JP2016009753A5 - - Google Patents
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- Publication number
- JP2016009753A5 JP2016009753A5 JP2014129203A JP2014129203A JP2016009753A5 JP 2016009753 A5 JP2016009753 A5 JP 2016009753A5 JP 2014129203 A JP2014129203 A JP 2014129203A JP 2014129203 A JP2014129203 A JP 2014129203A JP 2016009753 A5 JP2016009753 A5 JP 2016009753A5
- Authority
- JP
- Japan
- Prior art keywords
- layer
- magnetic
- magnetic recording
- magnetization
- magnetic layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010410 layer Substances 0.000 description 38
- 230000005415 magnetization Effects 0.000 description 12
- 239000011241 protective layer Substances 0.000 description 7
- 238000000034 method Methods 0.000 description 5
- 239000003575 carbonaceous material Substances 0.000 description 4
- 239000000956 alloy Substances 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000010687 lubricating oil Substances 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014129203A JP6375719B2 (ja) | 2014-06-24 | 2014-06-24 | 磁性薄膜および磁性薄膜を含む応用デバイス |
| SG11201607105PA SG11201607105PA (en) | 2014-06-24 | 2015-05-19 | Magnetic thin film and application device including magnetic thin film |
| MYPI2016703118A MY175040A (en) | 2014-06-24 | 2015-05-19 | Magnetic thin film and application device including magnetic thin film |
| PCT/JP2015/002519 WO2015198523A1 (ja) | 2014-06-24 | 2015-05-19 | 磁性薄膜および磁性薄膜を含む応用デバイス |
| CN201580011466.4A CN106062900B (zh) | 2014-06-24 | 2015-05-19 | 磁性薄膜以及包括磁性薄膜的应用设备 |
| US15/251,056 US10115890B2 (en) | 2014-06-24 | 2016-08-30 | Magnetic thin film and application device including magnetic thin film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014129203A JP6375719B2 (ja) | 2014-06-24 | 2014-06-24 | 磁性薄膜および磁性薄膜を含む応用デバイス |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016009753A JP2016009753A (ja) | 2016-01-18 |
| JP2016009753A5 true JP2016009753A5 (enExample) | 2017-06-15 |
| JP6375719B2 JP6375719B2 (ja) | 2018-08-22 |
Family
ID=54937635
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014129203A Active JP6375719B2 (ja) | 2014-06-24 | 2014-06-24 | 磁性薄膜および磁性薄膜を含む応用デバイス |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US10115890B2 (enExample) |
| JP (1) | JP6375719B2 (enExample) |
| CN (1) | CN106062900B (enExample) |
| MY (1) | MY175040A (enExample) |
| SG (1) | SG11201607105PA (enExample) |
| WO (1) | WO2015198523A1 (enExample) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2017135767A1 (ko) | 2016-02-05 | 2017-08-10 | 한양대학교 산학협력단 | 메모리 소자 |
| JP6884322B2 (ja) | 2016-10-31 | 2021-06-09 | 国立大学法人福井大学 | ２次元光走査ミラー装置の製造方法 |
| TWI626162B (zh) * | 2017-06-07 | 2018-06-11 | 國立清華大學 | 合金膜結晶織構誘導方法及其結構 |
| JP2019047119A (ja) * | 2017-09-04 | 2019-03-22 | Tdk株式会社 | 磁気抵抗効果素子、磁気メモリ、および磁気デバイス |
| US10468592B1 (en) * | 2018-07-09 | 2019-11-05 | Applied Materials, Inc. | Magnetic tunnel junctions and methods of fabrication thereof |
| CN110246656A (zh) * | 2019-07-02 | 2019-09-17 | 西华大学 | 一种多层耦合图形化磁性薄膜及制备和测试方法 |
| JP2020115217A (ja) * | 2020-03-24 | 2020-07-30 | 国立大学法人福井大学 | ２次元光走査ミラー装置、２次元光走査装置及び画像投影装置 |
| CN113460951B (zh) * | 2021-07-06 | 2023-07-25 | 北方工业大学 | 一种主动式mems固态制冷器件及其制造方法 |
| JP7587795B2 (ja) * | 2021-08-16 | 2024-11-21 | 株式会社デンソー | 正方晶系薄膜構造体 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI222630B (en) | 2001-04-24 | 2004-10-21 | Matsushita Electric Industrial Co Ltd | Magnetoresistive element and magnetoresistive memory device using the same |
| JP4024499B2 (ja) * | 2001-08-15 | 2007-12-19 | 株式会社東芝 | 磁気抵抗効果素子、磁気ヘッド及び磁気再生装置 |
| JP4686430B2 (ja) * | 2002-03-28 | 2011-05-25 | 株式会社東芝 | 磁気抵抗効果素子、磁気ヘッド及び磁気再生装置 |
| JP3749873B2 (ja) * | 2002-03-28 | 2006-03-01 | 株式会社東芝 | 磁気抵抗効果素子、磁気ヘッド及び磁気再生装置 |
| JP2005333106A (ja) | 2004-04-20 | 2005-12-02 | Ken Takahashi | 交換結合素子とその製造方法並びに交換結合素子を具備したデバイス |
| JP2007150265A (ja) * | 2005-10-28 | 2007-06-14 | Toshiba Corp | 磁気抵抗効果素子および磁気記憶装置 |
| US20070096229A1 (en) | 2005-10-28 | 2007-05-03 | Masatoshi Yoshikawa | Magnetoresistive element and magnetic memory device |
| US20080057350A1 (en) | 2006-09-01 | 2008-03-06 | Heraeus, Inc. | Magnetic media and sputter targets with compositions of high anisotropy alloys and oxide compounds |
| JP2008098523A (ja) * | 2006-10-13 | 2008-04-24 | Toshiba Corp | 磁気抵抗効果素子および磁気メモリ |
| JP5550007B2 (ja) * | 2008-12-05 | 2014-07-16 | 国立大学法人東北大学 | 磁性薄膜及びその製造方法、並びにこのような磁性薄膜を用いた各種応用デバイス |
| JP4903277B2 (ja) * | 2010-01-26 | 2012-03-28 | 株式会社日立製作所 | 磁気抵抗効果素子、それを用いた磁気メモリセル及びランダムアクセスメモリ |
| JP5811672B2 (ja) * | 2011-08-04 | 2015-11-11 | 富士電機株式会社 | 垂直磁気記録媒体およびその製造方法 |
| JP2014056624A (ja) * | 2012-09-11 | 2014-03-27 | Fuji Electric Co Ltd | 規則化合金を含む薄膜およびその製造方法 |
-
2014
- 2014-06-24 JP JP2014129203A patent/JP6375719B2/ja active Active
-
2015
- 2015-05-19 WO PCT/JP2015/002519 patent/WO2015198523A1/ja not_active Ceased
- 2015-05-19 SG SG11201607105PA patent/SG11201607105PA/en unknown
- 2015-05-19 CN CN201580011466.4A patent/CN106062900B/zh active Active
- 2015-05-19 MY MYPI2016703118A patent/MY175040A/en unknown
-
2016
- 2016-08-30 US US15/251,056 patent/US10115890B2/en active Active
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