JP2016509332A5 - - Google Patents

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Publication number
JP2016509332A5
JP2016509332A5 JP2015546533A JP2015546533A JP2016509332A5 JP 2016509332 A5 JP2016509332 A5 JP 2016509332A5 JP 2015546533 A JP2015546533 A JP 2015546533A JP 2015546533 A JP2015546533 A JP 2015546533A JP 2016509332 A5 JP2016509332 A5 JP 2016509332A5
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Japan
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layer
substrate
conductive layer
item
regions
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JP2015546533A
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Japanese (ja)
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JP2016509332A (ja
JP6700787B2 (ja
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Priority claimed from PCT/US2013/072624 external-priority patent/WO2014088950A1/en
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Publication of JP2016509332A5 publication Critical patent/JP2016509332A5/ja
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JP2015546533A 2012-12-07 2013-12-02 基板上に透明導電体を製作する方法 Expired - Fee Related JP6700787B2 (ja)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US201261734793P 2012-12-07 2012-12-07
US61/734,793 2012-12-07
US201361782634P 2013-03-14 2013-03-14
US61/782,634 2013-03-14
US201361840876P 2013-06-28 2013-06-28
US61/840,876 2013-06-28
PCT/US2013/072624 WO2014088950A1 (en) 2012-12-07 2013-12-02 Method of making transparent conductors on a substrate

Publications (3)

Publication Number Publication Date
JP2016509332A JP2016509332A (ja) 2016-03-24
JP2016509332A5 true JP2016509332A5 (enExample) 2016-12-22
JP6700787B2 JP6700787B2 (ja) 2020-05-27

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JP2015546533A Expired - Fee Related JP6700787B2 (ja) 2012-12-07 2013-12-02 基板上に透明導電体を製作する方法

Country Status (8)

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US (2) US10254786B2 (enExample)
EP (1) EP2929417A4 (enExample)
JP (1) JP6700787B2 (enExample)
KR (1) KR102145157B1 (enExample)
CN (1) CN104838342B (enExample)
BR (1) BR112015013033A2 (enExample)
SG (1) SG11201504125UA (enExample)
WO (1) WO2014088950A1 (enExample)

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR3000917B1 (fr) * 2013-01-11 2015-02-20 Bobst Lyon Procede de commande, pour commander une machine de transformation, machine de transformation et programme d'ordinateur pour realiser un tel procede de commande
BR112016002093A2 (pt) 2013-07-31 2017-08-01 3M Innovative Properties Co ligação de componentes eletrônicos para condutores transparentes de nanofios dotados de um padrão
WO2015031033A1 (en) 2013-08-28 2015-03-05 3M Innovative Properties Company Electronic assembly with fiducial marks for precision registration during subsequent processing steps
CN105593796B (zh) 2013-09-30 2019-01-04 3M创新有限公司 用于图案化的纳米线透明导体上的印刷导电图案的保护性涂层
EP3065951B1 (en) 2013-11-06 2019-07-31 3M Innovative Properties Company Microcontact printing stamps with functional features
US10166571B2 (en) * 2013-12-10 2019-01-01 Lg Display Co., Ltd. Refining method for microstructure
