en) * | 2011-03-22 | 2011-05-04 | Univ Manchester | Structures and methods relating to graphene |
| JP6019640B2 (ja) * | 2011-03-23 | 2016-11-02 | 富士通株式会社 | 電子デバイス及びその製造方法 |
| US20140120270A1 (en) * | 2011-04-25 | 2014-05-01 | James M. Tour | Direct growth of graphene films on non-catalyst surfaces |
| JP2012246193A (ja) * | 2011-05-30 | 2012-12-13 | National Institute Of Advanced Industrial Science & Technology | 炭素膜の形成装置、及び炭素膜の形成方法 |
| JP5772299B2 (ja) * | 2011-06-29 | 2015-09-02 | 富士通株式会社 | 半導体デバイス及びその製造方法 |
| JP2013067549A (ja) * | 2011-09-06 | 2013-04-18 | Waseda Univ | 薄膜の形成方法 |
| US8884310B2 (en) * | 2011-10-19 | 2014-11-11 | Sunedison Semiconductor Limited (Uen201334164H) | Direct formation of graphene on semiconductor substrates |
| JP6031948B2 (ja) * | 2012-10-31 | 2016-11-24 | 株式会社デンソー | 半導体素子の製造方法 |
-
2014
- 2014-05-01 EP EP23206843.7A patent/EP4293707A3/en active Pending
- 2014-05-01 WO PCT/US2014/036405 patent/WO2014182540A1/en not_active Ceased
- 2014-05-01 ES ES14727142T patent/ES2968152T3/es active Active
- 2014-05-01 EP EP23206841.1A patent/EP4293706A3/en active Pending
- 2014-05-01 EP EP14727142.3A patent/EP2994933B1/en active Active
- 2014-05-01 KR KR1020157035025A patent/KR102202991B1/ko active Active
- 2014-05-01 JP JP2016512958A patent/JP6228293B2/ja active Active
-
2017
- 2017-10-12 JP JP2017198481A patent/JP6488350B2/ja active Active
-
2019
- 2019-02-25 JP JP2019031183A patent/JP6567208B2/ja active Active
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