JP2015504568A - エッチングされたシリコン構造、エッチングされたシリコン構造を形成する方法及びそれらの使用 - Google Patents
エッチングされたシリコン構造、エッチングされたシリコン構造を形成する方法及びそれらの使用 Download PDFInfo
- Publication number
- JP2015504568A JP2015504568A JP2014533992A JP2014533992A JP2015504568A JP 2015504568 A JP2015504568 A JP 2015504568A JP 2014533992 A JP2014533992 A JP 2014533992A JP 2014533992 A JP2014533992 A JP 2014533992A JP 2015504568 A JP2015504568 A JP 2015504568A
- Authority
- JP
- Japan
- Prior art keywords
- silicon
- etched
- copper
- aqueous
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
- H01M4/04—Processes of manufacture in general
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
- H01M4/04—Processes of manufacture in general
- H01M4/0402—Methods of deposition of the material
- H01M4/0404—Methods of deposition of the material by coating on electrode collectors
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
- H01M4/13—Electrodes for accumulators with non-aqueous electrolyte, e.g. for lithium-accumulators; Processes of manufacture thereof
- H01M4/134—Electrodes based on metals, Si or alloys
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
- H01M4/13—Electrodes for accumulators with non-aqueous electrolyte, e.g. for lithium-accumulators; Processes of manufacture thereof
- H01M4/139—Processes of manufacture
- H01M4/1395—Processes of manufacture of electrodes based on metals, Si or alloys
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
- H01M4/36—Selection of substances as active materials, active masses, active liquids
- H01M4/38—Selection of substances as active materials, active masses, active liquids of elements or alloys
- H01M4/386—Silicon or alloys based on silicon
-
- H10P50/642—
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M10/00—Secondary cells; Manufacture thereof
- H01M10/05—Accumulators with non-aqueous electrolyte
- H01M10/052—Li-accumulators
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M2220/00—Batteries for particular applications
- H01M2220/30—Batteries in portable systems, e.g. mobile phone, laptop
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/10—Energy storage using batteries
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Inorganic Chemistry (AREA)
- Weting (AREA)
- Silicon Compounds (AREA)
- ing And Chemical Polishing (AREA)
- Secondary Cells (AREA)
- Battery Electrode And Active Subsutance (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB1117279.8 | 2011-10-06 | ||
| GBGB1117279.8A GB201117279D0 (en) | 2011-10-06 | 2011-10-06 | Etched silicon structures, method of forming etched silicon structures and uses thereof |
| PCT/GB2012/052483 WO2013050785A1 (en) | 2011-10-06 | 2012-10-05 | Etched silicon structures, method of forming etched silicon structures and uses thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2015504568A true JP2015504568A (ja) | 2015-02-12 |
| JP2015504568A5 JP2015504568A5 (enExample) | 2015-11-26 |
Family
ID=45035271
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014533992A Pending JP2015504568A (ja) | 2011-10-06 | 2012-10-05 | エッチングされたシリコン構造、エッチングされたシリコン構造を形成する方法及びそれらの使用 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20140248539A1 (enExample) |
| EP (1) | EP2764563B1 (enExample) |