TWI564762B (zh) * 2015-04-22 2017-01-01 恆顥科技股份有限公司 觸控薄膜疊層卷的製作方法與所製得之觸控薄膜疊層片
US11284521B2 (en) 2015-06-30 2022-03-22 3M Innovative Properties, Company Electronic devices comprising a via and methods of forming such electronic devices
US10492305B2 (en) 2015-06-30 2019-11-26 3M Innovative Properties Company Patterned overcoat layer
KR20180033218A (ko) 2015-07-21 2018-04-02 쓰리엠 이노베이티브 프로퍼티즈 컴파니 전기전도성 필름, 조립체, 및 전기전도성 패턴에서 정전하를 제거하는 방법
KR102555869B1 (ko) * 2015-08-06 2023-07-13 삼성전자주식회사 도전체 및 그 제조 방법
WO2017034870A1 (en) 2015-08-21 2017-03-02 3M Innovative Properties Company Transparent conductors including metal traces and methods of making same
HUE071195T2 (hu) * 2015-12-04 2025-08-28 Leonhard Kurz Stiftung & Co Kg Fólia és eljárás a fólia elõállítására
WO2017159698A1 (ja) * 2016-03-18 2017-09-21 国立大学法人大阪大学 金属ナノワイヤ層が形成された基材及びその製造方法
JP6960416B2 (ja) 2016-05-25 2021-11-05 スリーエム イノベイティブ プロパティズ カンパニー タッチセンサのための基板
JP6647399B2 (ja) * 2016-07-08 2020-02-14 旭化成株式会社 導電性フィルム、電子ペーパー、タッチパネル、及びフラットパネルディスプレイ
WO2018122745A1 (en) 2016-12-29 2018-07-05 3M Innovative Properties Company Methods for preparing electrically conductive patterns and articles containing electrically conductive patterns
KR101841946B1 (ko) * 2017-02-24 2018-03-26 동우 화인켐 주식회사 장력 제어를 이용한 터치 센서 필름 제조방법
DE102017106055B4 (de) * 2017-03-21 2021-04-08 Tdk Corporation Trägersubstrat für stressempflindliches Bauelement und Verfahren zur Herstellung
EP3646069A1 (en) 2017-06-29 2020-05-06 3M Innovative Properties Company Article and methods of making the same
JP7253550B2 (ja) 2017-11-30 2023-04-06 スリーエム イノベイティブ プロパティズ カンパニー 自己支持型3層積層体を含む基板
US10058014B1 (en) 2017-12-13 2018-08-21 International Business Machines Corporation Conductive adhesive layer for gasket assembly
JP2021003806A (ja) * 2018-01-29 2021-01-14 スリーエム イノベイティブ プロパティズ カンパニー 糸状部材への印刷方法、及び糸状のこぎり
CN109871141B (zh) * 2018-12-29 2023-02-03 赣州市德普特科技有限公司 一种触摸屏制作工艺中的布线区保护方法
KR102755456B1 (ko) * 2019-01-04 2025-01-20 삼성디스플레이 주식회사 표시 장치 및 이의 제조 방법
US11261529B2 (en) * 2020-03-31 2022-03-01 Futuretech Capital, Inc. Reduced visibility conductive micro mesh touch sensor
KR102461794B1 (ko) * 2020-08-13 2022-11-02 한국과학기술연구원 은 나노와이어 메쉬 전극 및 이의 제조방법
CN114496352A (zh) * 2020-11-12 2022-05-13 天材创新材料科技(厦门)有限公司 纳米银线保护层结构及其制备方法
US12412678B2 (en) 2020-12-04 2025-09-09 Korea Advanced Institute Of Science And Technology Fabrication method of conductive nanonetworks through adaptation of sacrificial layer
KR102628299B1 (ko) 2020-12-04 2024-01-24 한국과학기술원 마스터몰드를 이용한 투명 전도성 네트워크 제조방법
US11961632B2 (en) 2020-12-04 2024-04-16 Korea Advanced Institute Of Science And Technology Fabrication method of conductive nanonetworks using mastermold
KR102722103B1 (ko) 2020-12-04 2024-10-28 한국과학기술원 나노마스크를 이용한 투명 전도성 네트워크 제조방법
KR102722102B1 (ko) 2020-12-04 2024-10-28 한국과학기술원 희생층을 이용한 투명 전도성 네트워크 제조방법
US11513638B2 (en) 2020-12-18 2022-11-29 Cambrios Film Solutions Corporation Silver nanowire protection layer structure and manufacturing method thereof
CN113764564B (zh) * 2021-08-31 2024-01-23 Tcl华星光电技术有限公司 基板制备方法及膜片结构
KR102691766B1 (ko) * 2022-10-25 2024-08-05 서울대학교산학협력단 나노와이어 함유 패턴의 제조방법 및 이를 이용하여 제조된 투명 전극

