JP2015530346A5 - - Google Patents
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- Publication number
- JP2015530346A5 JP2015530346A5 JP2015529991A JP2015529991A JP2015530346A5 JP 2015530346 A5 JP2015530346 A5 JP 2015530346A5 JP 2015529991 A JP2015529991 A JP 2015529991A JP 2015529991 A JP2015529991 A JP 2015529991A JP 2015530346 A5 JP2015530346 A5 JP 2015530346A5
- Authority
- JP
- Japan
- Prior art keywords
- titania
- silica
- glass
- range
- niobia
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 38
- 239000011521 glass Substances 0.000 claims description 38
- 239000000463 material Substances 0.000 claims description 27
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 26
- 238000010438 heat treatment Methods 0.000 claims description 19
- 239000000377 silicon dioxide Substances 0.000 claims description 13
- 238000007711 solidification Methods 0.000 claims description 10
- 230000008023 solidification Effects 0.000 claims description 10
- 239000002243 precursor Substances 0.000 claims description 9
- 239000004071 soot Substances 0.000 claims description 8
- 150000002822 niobium compounds Chemical class 0.000 claims description 6
- 238000001816 cooling Methods 0.000 claims description 5
- 239000001307 helium Substances 0.000 claims description 4
- 229910052734 helium Inorganic materials 0.000 claims description 4
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 4
- 239000000203 mixture Substances 0.000 claims description 4
- 230000032683 aging Effects 0.000 claims description 3
- 239000011230 binding agent Substances 0.000 claims description 3
- 238000002425 crystallisation Methods 0.000 claims description 3
- 230000008025 crystallization Effects 0.000 claims description 3
- 238000007872 degassing Methods 0.000 claims description 3
- 239000003349 gelling agent Substances 0.000 claims description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 claims description 3
- 238000001035 drying Methods 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims description 2
- 230000036962 time dependent Effects 0.000 claims description 2
- 229910004298 SiO 2 Inorganic materials 0.000 claims 1
- 238000000034 method Methods 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 238000007605 air drying Methods 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 229910052758 niobium Inorganic materials 0.000 description 2
- 239000010955 niobium Substances 0.000 description 2
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 2
- 238000000137 annealing Methods 0.000 description 1
- 230000003139 buffering effect Effects 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261694932P | 2012-08-30 | 2012-08-30 | |
| US61/694,932 | 2012-08-30 | ||
| PCT/US2013/057041 WO2014036116A1 (en) | 2012-08-30 | 2013-08-28 | Niobium doped silica titania glass and method of preparation |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015530346A JP2015530346A (ja) | 2015-10-15 |
| JP2015530346A5 true JP2015530346A5 (enExample) | 2016-10-13 |
| JP6302910B2 JP6302910B2 (ja) | 2018-04-11 |
Family
ID=49118827
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015529991A Expired - Fee Related JP6302910B2 (ja) | 2012-08-30 | 2013-08-28 | ニオブがドープされたシリカチタニアガラスおよび製造方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US8987155B2 (enExample) |
| EP (1) | EP2890651B1 (enExample) |
| JP (1) | JP6302910B2 (enExample) |
| WO (1) | WO2014036116A1 (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9505649B2 (en) * | 2013-09-13 | 2016-11-29 | Corning Incorporated | Ultralow expansion glass |
| US10017413B2 (en) | 2014-11-26 | 2018-07-10 | Corning Incorporated | Doped silica-titania glass having low expansivity and methods of making the same |
| US9822030B2 (en) * | 2015-02-13 | 2017-11-21 | Corning Incorporated | Ultralow expansion titania-silica glass |
| US10464840B2 (en) | 2016-10-05 | 2019-11-05 | Corning Incorporated | Near infrared shielding and laser-resistant window |
| KR102586150B1 (ko) | 2016-12-21 | 2023-10-06 | 코닝 인코포레이티드 | 소결 시스템 및 소결된 물품 |
Family Cites Families (40)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3673049A (en) * | 1970-10-07 | 1972-06-27 | Corning Glass Works | Glass laminated bodies comprising a tensilely stressed core and a compressively stressed surface layer fused thereto |
| US3801294A (en) | 1971-12-15 | 1974-04-02 | Corning Glass Works | Method of producing glass |
| US3806570A (en) * | 1972-03-30 | 1974-04-23 | Corning Glass Works | Method for producing high quality fused silica |
