JP2016134455A5 - - Google Patents
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- Publication number
- JP2016134455A5 JP2016134455A5 JP2015007228A JP2015007228A JP2016134455A5 JP 2016134455 A5 JP2016134455 A5 JP 2016134455A5 JP 2015007228 A JP2015007228 A JP 2015007228A JP 2015007228 A JP2015007228 A JP 2015007228A JP 2016134455 A5 JP2016134455 A5 JP 2016134455A5
- Authority
- JP
- Japan
- Prior art keywords
- region
- semiconductor device
- resistor
- power
- high concentration
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 claims 16
- 239000000758 substrate Substances 0.000 claims 4
- 238000001514 detection method Methods 0.000 claims 2
- 239000002184 metal Substances 0.000 claims 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims 1
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015007228A JP6436791B2 (ja) | 2015-01-16 | 2015-01-16 | 半導体装置 |
| TW104143865A TWI666731B (zh) | 2015-01-16 | 2015-12-25 | 半導體裝置 |
| US14/987,528 US9472547B2 (en) | 2015-01-16 | 2016-01-04 | Semiconductor device |
| KR1020160003341A KR102432745B1 (ko) | 2015-01-16 | 2016-01-11 | 반도체 장치 |
| CN201610025886.4A CN105810678B (zh) | 2015-01-16 | 2016-01-15 | 半导体装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015007228A JP6436791B2 (ja) | 2015-01-16 | 2015-01-16 | 半導体装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016134455A JP2016134455A (ja) | 2016-07-25 |
| JP2016134455A5 true JP2016134455A5 (enExample) | 2017-12-14 |
| JP6436791B2 JP6436791B2 (ja) | 2018-12-12 |
Family
ID=56408409
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015007228A Active JP6436791B2 (ja) | 2015-01-16 | 2015-01-16 | 半導体装置 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US9472547B2 (enExample) |
| JP (1) | JP6436791B2 (enExample) |
| KR (1) | KR102432745B1 (enExample) |
| CN (1) | CN105810678B (enExample) |
| TW (1) | TWI666731B (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6305468B2 (ja) | 2016-07-06 | 2018-04-04 | 株式会社ニトムズ | 粘着クリーナー |
| JP2018055742A (ja) * | 2016-09-28 | 2018-04-05 | エイブリック株式会社 | 不揮発性半導体記憶装置 |
| WO2020162013A1 (ja) * | 2019-02-07 | 2020-08-13 | 富士電機株式会社 | 半導体装置 |
| CN114761773B (zh) * | 2019-05-21 | 2025-08-05 | 触控解决方案股份有限公司 | 芯片级封装中的组合式近红外和中红外传感器 |
| TWI742613B (zh) * | 2020-04-14 | 2021-10-11 | 聯陽半導體股份有限公司 | 積體電路的溫度感測裝置 |
| CN111682070A (zh) * | 2020-07-30 | 2020-09-18 | 电子科技大学 | 抑制可控型采样场效应晶体管负温度特性的器件 |
| US12176289B2 (en) | 2022-03-24 | 2024-12-24 | International Business Machines Corporation | Semiconductor device design mitigating latch-up |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0693485B2 (ja) * | 1985-11-29 | 1994-11-16 | 日本電装株式会社 | 半導体装置 |
| JP2522208B2 (ja) * | 1987-03-19 | 1996-08-07 | 日本電装株式会社 | 半導体装置 |
| JP3125529B2 (ja) * | 1993-08-23 | 2001-01-22 | 富士電機株式会社 | 半導体装置 |
| JP2701824B2 (ja) | 1996-02-09 | 1998-01-21 | 株式会社デンソー | 半導体装置 |
| JP3431127B2 (ja) * | 1997-03-31 | 2003-07-28 | 松下電器産業株式会社 | 電子装置および電子スイッチ装置 |
| DE102004021393B4 (de) * | 2004-04-30 | 2006-06-14 | Infineon Technologies Ag | Feldeffekt-Leistungstransistor |
| DE102004047752B3 (de) * | 2004-09-30 | 2006-01-26 | Infineon Technologies Ag | Halbleiterbauteil mit Temperatursensor |
| JP5028748B2 (ja) * | 2005-04-15 | 2012-09-19 | 富士電機株式会社 | パワー半導体デバイスの温度計測装置 |
| JP5125106B2 (ja) * | 2007-01-15 | 2013-01-23 | 株式会社デンソー | 半導体装置 |
| JP2008198821A (ja) * | 2007-02-14 | 2008-08-28 | Ricoh Co Ltd | 過熱保護回路を備える定電圧回路を内蔵した半導体装置 |
| JP4934491B2 (ja) * | 2007-05-09 | 2012-05-16 | 株式会社リコー | 過熱保護回路およびそれを具備する電子機器、ならびにその制御方法 |
| JP2008301305A (ja) * | 2007-06-01 | 2008-12-11 | Renesas Technology Corp | 半導体集積回路 |
| US8089134B2 (en) * | 2008-02-06 | 2012-01-03 | Fuji Electric Sytems Co., Ltd. | Semiconductor device |
| DE102008011816B4 (de) * | 2008-02-29 | 2015-05-28 | Advanced Micro Devices, Inc. | Temperaturüberwachung in einem Halbleiterbauelement unter Anwendung eines pn-Übergangs auf der Grundlage von Silizium/Germaniummaterial |
| JP5391955B2 (ja) * | 2009-09-15 | 2014-01-15 | 株式会社リコー | 半導体装置 |
| US9559162B2 (en) * | 2013-06-19 | 2017-01-31 | Globalfoundries Inc. | Thermoresistance sensor structure for integrated circuits and method of making |
-
2015
- 2015-01-16 JP JP2015007228A patent/JP6436791B2/ja active Active
- 2015-12-25 TW TW104143865A patent/TWI666731B/zh active
-
2016
- 2016-01-04 US US14/987,528 patent/US9472547B2/en active Active
- 2016-01-11 KR KR1020160003341A patent/KR102432745B1/ko active Active
- 2016-01-15 CN CN201610025886.4A patent/CN105810678B/zh active Active
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