| JP (1) | JP2015504568A (enExample) |
| KR (1) | KR20140083006A (enExample) |
| CN (1) | CN103988342A (enExample) |
| GB (2) | GB201117279D0 (enExample) |
| WO (1) | WO2013050785A1 (enExample) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2015513912A (ja) * | 2012-04-02 | 2015-05-18 | モデルナ セラピューティクス インコーポレイテッドModerna Therapeutics,Inc. | タンパク質の産生のための修飾ポリヌクレオチド |
| JP2015518705A (ja) * | 2012-04-02 | 2015-07-06 | モデルナ セラピューティクス インコーポレイテッドModerna Therapeutics,Inc. | ヒト疾患に関連する生物製剤およびタンパク質の産生のための修飾ポリヌクレオチド |
| JP2020026965A (ja) * | 2018-08-09 | 2020-02-20 | 株式会社東芝 | 処理システム、貴金属の触媒層に関する判断方法、及び、物品の製造方法 |
| WO2021167434A1 (ko) * | 2020-02-20 | 2021-08-26 | 한양대학교 에리카산학협력단 | 금속 음극 전극, 이를 포함하는 이차 전지, 및 그 제조 방법 |
| JPWO2022065450A1 (enExample) * | 2020-09-25 | 2022-03-31 | ||
| US12444764B2 (en) | 2020-02-20 | 2025-10-14 | Flexolyte | Complex fiber, solid state electrolyte comprising same, and metal-air battery comprising same |
Families Citing this family (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB201122315D0 (en) * | 2011-12-23 | 2012-02-01 | Nexeon Ltd | Etched silicon structures, method of forming etched silicon structures and uses thereof |
| WO2014193124A1 (ko) * | 2013-05-30 | 2014-12-04 | 주식회사 엘지화학 | 다공성 실리콘계 음극 활물질, 이의 제조 방법, 및 이를 포함하는 리튬 이차전지 |
| EP3033788A1 (en) * | 2013-08-14 | 2016-06-22 | Board of Regents, The University of Texas System | Methods of fabricating silicon nanowires and devices containing silicon nanowires |
| WO2015065394A1 (en) | 2013-10-30 | 2015-05-07 | Hewlett-Packard Development Company, L.P. | Island etched filter passages |
| CN105682780B (zh) * | 2013-10-30 | 2018-03-13 | 惠普发展公司,有限责任合伙企业 | 不平行岛蚀刻 |
| CN105103346B (zh) * | 2013-12-03 | 2018-11-06 | 株式会社Lg 化学 | 多孔性硅类负极活性物质及其制备方法、以及包含它的锂二次电池 |
| CN104803342B (zh) * | 2014-01-23 | 2016-08-17 | 清华大学 | 碗状金属纳米结构的制备方法 |
| JP6121959B2 (ja) * | 2014-09-11 | 2017-04-26 | 株式会社東芝 | エッチング方法、物品及び半導体装置の製造方法、並びにエッチング液 |
| KR101677023B1 (ko) * | 2014-10-17 | 2016-11-17 | 한양대학교 에리카산학협력단 | 실리콘 표면 에칭방법 및 시드층 형성방법 |
| DE102015212202A1 (de) * | 2015-06-30 | 2017-01-05 | Robert Bosch Gmbh | Siliciummonolith-Graphit-Anode für eine Lithium-Zelle |
| KR101801789B1 (ko) | 2015-11-05 | 2017-11-28 | 한국과학기술연구원 | 다공성 탄소 재료 및 이의 제조 방법 |
| KR101859811B1 (ko) * | 2016-03-07 | 2018-06-28 | 한국과학기술원 | 금속 나노입자와 금속 초박막이 코팅된 전도성 단결정 실리콘 입자, 이를 포함하는 고용량 이차전지용 음극활물질 및 그 제조방법 |
| US11289700B2 (en) | 2016-06-28 | 2022-03-29 | The Research Foundation For The State University Of New York | KVOPO4 cathode for sodium ion batteries |
| CN108075164A (zh) * | 2016-11-09 | 2018-05-25 | 林逸樵 | 二次电池及其制作方法 |
| CN108232204A (zh) * | 2016-12-10 | 2018-06-29 | 中国科学院大连化学物理研究所 | 一种硅基有序化电极及其制备方法和应用 |
| WO2018119679A1 (en) * | 2016-12-27 | 2018-07-05 | China Triumph International Engineering Co., Ltd. | Method for activation of cdte layer of cdte thin-film solar cells with calcium hypochlorite |
| CN109597250B (zh) * | 2018-12-26 | 2021-06-01 | Tcl华星光电技术有限公司 | 蓝相液晶面板的制作方法及其立体电极的制作方法 |
| CN110803706B (zh) * | 2019-12-04 | 2023-03-28 | 宝鸡文理学院 | 一种快速高效脱除介孔氧化硅材料模板剂的方法 |
| US12315736B2 (en) * | 2022-09-14 | 2025-05-27 | Applied Materials, Inc. | Methods of highly selective silicon oxide removal |