| US3785722A (en) | 1972-06-20 | 1974-01-15 | Corning Glass Works | USE OF SiO{11 -NB{11 O{11 {11 AND/OR Ta{11 O{11 {11 GLASSES AS ULTRAVIOLET FILTERS |
| JPS6191024A (ja) | 1984-10-05 | 1986-05-09 | Seiko Epson Corp | 円筒状シリカ系ガラスの製造方法 |
| US4961767A (en) | 1987-05-20 | 1990-10-09 | Corning Incorporated | Method for producing ultra-high purity, optical quality, glass articles |
| EP0369091A1 (en) | 1988-11-15 | 1990-05-23 | Battelle Memorial Institute | Method for manufacturing amorphous silica objects |
| US5028568A (en) | 1989-07-05 | 1991-07-02 | Wisconsin Alumni Research Foundation | Niobium-doped titanium membranes |
| DE69104859T2 (de) | 1990-02-07 | 1995-04-27 | Shinetsu Chemical Co | Epoxidharzzusammensetzungen, enthaltend hochtransparente Kieselsäure-Titandioxid-Glaskugeln. |
| JP3115366B2 (ja) | 1991-09-02 | 2000-12-04 | 株式会社トクヤマ | シリカ−チタニアガラスの製造方法 |
| EP0535388A1 (en) | 1991-09-03 | 1993-04-07 | Konica Corporation | A blank member and a glass optical element and processes for manufacturing them |
| JPH09202652A (ja) * | 1995-11-24 | 1997-08-05 | Olympus Optical Co Ltd | 屈折率分布型光学素子の製造方法 |
| JP4002625B2 (ja) | 1996-03-19 | 2007-11-07 | 株式会社鈴木製作所 | 横ピロー三方シールフイルム包装方法および包装機 |
| US6309991B1 (en) | 1996-08-29 | 2001-10-30 | Corning Incorporated | Silica with low compaction under high energy irradiation |
| US6209357B1 (en) | 1998-07-21 | 2001-04-03 | Lucent Technologies Inc. | Method for forming article using sol-gel processing |
| US5970751A (en) | 1998-09-22 | 1999-10-26 | Corning Incorporated | Fused SiO2 -TiO2 glass method |
| US6931097B1 (en) | 1999-07-22 | 2005-08-16 | Corning Incorporated | Extreme ultraviolet soft x-ray projection lithographic method system and lithographic elements |
| US6442977B1 (en) | 2000-06-20 | 2002-09-03 | Fitel Usa Corp. | Sol-gel process for fabricating germanium-doped silica article |
| US6457329B1 (en) | 2000-12-14 | 2002-10-01 | Fitel Usa Corp. | Process for fabricating sol-gel article involving low-shrinkage formulation |
| US8047023B2 (en) | 2001-04-27 | 2011-11-01 | Corning Incorporated | Method for producing titania-doped fused silica glass |
| US6832493B2 (en) | 2002-02-27 | 2004-12-21 | Corning Incorporated | High purity glass bodies formed by zero shrinkage casting |
| US7053017B2 (en) | 2002-03-05 | 2006-05-30 | Corning Incorporated | Reduced striae extreme ultraviolet elements |
| CN100350571C (zh) * | 2002-04-04 | 2007-11-21 | 东曹株式会社 | 石英玻璃喷镀部件及其制造方法 |
| JP2004131373A (ja) | 2002-09-09 | 2004-04-30 | Corning Inc | シリカ・チタニア極端紫外線光学素子の製造方法 |
| JP4792705B2 (ja) * | 2003-04-03 | 2011-10-12 | 旭硝子株式会社 | ＴｉＯ２を含有するシリカガラスおよびその製造法 |
| JP4792706B2 (ja) * | 2003-04-03 | 2011-10-12 | 旭硝子株式会社 | ＴｉＯ２を含有するシリカガラスおよびその製造方法 |
| JP5367204B2 (ja) | 2003-04-03 | 2013-12-11 | 旭硝子株式会社 | ＴｉＯ２を含有するシリカガラスおよびＥＵＶリソグラフィ用光学部材 |
| EP1471038A3 (de) * | 2003-04-26 | 2005-11-23 | Schott Ag | Verfahren zur Herstellung von Glaskörpern aus dotiertem Quarzglas |
| US7155936B2 (en) | 2003-08-08 | 2007-01-02 | Corning Incorporated | Doped silica glass articles and methods of forming doped silica glass boules and articles |
| JP4492123B2 (ja) * | 2004-01-05 | 2010-06-30 | 旭硝子株式会社 | シリカガラス |
| KR101160861B1 (ko) * | 2004-07-01 | 2012-07-02 | 아사히 가라스 가부시키가이샤 | ＴｉＯ₂를 함유한 실리카계 유리 및 그 제조 공정 |
| US20060179879A1 (en) | 2004-12-29 | 2006-08-17 | Ellison Adam J G | Adjusting expansivity in doped silica glasses |
| JP5035516B2 (ja) * | 2005-12-08 | 2012-09-26 | 信越化学工業株式会社 | フォトマスク用チタニアドープ石英ガラスの製造方法 |
| JP5058649B2 (ja) | 2007-03-29 | 2012-10-24 | 株式会社沖データ | 定着器制御装置及び画像形成装置 |
| JP5428323B2 (ja) * | 2007-12-27 | 2014-02-26 | 旭硝子株式会社 | ＴｉＯ２を含有するシリカガラス |
| JP5644058B2 (ja) * | 2008-03-21 | 2014-12-24 | 旭硝子株式会社 | ＴｉＯ２を含有するシリカガラス |
| WO2011021609A1 (ja) * | 2009-08-19 | 2011-02-24 | 旭硝子株式会社 | ＴｉＯ2を含有するシリカガラスおよびＥＵＶリソグラフィ用光学部材 |
| US8328417B2 (en) | 2009-08-20 | 2012-12-11 | Corning Incorporated | Photoelastic method for absolute determination of zero CTE crossover in low expansion silica-titania glass samples |
| US8713969B2 (en) | 2009-08-31 | 2014-05-06 | Corning Incorporated | Tuning Tzc by the annealing of ultra low expansion glass |
| US8541325B2 (en) | 2010-02-25 | 2013-09-24 | Corning Incorporated | Low expansivity, high transmission titania doped silica glass |
-
2013
- 2013-08-22 US US13/973,428 patent/US8987155B2/en not_active Expired - Fee Related
- 2013-08-28 WO PCT/US2013/057041 patent/WO2014036116A1/en not_active Ceased
- 2013-08-28 EP EP13759399.2A patent/EP2890651B1/en not_active Not-in-force
- 2013-08-28 JP JP2015529991A patent/JP6302910B2/ja not_active Expired - Fee Related
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