JP2015522852A5 - - Google Patents
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- JP2015522852A5 JP2015522852A5 JP2015520303A JP2015520303A JP2015522852A5 JP 2015522852 A5 JP2015522852 A5 JP 2015522852A5 JP 2015520303 A JP2015520303 A JP 2015520303A JP 2015520303 A JP2015520303 A JP 2015520303A JP 2015522852 A5 JP2015522852 A5 JP 2015522852A5
- Authority
- JP
- Japan
- Prior art keywords
- array
- prism
- machining
- plane
- optical component
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 230000003287 optical effect Effects 0.000 claims description 157
- 238000003754 machining Methods 0.000 claims description 80
- 239000000758 substrate Substances 0.000 claims description 62
- 238000004519 manufacturing process Methods 0.000 claims description 40
- 238000012545 processing Methods 0.000 claims description 3
- 239000010408 film Substances 0.000 description 96
- 238000000034 method Methods 0.000 description 59
- 229920000642 polymer Polymers 0.000 description 53
- 230000010287 polarization Effects 0.000 description 45
- 239000000463 material Substances 0.000 description 40
- 239000000853 adhesive Substances 0.000 description 37
- 230000001070 adhesive effect Effects 0.000 description 37
- 239000002243 precursor Substances 0.000 description 28
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 17
- 238000000576 coating method Methods 0.000 description 15
- 239000011248 coating agent Substances 0.000 description 14
- 238000003491 array Methods 0.000 description 12
- 238000003801 milling Methods 0.000 description 12
- 239000011521 glass Substances 0.000 description 11
- 239000012788 optical film Substances 0.000 description 11
- 238000005520 cutting process Methods 0.000 description 9
- 229920000058 polyacrylate Polymers 0.000 description 9
- 229920006254 polymer film Polymers 0.000 description 9
- 239000006096 absorbing agent Substances 0.000 description 8
- 238000005498 polishing Methods 0.000 description 7
- 230000007246 mechanism Effects 0.000 description 6
- 229920003023 plastic Polymers 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 5
- 229910003460 diamond Inorganic materials 0.000 description 4
- 239000010432 diamond Substances 0.000 description 4
- 238000000608 laser ablation Methods 0.000 description 4
- 229920000515 polycarbonate Polymers 0.000 description 4
- 239000004417 polycarbonate Substances 0.000 description 4
- QNRATNLHPGXHMA-XZHTYLCXSA-N (r)-(6-ethoxyquinolin-4-yl)-[(2s,4s,5r)-5-ethyl-1-azabicyclo[2.2.2]octan-2-yl]methanol;hydrochloride Chemical compound Cl.C([C@H]([C@H](C1)CC)C2)CN1[C@@H]2[C@H](O)C1=CC=NC2=CC=C(OCC)C=C21 QNRATNLHPGXHMA-XZHTYLCXSA-N 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 230000000704 physical effect Effects 0.000 description 3
- 239000004820 Pressure-sensitive adhesive Substances 0.000 description 2
- 230000003667 anti-reflective effect Effects 0.000 description 2
- 238000004630 atomic force microscopy Methods 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 239000011253 protective coating Substances 0.000 description 2
- 229920006353 Acrylite® Polymers 0.000 description 1
- 229920000089 Cyclic olefin copolymer Polymers 0.000 description 1
- 229920005372 Plexiglas® Polymers 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000003848 UV Light-Curing Methods 0.000 description 1
- 229920006397 acrylic thermoplastic Polymers 0.000 description 1