Family Cites Families (50)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3654384A (en) 1970-05-25 1972-04-04 Magnavox Co Apparatus for modifying electrical signals
US4895630A (en) 1985-08-28 1990-01-23 W. H. Brady Co. Rapidly removable undercoating for vacuum deposition of patterned layers onto substrates
JPH05224818A (ja) 1992-02-10 1993-09-03 Matsushita Electric Ind Co Ltd タッチパネル装置
TWI231293B (en) * 1997-11-12 2005-04-21 Jsr Corp Transfer film
US6037005A (en) * 1998-05-12 2000-03-14 3M Innovative Properties Company Display substrate electrodes with auxiliary metal layers for enhanced conductivity
US20030148024A1 (en) 2001-10-05 2003-08-07 Kodas Toivo T. Low viscosity precursor compositons and methods for the depositon of conductive electronic features
TWI268813B (en) * 2002-04-24 2006-12-21 Sipix Imaging Inc Process for forming a patterned thin film conductive structure on a substrate
KR100486915B1 (ko) 2002-09-12 2005-05-03 엘지전자 주식회사 포토필링법을 이용한 플라즈마 디스플레이 패널의 전극제조방법
US6975067B2 (en) 2002-12-19 2005-12-13 3M Innovative Properties Company Organic electroluminescent device and encapsulation method
US7175876B2 (en) 2003-06-27 2007-02-13 3M Innovative Properties Company Patterned coating method employing polymeric coatings
US7416993B2 (en) * 2003-09-08 2008-08-26 Nantero, Inc. Patterned nanowire articles on a substrate and methods of making the same
US20050196707A1 (en) 2004-03-02 2005-09-08 Eastman Kodak Company Patterned conductive coatings
ES2454551T3 (es) 2004-12-28 2014-04-10 Gemin X Pharmaceuticals Canada Inc. Compuestos dipirrólicos, composiciones, y métodos para el tratamiento del cáncer o enfermedades virales
CN103127523A (zh) * 2005-06-20 2013-06-05 Psma开发有限公司 Psma抗体-药物缀合物
SG150516A1 (en) 2005-08-12 2009-03-30 Cambrios Technologies Corp Nanowires-based transparent conductors
KR101095325B1 (ko) 2005-09-22 2011-12-16 후지필름 가부시키가이샤 광-투과성 전자파 차폐필름, 광-투과성 전자파 차폐필름의제조 방법, 디스플레이 패널용 필름, 디스플레이 패널용광학 필터 및 플라즈마 디스플레이 패널
US8264137B2 (en) 2006-01-03 2012-09-11 Samsung Electronics Co., Ltd. Curing binder material for carbon nanotube electron emission cathodes
US8461992B2 (en) 2006-05-12 2013-06-11 Solstice Medical, Llc RFID coupler for metallic implements
US20080048996A1 (en) 2006-08-11 2008-02-28 Unidym, Inc. Touch screen devices employing nanostructure networks
WO2008046058A2 (en) 2006-10-12 2008-04-17 Cambrios Technologies Corporation Nanowire-based transparent conductors and applications thereof
US8018568B2 (en) 2006-10-12 2011-09-13 Cambrios Technologies Corporation Nanowire-based transparent conductors and applications thereof
US7867907B2 (en) * 2006-10-17 2011-01-11 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing semiconductor device
WO2008127313A2 (en) * 2006-11-17 2008-10-23 The Regents Of The University Of California Electrically conducting and optically transparent nanowire networks
JP4902344B2 (ja) 2006-12-27 2012-03-21 富士フイルム株式会社 金属パターン材料の製造方法
KR100875168B1 (ko) * 2007-07-26 2008-12-22 주식회사 동부하이텍 반도체 소자의 금속배선 잔류 폴리머 제거방법
US8378046B2 (en) 2007-10-19 2013-02-19 3M Innovative Properties Company High refractive index pressure-sensitive adhesives
TWI500713B (zh) 2008-02-26 2015-09-21 Cambrios Technologies Corp 用於導電部件之噴墨沉積的方法及組合物
JP2011517367A (ja) 2008-02-28 2011-06-02 スリーエム イノベイティブ プロパティズ カンパニー 基材上に導電体をパターン化する方法
JP5086886B2 (ja) * 2008-05-15 2012-11-28 富士通コンポーネント株式会社 座標検出装置の製造方法
WO2010014679A2 (en) * 2008-08-01 2010-02-04 3M Innovative Properties Company Methods of making composite electrodes
JP5474097B2 (ja) 2009-02-06 2014-04-16 エルジー・ケム・リミテッド タッチスクリーンおよびその製造方法
US20100238133A1 (en) 2009-03-17 2010-09-23 Wintek Corporation Capacitive touch panel
JP2010271796A (ja) * 2009-05-19 2010-12-02 Optrex Corp 電極間接続構造およびタッチパネル
JP4737348B2 (ja) 2009-06-30 2011-07-27 Dic株式会社 透明導電層パターンの形成方法
WO2011025782A1 (en) 2009-08-24 2011-03-03 Cambrios Technologies Corporation Contact resistance measurement for resistance linearity in nanostructure thin films
CN101699376B (zh) 2009-09-04 2011-09-14 深超光电(深圳)有限公司 触控面板及触控面板的检测方法
US20110057905A1 (en) * 2009-09-04 2011-03-10 Hong-Chih Yu Touch Panel and Inspection Method Thereof
KR101073280B1 (ko) 2010-04-01 2011-10-12 삼성모바일디스플레이주식회사 터치 스크린 패널 및 이를 구비한 영상표시장치
US8236626B2 (en) * 2010-04-15 2012-08-07 The Board Of Trustees Of The Leland Stanford Junior University Narrow graphene nanoribbons from carbon nanotubes
US8865394B2 (en) * 2010-08-23 2014-10-21 Koninklijke Philips N.V. Self-aligned coverage of opaque conductive areas
KR101367569B1 (ko) * 2010-12-29 2014-02-28 주식회사 엘지화학 터치 스크린 및 이의 제조방법
WO2012105690A1 (ja) * 2011-02-04 2012-08-09 信越ポリマー株式会社 静電容量式センサーシートおよびその製造方法
US8558807B2 (en) 2011-02-15 2013-10-15 Teh-Zheng Lin Transparent touch panel
JP2012182005A (ja) 2011-03-01 2012-09-20 Nitto Denko Corp 有機エレクトロルミネッセンス素子の製法
US8854326B2 (en) 2011-03-10 2014-10-07 Wintek Corporation Touch panel and touch-sensitive display device
KR101812606B1 (ko) * 2011-04-26 2017-12-27 니폰 메크트론 가부시키가이샤 투명인쇄회로 제조방법 및 투명터치패널 제조방법
KR20120127556A (ko) * 2011-05-14 2012-11-22 정병현 투명 도전막 에칭 방법
JP5806066B2 (ja) 2011-09-30 2015-11-10 富士フイルム株式会社 電極パターン、タッチパネル、液晶表示装置及び、有機elディスプレイ
KR101373044B1 (ko) * 2012-04-19 2014-03-11 삼성디스플레이 주식회사 터치 스크린 패널
WO2015061048A1 (en) 2013-10-23 2015-04-30 3M Innovative Properties Company System and method for making a textured film

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