| WO2024249394A1 (en) * | 2023-05-27 | 2024-12-05 | University Of Louisville Research Foundation, Inc. | Materials and methods for high energy density silicon lithium ion batteries |
| KR102861629B1 (ko) * | 2024-06-03 | 2025-09-17 | 한화모멘텀 주식회사 | 음극재 및 이의 제조방법, 이를 포함하는 리튬이온 이차전지 |
| CN119419233B (zh) * | 2024-10-09 | 2025-12-19 | 浙江锂威能源科技有限公司 | 一种金属镀层包覆硅基材料及二次电池 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009524264A (ja) * | 2006-01-23 | 2009-06-25 | ネクソン・リミテッド | シリコン系材料のエッチング方法 |
| JP2011046603A (ja) * | 2007-07-17 | 2011-03-10 | Nexeon Ltd | シリコン又はシリコンベースの材料で構成される構造化粒子の製造方法及びリチウム蓄電池におけるそれらの使用 |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3436259A (en) * | 1966-05-12 | 1969-04-01 | Ibm | Method for plating and polishing a silicon planar surface |
| JP3186621B2 (ja) * | 1996-12-24 | 2001-07-11 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
| EP1208002A4 (en) | 1999-06-03 | 2006-08-02 | Penn State Res Found | MATERIALS WITH NETWORK OF SURFACE POROSITY COLUMNS DEPOSITED IN THIN FILM |
| US6790785B1 (en) * | 2000-09-15 | 2004-09-14 | The Board Of Trustees Of The University Of Illinois | Metal-assisted chemical etch porous silicon formation method |
| GB2395059B (en) | 2002-11-05 | 2005-03-16 | Imp College Innovations Ltd | Structured silicon anode |
| US7244513B2 (en) * | 2003-02-21 | 2007-07-17 | Nano-Proprietary, Inc. | Stain-etched silicon powder |
| FR2853562B1 (fr) * | 2003-04-14 | 2006-08-11 | Centre Nat Rech Scient | Procede de fabrication de granules semiconducteurs |
| TW200620451A (en) * | 2004-11-09 | 2006-06-16 | Univ Osaka | Method for forming hole in crystal substrate, and crystal substrate having hole formed by the method |
| DE102005041877A1 (de) * | 2005-09-02 | 2007-03-08 | Koynov, Svetoslav, Dr. | Verfahren zur Herstellung siliziumhaltiger Oberflächen und optoelektronische Bauelemente |
| CN101496199B (zh) * | 2006-10-10 | 2010-12-22 | 松下电器产业株式会社 | 非水电解质二次电池用负极 |
| JP2008171802A (ja) * | 2006-12-13 | 2008-07-24 | Matsushita Electric Ind Co Ltd | 非水電解質二次電池用負極とその製造方法およびそれを用いた非水電解質二次電池 |
| FR2914925B1 (fr) | 2007-04-13 | 2009-06-05 | Altis Semiconductor Snc | Solution utilisee dans la fabrication d'un materiau semi-conducteur poreux et procede de fabrication dudit materiau |
| GB0709165D0 (en) * | 2007-05-11 | 2007-06-20 | Nexeon Ltd | A silicon anode for a rechargeable battery |
| US8815104B2 (en) * | 2008-03-21 | 2014-08-26 | Alliance For Sustainable Energy, Llc | Copper-assisted, anti-reflection etching of silicon surfaces |
| WO2010027962A2 (en) * | 2008-09-04 | 2010-03-11 | The Board Of Trustees Of The University Of Illinois | Method of forming a nanoscale three-demensional pattern in a porous semiconductor |
| GB2464158B (en) * | 2008-10-10 | 2011-04-20 | Nexeon Ltd | A method of fabricating structured particles composed of silicon or a silicon-based material and their use in lithium rechargeable batteries |
| EP2226374B1 (en) * | 2009-03-06 | 2012-05-16 | S.O.I. TEC Silicon | Etching composition, in particular for silicon materials, method for characterizing defects of such materials and process of treating such surfaces with etching composition |
| US8278191B2 (en) * | 2009-03-31 | 2012-10-02 | Georgia Tech Research Corporation | Methods and systems for metal-assisted chemical etching of substrates |