- 230000006978 adaptation Effects 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000004624 confocal microscopy Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 150000001925 cycloalkenes Chemical class 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000002296 dynamic light scattering Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000007524 flame polishing Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000013007 heat curing Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 238000005305 interferometry Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 238000003698 laser cutting Methods 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000010137 moulding (plastic) Methods 0.000 description 1
- 239000005304 optical glass Substances 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920003258 poly(methylsilmethylene) Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 238000013061 process characterization study Methods 0.000 description 1
- 238000001314 profilometry Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261664948P | 2012-06-27 | 2012-06-27 | |
| US61/664,948 | 2012-06-27 | ||
| PCT/US2013/046683 WO2014004228A1 (en) | 2012-06-27 | 2013-06-20 | Optical component array |
Related Child Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018115921A Division JP6876653B2 (ja) | 2012-06-27 | 2018-06-19 | 光学部品アレイ |
| JP2018145777A Division JP6876656B2 (ja) | 2012-06-27 | 2018-08-02 | 光学部品アレイ |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015522852A JP2015522852A (ja) | 2015-08-06 |
| JP2015522852A5 true JP2015522852A5 (enExample) | 2017-08-17 |
| JP6382803B2 JP6382803B2 (ja) | 2018-08-29 |
Family
ID=49783755
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015520303A Expired - Fee Related JP6382803B2 (ja) | 2012-06-27 | 2013-06-20 | 光学部品アレイ |
| JP2018115921A Expired - Fee Related JP6876653B2 (ja) | 2012-06-27 | 2018-06-19 | 光学部品アレイ |
| JP2018145777A Expired - Fee Related JP6876656B2 (ja) | 2012-06-27 | 2018-08-02 | 光学部品アレイ |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018115921A Expired - Fee Related JP6876653B2 (ja) | 2012-06-27 | 2018-06-19 | 光学部品アレイ |
| JP2018145777A Expired - Fee Related JP6876656B2 (ja) | 2012-06-27 | 2018-08-02 | 光学部品アレイ |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US9841605B2 (enExample) |
| JP (3) | JP6382803B2 (enExample) |
| KR (1) | KR20150024416A (enExample) |
| CN (1) | CN104428696B (enExample) |
| TW (1) | TWI611212B (enExample) |
| WO (1) | WO2014004228A1 (enExample) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9851576B2 (en) | 2012-08-15 | 2017-12-26 | 3M Innovative Properties Company | Polarizing beam splitter plates providing high resolution images and systems utilizing such polarizing beam splitter plates |
| EP3208651A1 (en) | 2013-12-23 | 2017-08-23 | 3M Innovative Properties Company | Optical article |
| JP6324096B2 (ja) * | 2014-02-05 | 2018-05-16 | 旭化成株式会社 | 偏光ビームスプリッタ及び偏光分離素子の製造方法 |
| CN104934330A (zh) * | 2015-05-08 | 2015-09-23 | 京东方科技集团股份有限公司 | 一种薄膜晶体管及其制备方法、阵列基板和显示面板 |
| CN105549248A (zh) * | 2016-02-02 | 2016-05-04 | 西安中科微精光子制造科技有限公司 | 微显示器动态目标仿真模块 |
| JP6730871B2 (ja) * | 2016-04-07 | 2020-07-29 | デクセリアルズ株式会社 | 光学体、窓材及びロールカーテン |
| TWI652530B (zh) | 2016-05-04 | 2019-03-01 | 中強光電股份有限公司 | 稜鏡模組以及顯示裝置 |
| TWM538171U (zh) | 2016-11-11 | 2017-03-11 | 揚昇照明股份有限公司 | 稜鏡組及使用其之顯示裝置 |
| DE102017205844A1 (de) * | 2017-04-06 | 2018-10-11 | Robert Bosch Gmbh | Lichttransmissionselement, optische Empfangseinheit, optische Aktoreinheit, LiDAR-System, Arbeitsvorrichtung und Fahrzeug |
| GB2580822B (en) * | 2017-09-11 | 2022-07-13 | Orafol Americas Inc | Methods of fabricating retroreflector prisms with polygonal apertures and devices thereof |
| WO2019082162A1 (en) * | 2017-10-27 | 2019-05-02 | 3M Innovative Properties Company | LIGHT ORIENTATION ARTICLE WITH CONFORMING SELF-TIMER |
| KR102482724B1 (ko) * | 2017-12-19 | 2022-12-28 | 엘지디스플레이 주식회사 | 광학 필름 및 그를 이용한 백라이트 유닛과 표시 장치 |
| US10447424B2 (en) * | 2018-01-18 | 2019-10-15 | Apple Inc. | Spatial multiplexing scheme |
| JP7411255B2 (ja) * | 2018-07-16 | 2024-01-11 | ルムス エルティーディー． | 偏光された内部反射体を採用する導光光学素子 |
| CN109164663B (zh) * | 2018-08-21 | 2020-08-25 | 中国科学技术大学 | 一种小型化纠缠源及其制备方法、以及设备无关量子随机数发生器 |
| US11493606B1 (en) | 2018-09-12 | 2022-11-08 | Apple Inc. | Multi-beam scanning system |
| CN111158159B (zh) * | 2018-11-08 | 2021-09-21 | 舜宇光学（浙江）研究院有限公司 | 用于投影系统的偏振复用器件 |
| CN111196050B (zh) * | 2018-11-16 | 2021-09-14 | 佳胜科技股份有限公司 | 液晶聚合物薄膜的加工方法及其装置 |
| WO2021002484A2 (ja) | 2019-10-31 | 2021-01-07 | クミアイ化学工業株式会社 | 除草剤及びその中間体の製造方法 |
| CN113138469A (zh) * | 2020-01-17 | 2021-07-20 | 中国科学院长春光学精密机械与物理研究所 | 一种具有空间光阵列分束功能器件的装调装置 |
| CN111399240B (zh) * | 2020-04-26 | 2021-02-02 | 腾景科技股份有限公司 | 一种激光全内反合色棱镜 |
| CN112180666A (zh) * | 2020-11-04 | 2021-01-05 | 南华智能精密机器(深圳)有限公司 | 一种lcd投影机光学系统和投影方法 |
| CN114895505B (zh) * | 2020-12-03 | 2024-04-26 | 嘉兴驭光光电科技有限公司 | 用于实现激光点阵的投射模组 |
| JP7761007B2 (ja) * | 2020-12-15 | 2025-10-28 | Ａｇｃ株式会社 | 光学素子 |
| IT202100028076A1 (it) * | 2021-11-04 | 2023-05-04 | Nexter S R L | Sensore per rilevamento di impulsi e/o livelli luminosi |
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| US3739455A (en) | 1971-04-05 | 1973-06-19 | Humphrey Res Ass | Method of making fresnelled optical element matrix |
| US3827798A (en) | 1971-04-05 | 1974-08-06 | Optical Res & Dev Corp | Optical element of reduced thickness |
| US3829536A (en) | 1971-04-05 | 1974-08-13 | Humphrey Res Ass | Method of forming an optical element of reduced thickness |
| JPS6234104A (ja) * | 1985-08-06 | 1987-02-14 | Mitsubishi Electric Corp | 偏光ビ−ムスプリツタ及びその製造方法 |
| JPH03126910A (ja) * | 1989-10-13 | 1991-05-30 | Mitsubishi Rayon Co Ltd | 偏光光源装置及び偏光ビームスプリッター |
| EP0422661A3 (en) * | 1989-10-13 | 1992-07-01 | Mitsubishi Rayon Co., Ltd | Polarization forming optical device and polarization beam splitter |
| JP2989710B2 (ja) * | 1991-04-09 | 1999-12-13 | キヤノン株式会社 | 板状偏光素子、該素子を備える偏光変換ユニット、および該ユニットを備える画像装置と画像投影装置 |
| US5751480A (en) * | 1991-04-09 | 1998-05-12 | Canon Kabushiki Kaisha | Plate-like polarizing element, a polarizing conversion unit provided with the element, and a projector provided with the unit |
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| US5400179A (en) * | 1992-02-18 | 1995-03-21 | Asahi Kogaku Kogyo Kabushiki Kaisha | Optical multilayer thin film and beam splitter |
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| US6404550B1 (en) * | 1996-07-25 | 2002-06-11 | Seiko Epson Corporation | Optical element suitable for projection display apparatus |
| TW349175B (en) * | 1996-09-30 | 1999-01-01 | Siemens Ag | Method to produce a beam-division-form-body and its arrangement in an opto-electronic module |
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| US6597510B2 (en) | 2001-11-02 | 2003-07-22 | Corning Incorporated | Methods and apparatus for making optical devices including microlens arrays |