| KR101103841B1 (ko) * | 2009-05-27 | 2012-01-06 | 한국과학기술연구원 | 금속이온 이용 무전해 에칭법에 의한 다발구조의 실리콘 나노로드 제조방법 및 이를 함유하는 리튬이차전지용 음극 활물질 |
| GB0922063D0 (en) | 2009-12-17 | 2010-02-03 | Intrinsiq Materials Global Ltd | Porous silicon |
| TWI472477B (zh) | 2010-03-02 | 2015-02-11 | 國立臺灣大學 | 矽奈米結構與其製造方法及應用 |
| GB201005979D0 (en) * | 2010-04-09 | 2010-05-26 | Nexeon Ltd | A method of fabricating structured particles composed of silicon or a silicon-based material and their use in lithium rechargeable batteries |
-
2011
- 2011-10-06 GB GBGB1117279.8A patent/GB201117279D0/en not_active Ceased
-
2012
- 2012-10-05 WO PCT/GB2012/052483 patent/WO2013050785A1/en not_active Ceased
- 2012-10-05 JP JP2014533992A patent/JP2015504568A/ja active Pending
- 2012-10-05 GB GB1217909.9A patent/GB2495405B/en not_active Expired - Fee Related
- 2012-10-05 KR KR1020147012116A patent/KR20140083006A/ko not_active Withdrawn
- 2012-10-05 EP EP12772390.6A patent/EP2764563B1/en not_active Not-in-force
- 2012-10-05 US US14/349,498 patent/US20140248539A1/en not_active Abandoned
- 2012-10-05 CN CN201280060454.7A patent/CN103988342A/zh active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009524264A (ja) * | 2006-01-23 | 2009-06-25 | ネクソン・リミテッド | シリコン系材料のエッチング方法 |
| JP2011046603A (ja) * | 2007-07-17 | 2011-03-10 | Nexeon Ltd | シリコン又はシリコンベースの材料で構成される構造化粒子の製造方法及びリチウム蓄電池におけるそれらの使用 |
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2015513912A (ja) * | 2012-04-02 | 2015-05-18 | モデルナ セラピューティクス インコーポレイテッドModerna Therapeutics,Inc. | タンパク質の産生のための修飾ポリヌクレオチド |
| JP2015513913A (ja) * | 2012-04-02 | 2015-05-18 | モデルナ セラピューティクス インコーポレイテッドModerna Therapeutics,Inc. | 修飾ポリヌクレオチド |
| JP2015516143A (ja) * | 2012-04-02 | 2015-06-08 | モデルナ セラピューティクス インコーポレイテッドModerna Therapeutics,Inc. | ヒト疾患に関連するタンパク質の産生のための修飾ポリヌクレオチド |
| JP2015518705A (ja) * | 2012-04-02 | 2015-07-06 | モデルナ セラピューティクス インコーポレイテッドModerna Therapeutics,Inc. | ヒト疾患に関連する生物製剤およびタンパク質の産生のための修飾ポリヌクレオチド |
| JP2015519881A (ja) * | 2012-04-02 | 2015-07-16 | モデルナ セラピューティクス インコーポレイテッドModerna Therapeutics,Inc. | 核タンパク質の産生のための修飾ポリヌクレオチド |
| JP2020026965A (ja) * | 2018-08-09 | 2020-02-20 | 株式会社東芝 | 処理システム、貴金属の触媒層に関する判断方法、及び、物品の製造方法 |
| JP7134778B2 (ja) | 2018-08-09 | 2022-09-12 | 株式会社東芝 | 処理システム |
| WO2021167434A1 (ko) * | 2020-02-20 | 2021-08-26 | 한양대학교 에리카산학협력단 | 금속 음극 전극, 이를 포함하는 이차 전지, 및 그 제조 방법 |
| US12444764B2 (en) | 2020-02-20 | 2025-10-14 | Flexolyte | Complex fiber, solid state electrolyte comprising same, and metal-air battery comprising same |
| JPWO2022065450A1 (enExample) * | 2020-09-25 | 2022-03-31 | ||
| WO2022065450A1 (ja) * | 2020-09-25 | 2022-03-31 | 国立大学法人東北大学 | リチウムイオン二次電池用の負極合剤、およびリチウムイオン二次電池 |
| JP7766349B2 (ja) | 2020-09-25 | 2025-11-10 | 国立大学法人東北大学 | リチウムイオン二次電池用の負極合剤、およびリチウムイオン二次電池 |
Also Published As
| Publication number | Publication date |
|---|---|
| GB201117279D0 (en) | 2011-11-16 |
| CN103988342A (zh) | 2014-08-13 |
| GB2495405B (en) | 2014-11-12 |
| GB201217909D0 (en) | 2012-11-21 |
| US20140248539A1 (en) | 2014-09-04 |
| EP2764563A1 (en) | 2014-08-13 |
| WO2013050785A1 (en) | 2013-04-11 |
| GB2495405A (en) | 2013-04-10 |
| EP2764563B1 (en) | 2016-09-21 |
| KR20140083006A (ko) | 2014-07-03 |
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