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| US20040227994A1 (en) * | 2003-05-16 | 2004-11-18 | Jiaying Ma | Polarizing beam splitter and projection systems using the polarizing beam splitter |
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| US7074463B2 (en) * | 2003-09-12 | 2006-07-11 | 3M Innovative Properties Company | Durable optical element |
| US7619824B2 (en) | 2003-11-18 | 2009-11-17 | Merlin Technology Limited Liability Company | Variable optical arrays and variable manufacturing methods |
| US7268950B2 (en) | 2003-11-18 | 2007-09-11 | Merlin Technology Limited Liability Company | Variable optical arrays and variable manufacturing methods |
| CN100449351C (zh) | 2003-11-18 | 2009-01-07 | 莫林技术有限公司 | 可变光阵列和该可变光学阵列的制作方法 |
| KR100661365B1 (ko) * | 2005-04-27 | 2006-12-27 | 삼성전자주식회사 | 액정표시장치 |
| US7362507B2 (en) * | 2005-07-29 | 2008-04-22 | 3M Innovative Properties Company | Polarizing beam splitter |
| CN1908753A (zh) * | 2005-08-05 | 2007-02-07 | 鸿富锦精密工业（深圳）有限公司 | 偏振光转换器、其制造方法及背光模组 |
| JP4860268B2 (ja) * | 2006-01-13 | 2012-01-25 | 富士フイルム株式会社 | プリズムの製造方法、プリズム、光ピックアップ及び液晶プロジェクタ |
| JP2007279692A (ja) * | 2006-03-13 | 2007-10-25 | Epson Toyocom Corp | 偏光分離素子とその製造方法 |
| JP2007249129A (ja) * | 2006-03-20 | 2007-09-27 | Epson Toyocom Corp | 波長分離素子、波長分離素子の製造方法及び光モジュール |
| WO2008042648A1 (en) * | 2006-09-29 | 2008-04-10 | 3M Innovative Properties Company | Adhesives inhibiting formation of artifacts in polymer based optical elements |
| US20080231780A1 (en) * | 2007-03-22 | 2008-09-25 | Sabic Innovative Plastics Ip Bv | Low-absorptive diffuser sheet and film stacks for direct-lit backlighting |
| KR100957496B1 (ko) * | 2007-11-26 | 2010-05-14 | 엘지전자 주식회사 | 반사형 편광 필름, 이를 포함하는 백라이트 유닛 및액정표시장치 |
| US8619354B2 (en) * | 2008-12-24 | 2013-12-31 | Samsung Electronics Co., Ltd. | High speed optical shutter, method of operating the same and apparatus including the same |
| SG175840A1 (en) * | 2009-05-04 | 2011-12-29 | 3M Innovative Properties Co | Methods for making microreplication tools |
| WO2011050233A1 (en) | 2009-10-24 | 2011-04-28 | 3M Innovative Properties Company | Immersed asymmetric reflector with reduced color |
| WO2012063882A1 (ja) * | 2010-11-09 | 2012-05-18 | コニカミノルタオプト株式会社 | ウェハーレンズの製造方法 |
| DE102011087846B4 (de) * | 2011-12-06 | 2013-10-24 | Schildtec GmbH | Verfahren zum Herstellen optischer Strahlteilerwürfel |
| DE102012221011B3 (de) * | 2012-11-16 | 2014-04-10 | Schildtec GmbH | Verfahren zum Herstellen optischer Strahlteilerwürfel |
-
2013
- 2013-06-20 JP JP2015520303A patent/JP6382803B2/ja not_active Expired - Fee Related
- 2013-06-20 KR KR20157001599A patent/KR20150024416A/ko not_active Withdrawn
- 2013-06-20 WO PCT/US2013/046683 patent/WO2014004228A1/en not_active Ceased
- 2013-06-20 US US14/399,989 patent/US9841605B2/en active Active
- 2013-06-20 CN CN201380033079.1A patent/CN104428696B/zh not_active Expired - Fee Related
- 2013-06-26 TW TW102122772A patent/TWI611212B/zh not_active IP Right Cessation
-
2017
- 2017-11-14 US US15/812,023 patent/US10578884B2/en not_active Expired - Fee Related
-
2018
- 2018-06-19 JP JP2018115921A patent/JP6876653B2/ja not_active Expired - Fee Related
- 2018-08-02 JP JP2018145777A patent/JP6876656B2/ja not_active Expired - Fee Related
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